JP2009515326A5 - - Google Patents
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- Publication number
- JP2009515326A5 JP2009515326A5 JP2008538280A JP2008538280A JP2009515326A5 JP 2009515326 A5 JP2009515326 A5 JP 2009515326A5 JP 2008538280 A JP2008538280 A JP 2008538280A JP 2008538280 A JP2008538280 A JP 2008538280A JP 2009515326 A5 JP2009515326 A5 JP 2009515326A5
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- mirror
- opening
- aspheric surface
- sink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IE20050730 | 2005-11-02 | ||
| IES2005/0730 | 2005-11-02 | ||
| PCT/EP2006/010187 WO2007051537A2 (en) | 2005-11-02 | 2006-10-23 | High power euv lamp system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009515326A JP2009515326A (ja) | 2009-04-09 |
| JP2009515326A5 true JP2009515326A5 (https=) | 2009-12-10 |
| JP4901874B2 JP4901874B2 (ja) | 2012-03-21 |
Family
ID=37564079
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008538280A Expired - Fee Related JP4901874B2 (ja) | 2005-11-02 | 2006-10-23 | Ｅｕｖミラー |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7763872B2 (https=) |
| EP (1) | EP1946331B1 (https=) |
| JP (1) | JP4901874B2 (https=) |
| AT (1) | ATE430369T1 (https=) |
| DE (1) | DE602006006589D1 (https=) |
| WO (1) | WO2007051537A2 (https=) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2904176A1 (fr) * | 2006-07-24 | 2008-01-25 | Xenocs Soc Par Actions Simplif | Systeme de delivrance de faisceau de rayons x stabilise |
| ATE551882T1 (de) * | 2007-09-07 | 2012-04-15 | Koninkl Philips Electronics Nv | Drehradelektrodenvorrichtung für gasentladungsquellen mit radabdeckung für hochleistungsbetrieb |
| EP2198675B1 (en) | 2007-09-07 | 2013-03-13 | Philips Intellectual Property & Standards GmbH | Electrode device for gas discharge sources and method of operating a gas discharge source having this electrode device |
| EP2215527A2 (en) | 2007-11-22 | 2010-08-11 | Philips Intellectual Property & Standards GmbH | Method of increasing the operation lifetime of a collector optics arranged in an irradiation device and corresponding irradiation device |
| NL1036613A1 (nl) * | 2008-03-03 | 2009-09-07 | Asml Netherlands Bv | Lithographic apparatus, plasma source, and reflecting method. |
| US20110039039A1 (en) * | 2008-04-30 | 2011-02-17 | University College Dublin, National University Of Ireland, Dublin | Wetting a surface of a solid substrate with a liquid metal |
| US8519367B2 (en) * | 2008-07-07 | 2013-08-27 | Koninklijke Philips N.V. | Extreme UV radiation generating device comprising a corrosion-resistant material |
| EP2157481A3 (en) * | 2008-08-14 | 2012-06-13 | ASML Netherlands B.V. | Radiation source, lithographic apparatus, and device manufacturing method |
| JP5577351B2 (ja) * | 2008-12-22 | 2014-08-20 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置および放射システム |
| US8330131B2 (en) * | 2010-01-11 | 2012-12-11 | Media Lario, S.R.L. | Source-collector module with GIC mirror and LPP EUV light source |
| US8746975B2 (en) | 2011-02-17 | 2014-06-10 | Media Lario S.R.L. | Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography |
| US8731139B2 (en) | 2011-05-04 | 2014-05-20 | Media Lario S.R.L. | Evaporative thermal management of grazing incidence collectors for EUV lithography |
| NL2010965A (en) | 2012-06-22 | 2013-12-24 | Asml Netherlands Bv | Radiation source and lithographic apparatus. |
| US9544984B2 (en) * | 2013-07-22 | 2017-01-10 | Kla-Tencor Corporation | System and method for generation of extreme ultraviolet light |
| JP6571092B2 (ja) | 2013-09-25 | 2019-09-04 | エーエスエムエル ネザーランズ ビー．ブイ． | ビームデリバリ装置及び方法 |
| RU2670273C2 (ru) * | 2017-11-24 | 2018-10-22 | Общество с ограниченной ответственностью "РнД-ИСАН" | Устройство и способ для генерации излучения из лазерной плазмы |
| US10613444B2 (en) * | 2018-08-28 | 2020-04-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor apparatus and method of operating the same |
| US11968772B2 (en) * | 2019-05-30 | 2024-04-23 | Kla Corporation | Optical etendue matching methods for extreme ultraviolet metrology |
| JP7806584B2 (ja) * | 2022-03-30 | 2026-01-27 | ウシオ電機株式会社 | 光源装置 |
| JP2024179110A (ja) * | 2023-06-14 | 2024-12-26 | ウシオ電機株式会社 | 光源装置及び膜厚調整機構 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55143502A (en) * | 1979-04-25 | 1980-11-08 | Toshikatsu Omiya | Production of paraboloid-of-revolution mirror |
| DD152168A1 (de) * | 1980-07-07 | 1981-11-18 | Ustinow Nikolai | Parabolspiegel zur energiegewinnung |
| DD230944A1 (de) * | 1983-11-15 | 1985-12-11 | Nikolai Ustinow | Parabolspiegel zur informationsgewinnung |
| JPH05343297A (ja) * | 1992-06-09 | 1993-12-24 | Matsushita Electron Corp | 露光方法および露光装置 |
| US7439530B2 (en) * | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
| DE10138284A1 (de) * | 2001-08-10 | 2003-02-27 | Zeiss Carl | Beleuchtungssystem mit genesteten Kollektoren |
| JP4065528B2 (ja) * | 2003-03-10 | 2008-03-26 | キヤノン株式会社 | 恒温真空容器及びそれを用いた露光装置 |
| EP1624467A3 (en) * | 2003-10-20 | 2007-05-30 | ASML Netherlands BV | Lithographic apparatus and device manufacturing method |
| JP2006019510A (ja) * | 2004-07-01 | 2006-01-19 | Nikon Corp | 露光装置及びマイクロデバイスの製造方法 |
-
2006
- 2006-10-23 AT AT06806462T patent/ATE430369T1/de not_active IP Right Cessation
- 2006-10-23 US US12/083,361 patent/US7763872B2/en active Active
- 2006-10-23 DE DE602006006589T patent/DE602006006589D1/de active Active
- 2006-10-23 WO PCT/EP2006/010187 patent/WO2007051537A2/en not_active Ceased
- 2006-10-23 EP EP06806462A patent/EP1946331B1/en not_active Not-in-force
- 2006-10-23 JP JP2008538280A patent/JP4901874B2/ja not_active Expired - Fee Related
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