JP2010103321A - Electrostatic chuck device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a technique for suppressing the direct transmission of load applied from the external to a connection terminal to a ceramic substrate. <P>SOLUTION: An electrostatic chuck device includes: a ceramic substrate; a metallic base member in which a through-hole penetrated up to the lower surface of the ceramic substrate is formed; an insulator of a hollow shape which engages with the metallic base member in the through-hole; a first terminal arranged in the insulator and electrically connected to a conductor in a state of junction with the lower surface of the ceramic substrate; and a second terminal electrically connected to the first terminal. In the first and second terminals, either one terminal is a male terminal and the other is a female terminal and is electrically connected in a slidable state along an inserting direction of the second terminal. A first engagement part between the second terminal and the insulator and a second engagement part between the insulator and the metallic base member are configured so that load applied from an external apparatus to the second terminal is transmitted from the second terminal to the metallic base member through the insulator. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to an electrostatic chuck device.

  The electrostatic chuck device is used for fixing a substrate, correcting the flatness, transporting, etc. in various processing devices (for example, an etching device, an ion implantation device, an electron beam exposure device, etc.) used in the manufacture of semiconductors and liquid crystal panels. Device. As such an electrostatic chuck device, for example, a device described in Patent Document 1 is known. The electrostatic chuck device includes a metal base member and a ceramic substrate provided on the base member. A conductor is embedded in the ceramic substrate. In addition, a connection terminal for making an electrical connection with a control device (also referred to as “external device”) is embedded in the metal base member. The electrostatic chuck device and the control device are electrically connected by pressing the front end surface of the connection terminal of the electrostatic chuck device and the front end surface of the connection terminal of the control device in contact with each other.

JP 2004-31599 A

  In the conventional connection method, the load received from the connection terminal of the control device is directly transmitted to the ceramic substrate. Thereby, for example, there is a problem that the ceramic substrate is broken or the ceramic substrate and the metal base member are separated.

  An object of this invention is to provide the technique which suppresses that the load to the connection terminal from the outside is transmitted to a ceramic substrate directly.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

[Application Example 1]
An electrostatic chuck device,
A ceramic substrate having a conductor therein and on which a wafer is placed;
A metal base member bonded to the lower surface of the ceramic substrate and having a through hole reaching the lower surface of the ceramic substrate;
A hollow insulator disposed in the through hole and engaged with the metal base member;
A first terminal disposed inside the insulator and electrically connected to the conductor in a state of being bonded to the lower surface of the ceramic substrate;
A second terminal electrically connected to an external device and electrically connected to the first terminal in a state engaged with the insulator;
With
One of the first terminal and the second terminal is a male terminal and the other is a female terminal, and is a terminal that is electrically connected so as to be slidable along the insertion direction of the second terminal. And
A first engagement portion between the second terminal and the insulator and a second engagement portion between the insulator and the metal base member are connected to the second device from the external device. An electrostatic chuck device configured to transmit a load applied to a terminal from the second terminal to the metal base member through the insulator.
If it carries out like this, the load added to a 2nd terminal from an external device will be disperse | distributed to a metal base member by the 1st engaging part and the 2nd engaging part. In addition, by connecting the first terminal and the second terminal in a slidable state, it is possible to suppress transmission of a load applied to the second terminal from the external device to the first terminal. it can. As a result, it is possible to suppress the external load applied to the connection terminal from being directly transmitted to the ceramic substrate.

[Application Example 2]
An electrostatic chuck device according to Application Example 1,
The second terminal is a first engaging element that constitutes the first engaging portion.
A terminal reduced diameter portion whose diameter decreases as it approaches the lower surface of the ceramic substrate inside the through hole,
A terminal screw portion having a screw structure at an outer peripheral portion engaged with the insulator;
One of the
The metal base member, as a second engagement element constituting the second engagement portion,
A through-hole reduced diameter portion in which the diameter of the through-hole decreases as it approaches the lower surface of the ceramic substrate;
A through-hole screw portion having a screw structure on the inner periphery of the through-hole,
One of the
The insulator includes two engagement elements that engage with the first engagement element of the second terminal and the second engagement element of the metal base member, Electrostatic chuck device.
If it carries out like this, the load added to a 2nd terminal from an external apparatus will be transmitted from the 1st engaging element of a 2nd terminal to the engaging element of an insulator. Then, it is transmitted to the second engagement element of the metal base member through the other engagement element of the insulator, and is distributed to the entire metal base member. As a result, it is possible to suppress the external load applied to the connection terminal from being directly transmitted to the ceramic substrate.

