JP2010251410A - ウエハ接合装置 - Google Patents
ウエハ接合装置 Download PDFInfo
- Publication number
- JP2010251410A JP2010251410A JP2009097050A JP2009097050A JP2010251410A JP 2010251410 A JP2010251410 A JP 2010251410A JP 2009097050 A JP2009097050 A JP 2009097050A JP 2009097050 A JP2009097050 A JP 2009097050A JP 2010251410 A JP2010251410 A JP 2010251410A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- jig
- wafers
- silicon
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009097050A JP2010251410A (ja) | 2009-04-13 | 2009-04-13 | ウエハ接合装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009097050A JP2010251410A (ja) | 2009-04-13 | 2009-04-13 | ウエハ接合装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010251410A true JP2010251410A (ja) | 2010-11-04 |
| JP2010251410A5 JP2010251410A5 (enExample) | 2012-04-05 |
Family
ID=43313453
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009097050A Pending JP2010251410A (ja) | 2009-04-13 | 2009-04-13 | ウエハ接合装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2010251410A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016114329A1 (en) * | 2015-01-16 | 2016-07-21 | Tokyo Electron Limited | Joint apparatus, joint system, and joint method |
| WO2016114328A1 (en) * | 2015-01-16 | 2016-07-21 | Tokyo Electron Limited | Joint apparatus, joint system, and joint method |
| JP2017108055A (ja) * | 2015-12-11 | 2017-06-15 | 東京エレクトロン株式会社 | 検査装置、接合装置、接合システムおよび検査方法 |
| CN112018002A (zh) * | 2020-08-25 | 2020-12-01 | 武汉新芯集成电路制造有限公司 | 晶圆键合设备及晶圆键合的方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005311298A (ja) * | 2004-01-22 | 2005-11-04 | Bondotekku:Kk | 接合方法及びこの方法により作成されるデバイス並びに接合装置 |
-
2009
- 2009-04-13 JP JP2009097050A patent/JP2010251410A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005311298A (ja) * | 2004-01-22 | 2005-11-04 | Bondotekku:Kk | 接合方法及びこの方法により作成されるデバイス並びに接合装置 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016114329A1 (en) * | 2015-01-16 | 2016-07-21 | Tokyo Electron Limited | Joint apparatus, joint system, and joint method |
| WO2016114328A1 (en) * | 2015-01-16 | 2016-07-21 | Tokyo Electron Limited | Joint apparatus, joint system, and joint method |
| JP2016134457A (ja) * | 2015-01-16 | 2016-07-25 | 東京エレクトロン株式会社 | 接合装置、接合システムおよび接合方法 |
| JP2016134459A (ja) * | 2015-01-16 | 2016-07-25 | 東京エレクトロン株式会社 | 接合装置、接合システムおよび接合方法 |
| JP2017108055A (ja) * | 2015-12-11 | 2017-06-15 | 東京エレクトロン株式会社 | 検査装置、接合装置、接合システムおよび検査方法 |
| CN112018002A (zh) * | 2020-08-25 | 2020-12-01 | 武汉新芯集成电路制造有限公司 | 晶圆键合设备及晶圆键合的方法 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10037968B2 (en) | Alignment systems and wafer bonding systems and methods | |
| JP6395600B2 (ja) | 撮像装置の製造方法および半導体装置の製造方法 | |
| US7091599B2 (en) | Solid-state imaging device | |
| TWI488499B (zh) | 光敏感器件的透鏡校準之方法,裝置及實施其之系統 | |
| JP6315859B2 (ja) | 撮像装置、半導体装置および撮像ユニット | |
| KR100687069B1 (ko) | 보호판이 부착된 이미지 센서 칩과 그의 제조 방법 | |
| JP4559993B2 (ja) | 半導体装置の製造方法 | |
| CN110957333B (zh) | 晶圆级图像传感器封装件 | |
| JP7542885B2 (ja) | 接合方法および接合装置 | |
| TWI395253B (zh) | 使用自我組織化功能之積體電路裝置的製造方法及製造裝置 | |
| WO2005022631A1 (ja) | 半導体パッケージおよびその製造方法 | |
| TWI614881B (zh) | 感光模組及其製造方法 | |
| WO2009084700A1 (en) | Semiconductor package including through-hole electrode and light-transmitting substrate | |
| JP6147250B2 (ja) | 撮像装置の製造方法および半導体装置の製造方法 | |
| JPH07326641A (ja) | フリップ・チップ接合のための装置と方法 | |
| WO2008044675A1 (en) | Solid-state imaging device | |
| TW201624683A (zh) | 感光模組及其製造方法 | |
| JP2010251410A (ja) | ウエハ接合装置 | |
| WO2007052796A1 (ja) | 光学装置用モジュール、光学装置用モジュールの製造方法、及び、構造体 | |
| JP4867373B2 (ja) | ウェハホルダ及び半導体装置の製造方法 | |
| US7037747B2 (en) | Method of manufacturing optical device | |
| US7811849B2 (en) | Placing a MEMS part on an application platform using a guide mask | |
| TWI589016B (zh) | 感光模組及其製造方法 | |
| JP2005026346A (ja) | 半導体チップの積層方法 | |
| JP2008300551A (ja) | 裏面照射型撮像素子及びその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120222 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120222 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20131025 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131029 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20140304 |