JP2009510747A - 金属表面構造物を発生させる方法およびそのための装置 - Google Patents
金属表面構造物を発生させる方法およびそのための装置 Download PDFInfo
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- 239000002923 metal particle Substances 0.000 claims abstract description 31
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- 238000000576 coating method Methods 0.000 claims abstract description 18
- 239000011248 coating agent Substances 0.000 claims abstract description 14
- 229910044991 metal oxide Inorganic materials 0.000 claims description 34
- 150000004706 metal oxides Chemical class 0.000 claims description 34
- 239000002245 particle Substances 0.000 claims description 33
- 239000000463 material Substances 0.000 claims description 32
- 238000005245 sintering Methods 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 15
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- 239000004642 Polyimide Substances 0.000 claims description 7
- 229920001721 polyimide Polymers 0.000 claims description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 6
- 229920000642 polymer Polymers 0.000 claims description 6
- -1 polysiloxane Polymers 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 5
- 239000004416 thermosoftening plastic Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 229920001601 polyetherimide Polymers 0.000 claims description 4
- 239000004697 Polyetherimide Substances 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
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- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 229910010293 ceramic material Inorganic materials 0.000 claims description 2
- 238000013500 data storage Methods 0.000 claims description 2
- 229920001971 elastomer Polymers 0.000 claims description 2
- 239000000806 elastomer Substances 0.000 claims description 2
- 229910010272 inorganic material Inorganic materials 0.000 claims description 2
- 239000011147 inorganic material Substances 0.000 claims description 2
- 239000010985 leather Substances 0.000 claims description 2
- 229920001643 poly(ether ketone) Polymers 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 229920000412 polyarylene Polymers 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 229920000098 polyolefin Polymers 0.000 claims description 2
- 229920001296 polysiloxane Polymers 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000002023 wood Substances 0.000 claims description 2
- 239000013590 bulk material Substances 0.000 claims 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 239000000976 ink Substances 0.000 description 13
- 150000002739 metals Chemical class 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 4
- 239000002082 metal nanoparticle Substances 0.000 description 4
- 238000009768 microwave sintering Methods 0.000 description 4
- 239000002105 nanoparticle Substances 0.000 description 4
- 239000012876 carrier material Substances 0.000 description 3
- 235000011837 pasties Nutrition 0.000 description 3
- 239000012530 fluid Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 2
- 101100264195 Caenorhabditis elegans app-1 gene Proteins 0.000 description 1
- 239000012691 Cu precursor Substances 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
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- 238000004806 packaging method and process Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
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- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1283—After-treatment of the printed patterns, e.g. sintering or curing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/102—Using microwaves, e.g. for curing ink patterns or adhesive
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
【選択図】 なし
Description
i)基材の表面に、金属粒子または導電性金属酸化物粒子の所定のパターンを、前記金属粒子または前記金属酸化物粒子を液体中に含有する分散体を前記表面に塗布することによってコーティングするステップと、