[Application Example 3]
An electrostatic chuck device according to Application Example 1 or 2,
At least one of the first terminal and the second terminal has a plurality of contact members made of spring material on the inner periphery of the female terminal or the outer periphery of the male terminal. apparatus.
If it carries out like this, the contact point of a 1st terminal and a 2nd terminal can be increased with a some contact member. Further, by using a spring material for the contact member, it is possible to cope with a positional shift between the first terminal and the second terminal. As a result, the first terminal and the second terminal can be brought into reliable contact and electrical connection can be ensured.

Next, embodiments of the present invention and experimental results will be described in the following order.
A. Example 1:
B. Example 2:
C. Example 3:
D. Variation:

A. Example 1:
FIG. 1 is a partial sectional view of an electrostatic chuck apparatus 10 as an embodiment of the present invention. FIG. 2 is an exploded view of FIG. The electrostatic chuck device 10 includes a ceramic substrate 100 and a metal base member 200.

  The ceramic substrate 100 has a flat plate shape with a constant thickness and a substantially circular shape, and is formed of a sintered body having a ceramic multilayer structure mainly composed of alumina. A member to be adsorbed such as a substrate (for example, a semiconductor wafer) (not shown) is placed on the upper surface 102 of the ceramic substrate 100. A plurality of electrostatic electrodes 110 as conductors are embedded in the ceramic substrate 100. An electrostatic force is generated by applying a voltage to the electrostatic electrode 110, and the substrate placed on the upper surface 102 is held. The ceramic substrate 100 may be provided with a resistance heating element for a heater in addition to the electrostatic electrode 110 as a conductor. Further, a gas flow path for supplying helium gas to the upper surface 102 may be provided inside the ceramic substrate 100.

  The metal base member 200 is a member having a constant thickness and a disk shape larger in diameter than the ceramic substrate 100. The metal base member 200 can be made of, for example, aluminum. The upper surface 202 of the metal base member 200 and the lower surface 104 of the ceramic substrate 100 are arranged concentrically and joined by an adhesive layer 150 made of silicon resin.

  The metal base member 200 is formed with a plurality of through holes 240 that penetrate the metal base member 200 and reach the lower surface 104 of the ceramic substrate 100 (FIG. 2). A hollow insulator 210 that engages with the inner periphery of the metal base member 200 is fitted into the through hole 240. The insulator 210 is fixed to the inner peripheral surface of the through hole 240 with an adhesive or the like. A buffer member 140 is disposed between the insulator 210 and the lower surface 104 of the ceramic substrate 100 (FIG. 2). The buffer member 140 is made of, for example, silicon resin. The buffer member 140 can suppress damage caused by direct contact between the ceramic substrate 100 and the insulator 210.

  A female terminal 120 is provided inside the insulator 210. The female terminal 120 is joined to the lower surface 104 of the ceramic substrate 100 by brazing. The female terminal 120 is electrically connected to the electrostatic electrode 110 by an electrode terminal (not shown).

  As shown in FIG. 2, the male terminal 250 includes a male terminal base member 230 and a male terminal tip member 220. The male terminal 250 is formed by fitting the screw portion 236 of the male terminal base member 230 into the tip screw portion 224 of the male terminal tip member 220 so as to be integrated. The male terminal tip member 220 includes a plurality of contact members 222 on the outer periphery thereof. The contact member 222 is an arc-shaped leaf spring, and is a member for contacting the female terminal inner periphery 122 of the female terminal 120. As described above, the contact points between the male terminal 250 and the female terminal 120 can be increased by using the plurality of contact members 222. Further, by using a leaf spring for the contact member 222, for example, even when a positional deviation occurs between the male terminal 250 and the female terminal 120, the contact member 222 and the female terminal inner periphery 122 can be reliably connected. It can be contacted to ensure electrical connection. In addition, the direction in which the contact member 222 is disposed can be an arbitrary direction. For example, you may arrange | position so that a spiral may be drawn on the surface of the male terminal front-end | tip member 220. FIG. The contact member 222 may be made of a spring material other than a leaf spring. Further, the contact member 222 can be configured without using a spring material. However, from the viewpoint of reliably connecting the male terminal 250 and the female terminal 120, it is preferable to use a spring material for the contact member 222.

