JP2010179381A - 放電加工液組成物および放電加工方法 - Google Patents
放電加工液組成物および放電加工方法 Download PDFInfo
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Landscapes
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
【解決手段】イミド化合物と水とを含有する放電加工液組成物。前記イミド化合物としては、コハク酸イミド、マレイン酸イミド、グルタル酸イミド、またはフタル酸イミド等を用いることができ、放電加工液組成物中のイミド化合物の含有率は、0.001質量%以上1.0質量%以下が好ましい。また、放電加工液組成物は、ベンゾトリアゾール化合物や糖を含有していてもよい。
【選択図】なし
Description
[式(1)中、Rは炭素数1〜6のアルキレン基、炭素数1〜6のアルケニレン基、またはフェニレン基を表す。]
表1に示すように、各試薬を所定の比率で配合し、各成分を水に溶解し、放電加工液組成物を得た。表1中、コハク酸イミド、マレイン酸イミド、およびグルタル酸イミドは、イミド化合物に相当し、D−ソルビトールは糖に相当し、ベンゾトリアゾールはベンゾトリアゾール化合物に相当し、N−メチル−2−ピロリドンは極性溶媒に相当する。なお、1,1,1−トリス(ヒドロキシメチル)エタンは、従来、放電加工液組成物に用いられる成分として、比較対象として用いた。
(2−1)導電率の測定
各放電加工液組成物の導電率を、導電率計EC Testr11+(アズワン社製)を用いて測定した。測定結果は表1に示した。
500mLビーカーに、上記(1)で得られた各放電加工液組成物を400mL入れ、そこに試験片(SPCC:冷間圧延鋼板、#240研磨、60mm×80mm×1.2mm)を浸漬し、25℃で48時間放置した後、試験片のさび発生状況を観察した。試験片の作製と試験片のさび発生状況に基づくさび発生度の評価は、JIS K 2246:2007に基づいて行った。さび発生度の評価は、下記基準に従い、評価結果を表1に示した。
A:さび発生度が0%
B:さび発生度が1%〜10%
C:さび発生度が11%〜25%
D:さび発生度が26%〜50%
E:さび発生度が51%〜100%
500mLビーカーに放電加工液組成物500mLを入れ、放電加工液組成物をスターラーで攪拌しながら、循環ポンプを用いて、放電加工液組成物を強酸性陽イオン交換樹脂(アンバーライトIR120B、オルガノ社製)15mLを充填したカラムと強塩基性陰イオン交換樹脂(アンバーライトIRA400、オルガノ社製)15mLを充填したカラムとに通液し、ビーカーとカラム間を循環させた。試験で使用した強酸性陽イオン交換樹脂は、骨格としてポリスチレンを、官能基としてスルホン酸基を有し、試験で使用した強塩基性陰イオン交換樹脂は、骨格としてポリスチレンを、官能基としてトリメチルアンモニウム基を有していた。放電加工液組成物は、25℃で、15mL/分の流速で、カラムに通液した。なお、通液開始時、カラムおよびカラムに接続されたチューブ中には、脱イオン水が50mL残留していた。
(3−1)防錆試験および導電率
放電加工液組成物No.1〜12は、いずれもイミド化合物を含有しており、防錆試験ではいずれもC以上のさび発生度の評価となり、十分な防錆効果を有していた。また、放電加工液組成物No.1〜12は、導電率がいずれも20μS/cm以下と低い値であり、放電加工に使用可能であることが分かった。
放電加工液組成物No.4(コハク酸イミドとD−ソルビトールを含有)と放電加工液組成物No.17(D−ソルビトールとベンゾトリアゾールとを含有)とを比較すると、コハク酸イミドはベンゾトリアゾールよりイオン交換樹脂に吸着されにくい結果となった。放電加工液組成物No.4(コハク酸イミドとD−ソルビトールを含有)と放電加工液組成物No.12(コハク酸イミドとD−ソルビトールとベンゾトリアゾールとを含有)とを比較すると、ベンゾトリアゾールが共存することで、コハク酸イミドのイオン交換樹脂への吸着が抑えられる結果となった。放電加工液組成物No.4を通液後、同じイオン交換樹脂に放電加工液組成物No.17を通液した場合、ベンゾトリアゾールがイオン交換樹脂に吸着されてビーカー中のベンゾトリアゾール濃度が低下するに従い、コハク酸イミドがイオン交換樹脂から溶出することが確認された。これらの結果より、ベンゾトリアゾールは、イミド化合物のイオン交換樹脂への吸着を防ぐ犠牲薬剤としての効果を有していることが分かった。
