JP2009520665A - SiO2及びその混合酸化物のナノスケール原粒子、その製造及び生地材料を処理するための使用 - Google Patents
SiO2及びその混合酸化物のナノスケール原粒子、その製造及び生地材料を処理するための使用 Download PDFInfo
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- JP2009520665A JP2009520665A JP2008546181A JP2008546181A JP2009520665A JP 2009520665 A JP2009520665 A JP 2009520665A JP 2008546181 A JP2008546181 A JP 2008546181A JP 2008546181 A JP2008546181 A JP 2008546181A JP 2009520665 A JP2009520665 A JP 2009520665A
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Abstract
Description
TMOS(テトラメチルオルトシリケート)1重量%を蒸留水に添加する。後の使用に関しては、TMOSの量は最適な作用を達成するための生地材料の重量に、そして、液体取り込み性に依存している。ノニオン性の洗剤液(化学名:脂肪族アルコールエトキシレート;商品名TissocylRLB、販売元Zschimmer&Schwarz社)1滴を得られた分散液に添加することにより均質な分散液とし、そして小型のナノスケール原粒子を得る。その後、使用するオルトシリケートの量に基づいて20モル%の硫酸アルミニウムを蒸留水に添加する。TMOSを用いて製造した初期に得られた分散液のうち、0.125重量部を第2の分散液0.625重量部と混合した。これはJanke&KunkelGmbH社より販売されている商品名Ultra−Turraxの強力分散装置において行った。混合プロセスは約20秒間継続した。
1.ゼータ電位の計測
TMOS0.5〜2重量%の濃度、及びTMOSの量に基づいて10〜30モル%のAl2(SO4)3並びに0.2g/l〜0.8g/lのノニオン性分散剤を有する水性懸濁液(弱酸性pH=4.5〜5.0)をMalvern Instruments社のZetasizerZS装置を用いて計測した。ゼータ電位を計算することによりナノスケール原粒子の荷電状態を調べた。結果によれば、ナノスケール粒子は−8mVの負電荷を有しており、そして硫酸アルミニウムを添加しないSiO2含有分散液は−100mVの負電荷を有していた。文献値は以下の表にまとめた。
上記した分散液をここで24時間−55℃で凍結乾燥した。白色の微細な粉末が得られた。ナノスケール粒子の結合比を検討するために、これらを固体本体NMRスペクトル分析を用いて分析した。検討の結果は、硫酸アルミニウムのTMOSの加水分解により−Si−O−Al−ネットワークがもたらされ、これはQグループ[Q4(2Al)]及び[Q4(1Al)]により説明することができる。
SiO2又はSiO2/Al2O3(粒径:100nm)を含有する分散液を以下に記載する通りフーラード上で種々の生地材料に対してコーティングした。
これはナノスケール粒子(SiO2又はSiO2/Al2O3)による生地材料のコーティングとその後の材料の疎水性化の化学的後処理を組み合わせたものである。従って、親水性化コーティングを先ず生地材料表面上に形成した。必要となる疎水性化薬剤、特にフッ化炭素樹脂は遥かに少量となることが後に明らかになる。疎水性化は好ましくは2工程の方法により行う。従って、まずナノスケール粒子を製造し(約100nmの粒径のSiO2又はSiO2/Al2O3)、そして次に適用して20分間80℃で乾燥した。次に従来の市販のフッ化炭素樹脂を以下に記載する通りフーラードを用いて生地材料上に適用した。親水性化生地材料に以下の組成、即ち0.5〜2重量%のTMOS;TMOSの量に基づいて10〜30モル%の硫酸アルミニウム、及び0.2g/l〜0.4g/lのノニオン性分散剤を有する分散液を含浸させた。
Claims (34)
- ナノスケール原粒子であって、1〜2000nm(ZetasizerNS装置(Nano Series)による粒径を計測する方法により測定)の平均粒径並びに負電荷を有することを特徴とするSiO2又はSiO2と他の金属酸化物、特にAl2O3との混合酸化物のナノスケール原粒子。
- 平均粒径が約40〜500nm、特に100〜150nmであることを特徴とする請求項1記載のナノスケール原粒子。
- 混合酸化物の、特にSiO2/Al2O3の形態のナノスケール原粒子であって、ゼータ電位(Zerasizer装置によるpHの関数としての計測方法により測定)が約−8〜−100mVであることを特徴とする、混合酸化物系の、特にSiO2/Al2O3の形態における、請求項1又は2記載のナノスケール原粒子。
- 混合酸化物のナノスケール原粒子であって、ゼータ電位が約−10〜−100mV、特に約−10〜−40mVであることを特徴とする請求項3記載のナノスケール原粒子。
- 約−100〜−200mV、特に約−100mVの負電荷を有することを特徴とする、SiO2の請求項1又は2記載のナノスケール原粒子。
- SiO2/Al2O3の混合酸化物であることを特徴とする請求項1〜4のいずれか一項に記載のナノスケール原粒子。