  FIG. 3 is an explanatory view showing a manufacturing process of the electrostatic chuck device. At the time of manufacture, first, as shown in FIG. 3A, a recess 106 for installing the female terminal 120 is formed on the lower surface 104 of the ceramic substrate 100. Next, as shown in FIG. 3B, the female terminal 120 is brazed to the ceramic substrate 100 in a state where the female terminal 120 is accurately positioned in the recess 106. For this brazing, for example, silver brazing can be used. Next, as shown in FIG. 3C, the buffer member 140 is installed in the recess 106, and an adhesive is applied to the lower surface 104 of the ceramic substrate 100 to form an adhesive layer 150. Then, a joined body of the metal base member 200 and the insulator 210 is installed on the lower surface 104 of the ceramic substrate 100, and the substrate 100 and the metal base member 200 are bonded via the adhesive layer 150. Note that the metal base member 200 and the insulator 210 are bonded to each other in advance with an adhesive or the like prior to the step of FIG.

  FIG. 4 is an enlarged cross-sectional view of the electrostatic chuck device 10 with the male terminal 250 inserted. The male terminal 250 and the insulator 210 have steps 232 and 212, respectively. When the male terminal 250 is inserted, these steps 232 and 212 are engaged with each other. Each of these steps 232 and 212 is a step whose diameter decreases toward the top of FIG. 4 (the direction toward the ceramic substrate 100). Therefore, when an upward force is applied to the male terminal 250 from the outside, the force is transmitted to the insulator 210 via the engaging portions formed by the steps 232 and 212. The step 232 of the male terminal 250 is also referred to as a “terminal reduced diameter portion” or a “terminal engaging element”. The step 212 of the insulator 210 is also referred to as “insulator engaging element”.

  In the present specification, a portion that transmits force by a structural or geometrical engagement relationship is called an “engagement portion”, and two elements that form the engagement portion are called “engagement elements”. .

  The insulator 210 and the metal base member 200 are engaged with each other at steps 214 and 244 different from those described above. These steps 214 and 244 are also steps whose diameters decrease toward the top of FIG. Therefore, when an upward force is applied to the insulator 210 from the outside via the male terminal 250, the force is transmitted to the metal base member 200 via the engaging portions formed by the steps 214 and 244. Since the step 244 of the metal base member 200 is provided in the through hole 240, it is also referred to as a “through hole reduced diameter portion”. The step 214 of the insulator 210 is also referred to as “insulator engaging element”. The steps 232, 212, 214, 244 do not have to be steps perpendicular to the insertion direction of the male terminal 250. For example, the diameter of the male terminal base member 230 can be gradually reduced to obtain a terminal reduced diameter portion. Note that the male terminal 250 itself can be used as a terminal on the external device side.

  The male terminal 250 is inserted into the inner periphery of the female terminal 120 from the lower surface 204 of the metal base member 200, and the male terminal 250 and the female terminal 120 are connected so as to be slidable along the insertion direction. is there. The male terminal 250 and the female terminal 120 are electrically connected when the outer peripheral surface of the male terminal tip member 220 and the inner peripheral surface of the female terminal 120 are in contact with each other. Further, the electrostatic chuck device 10 and the external device are electrically connected by being pressed in a state where the connection surface 235 of the male terminal base member 230 and the terminal on the external device side are in contact with each other.

