JP2010274635A5 - - Google Patents

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Publication number
JP2010274635A5
JP2010274635A5 JP2009132430A JP2009132430A JP2010274635A5 JP 2010274635 A5 JP2010274635 A5 JP 2010274635A5 JP 2009132430 A JP2009132430 A JP 2009132430A JP 2009132430 A JP2009132430 A JP 2009132430A JP 2010274635 A5 JP2010274635 A5 JP 2010274635A5
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JP
Japan
Prior art keywords
mold
substrate
imprint
imprint apparatus
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009132430A
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English (en)
Japanese (ja)
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JP2010274635A (ja
JP5563243B2 (ja
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Publication date
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Priority to JP2009132430A priority Critical patent/JP5563243B2/ja
Priority claimed from JP2009132430A external-priority patent/JP5563243B2/ja
Publication of JP2010274635A publication Critical patent/JP2010274635A/ja
Publication of JP2010274635A5 publication Critical patent/JP2010274635A5/ja
Application granted granted Critical
Publication of JP5563243B2 publication Critical patent/JP5563243B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009132430A 2009-06-01 2009-06-01 インプリント装置、および、物品の製造方法 Expired - Fee Related JP5563243B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009132430A JP5563243B2 (ja) 2009-06-01 2009-06-01 インプリント装置、および、物品の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009132430A JP5563243B2 (ja) 2009-06-01 2009-06-01 インプリント装置、および、物品の製造方法

Publications (3)

Publication Number Publication Date
JP2010274635A JP2010274635A (ja) 2010-12-09
JP2010274635A5 true JP2010274635A5 (cg-RX-API-DMAC7.html) 2012-07-19
JP5563243B2 JP5563243B2 (ja) 2014-07-30

Family

ID=43422037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009132430A Expired - Fee Related JP5563243B2 (ja) 2009-06-01 2009-06-01 インプリント装置、および、物品の製造方法

Country Status (1)

Country Link
JP (1) JP5563243B2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5820707B2 (ja) * 2011-11-30 2015-11-24 株式会社Ｓｃｒｅｅｎホールディングス パターン転写方法およびパターン転写装置
JP6602033B2 (ja) * 2015-03-31 2019-11-06 キヤノン株式会社 インプリント装置、供給量分布の作成方法、インプリント方法、及び物品の製造方法
JP7134055B2 (ja) * 2018-10-09 2022-09-09 キヤノン株式会社 成形装置、および物品の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5000112B2 (ja) * 2005-09-09 2012-08-15 東京応化工業株式会社 ナノインプリントリソグラフィによるパターン形成方法
JP4854313B2 (ja) * 2006-01-27 2012-01-18 東芝機械株式会社 転写装置における制御装置
US7774287B2 (en) * 2006-03-14 2010-08-10 Asml Netherlands B.V. System and method for moving a component through a setpoint profile, lithographic apparatus and device manufacturing method
JP4810319B2 (ja) * 2006-06-09 2011-11-09 キヤノン株式会社 加工装置及びデバイス製造方法
JP5238164B2 (ja) * 2007-01-26 2013-07-17 株式会社東芝 パターン形成方法
WO2008099795A2 (en) * 2007-02-06 2008-08-21 Canon Kabushiki Kaisha Imprint method and imprint apparatus
JP2008246729A (ja) * 2007-03-29 2008-10-16 Sumitomo Heavy Ind Ltd 成形装置及びそれによる成形方法
US8945444B2 (en) * 2007-12-04 2015-02-03 Canon Nanotechnologies, Inc. High throughput imprint based on contact line motion tracking control

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