- SiO2と他の金属酸化物の混合酸化物であり、前記他の金属酸化物の約0.125〜0.625重量部、特に約0.125〜0.25重量部がSiO21重量部に割り当てられることを特徴とする請求項1〜6の少なくともいずれか一項に記載のナノスケール原粒子。
- −Si−O−Al−ネットワークを有し、Qグループ[Q4(2Al)]及び[Q4(1Al)]の固体NMRスペクトルを示す前記請求項1〜4又は6のいずれか一項に記載のナノスケール原粒子。
- 前記請求項1〜8の少なくともいずれか一項に記載のナノスケール粒子を含む液体媒体。
- ナノスケール原粒子が形成されている反応媒体であることを特徴とする請求項9記載の液体媒体。
- 液体構成成分が水及び/又はアルコール、特にメタノール及び/又はエタノールの形態である請求項9又は10記載の液体媒体。
- オルトシリケート、特にテトラメチルオルトシリケート(TMOS)の形態の分散液を強力な攪拌器で分散剤の存在下で攪拌して、オルトシリケートを加水分解してナノスケール原粒子とすること、又は、金属塩の分散液を前記オルトシリケートの分散液に混入させてSiO2と他の金属酸化物の混合酸化物を形成し、この分散液を強力攪拌器で攪拌し、そこに含有されるオルトシリケートを加水分解してナノスケール原粒子とすることを特徴とする請求項1〜11の少なくともいずれか一項に記載のナノスケール原粒子の製造方法。
- Ultra−Turax装置を強力な攪拌器として使用することを特徴とする請求項12記載のナノスケール原粒子の製造方法。
- それぞれの分散液におけるオルトシリケートの濃度が約0.5〜5重量%、特に約0.5〜2重量%に調節されることを特徴とする請求項12又は13に記載のナノスケール原の製造方法。
- ナノスケール原粒子の平均粒径を制御するためにTMOSの濃度、金属塩の濃度、分散剤の濃度、及び、水及び/又はアルコールへの分散手段を変動させることを特徴とする請求項12〜14のいずれか一項に記載のナノスケール原粒子の製造方法。
- ナノスケール原粒子の小型平均粒径、特に1〜10nmの平均粒径を調節するために、メタノール及び/又はエタノールを分散媒体として使用し、その際に特に約0.5〜0.001Nの濃度の希塩酸を特に反応促進剤として使用することを特徴とする請求項15記載のナノスケール原粒子の製造方法。
- 前記希塩酸の濃度が約0.008〜0.015Nに調節されることを特徴とする請求項16記載のナノスケール原粒子の製造方法。
- SiO2/Al2O3混合酸化物を製造するためにオルトシリケートの分散液をアルミニウム塩の分散液と強力な攪拌器を用いて混合することを特徴とする請求項12〜17のいずれか一項に記載のナノスケール原粒子の製造方法。
- 前記アルミニウム塩として硫酸アルミニウムを使用することを特徴とする請求項18記載のナノスケール原粒子の製造方法。
- オルトシリケートとの混合分散液中のアルミニウム塩、特に硫酸アルミニウムの濃度が、オルトシリケートの量に対して、約10〜30モル%、特に約15〜25モル%に調節されることを特徴とする請求項18又は19に記載のナノスケール原粒子の製造方法。
- ナノスケールのSiO2/Al2O3混合酸化物中において、Al2O3約0.125〜0.625重量部がSiO21重量部に割り当てられる、特にAl2O3約0.125〜0.25重量部がSiO21重量部に割り当てられるように方法を制御することを特徴とする請求項12〜20のいずれか一項に記載のナノスケール原粒子の製造方法。
- 疎水性生地材料の親水性化コーティングのための請求項1〜8の少なくともいずれか一項に記載のナノスケール原粒子の使用方法。
- 生地材料としてフィラメント、繊維、糸、織布、編地及び/又は不織布が親水性コーティングを付与されることを特徴とする請求項22記載のナノスケール原粒子の使用方法。
- 生地材料が有機重合体又はガラス材料を含むことを特徴とする請求項22又は請求項23記載のナノスケール原粒子の使用方法。
- 前記有機重合体がポリエステル、ポリオレフィン、特にエチレン及び/又はプロピレンの単独重合体又は共重合体、ハロゲン化ポリオレフィン、特にPVC、ポリアクリル酸誘導体(PAN)、ポリアミド及び/又はポリプロピレンであることを特徴とする請求項24記載のナノスケール原粒子の使用方法。
- 水滴の接触角の計測試験及び液体浸透時間試験により測定した場合に強力に顕在化した親水性の特性を有する生地材料を得る請求項22〜25のいずれか一項に記載のナノスケール原粒子の使用方法。
- ポリプロピレン不織布上で計測した場合に非親水性化ポリプロピレン不織布と比較して水滴接触角が120から60°に、ポリプロピレン織布上で同様に計測、比較した場合には117から48°に減少する程度に生地材料を親水化させることを特徴とする請求項26記載のナノスケール原粒子の使用方法。
- ポリプロピレン不織布上で計測した場合に、液体浸透時間試験において親水性化ポリプロピレン不織布が3秒未満のうちに被験液体で濡れる程度に生地材料を親水性化させることを特徴とする請求項26記載のナノスケール原粒子の使用方法。
- 親水性中間層を有さない生地材料と比較して、向上したアルコール及び油に対する駆散性を有する、疎水性の外層を生地材料の親水性コーティング上に形成することを特徴とする請求項22〜25の少なくともいずれか一項に記載のナノスケール原粒子の使用方法。
