JP2009544146A5 - - Google Patents

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Publication number
JP2009544146A5
JP2009544146A5 JP2009518757A JP2009518757A JP2009544146A5 JP 2009544146 A5 JP2009544146 A5 JP 2009544146A5 JP 2009518757 A JP2009518757 A JP 2009518757A JP 2009518757 A JP2009518757 A JP 2009518757A JP 2009544146 A5 JP2009544146 A5 JP 2009544146A5
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JP
Japan
Prior art keywords
illumination system
strips
light beam
light
strip
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Application number
JP2009518757A
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English (en)
Japanese (ja)
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JP5369319B2 (ja
JP2009544146A (ja
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Priority claimed from DE102006032878A external-priority patent/DE102006032878A1/de
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Publication of JP2009544146A publication Critical patent/JP2009544146A/ja
Publication of JP2009544146A5 publication Critical patent/JP2009544146A5/ja
Application granted granted Critical
Publication of JP5369319B2 publication Critical patent/JP5369319B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009518757A 2006-07-15 2007-07-05 マイクロリソグラフィ投影露光装置の照明システム Expired - Fee Related JP5369319B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006032878.7 2006-07-15
DE102006032878A DE102006032878A1 (de) 2006-07-15 2006-07-15 Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage
PCT/EP2007/005943 WO2008009353A1 (de) 2006-07-15 2007-07-05 Beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage

Publications (3)

Publication Number Publication Date
JP2009544146A JP2009544146A (ja) 2009-12-10
JP2009544146A5 true JP2009544146A5 (https=) 2010-08-19
JP5369319B2 JP5369319B2 (ja) 2013-12-18

Family

ID=38536021

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009518757A Expired - Fee Related JP5369319B2 (ja) 2006-07-15 2007-07-05 マイクロリソグラフィ投影露光装置の照明システム

Country Status (5)

Country Link
US (1) US20090115991A1 (https=)
EP (1) EP2041625B1 (https=)
JP (1) JP5369319B2 (https=)
DE (1) DE102006032878A1 (https=)
WO (1) WO2008009353A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008009601A1 (de) * 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
US9116303B2 (en) * 2010-03-05 2015-08-25 Canon Kabushiki Kaisha Hologram with cells to control phase in two polarization directions and exposure apparatus
CN103154818B (zh) 2010-09-28 2015-07-15 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备的光学系统以及降低图像位置误差的方法
DE102011085334A1 (de) * 2011-10-27 2013-05-02 Carl Zeiss Smt Gmbh Optisches System in einer Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69132120T2 (de) * 1990-11-15 2000-09-21 Nikon Corp., Tokio/Tokyo Verfahren und Vorrichtung zur Projektionsbelichtung
US5459000A (en) * 1992-10-14 1995-10-17 Canon Kabushiki Kaisha Image projection method and device manufacturing method using the image projection method
JP3985346B2 (ja) * 1998-06-12 2007-10-03 株式会社ニコン 投影露光装置、投影露光装置の調整方法、及び投影露光方法
DE19829612A1 (de) * 1998-07-02 2000-01-05 Zeiss Carl Fa Beleuchtungssystem der Mikrolithographie mit Depolarisator
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
JP3927753B2 (ja) * 2000-03-31 2007-06-13 キヤノン株式会社 露光装置及びデバイス製造方法
DE10124474A1 (de) * 2001-05-19 2002-11-21 Zeiss Carl Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens
JP2003090978A (ja) * 2001-09-17 2003-03-28 Canon Inc 照明装置、露光装置及びデバイス製造方法
EP1367446A1 (en) * 2002-05-31 2003-12-03 ASML Netherlands B.V. Lithographic apparatus
TW200412617A (en) 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
AU2003255441A1 (en) * 2003-08-14 2005-03-29 Carl Zeiss Smt Ag Illuminating device for a microlithographic projection illumination system
US7408616B2 (en) * 2003-09-26 2008-08-05 Carl Zeiss Smt Ag Microlithographic exposure method as well as a projection exposure system for carrying out the method
TW201834020A (zh) * 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
WO2005050325A1 (en) * 2003-11-05 2005-06-02 Carl Zeiss Smt Ag Polarization-optimizing illumination system
TW201809801A (zh) * 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
JP4497968B2 (ja) * 2004-03-18 2010-07-07 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
JP2006005319A (ja) 2004-06-21 2006-01-05 Canon Inc 照明光学系及び方法、露光装置及びデバイス製造方法
US7548370B2 (en) * 2004-06-29 2009-06-16 Asml Holding N.V. Layered structure for a tile wave plate assembly
JP2006196715A (ja) * 2005-01-13 2006-07-27 Nikon Corp 光束変換素子、照明光学装置、露光装置、および露光方法
JP2006269462A (ja) * 2005-03-22 2006-10-05 Sony Corp 露光装置および照明装置
US7317512B2 (en) * 2005-07-11 2008-01-08 Asml Netherlands B.V. Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing method
US20070058151A1 (en) * 2005-09-13 2007-03-15 Asml Netherlands B.V. Optical element for use in lithography apparatus and method of conditioning radiation beam
US7525642B2 (en) * 2006-02-23 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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