JP2010034566A - 塗布、現像装置 - Google Patents

塗布、現像装置 Download PDF

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Publication number
JP2010034566A
JP2010034566A JP2009211737A JP2009211737A JP2010034566A JP 2010034566 A JP2010034566 A JP 2010034566A JP 2009211737 A JP2009211737 A JP 2009211737A JP 2009211737 A JP2009211737 A JP 2009211737A JP 2010034566 A JP2010034566 A JP 2010034566A
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JP
Japan
Prior art keywords
unit
block
processing
substrate
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009211737A
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English (en)
Japanese (ja)
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JP2010034566A5 (OSRAM
Inventor
Masami Akumoto
正巳 飽本
Shinichi Hayashi
伸一 林
Yasushi Hayashida
林田  安
Nobuaki Matsuoka
伸明 松岡
Yoshio Kimura
義雄 木村
Kazunari Ueda
一成 上田
Akira Ito
晃 伊東
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2009211737A priority Critical patent/JP2010034566A/ja
Publication of JP2010034566A publication Critical patent/JP2010034566A/ja
Publication of JP2010034566A5 publication Critical patent/JP2010034566A5/ja
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009211737A 2009-09-14 2009-09-14 塗布、現像装置 Pending JP2010034566A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009211737A JP2010034566A (ja) 2009-09-14 2009-09-14 塗布、現像装置

Applications Claiming Priority (1)

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JP2009211737A JP2010034566A (ja) 2009-09-14 2009-09-14 塗布、現像装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2005025509A Division JP4459831B2 (ja) 2005-02-01 2005-02-01 塗布、現像装置

Publications (2)

Publication Number Publication Date
JP2010034566A true JP2010034566A (ja) 2010-02-12
JP2010034566A5 JP2010034566A5 (OSRAM) 2010-11-18

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ID=41738610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009211737A Pending JP2010034566A (ja) 2009-09-14 2009-09-14 塗布、現像装置

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JP (1) JP2010034566A (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021057546A (ja) * 2019-10-02 2021-04-08 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法
JP2021086909A (ja) * 2019-11-27 2021-06-03 株式会社Screenホールディングス 基板処理装置および基板搬送方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05178416A (ja) * 1991-11-05 1993-07-20 Tokyo Electron Ltd 板状体の処理装置及び搬送装置
JP2002252156A (ja) * 2001-02-22 2002-09-06 Tokyo Electron Ltd 処理装置
JP2004266283A (ja) * 2004-03-15 2004-09-24 Tokyo Electron Ltd 基板処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05178416A (ja) * 1991-11-05 1993-07-20 Tokyo Electron Ltd 板状体の処理装置及び搬送装置
JP2002252156A (ja) * 2001-02-22 2002-09-06 Tokyo Electron Ltd 処理装置
JP2004266283A (ja) * 2004-03-15 2004-09-24 Tokyo Electron Ltd 基板処理装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021057546A (ja) * 2019-10-02 2021-04-08 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法
JP6994489B2 (ja) 2019-10-02 2022-01-14 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法
JP2021086909A (ja) * 2019-11-27 2021-06-03 株式会社Screenホールディングス 基板処理装置および基板搬送方法
US12035576B2 (en) 2019-11-27 2024-07-09 SCREEN Holdings Co., Ltd. Substrate treating apparatus and substrate transporting method

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