JP2009545878A5 - - Google Patents

Download PDF

Info

Publication number
JP2009545878A5
JP2009545878A5 JP2009522771A JP2009522771A JP2009545878A5 JP 2009545878 A5 JP2009545878 A5 JP 2009545878A5 JP 2009522771 A JP2009522771 A JP 2009522771A JP 2009522771 A JP2009522771 A JP 2009522771A JP 2009545878 A5 JP2009545878 A5 JP 2009545878A5
Authority
JP
Japan
Prior art keywords
electronic device
particulate material
substrate
thin film
embedding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009522771A
Other languages
English (en)
Other versions
JP2009545878A (ja
Filing date
Publication date
Priority claimed from US11/461,080 external-priority patent/US7678701B2/en
Application filed filed Critical
Publication of JP2009545878A publication Critical patent/JP2009545878A/ja
Publication of JP2009545878A5 publication Critical patent/JP2009545878A5/ja
Pending legal-status Critical Current

Links

Claims (4)

  1. 電子デバイスの製造方法であって、
    a)少なくとも1つのプラスチック材料を含む基板を用意する工程と、
    b)微粒子材料を前記基板の少なくとも1つの表面内に埋め込む工程と、
    c)前記微粒子材料を有する前記表面上で薄膜電子デバイスを形成する工程と、
    を含む、方法。
  2. d)前記微粒子材料を前記基板の第2の表面内に埋め込む工程と、
    e)前記埋め込まれた微粒子材料を有する前記第2の表面上に薄膜電子デバイスを形成する工程と、
    をさらに含む、請求項1記載の方法。
  3. 前記電子デバイスは1つまたは複数の薄膜トランジスタを含む、請求項1記載の方法。
  4. 前記プラスチック材料は実質的に透明である、請求項1記載の方法。
JP2009522771A 2006-07-31 2007-07-16 電子デバイスが形成されたフレキシブル基板 Pending JP2009545878A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/461,080 US7678701B2 (en) 2006-07-31 2006-07-31 Flexible substrate with electronic devices formed thereon
PCT/US2007/016085 WO2008016479A1 (en) 2006-07-31 2007-07-16 Flexible substrate with electronic devices formed thereon

Publications (2)

Publication Number Publication Date
JP2009545878A JP2009545878A (ja) 2009-12-24
JP2009545878A5 true JP2009545878A5 (ja) 2011-09-08

Family

ID=38669806

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009522771A Pending JP2009545878A (ja) 2006-07-31 2007-07-16 電子デバイスが形成されたフレキシブル基板

Country Status (5)

Country Link
US (2) US7678701B2 (ja)
EP (1) EP2047513A1 (ja)
JP (1) JP2009545878A (ja)
TW (1) TW200814333A (ja)
WO (1) WO2008016479A1 (ja)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7977170B2 (en) * 2006-10-03 2011-07-12 Eastman Kodak Company Flexible substrate with electronic devices and traces
US7913381B2 (en) * 2006-10-26 2011-03-29 Carestream Health, Inc. Metal substrate having electronic devices formed thereon
KR101408510B1 (ko) * 2007-05-18 2014-06-17 삼성전자주식회사 표시소자용 연성기판 및 이를 이용한 디스플레이 소자
US8502259B2 (en) 2008-01-11 2013-08-06 Industrial Technology Research Institute Light emitting device
US20090200543A1 (en) * 2008-02-08 2009-08-13 Roger Stanley Kerr Method of forming an electronic device on a substrate supported by a carrier and resultant device
US8800138B2 (en) * 2008-02-08 2014-08-12 Carestream Health, Inc. Method for conditioning a substrate surface for forming an electronic device thereon and resultant device
US20100032702A1 (en) * 2008-08-11 2010-02-11 E. I. Du Pont De Nemours And Company Light-Emitting Diode Housing Comprising Fluoropolymer
TWI400673B (zh) * 2009-02-18 2013-07-01 Prime View Int Co Ltd 可撓性顯示面板及其製作方法
US8074349B2 (en) * 2009-04-16 2011-12-13 Carestream Health, Inc. Magnetic hold-down for foil substrate processing
GB0909721D0 (en) * 2009-06-05 2009-07-22 Plastic Logic Ltd Dielectric seed layer
TWI387138B (zh) * 2009-07-10 2013-02-21 Ind Tech Res Inst 磁性發光元件、磁性發光裝置以及氮化物半導體模板
EP2404650A1 (de) * 2010-07-09 2012-01-11 Bayer MaterialScience AG Vorrichtung und Verfahren zur Fest-/Flüssig-Trennung von Fest-Flüssig-Suspensionen
JP5899220B2 (ja) * 2010-09-29 2016-04-06 ポスコ ロール状の母基板を利用したフレキシブル電子素子の製造方法、フレキシブル電子素子及びフレキシブル基板
USRE49869E1 (en) * 2015-02-10 2024-03-12 iBeam Materials, Inc. Group-III nitride devices and systems on IBAD-textured substrates
KR20160127892A (ko) * 2015-04-27 2016-11-07 삼성디스플레이 주식회사 플렉서블 기판 및 이를 포함하는 표시 장치
JP7044802B2 (ja) 2017-04-04 2022-03-30 ダブリュ.エル.ゴア アンド アソシエーツ,ゲゼルシャフト ミット ベシュレンクテル ハフツング 強化されたエラストマー及び統合電極を含む誘電複合体
JP2019121734A (ja) * 2018-01-10 2019-07-22 株式会社Joled 半導体装置および表示装置
EP3791697A1 (en) 2018-05-08 2021-03-17 W. L. Gore & Associates Inc Flexible and stretchable printed circuits on stretchable substrates
JP7089064B2 (ja) 2018-05-08 2022-06-21 ダブリュ.エル.ゴア アンド アソシエイツ,インコーポレイティド 皮膚適用のためのフレキシブルプリント回路
JP7085023B2 (ja) 2018-05-08 2022-06-15 ダブリュ.エル.ゴア アンド アソシエイツ,インコーポレイティド 伸長性基材及び非伸長性基材上の可撓性かつ耐久性プリント回路
CN109285462B (zh) * 2018-12-12 2021-04-20 武汉天马微电子有限公司 柔性显示面板及其制作方法、柔性显示装置
KR102084519B1 (ko) * 2019-07-16 2020-03-04 주식회사 오플렉스 자외선(uv) 경화형 점착제층을 포함하는 백플레이트 필름 및 이를 이용한 유기 발광 표시 장치 제조 방법

