JP2009505369A - 電子カラム用検出器および電子カラム用電子検出方法 - Google Patents
電子カラム用検出器および電子カラム用電子検出方法 Download PDFInfo
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- JP2009505369A JP2009505369A JP2008526891A JP2008526891A JP2009505369A JP 2009505369 A JP2009505369 A JP 2009505369A JP 2008526891 A JP2008526891 A JP 2008526891A JP 2008526891 A JP2008526891 A JP 2008526891A JP 2009505369 A JP2009505369 A JP 2009505369A
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- 238000001514 detection method Methods 0.000 title claims description 36
- 238000010894 electron beam technology Methods 0.000 claims abstract description 46
- 239000004020 conductor Substances 0.000 claims abstract description 38
- 238000000034 method Methods 0.000 claims abstract description 24
- 230000003321 amplification Effects 0.000 abstract description 5
- 238000003199 nucleic acid amplification method Methods 0.000 abstract description 5
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 2
- 238000007689 inspection Methods 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2444—Electron Multiplier
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Measurement Of Radiation (AREA)
Abstract
【解決手段】既存のMCP(micro-channel plate)、SE(secondary electron)検出器、または半導体検出器では、自体的な構造によって電子の数が増幅される。このような増幅のために、若干の電圧差を外部から加え或いは自体的な構造および材質によって発生させる。このような過程を経た電子の電流値は外部の増幅回路によって増幅される。本発明では、マイクロカラムによって発生した電子ビームの衝突から生ずる電子を周囲の導体配線によって検出する。検出された電子は既存の方式と同様に外部で増幅回路を用いて増幅される。
【選択図】図2
Description
7…電流データ 9…電子 10、20…検出器 21、50…配線
51、52…スキャン領域 61、63…ブロックバー 62…下方のピーク領域
64…上部領域 100…電子ビーム発生器
Claims (7)
- 一つ以上の導線で配列された網状または導体板状に導体材質で製造され、試料の上に位置して使用されることを特徴とする、電子カラム用検出器。
- 前記検出器は1本の導線から2次元または3次元形状の構造で出来ていることを特徴とする、請求項1に記載の電子カラム用検出器。
- 電子カラムにおいて電子ビームによって発生した電子を検出する方法であって、
前記検出方法は、検出器が前記電子を直接検出し、検出された電子の電流データを外部に伝達することを特徴とする、検出方法。 - 前記検出器は請求項1または2に記載の検出器であることを特徴とする、請求項3に記載の検出方法。
- 試料内の配線された導体部分は、検出のためにサンプル電流方式を用いた検出器として用いられることを特徴とする、請求項3に記載の検出方法。
- 前記サンプルに陰電圧を印加して検出することを特徴とする、請求項5に記載の検出方法。
- 前記検出器は、複数の電子カラムで発生した電子ビームから電子を検出し、前記電子カラムが順次作動する間に検出を行うことを特徴とする、請求項3〜6のいずれか1項に記載の検出方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20050075519 | 2005-08-18 | ||
PCT/KR2006/003265 WO2007021163A1 (en) | 2005-08-18 | 2006-08-18 | Detector for electron column and method for detecting electrons for electron column |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2009505369A true JP2009505369A (ja) | 2009-02-05 |
Family
ID=37757788
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008526891A Pending JP2009505369A (ja) | 2005-08-18 | 2006-08-18 | 電子カラム用検出器および電子カラム用電子検出方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8324573B2 (ja) |
EP (1) | EP1929505A4 (ja) |
JP (1) | JP2009505369A (ja) |
KR (2) | KR20080032195A (ja) |
CN (1) | CN101243532B (ja) |
WO (1) | WO2007021163A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011119892A1 (en) * | 2010-03-24 | 2011-09-29 | Mark Sinreich | Power management circuit for a wireless communication device and process control system using same |
ES2479894B1 (es) * | 2012-12-21 | 2015-10-13 | Universidad Complutense De Madrid | Dispositivo electroóptico y método para obtener haces iónicos de gran densidad y baja energía |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58115383A (ja) * | 1981-12-29 | 1983-07-09 | Shimadzu Corp | 反射電子検出器 |
JPH02259408A (ja) * | 1989-03-30 | 1990-10-22 | Seiko Instr Inc | 荷電粒子線装置 |
