JP2010192549A5 - - Google Patents
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- Publication number
- JP2010192549A5 JP2010192549A5 JP2009033382A JP2009033382A JP2010192549A5 JP 2010192549 A5 JP2010192549 A5 JP 2010192549A5 JP 2009033382 A JP2009033382 A JP 2009033382A JP 2009033382 A JP2009033382 A JP 2009033382A JP 2010192549 A5 JP2010192549 A5 JP 2010192549A5
- Authority
- JP
- Japan
- Prior art keywords
- microbubbles
- liquid
- liquid containing
- substrate
- electric field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 41
- 239000000758 substrate Substances 0.000 claims description 22
- 230000005684 electric field Effects 0.000 claims description 9
- 238000003672 processing method Methods 0.000 claims description 3
- 239000002101 nanobubble Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009033382A JP5412131B2 (ja) | 2009-02-17 | 2009-02-17 | 基板処理装置および基板処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009033382A JP5412131B2 (ja) | 2009-02-17 | 2009-02-17 | 基板処理装置および基板処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010192549A JP2010192549A (ja) | 2010-09-02 |
| JP2010192549A5 true JP2010192549A5 (enExample) | 2012-03-29 |
| JP5412131B2 JP5412131B2 (ja) | 2014-02-12 |
Family
ID=42818293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009033382A Expired - Fee Related JP5412131B2 (ja) | 2009-02-17 | 2009-02-17 | 基板処理装置および基板処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5412131B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012090815A1 (ja) * | 2010-12-28 | 2012-07-05 | シャープ株式会社 | レジスト除去装置及びレジスト除去方法 |
| JP2012250301A (ja) * | 2011-05-31 | 2012-12-20 | Kyocera Crystal Device Corp | ナノバブル循環型研磨装置 |
| JP5854668B2 (ja) * | 2011-07-07 | 2016-02-09 | 芝浦メカトロニクス株式会社 | 気液混合流体生成装置、気液混合流体生成方法、処理装置及び処理方法 |
| US9308542B2 (en) | 2011-07-29 | 2016-04-12 | Tokyo Electron Limited | Treatment solution supply apparatus, treatment solution supply method, and computer storage medium |
| JP5781015B2 (ja) * | 2012-05-31 | 2015-09-16 | 三菱電機株式会社 | ウェハ洗浄装置及び洗浄槽の洗浄方法 |
| JP6372329B2 (ja) * | 2014-12-03 | 2018-08-15 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法 |
| TWI718962B (zh) * | 2020-06-11 | 2021-02-11 | 威光自動化科技股份有限公司 | 液管內之氣泡篩選器 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3205413B2 (ja) * | 1993-02-15 | 2001-09-04 | 株式会社日立製作所 | 微粒子計測装置及び微粒子計測方法 |
| JP2006179765A (ja) * | 2004-12-24 | 2006-07-06 | Dainippon Screen Mfg Co Ltd | 基板処理装置およびパーティクル除去方法 |
| JP2007117799A (ja) * | 2005-10-25 | 2007-05-17 | Goto Tekkosho:Kk | 微細気泡生成器及びこれを用いた微細気泡生成装置 |
-
2009
- 2009-02-17 JP JP2009033382A patent/JP5412131B2/ja not_active Expired - Fee Related
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