DE602006006589D1 - - Google Patents

Info

Publication number
DE602006006589D1
DE602006006589D1 DE602006006589T DE602006006589T DE602006006589D1 DE 602006006589 D1 DE602006006589 D1 DE 602006006589D1 DE 602006006589 T DE602006006589 T DE 602006006589T DE 602006006589 T DE602006006589 T DE 602006006589T DE 602006006589 D1 DE602006006589 D1 DE 602006006589D1
Authority
DE
Germany
Prior art keywords
mirror
aspheric surface
euv radiation
euv
produce
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006006589T
Other languages
German (de)
English (en)
Inventor
Fergal O'reilly
Patrick Hayden
Gerard O'sullivan
Padraig Dunne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University College Dublin
Original Assignee
University College Dublin
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University College Dublin filed Critical University College Dublin
Publication of DE602006006589D1 publication Critical patent/DE602006006589D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
DE602006006589T 2005-11-02 2006-10-23 Active DE602006006589D1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IE20050730 2005-11-02
PCT/EP2006/010187 WO2007051537A2 (en) 2005-11-02 2006-10-23 High power euv lamp system

Publications (1)

Publication Number Publication Date
DE602006006589D1 true DE602006006589D1 (https=) 2009-06-10

Family

ID=37564079

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006006589T Active DE602006006589D1 (https=) 2005-11-02 2006-10-23

Country Status (6)

Country Link
US (1) US7763872B2 (https=)
EP (1) EP1946331B1 (https=)
JP (1) JP4901874B2 (https=)
AT (1) ATE430369T1 (https=)
DE (1) DE602006006589D1 (https=)
WO (1) WO2007051537A2 (https=)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2904176A1 (fr) * 2006-07-24 2008-01-25 Xenocs Soc Par Actions Simplif Systeme de delivrance de faisceau de rayons x stabilise
ATE551882T1 (de) * 2007-09-07 2012-04-15 Koninkl Philips Electronics Nv Drehradelektrodenvorrichtung für gasentladungsquellen mit radabdeckung für hochleistungsbetrieb
EP2198675B1 (en) 2007-09-07 2013-03-13 Philips Intellectual Property & Standards GmbH Electrode device for gas discharge sources and method of operating a gas discharge source having this electrode device
EP2215527A2 (en) 2007-11-22 2010-08-11 Philips Intellectual Property & Standards GmbH Method of increasing the operation lifetime of a collector optics arranged in an irradiation device and corresponding irradiation device
NL1036613A1 (nl) * 2008-03-03 2009-09-07 Asml Netherlands Bv Lithographic apparatus, plasma source, and reflecting method.
US20110039039A1 (en) * 2008-04-30 2011-02-17 University College Dublin, National University Of Ireland, Dublin Wetting a surface of a solid substrate with a liquid metal
US8519367B2 (en) * 2008-07-07 2013-08-27 Koninklijke Philips N.V. Extreme UV radiation generating device comprising a corrosion-resistant material
EP2157481A3 (en) * 2008-08-14 2012-06-13 ASML Netherlands B.V. Radiation source, lithographic apparatus, and device manufacturing method
JP5577351B2 (ja) * 2008-12-22 2014-08-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および放射システム
US8330131B2 (en) * 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
US8746975B2 (en) 2011-02-17 2014-06-10 Media Lario S.R.L. Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography
US8731139B2 (en) 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
NL2010965A (en) 2012-06-22 2013-12-24 Asml Netherlands Bv Radiation source and lithographic apparatus.
US9544984B2 (en) * 2013-07-22 2017-01-10 Kla-Tencor Corporation System and method for generation of extreme ultraviolet light
JP6571092B2 (ja) 2013-09-25 2019-09-04 エーエスエムエル ネザーランズ ビー．ブイ． ビームデリバリ装置及び方法
RU2670273C2 (ru) * 2017-11-24 2018-10-22 Общество с ограниченной ответственностью "РнД-ИСАН" Устройство и способ для генерации излучения из лазерной плазмы
US10613444B2 (en) * 2018-08-28 2020-04-07 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor apparatus and method of operating the same
US11968772B2 (en) * 2019-05-30 2024-04-23 Kla Corporation Optical etendue matching methods for extreme ultraviolet metrology
JP7806584B2 (ja) * 2022-03-30 2026-01-27 ウシオ電機株式会社 光源装置
JP2024179110A (ja) * 2023-06-14 2024-12-26 ウシオ電機株式会社 光源装置及び膜厚調整機構