JPH03182039A (ja) * | 1989-12-04 | 1991-08-08 | Internatl Business Mach Corp <Ibm> | 磁気フィルタ式低損失走査型電子顕微鏡 |
JPH10188883A (ja) * | 1996-12-26 | 1998-07-21 | Shimadzu Corp | エネルギーアナライザー |
JP2004031207A (ja) * | 2002-06-27 | 2004-01-29 | Canon Inc | 電子線照射装置および走査型電子顕微鏡装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02132745A (ja) | 1988-11-11 | 1990-05-22 | Jeol Ltd | 荷電粒子線装置 |
US5412211A (en) * | 1993-07-30 | 1995-05-02 | Electroscan Corporation | Environmental scanning electron microscope |
US5644128A (en) | 1994-08-25 | 1997-07-01 | Ionwerks | Fast timing position sensitive detector |
US5894124A (en) * | 1995-03-17 | 1999-04-13 | Hitachi, Ltd. | Scanning electron microscope and its analogous device |
US5945672A (en) * | 1998-01-29 | 1999-08-31 | Fei Company | Gaseous backscattered electron detector for an environmental scanning electron microscope |
JPH11233060A (ja) * | 1998-02-17 | 1999-08-27 | Fujitsu Ltd | 2次電子検出器及びこれを用いた電子ビーム装置 |
EP1133785A2 (en) * | 1998-11-24 | 2001-09-19 | Applied Materials, Inc. | Detector configuration for efficient secondary electron collection in microcolumns |
US6195214B1 (en) | 1999-07-30 | 2001-02-27 | Etec Systems, Inc. | Microcolumn assembly using laser spot welding |
DE60136036D1 (de) * | 2000-02-09 | 2008-11-20 | Fei Co | Zur anwendung in der herstellung von nanostrukturen |
EP1162645A3 (en) * | 2000-06-09 | 2007-09-26 | Jeol Ltd. | Specimen inspection instrument |
JP2002289129A (ja) * | 2001-03-26 | 2002-10-04 | Jeol Ltd | 低真空走査電子顕微鏡 |
WO2002086941A1 (en) | 2001-04-18 | 2002-10-31 | Multibeam Systems, Inc. | Detector optics for electron beam inspection system |
WO2003034462A1 (en) | 2001-09-06 | 2003-04-24 | Applied Materials, Inc. | Suppression of emission noise for microcolumn applications in electron beam inspection |
US7109486B1 (en) * | 2004-06-18 | 2006-09-19 | Novelx, Inc. | Layered electron beam column and method of use thereof |
-
2006
- 2006-08-18 KR KR1020087003771A patent/KR20080032195A/ko not_active Application Discontinuation
- 2006-08-18 US US12/064,071 patent/US8324573B2/en not_active Expired - Fee Related
- 2006-08-18 WO PCT/KR2006/003265 patent/WO2007021163A1/en active Application Filing
- 2006-08-18 KR KR1020107021025A patent/KR101023430B1/ko active IP Right Grant
- 2006-08-18 JP JP2008526891A patent/JP2009505369A/ja active Pending
- 2006-08-18 EP EP06783666A patent/EP1929505A4/en not_active Withdrawn
- 2006-08-18 CN CN2006800301619A patent/CN101243532B/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58115383A (ja) * | 1981-12-29 | 1983-07-09 | Shimadzu Corp | 反射電子検出器 |
JPH02259408A (ja) * | 1989-03-30 | 1990-10-22 | Seiko Instr Inc | 荷電粒子線装置 |
JPH03182039A (ja) * | 1989-12-04 | 1991-08-08 | Internatl Business Mach Corp <Ibm> | 磁気フィルタ式低損失走査型電子顕微鏡 |
JPH10188883A (ja) * | 1996-12-26 | 1998-07-21 | Shimadzu Corp | エネルギーアナライザー |
JP2004031207A (ja) * | 2002-06-27 | 2004-01-29 | Canon Inc | 電子線照射装置および走査型電子顕微鏡装置 |
Also Published As
Publication number | Publication date |
---|---|
EP1929505A1 (en) | 2008-06-11 |
US20090014650A1 (en) | 2009-01-15 |
KR20080032195A (ko) | 2008-04-14 |
KR101023430B1 (ko) | 2011-03-25 |
CN101243532B (zh) | 2012-01-18 |
KR20100123732A (ko) | 2010-11-24 |
EP1929505A4 (en) | 2009-12-02 |
WO2007021163A1 (en) | 2007-02-22 |
US8324573B2 (en) | 2012-12-04 |
CN101243532A (zh) | 2008-08-13 |
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