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5237436A (en) * 1990-12-14 1993-08-17 North American Philips Corporation Active matrix electro-optic display device with light shielding layer and projection and color employing same
US5891552A (en) * 1996-01-04 1999-04-06 Mobil Oil Corporation Printed plastic films and method of thermal transfer printing
US5817550A (en) 1996-03-05 1998-10-06 Regents Of The University Of California Method for formation of thin film transistors on plastic substrates
US6492026B1 (en) 2000-04-20 2002-12-10 Battelle Memorial Institute Smoothing and barrier layers on high Tg substrates
WO2001097974A1 (en) * 2000-06-19 2001-12-27 Caliper Technologies Corp. Methods and devices for enhancing bonded substrate yields and regulating temperature
JP2002108250A (ja) * 2000-09-29 2002-04-10 Sharp Corp アクティブマトリックス駆動型自発光表示装置及びその製造方法
DE10059498A1 (de) * 2000-11-30 2002-06-13 Infineon Technologies Ag Substrat mit einer halbleitenden Schicht, elektronisches Bauelement mit diesem Substrat, elektronische Schaltung mit mindestens einem solchen elektronischen Bauelement, druckbare Zusammensetzung sowie Verfahren zur Herstellung eines Substrats
US6762124B2 (en) 2001-02-14 2004-07-13 Avery Dennison Corporation Method for patterning a multilayered conductor/substrate structure
US7535624B2 (en) * 2001-07-09 2009-05-19 E Ink Corporation Electro-optic display and materials for use therein
US7110163B2 (en) * 2001-07-09 2006-09-19 E Ink Corporation Electro-optic display and lamination adhesive for use therein
JP2003045234A (ja) * 2001-07-26 2003-02-14 Dainippon Printing Co Ltd 透明導電性フィルム
TWI308231B (en) * 2001-08-28 2009-04-01 Sipix Imaging Inc Electrophoretic display
US20030193796A1 (en) * 2002-04-15 2003-10-16 Heeks Stephen K. Light-emitting devices
US7223672B2 (en) * 2002-04-24 2007-05-29 E Ink Corporation Processes for forming backplanes for electro-optic displays
EP1362682A1 (en) * 2002-05-13 2003-11-19 ZBD Displays Ltd, Method and apparatus for liquid crystal alignment
JP2004140267A (ja) 2002-10-18 2004-05-13 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JP2004200365A (ja) * 2002-12-18 2004-07-15 Konica Minolta Holdings Inc 有機薄膜トランジスタ素子
TWI330269B (en) 2002-12-27 2010-09-11 Semiconductor Energy Lab Separating method
US20050216075A1 (en) * 2003-04-08 2005-09-29 Xingwu Wang Materials and devices of enhanced electromagnetic transparency
JP4233433B2 (ja) * 2003-11-06 2009-03-04 シャープ株式会社 表示装置の製造方法
JP4554344B2 (ja) * 2003-12-02 2010-09-29 株式会社半導体エネルギー研究所 半導体装置の作製方法
EP1707590B1 (en) * 2003-12-26 2008-12-10 Toyo Boseki Kabushiki Kaisha Polyimide film
US8053171B2 (en) * 2004-01-16 2011-11-08 Semiconductor Energy Laboratory Co., Ltd. Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television
US20050163968A1 (en) * 2004-01-20 2005-07-28 Hanket Gregory M. Microfiller-reinforced polymer film
EP1737053B1 (en) * 2004-03-25 2012-02-29 National Institute of Advanced Industrial Science and Technology Thermoelectric conversion element and thermoelectric conversion module
JP5089027B2 (ja) * 2004-05-28 2012-12-05 株式会社半導体エネルギー研究所 半導体装置
EP1791185A1 (en) * 2004-07-27 2007-05-30 Quantum 14 KK Light-emitting element, light-emitting device and information display
JP4715149B2 (ja) * 2004-09-30 2011-07-06 ソニー株式会社 薄膜半導体装置の製造方法
US7582904B2 (en) * 2004-11-26 2009-09-01 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, display device and method for manufacturing thereof, and television device
US20060180890A1 (en) * 2005-01-18 2006-08-17 Naugler W E Jr Top emission flat panel display with sensor feedback stabilization
TWI408734B (zh) * 2005-04-28 2013-09-11 Semiconductor Energy Lab 半導體裝置及其製造方法
TWI402935B (zh) * 2005-05-17 2013-07-21 Koninkl Philips Electronics Nv 彩色主動矩陣顯示器
CN101203976B (zh) * 2005-06-20 2011-04-06 松下电器产业株式会社 膜-电极接合体的制造方法
KR101102152B1 (ko) * 2005-06-28 2012-01-02 삼성전자주식회사 유기박막 트랜지스터의 제조방법 및 그에 의해 제조된유기박막 트랜지스터
US20070002199A1 (en) * 2005-06-30 2007-01-04 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device and method for manufacturing the same
US20070007579A1 (en) * 2005-07-11 2007-01-11 Matrix Semiconductor, Inc. Memory cell comprising a thin film three-terminal switching device having a metal source and /or drain region
GB2430547A (en) 2005-09-20 2007-03-28 Seiko Epson Corp A method of producing a substrate having areas of different hydrophilicity and/or oleophilicity on the same surface
US7235736B1 (en) * 2006-03-18 2007-06-26 Solyndra, Inc. Monolithic integration of cylindrical solar cells