Claims (7)
- イミド化合物と水とを含有することを特徴とする放電加工液組成物。
- 前記イミド化合物が、下記式(1)で示されるイミド化合物である請求項1に記載の放電加工液組成物。
[式(1)中、Rは炭素数1〜6のアルキレン基、炭素数1〜6のアルケニレン基、またはフェニレン基を表す。] - さらに、ベンゾトリアゾール化合物を含む請求項1または2に記載の放電加工液組成物。
- 前記イミド化合物を、0.001質量%以上1.0質量%以下含有する請求項1〜3のいずれか一項に記載の放電加工液組成物。
- 前記イミド化合物が、コハク酸イミド、マレイン酸イミド、グルタル酸イミド、およびフタル酸イミドよりなる群から選ばれる少なくとも一種である請求項1〜4のいずれか一項に記載の放電加工液組成物。
- さらに、糖を含む請求項1〜5のいずれか一項に記載の放電加工液組成物。
- 請求項1〜6のいずれか一項に記載の放電加工液組成物を含む液中で放電加工を行うことを特徴とする放電加工方法。
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2014043625A (ja) * | 2012-08-28 | 2014-03-13 | Chubu Kiresuto Kk | 防錆剤組成物および水性防錆潤滑剤、並びにこれを用いた金属材の加工法 |
Citations (4)
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JPH04193419A (ja) * | 1990-11-28 | 1992-07-13 | Yushiro Chem Ind Co Ltd | 改良された水溶液系放電加工液 |
JPH04250921A (ja) * | 1990-12-28 | 1992-09-07 | Mitsubishi Electric Corp | 水溶液系放電加工液 |
JPH06170647A (ja) * | 1992-10-13 | 1994-06-21 | Nobuyuki Takahashi | 粉末濃縮分散液状物および粉末分散放電加工液 |
JP2003514063A (ja) * | 1999-10-29 | 2003-04-15 | ビーエーエスエフ アクチェンゲゼルシャフト | ジカルボン酸、モリブデン酸塩およびトリアゾールまたはチアゾールを基礎とする凍結防止剤濃縮物ならびにこの凍結防止剤濃縮物を含有する冷媒組成物 |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04193419A (ja) * | 1990-11-28 | 1992-07-13 | Yushiro Chem Ind Co Ltd | 改良された水溶液系放電加工液 |
JPH04250921A (ja) * | 1990-12-28 | 1992-09-07 | Mitsubishi Electric Corp | 水溶液系放電加工液 |
JPH06170647A (ja) * | 1992-10-13 | 1994-06-21 | Nobuyuki Takahashi | 粉末濃縮分散液状物および粉末分散放電加工液 |
JP2003514063A (ja) * | 1999-10-29 | 2003-04-15 | ビーエーエスエフ アクチェンゲゼルシャフト | ジカルボン酸、モリブデン酸塩およびトリアゾールまたはチアゾールを基礎とする凍結防止剤濃縮物ならびにこの凍結防止剤濃縮物を含有する冷媒組成物 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014043625A (ja) * | 2012-08-28 | 2014-03-13 | Chubu Kiresuto Kk | 防錆剤組成物および水性防錆潤滑剤、並びにこれを用いた金属材の加工法 |
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