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55143502A (en) * 1979-04-25 1980-11-08 Toshikatsu Omiya Production of paraboloid-of-revolution mirror
DD152168A1 (de) * 1980-07-07 1981-11-18 Ustinow Nikolai Parabolspiegel zur energiegewinnung
DD230944A1 (de) * 1983-11-15 1985-12-11 Nikolai Ustinow Parabolspiegel zur informationsgewinnung
JPH05343297A (ja) * 1992-06-09 1993-12-24 Matsushita Electron Corp 露光方法および露光装置
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
JP4065528B2 (ja) * 2003-03-10 2008-03-26 キヤノン株式会社 恒温真空容器及びそれを用いた露光装置
EP1624467A3 (en) * 2003-10-20 2007-05-30 ASML Netherlands BV Lithographic apparatus and device manufacturing method
JP2006019510A (ja) * 2004-07-01 2006-01-19 Nikon Corp 露光装置及びマイクロデバイスの製造方法

Also Published As

Publication number Publication date
EP1946331A2 (en) 2008-07-23
JP4901874B2 (ja) 2012-03-21
US20090153975A1 (en) 2009-06-18
EP1946331B1 (en) 2009-04-29
US7763872B2 (en) 2010-07-27
JP2009515326A (ja) 2009-04-09
ATE430369T1 (de) 2009-05-15
WO2007051537A3 (en) 2007-07-19
WO2007051537A2 (en) 2007-05-10

Similar Documents

Publication Publication Date Title
DE602006006589D1 (https=)
FR2871622B1 (fr) Dispositif de generation de lumiere dans l'extreme ultraviolet et application a une source de lithographie par rayonnement dans l'extreme ultraviolet
WO2007005415A3 (en) Lpp euv light source drive laser system
TW200630179A (en) Optical illumination system for creating a line beam
WO2006075298A3 (en) Spotlight unit comprising means for adjusting the light beam direction
WO2004066401A3 (de) Solarkollektor
WO2005081372A3 (en) Laser multiplexing
WO2013180884A3 (en) System and method to optimize extreme ultraviolet light generation
TW200728767A (en) Laser optical device
JP5639745B2 (ja) レーザ露光装置
TW200745607A (en) Systems and methods for generating laser light shaped as a line beam
TW200703455A (en) Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
EP1232829A3 (de) Vorrichtung zum Beschriften oder Markieren von Gegenständen mittels Laserstrahl
WO2007041444A3 (en) Electron beam column for writing shaped electron beams
SE0002405L (sv) Multi-beam pattern generator
EP1255163A3 (en) High output extreme ultraviolet source
WO2008100708A3 (en) Systems and method for optimization of lazer beam spatial intensity profile
TW200715849A (en) Method for producing transmissive screen, apparatus for producing transmissive screen, and transmissive screen
TW200627087A (en) Methods and systems for lithographic beam generation
WO2004081610A3 (en) Apparatus for generating improved laser beam
PL2050574T3 (pl) Przyrząd i proces do opisywania struktury obrazów iluzji
CA2350448A1 (en) Laser imaging with variable printing spot size
WO2008124313A3 (en) Optical systems for external cavity frequency upconverting laser arrays
SG148958A1 (en) Systems and methods for curing a deposited layer on a substrate
WO2010050698A3 (ko) 태양에너지 발전 시스템용 집광장치 및 이를 이용한 태양에너지 발전 시스템

Legal Events

Date Code Title Description
8364 No opposition during term of opposition