  As described above, in this embodiment, the male terminal 250 and the female terminal 120 are electrically connected in a slidable state, and the force applied to the male terminal 250 from the outside is almost related to the female terminal 120. It has no structure. Moreover, the force which concerns on the male terminal 250 from an external device is the engagement part (232, 212) between the male terminal 250 and the insulator 210, and the engagement between the insulator 210 and the metal base member 200. It is transmitted to the metal base member 200 via the parts (214, 244). Therefore, it is possible to suppress the force related to the male terminal 250 from being directly transmitted to the ceramic substrate 100 from the outside, and it is possible to suppress the separation between the ceramic substrate 100 and the metal base member 200.

  FIG. 5 is an enlarged cross-sectional view of the electrostatic chuck device 10c in the comparative example. In the electrostatic chuck device 10c, the diameter of the through hole 240c of the metal base member 200c is substantially constant from the lower surface 204 to the upper surface 202 of the metal base member 200c. Further, there is no distinction between a male terminal and a female terminal, and it is electrically connected to an external device through a connection terminal 290 having a substantially constant diameter, similar to the through hole 240c. Specifically, the connection is made by pressing the connection surface 295 of the connection terminal 290 and the terminal on the external device side in contact. Further, the inner and outer diameters of the insulator 210c inserted between the connection terminal 290 and the metal base member 200c are also substantially constant. That is, the said Example and a comparative example differ in the point which does not have an engaging part, and the point which does not have a male terminal and a female terminal.

  The terminal on the external device side is strongly pressed against the connection surface 295 using a force such as a spring in order to securely connect the external device and the electrostatic chuck device 10c. For this reason, in the comparative example, the force applied to the connection terminal 290 from the outside is directly transmitted to the ceramic substrate 100. Thereby, for example, there is a problem that the ceramic substrate 100 is damaged or the ceramic substrate 100 and the metal base member 200c are separated.

  On the other hand, in the first embodiment, the force applied from the external device to the connection surface 235 of the male terminal 250 is the first engaging portion between the male terminal 250 and the insulator 210, and the insulator 210 and the metal. It is transmitted to the metal base member 200 via the second engaging portion with the base member 200. In other words, in the first embodiment, the load from the outside is distributed to the metal base member 200 by these two engaging portions. In addition, the male terminal 250 and the female terminal 120 are electrically connected so as to be slidable along the insertion direction of the male terminal 250, and play is provided between the male terminal 250 and the female terminal 120. ing. For this reason, it is possible to suppress the load applied to the male terminal 250 from being transmitted to the female terminal 120. Furthermore, even if there are variations in the size of each part (for example, male terminal 250, female terminal 120, insulator 210, metal base member 200, etc.) constituting the electrostatic chuck device 10, the male terminal 250 and the female terminal 120 can be securely connected to each other.

  As described above, the electrostatic chuck device 10 according to the first embodiment can suppress the load on the connection terminal from the outside from being directly transmitted to the ceramic substrate 100. As a result, problems such as breakage of the ceramic substrate 100 and peeling of the ceramic substrate 100 and the metal base member 200 in the comparative example can be improved.

B. Example 2:
FIG. 6 is an enlarged sectional view and an exploded sectional view of the electrostatic chuck device 10a in the second embodiment. The shape of the engaging element is different from that of the first embodiment shown in FIG. Other configurations are substantially the same as those of the first embodiment.

  In the second embodiment, the male terminal 250a and the insulator 210a have screw portions 237 and 217, respectively, and when the male terminal 250a is fitted, these screw portions 237 and 217 are engaged with each other. Therefore, when an upward force is applied to the male terminal 250a from the outside, the force is transmitted to the insulator 210a through the engaging portions by the screw portions 237 and 217. Since the screw portion 237 of the male terminal 250a is provided on the outer periphery of the male terminal 250a, it is also referred to as a “terminal screw portion” or “terminal engaging element”. The screw portion 217 of the insulator 210a is also referred to as “insulator engaging element”.

  The insulator 210a and the metal base member 200a are fitted to each other by screw portions 218 and 248 different from those described above. Therefore, when an upward force is applied to the insulator 210a from the outside via the male terminal 250a, the force is transmitted to the metal base member 200a via the engaging portions by the screw portions 218 and 248. In addition, since the screw part 248 of the metal base member 200a is provided on the inner periphery of the through hole 240a, it is also referred to as a “through hole screw part”. Further, the screw portion 218 of the insulator 210a is also referred to as an “insulator engaging element”.

