JP2009532901A5 - - Google Patents

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Publication number
JP2009532901A5
JP2009532901A5 JP2009504215A JP2009504215A JP2009532901A5 JP 2009532901 A5 JP2009532901 A5 JP 2009532901A5 JP 2009504215 A JP2009504215 A JP 2009504215A JP 2009504215 A JP2009504215 A JP 2009504215A JP 2009532901 A5 JP2009532901 A5 JP 2009532901A5
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JP
Japan
Prior art keywords
purge gas
vaporizer
gas mixture
vaporizable liquid
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009504215A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009532901A (ja
Filing date
Publication date
Priority claimed from US11/396,823 external-priority patent/US20060285091A1/en
Application filed filed Critical
Publication of JP2009532901A publication Critical patent/JP2009532901A/ja
Publication of JP2009532901A5 publication Critical patent/JP2009532901A5/ja
Pending legal-status Critical Current

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JP2009504215A 2006-04-03 2007-03-28 リソグラフィ用投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム Pending JP2009532901A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/396,823 US20060285091A1 (en) 2003-07-21 2006-04-03 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
PCT/US2007/007901 WO2007120451A1 (en) 2006-04-03 2007-03-28 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system

Publications (2)

Publication Number Publication Date
JP2009532901A JP2009532901A (ja) 2009-09-10
JP2009532901A5 true JP2009532901A5 (https=) 2011-10-20

Family

ID=38326249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009504215A Pending JP2009532901A (ja) 2006-04-03 2007-03-28 リソグラフィ用投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム

Country Status (8)

Country Link
US (2) US20060285091A1 (https=)
EP (1) EP2002309A1 (https=)
JP (1) JP2009532901A (https=)
KR (1) KR20080109813A (https=)
CN (2) CN101410760B (https=)
SG (1) SG173318A1 (https=)
TW (2) TW201202869A (https=)
WO (1) WO2007120451A1 (https=)

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US11624904B2 (en) 2019-08-06 2023-04-11 Kla Corporation Vapor as a protectant and lifetime extender in optical systems
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CN113457318B (zh) * 2020-03-31 2022-08-30 上海微电子装备（集团）股份有限公司 一种超洁净湿空气制备装置及光刻设备
US12085860B2 (en) * 2021-01-15 2024-09-10 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for monitoring and controlling extreme ultraviolet photolithography processes
KR102863968B1 (ko) * 2021-06-14 2025-09-25 에이에스엠엘 네델란즈 비.브이. 조명 소스 및 연관된 방법, 장치
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