JP2010147051A5 - - Google Patents

Download PDF

Info

Publication number
JP2010147051A5
JP2010147051A5 JP2008319355A JP2008319355A JP2010147051A5 JP 2010147051 A5 JP2010147051 A5 JP 2010147051A5 JP 2008319355 A JP2008319355 A JP 2008319355A JP 2008319355 A JP2008319355 A JP 2008319355A JP 2010147051 A5 JP2010147051 A5 JP 2010147051A5
Authority
JP
Japan
Prior art keywords
metal layer
resist film
forming
opening
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008319355A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010147051A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008319355A priority Critical patent/JP2010147051A/ja
Priority claimed from JP2008319355A external-priority patent/JP2010147051A/ja
Publication of JP2010147051A publication Critical patent/JP2010147051A/ja
Publication of JP2010147051A5 publication Critical patent/JP2010147051A5/ja
Pending legal-status Critical Current

Links

JP2008319355A 2008-12-16 2008-12-16 半導体集積回路装置および半導体集積回路装置の製造方法 Pending JP2010147051A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008319355A JP2010147051A (ja) 2008-12-16 2008-12-16 半導体集積回路装置および半導体集積回路装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008319355A JP2010147051A (ja) 2008-12-16 2008-12-16 半導体集積回路装置および半導体集積回路装置の製造方法

Publications (2)

Publication Number Publication Date
JP2010147051A JP2010147051A (ja) 2010-07-01
JP2010147051A5 true JP2010147051A5 (cg-RX-API-DMAC7.html) 2012-01-26

Family

ID=42567200

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008319355A Pending JP2010147051A (ja) 2008-12-16 2008-12-16 半導体集積回路装置および半導体集積回路装置の製造方法

Country Status (1)

Country Link
JP (1) JP2010147051A (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150171039A1 (en) * 2013-12-13 2015-06-18 Chipmos Technologies Inc. Redistribution layer alloy structure and manufacturing method thereof
JP6522980B2 (ja) * 2015-02-18 2019-05-29 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003152014A (ja) * 2001-11-09 2003-05-23 Shinko Electric Ind Co Ltd 半導体装置の製造方法及び半導体装置
JP5388422B2 (ja) * 2007-05-11 2014-01-15 スパンション エルエルシー 半導体装置及びその製造方法

Similar Documents

Publication Publication Date Title
CN100562991C (zh) 半导体封装结构及其形成方法
TW571371B (en) Method for fabricating semiconductor package
TWI706519B (zh) 具有可路由囊封的傳導基板的半導體封裝及方法
US20070178686A1 (en) Interconnect substrate, semiconductor device, and method of manufacturing the same
JP2009194144A5 (cg-RX-API-DMAC7.html)
TWI590396B (zh) 用於積體電路封裝的外露式可焊接散熱器
JP2010103398A5 (cg-RX-API-DMAC7.html)
CN1503359A (zh) 电子元件封装结构及制造该电子元件封装结构的方法
CN103794587B (zh) 一种高散热芯片嵌入式重布线封装结构及其制作方法
JP2011023574A5 (cg-RX-API-DMAC7.html)
TWI446508B (zh) 無核心式封裝基板及其製法
JP2010239126A5 (ja) パッケージ基板および半導体装置の製造方法
JP2010129899A5 (cg-RX-API-DMAC7.html)
TW201330129A (zh) 致能無凸塊增層式(bbul)封裝體上之封裝體疊加(pop)墊表面修整層之技術
JP2016219559A5 (cg-RX-API-DMAC7.html)
JP2008235555A5 (cg-RX-API-DMAC7.html)
CN103050466B (zh) 半导体封装件及其制法
JP4763639B2 (ja) 電子素子パッケージの製造方法
JP2009004609A5 (cg-RX-API-DMAC7.html)
JP2010147051A5 (cg-RX-API-DMAC7.html)
TWI447823B (zh) 四邊扁平無接腳封裝方法
CN101083214A (zh) 封装基板的制造方法
TWI789151B (zh) 電子封裝件及其製法
TWI405308B (zh) 封裝件及其製造方法
JP2017538280A5 (cg-RX-API-DMAC7.html)