  Even in such a configuration, as in the first embodiment, the force applied from the external device to the male terminal 250a is distributed to the metal base member 200 via the engaging portion. As a result, it is possible to suppress a load on the connection terminal from the outside from being directly transmitted to the ceramic substrate 100.

C. Example 3:
FIG. 7 is an enlarged sectional view and an exploded sectional view of the electrostatic chuck device 10b according to the third embodiment. The main difference from the first embodiment shown in FIG. 1 is that the male terminal 250b is fixed by using the first insulator 260 and the second insulator 270 instead of the insulator 210. Is substantially the same as that of the first embodiment.

  In the third embodiment, a hollow first insulator 260 that engages with the inner periphery of the metal base member 200b is fitted into the through hole 240b. The first insulator 260 is fixed to the inner peripheral surface of the through hole 240b with an adhesive or the like. The male terminal 250 b is inserted into the joined body of the metal base member 200 b and the first insulator 260. With the male terminal 250b inserted, the second insulator 270 having the locking screw 271 on the outer periphery is fitted into the through hole 240b. The male terminal 250b is fixed by engaging the locking portion 273 of the second insulator 270 and the flange portion 231 of the male terminal 250b.

  The male terminal 250b has a step 232b. When the male terminal 250b is inserted, the step 232b and the lower surface 262 of the first insulator 260 are engaged with each other. Therefore, when an upward force is applied to the male terminal 250b from the outside, the force is transmitted to the first insulator 260 through the engaging portion formed by the step 232b and the lower surface 262, as in the first embodiment. The step 232b of the male terminal 250b is also referred to as a “terminal reduced diameter portion”. The lower surface 262 of the first insulator 260 is also referred to as “insulator engaging element”.

  The first insulator 260 and the metal base member 200b are engaged with each other at steps 264 and 244b different from those described above. These steps 264 and 244b are steps whose diameter decreases toward the top of FIG. Therefore, when an upward force is applied to the first insulator 260 from the outside via the male terminal 250b, the force is applied to the metal base via the engaging portions formed by the steps 264 and 244b, as in the first embodiment. It is transmitted to the member 200b. The step 244b of the metal base member 200b is also referred to as a “through-hole diameter-reduced portion”. The step 264 of the first insulator 260 is also referred to as “insulator engaging element”.

  Even in such a configuration, as in the first embodiment, the force applied from the external device to the male terminal 250b is distributed to the metal base member 200b via the engaging portion. As a result, it is possible to suppress a load on the connection terminal from the outside from being directly transmitted to the ceramic substrate 100.

D. Variation:
The present invention is not limited to the above-described examples and embodiments, and can be implemented in various modes without departing from the gist thereof. For example, the following modifications are possible.

D1. Modification 1:
In the said 1st and 3rd Example, the structure provided with a terminal reduced diameter part as a 1st engagement element, and the through-hole reduced diameter part as a 2nd engagement element was described. Moreover, in the said 2nd Example, the structure provided with a terminal screw part as a 1st engagement element, and the through-hole screw part as a 2nd engagement element was described. However, these engagement elements can be in any combination. For example, a configuration in which a terminal reduced diameter portion is provided as the first engagement element and a through-hole screw portion is provided as the second engagement element may be employed.

D2. Modification 2:
In the said Example, the 1st terminal was described as a female terminal and the 2nd terminal was described as a male terminal. Moreover, it described as having a contact member comprised with the spring material in the male terminal side. However, these can be changed in any combination. For example, the first terminal may be a male terminal and the second terminal may be a female terminal, and a contact member made of a spring material may be provided on the inner periphery of the female terminal on the female terminal side. Furthermore, it is good also as a structure provided with the contact member comprised with the spring material in both the outer periphery of a male terminal, and the inner periphery of a female terminal.