ii)場合によって、前記コーティングした基材を乾燥して前記液体を蒸発させるステップと、
iii)前記表面上に前記金属粒子または前記金属酸化物粒子のパターンを含有する前記基材を、マイクロ波放射を用いて加熱して、前記金属粒子または前記金属酸化物粒子が融解および/または焼結する加熱を生じさせ、前記表面上に導電性金属のパターンまたは導電性金属酸化物のパターンを形成させるステップとを含み、
iv)前記金属または前記金属酸化物および前記基材を、該基材の誘電損率が表面パターンを形成している該金属または該金属酸化物の誘電損率と比較して、50%よりも低くなるように選択する方法である。
A)金属粒子または金属酸化物粒子の所定のパターンを有する基材の表面コーティングのためのコーティングデバイスと、場合によって、
B)そのコーティングした基材を加熱するための加熱デバイスと、
C)コーティングした基材を処理して、前記表面の前記粒子を融解および/または焼結することによって前記基材の表面の金属粒子または金属酸化物粒子のパターンから導電性パターンを発生させるためのマイクロ波発振器と、
の組合せを含む。
ポリイミド上への銀トラックの印刷および焼結
ナノペースト(Nanopaste)(商標)として知られるテトラデカン中の銀ナノ粒子の分散体をHarima Chemical Ltd(ハリマ化成株式会社)から購入した。厚さが100μmであり、Kapton HNとして知られるポリイミドホイルを基材として使用した。
ポリイミドシートの代わりにポリエチレンテレフタレートシート(実施例2)またはポリエーテル−イミドシート(実施例3)を使用した以外は実施例1の手順を繰り返した。
Claims (18)
- 基材表面に表面パターンを発生させる方法であって、
i)基材の表面に、金属粒子または導電性金属酸化物粒子の所定のパターンを、前記金属粒子または前記金属酸化物粒子を液体中に含有する分散体を前記表面に塗布することによってコーティングするステップと、
ii)場合によって、前記コーティングした基材を乾燥して前記液体を蒸発させるステップと、
iii)前記表面上に前記金属粒子または前記金属酸化物粒子のパターンを含有する前記基材を、マイクロ波放射を用いて加熱して、前記金属粒子または前記金属酸化物粒子が融解および/または焼結する加熱を生じさせ、前記表面上に導電性パターンを形成させるステップとを含み、
iv)前記金属または前記金属酸化物および前記基材を、該基材の誘電損率が表面パターンを形成している該金属または該金属酸化物の誘電損率と比較して、50%よりも低くなるように選択する方法。 - 基材が、ポリマー、無機材料、半導体基材、天然繊維および/または人造繊維を含有する繊維質基材、ポリマーおよび/または天然材料でできているフィルムおよびシート材料からなる群から選択される、請求項1に記載の方法。
- 基材が、熱可塑性またはデュロプラスチックポリマー、エラストマー、セラミック材料、シリコンまたはガリウムヒ素、紙、皮革、木材、熱可塑性シートまたはバルク材あるいは前記シートまたはバルク材を含有する複合材料である、請求項1に記載の方法。
- 基材が、熱可塑性ポリマー、好ましくは、ポリエステル、ポリアミド、ポリイミド、ポリエーテル−イミド、ポリカーボネート、ポリオレフィン、ポリエーテルケトン、ポリシロキサンおよび/またはポリアリーレンスルフィドであり、非常に好ましくは、ポリイミドシート、ポリエステルシートまたはポリエーテル−イミドシートである、請求項1に記載の方法。
- 金属粒子が使用される、請求項1に記載の方法。
- 金属が、金および/または銀または銀合金である、請求項5に記載の方法。
- 金属が銀である、請求項6に記載の方法。
- 粒子が、1nmと100μmの間、特に好ましくは1nmと50nmの間の平均粒径を有する、請求項1に記載の方法。
- 所定の表面パターンが、トラックの形態で、および/または、金属粒子または金属酸化物粒子の分離したスポットの形態で、前記表面の一部をカバーする、請求項1に記載の方法。
- コーティング方法として印刷方法を使用する、請求項9に記載の方法。
- 印刷方法がインクジェット印刷である、請求項10に記載の方法。
- 金属粒子または金属酸化物粒子の分散体がペーストの形態をしているか、好ましくはインクの形態をしている、請求項1に記載の方法。
- 金属粒子または金属酸化物粒子の分散体を表面にコーティングする間に基材を加熱する、請求項1に記載の方法。
- 使用するマイクロ波放射が、単一モードのマイクロ波放射である、請求項1から13の一項に記載の方法。
- 前記金属および前記基材を、前記基材の誘電損率が表面パターンを形成している金属または金属酸化物の誘電損率と比較して、10%よりも低くなるように選択する、請求項1から14の一項に記載の方法。
- 基材表面上の金属粒子または金属酸化物粒子を融解および/または焼結することによって導電性パターンを発生させるためのマイクロ波放射の使用。
- プリント基板もしくは集積回路の製造、化粧板の製造、データ記録媒体もしくはデータ保存媒体の製造、プリントボードの製造、高周波識別デバイス(RFIDデバイス)の製造、または電気デバイスの製造のための、請求項1に記載の方法の使用。
- 電気デバイスが、加熱素子、抵抗器、コイルまたはアンテナである、請求項17に記載の使用。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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PCT/EP2005/010486 WO2007038950A1 (en) | 2005-09-28 | 2005-09-28 | Method for generation of metal surface structures and apparatus therefor |
PCT/EP2006/009437 WO2007039227A1 (en) | 2005-09-28 | 2006-09-28 | Method for generation of metal surface structures and apparatus therefor |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010129790A (ja) * | 2008-11-27 | 2010-06-10 | Tokyo Electron Ltd | 成膜方法 |
JP2011159976A (ja) * | 2010-01-29 | 2011-08-18 | Lg Chem Ltd | マイクロウェーブを利用した導電性パターンの形成方法 |
JP2011159885A (ja) * | 2010-02-02 | 2011-08-18 | Toshiba Corp | 薄膜の製造方法 |
JP2011179117A (ja) * | 2010-02-04 | 2011-09-15 | Pika Power:Kk | マイクロ波照射を用いた金属微粒子担持処理加工方法およびその方法により所定箇所の導電性を向上させた物体 |
WO2011162095A1 (ja) * | 2010-06-24 | 2011-12-29 | 独立行政法人科学技術振興機構 | 3次元ポリマー-金属複合マイクロ構造体、及びその製造方法 |
US8866271B2 (en) | 2010-10-07 | 2014-10-21 | Hitachi Kokusai Electric Inc. | Semiconductor device manufacturing method, substrate processing apparatus and semiconductor device |
JP2019026946A (ja) * | 2017-07-26 | 2019-02-21 | セーレン株式会社 | 導電性布帛の製造方法及び導電性布帛 |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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Also Published As
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WO2007038950A1 (en) | 2007-04-12 |
WO2007039227A1 (en) | 2007-04-12 |
US20090191358A1 (en) | 2009-07-30 |
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