JP2009533551A5 - - Google Patents

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Publication number
JP2009533551A5
JP2009533551A5 JP2009504629A JP2009504629A JP2009533551A5 JP 2009533551 A5 JP2009533551 A5 JP 2009533551A5 JP 2009504629 A JP2009504629 A JP 2009504629A JP 2009504629 A JP2009504629 A JP 2009504629A JP 2009533551 A5 JP2009533551 A5 JP 2009533551A5
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JP
Japan
Prior art keywords
cathode
bias
power supply
substrate
power
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Application number
JP2009504629A
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English (en)
Japanese (ja)
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JP2009533551A (ja
JP5541677B2 (ja
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Priority claimed from GB0607269A external-priority patent/GB2437080B/en
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Publication of JP2009533551A publication Critical patent/JP2009533551A/ja
Publication of JP2009533551A5 publication Critical patent/JP2009533551A5/ja
Application granted granted Critical
Publication of JP5541677B2 publication Critical patent/JP5541677B2/ja
Expired - Fee Related legal-status Critical Current
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JP2009504629A 2006-04-11 2007-04-10 真空処理装置、バイアス電源および真空処理装置の操作方法 Expired - Fee Related JP5541677B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0607269A GB2437080B (en) 2006-04-11 2006-04-11 A vacuum treatment apparatus, a bias power supply and a method of operating a vacuum treatment apparatus
GB0607269.8 2006-04-11
PCT/EP2007/003181 WO2007115819A1 (en) 2006-04-11 2007-04-10 A vacuum treatment apparatus, a bias power supply and a method of operating a vacuum treatment apparatus

Publications (3)

Publication Number Publication Date
JP2009533551A JP2009533551A (ja) 2009-09-17
JP2009533551A5 true JP2009533551A5 (https=) 2013-05-23
JP5541677B2 JP5541677B2 (ja) 2014-07-09

Family

ID=36539739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009504629A Expired - Fee Related JP5541677B2 (ja) 2006-04-11 2007-04-10 真空処理装置、バイアス電源および真空処理装置の操作方法

Country Status (7)

Country Link
US (1) US20100025230A1 (https=)
EP (1) EP2016610A1 (https=)
JP (1) JP5541677B2 (https=)
KR (1) KR20090007750A (https=)
CN (1) CN101461032B (https=)
GB (1) GB2437080B (https=)
WO (1) WO2007115819A1 (https=)

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