- 疎水性の外層を形成するために、フッ素化合物、特にフッ化炭素樹脂が、目標とされるアルコール及び油に対する駆散性が損なわれることなく、特に、親水性中間層を有さない生地材料と比較して有意に低減した適用量で使用されることを特徴とする請求項29記載のナノスケール原粒子の使用方法。
- 抗微生物性仕上げ加工、特に抗細菌性の仕上げ加工を生地材料の親水性コーティング上に設けることを特徴とする請求項22〜28の少なくともいずれか一項に記載のナノスケール原粒子の使用方法。
- 前記抗微生物性仕上げ加工を第4アンモニウム塩により、特に塩化ベンザルコニウム(アルキルベンジルジメチルアンモニウムクロリド)により形成することを特徴とする請求項31記載のナノスケール原粒子の使用方法。
- 前記抗微生物仕上げ加工において、長鎖アルキルを有する、特にアルキル鎖に12〜18炭素原子を有する第4アンモニウム塩を使用することを特徴とする請求項32記載のナノスケール原粒子の使用方法。
- ポリヘキサメチレンビグアニジウム塩、又は特に水溶性キトサンオリゴマーの形態のキトサンを抗微生物性の物質として使用することを特徴とする請求項31〜33のいずれか一項に記載のナノスケール原粒子の使用方法。
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DE102005062606A DE102005062606A1 (de) | 2005-12-23 | 2005-12-23 | Nanoskalige Teilchen auf der Basis von SiO2 und Mischoxiden hiervon, deren Herstellung und Verwendung zur Behandlung textiler Materialien |
PCT/EP2006/011657 WO2007079841A1 (de) | 2005-12-23 | 2006-12-05 | Nanoskalige teilchen auf der basis von sio2 und mischoxiden hiervon, deren herstellung und verwendung zur behandlung textiler materialien |
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JP (1) | JP2009520665A (ja) |
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EP2159319A1 (de) | 2008-08-25 | 2010-03-03 | Basf Se | Verfahren zum Behandeln von Textilen Substraten |
CN102587123A (zh) * | 2011-12-31 | 2012-07-18 | 潘雪峰 | 一种纳米SiO2添加的防水抗静电布料的生产方法 |
WO2014195762A1 (en) * | 2013-06-06 | 2014-12-11 | Pavia Farmaceutici S.R.L. | Antibacterial powders based on anionic silicon or titanium dioxide adsorbed with pharmaceutically active cations |
US11840797B1 (en) | 2014-11-26 | 2023-12-12 | Microban Products Company | Textile formulation and product with odor control |
CN107858828A (zh) * | 2017-11-16 | 2018-03-30 | 查治刚 | 量子材料涂料、其制备方法、量子材料涂覆布 |
CN109319797A (zh) * | 2018-10-12 | 2019-02-12 | 安庆北化大科技园有限公司 | 在油溶性体系中可梯度分布的纳米SiO2的制备方法及纳米SiO2 |
CN112899890B (zh) * | 2021-01-25 | 2022-02-18 | 浙江祥隆科技有限公司 | 一种纳米SiO2接枝聚丙烯腈防水透气纤维膜及制法 |
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JP2005145812A (ja) * | 2003-10-06 | 2005-06-09 | Tosoh Corp | 高濃度シリカスラリ−及びその製造方法 |
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EP1968891B1 (de) | 2011-02-23 |
WO2007079841A1 (de) | 2007-07-19 |
ATE499321T1 (de) | 2011-03-15 |
EP1968891A1 (de) | 2008-09-17 |
CA2634300A1 (en) | 2007-07-19 |
US20090149097A1 (en) | 2009-06-11 |
DE102005062606A1 (de) | 2007-07-05 |
DE502006008965D1 (de) | 2011-04-07 |
CN101360683A (zh) | 2009-02-04 |
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