JP2010184203A5 - - Google Patents

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Publication number
JP2010184203A5
JP2010184203A5 JP2009030366A JP2009030366A JP2010184203A5 JP 2010184203 A5 JP2010184203 A5 JP 2010184203A5 JP 2009030366 A JP2009030366 A JP 2009030366A JP 2009030366 A JP2009030366 A JP 2009030366A JP 2010184203 A5 JP2010184203 A5 JP 2010184203A5
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JP
Japan
Prior art keywords
spectrum
control device
combination
visible light
wavelength range
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Application number
JP2009030366A
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English (en)
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JP5340760B2 (ja
JP2010184203A (ja
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Application filed filed Critical
Priority claimed from JP2009030366A external-priority patent/JP5340760B2/ja
Priority to JP2009030366A priority Critical patent/JP5340760B2/ja
Priority to US13/201,155 priority patent/US20110315228A1/en
Priority to PCT/JP2010/051973 priority patent/WO2010092985A1/ja
Priority to KR1020117018132A priority patent/KR20110114613A/ko
Priority to CN2010800072264A priority patent/CN102316967A/zh
Priority to TW099104628A priority patent/TWI494729B/zh
Publication of JP2010184203A publication Critical patent/JP2010184203A/ja
Publication of JP2010184203A5 publication Critical patent/JP2010184203A5/ja
Publication of JP5340760B2 publication Critical patent/JP5340760B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Claims (1)

  1. 前記スペクトル測定の波長範囲は、８００〜２６００ｎｍの近赤外線スペクトル、４００〜８００ｎｍの可視光スペクトルもしくは１５０〜４００ｎｍの紫外線スペクトル又はそれらの組合せである請求項２５に記載の流体制御装置。
JP2009030366A 2009-02-12 2009-02-12 流体制御方法及び流体制御装置 Expired - Fee Related JP5340760B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2009030366A JP5340760B2 (ja) 2009-02-12 2009-02-12 流体制御方法及び流体制御装置
CN2010800072264A CN102316967A (zh) 2009-02-12 2010-02-10 流体控制方法及流体控制装置
PCT/JP2010/051973 WO2010092985A1 (ja) 2009-02-12 2010-02-10 流体制御方法及び流体制御装置
KR1020117018132A KR20110114613A (ko) 2009-02-12 2010-02-10 유체제어방법 및 유체제어장치
US13/201,155 US20110315228A1 (en) 2009-02-12 2010-02-10 Fluid control method and fluid control device
TW099104628A TWI494729B (zh) 2009-02-12 2010-02-12 Fluid control method and fluid control device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009030366A JP5340760B2 (ja) 2009-02-12 2009-02-12 流体制御方法及び流体制御装置

Publications (3)

Publication Number Publication Date
JP2010184203A JP2010184203A (ja) 2010-08-26
JP2010184203A5 true JP2010184203A5 (ja) 2012-02-16
JP5340760B2 JP5340760B2 (ja) 2013-11-13

Family

ID=42561826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009030366A Expired - Fee Related JP5340760B2 (ja) 2009-02-12 2009-02-12 流体制御方法及び流体制御装置

Country Status (6)

Country Link
US (1) US20110315228A1 (ja)
JP (1) JP5340760B2 (ja)
KR (1) KR20110114613A (ja)
CN (1) CN102316967A (ja)
TW (1) TWI494729B (ja)
WO (1) WO2010092985A1 (ja)

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JP5741056B2 (ja) * 2011-02-25 2015-07-01 栗田工業株式会社 ガス溶解水の製造装置
KR101958387B1 (ko) * 2011-07-28 2019-03-20 주식회사 동진쎄미켐 근적외선 분광기를 이용한 구리막 식각 공정 제어방법 및 구리막 식각액 조성물의 재생방법
TW201706396A (zh) * 2011-08-22 2017-02-16 1366科技公司 用於酸性溼式化學蝕刻矽晶片之調配物
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CN105301174B (zh) * 2014-07-16 2017-07-18 中国科学院苏州纳米技术与纳米仿生研究所 用于微流控芯片的试剂滴定方法及装置、微流控芯片
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JP6909620B2 (ja) * 2017-04-20 2021-07-28 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法
JP7110558B2 (ja) * 2017-09-01 2022-08-02 日産自動車株式会社 混合燃料供給装置及び混合燃料供給方法
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JP2020055214A (ja) * 2018-10-02 2020-04-09 東芝テック株式会社 液体吐出ヘッド及びプリンタ
CN111640661B (zh) * 2019-03-01 2024-01-30 东京毅力科创株式会社 基板处理方法、基板处理装置以及存储介质
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