D3. Modification 3:
In the said Example, the shape of each part which comprises an electrostatic chuck apparatus was illustrated. However, each part (for example, a male terminal, a female terminal, an insulator, a metal base member, etc.) constituting the electrostatic chuck device can adopt an arbitrary shape without departing from the gist of the present invention.

D4. Modification 4:
In the said Example, it illustrated about the material of the member which comprises each part of an electrostatic chuck apparatus. However, the material of the members constituting each part of the electrostatic chuck device is not limited to the exemplified material, and any material can be used.

It is a fragmentary sectional view of electrostatic chuck device 10 as one example of the present invention. FIG. 2 is an exploded view of FIG. 1. It is explanatory drawing which shows the manufacturing process of an electrostatic chuck apparatus. It is an expanded sectional view of electrostatic chuck device 10 in the state where male terminal 250 was inserted. It is an expanded sectional view of the electrostatic chuck apparatus 10c in a comparative example. It is an expanded sectional view and an exploded sectional view of electrostatic chuck device 10a in the 2nd example. It is the expanded sectional view and exploded sectional view of the electrostatic chuck apparatus 10b in 3rd Example.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10, 10a-c ... Electrostatic chuck apparatus 100 ... Ceramic substrate 102 ... Upper surface of ceramic substrate 104 ... Lower surface of ceramic substrate 106 ... Concave 110 ... Electrostatic electrode 120 ... Female terminal 122 ... Female terminal inner periphery 140 ... Buffer member 150 ... Adhesive layer 200, 200a-c ... Metal base member 202 ... Metal base member upper surface 204 ... Metal base member lower surface 210, 210a-210c ... Insulator 212 ... Step 214 ... Step 217 ... Screw part 218 ... Screw Part 220: Male terminal tip member 222 ... Contact member 224 ... Tip screw part 230 ... Male terminal base member 231 ... Gutter part 232, 232b ... Step 235 ... Connection surface 236 ... Screw part 237 ... Screw part 240, 240a-c ... Through Hole 244, 244b ... Step 248 ... Screw part 250, 250a-b ... Male terminal 260 ... first insulator 262 ... lower surface of the first insulator 264 ... step 270 ... second insulator 271 ... locking screw 273 ... locking portion 290 ... connection terminal 295 ... connection surface

Claims (3)

An electrostatic chuck device,
A ceramic substrate having a conductor therein and on which a wafer is placed;
A metal base member bonded to the lower surface of the ceramic substrate and having a through hole reaching the lower surface of the ceramic substrate;
A hollow insulator disposed in the through hole and engaged with the metal base member;
A first terminal disposed inside the insulator and electrically connected to the conductor in a state of being bonded to the lower surface of the ceramic substrate;
A second terminal electrically connected to an external device and electrically connected to the first terminal in a state engaged with the insulator;
With
One of the first terminal and the second terminal is a male terminal and the other is a female terminal, and is a terminal that is electrically connected so as to be slidable along the insertion direction of the second terminal. And
A first engagement portion between the second terminal and the insulator and a second engagement portion between the insulator and the metal base member are connected to the second device from the external device. An electrostatic chuck device configured to transmit a load applied to a terminal from the second terminal to the metal base member through the insulator. The electrostatic chuck device according to claim 1,
The second terminal is a first engaging element that constitutes the first engaging portion.
A terminal reduced diameter portion whose diameter decreases as it approaches the lower surface of the ceramic substrate inside the through hole,
A terminal screw portion having a screw structure at an outer peripheral portion engaged with the insulator;
One of the
The metal base member, as a second engagement element constituting the second engagement portion,
A through-hole diameter-reduced portion in which the diameter of the through-hole decreases as it approaches the lower surface of the ceramic substrate;
A through-hole screw portion having a screw structure on the inner periphery of the through-hole,
One of the
The insulator includes two engagement elements that engage with the first engagement element of the second terminal and the second engagement element of the metal base member, Electrostatic chuck device. The electrostatic chuck device according to claim 1 or 2,
At least one of the first terminal and the second terminal has a plurality of contact members made of spring material on the inner periphery of the female terminal or the outer periphery of the male terminal. apparatus.

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