Similar Documents

Publication Publication Date Title
JP2009545878A5 (ja)
EP1901123A4 (en) PHOTOSENSITIVE ADHESIVE COMPOSITION AND ADHESIVE FILM, ADHESIVE SHEET, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND ELECTRONIC PART OBTAINED BY USING THE SAME
JP2010508794A5 (ja)
JP2009541939A5 (ja)
TWI318458B (en) Thin film transistor substrate and manufacturing method thereof
EP1870945A4 (en) METHOD FOR PRODUCING AN INGAALN FILM AND LIGHT-EMITTING COMPONENT ON A SILICON SUBSTRATE
JP2006189853A5 (ja)
GB2439599B (en) Thin film transistor array substrate and method fabricating the same
JP2010506400A5 (ja)
EP2319893A4 (en) LIGHT-SENSITIVE ADHESIVE, ADHESIVE, LACQUER, SHAFT, SEMICONDUCTOR WITH HAZARD AND SEMICONDUCTOR ELEMENT WITH LIGHT SENSITIVE COMPOSITION
JP2009529442A5 (ja)
JP2008044923A5 (ja)
WO2008133864A3 (en) Mass production of micro-optical devices, corresponding tools, and resultant structures
JP2005023300A5 (ja)
TW200737589A (en) Electronic device and antenna structure thereof
EP1939319A4 (en) SEMICONDUCTOR THIN FILM AND METHOD FOR PRODUCING THE SAME
EP1850373A3 (en) Method of forming highly orientated silicon film, method of manufacturing three-dimensional semiconductor device, and three-dimensional semiconductor device
JP2007129110A5 (ja)
TW200603270A (en) Method to form a film
TW200743219A (en) Thin film transistor array substrate structures and fabrication method thereof
JP2006528430A5 (ja)
JP2007157787A5 (ja)
SG149036A1 (en) A method of fabricating periodic nano-structure arrays with different feature sizes
TW200735271A (en) Semiconductor device fabrication method
FR2866983B1 (fr) Realisation d'une entite en materiau semiconducteur sur substrat