JP2009505124A5 - - Google Patents

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Publication number
JP2009505124A5
JP2009505124A5 JP2008525556A JP2008525556A JP2009505124A5 JP 2009505124 A5 JP2009505124 A5 JP 2009505124A5 JP 2008525556 A JP2008525556 A JP 2008525556A JP 2008525556 A JP2008525556 A JP 2008525556A JP 2009505124 A5 JP2009505124 A5 JP 2009505124A5
Authority
JP
Japan
Prior art keywords
projection system
image projection
image
sio
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008525556A
Other languages
English (en)
Japanese (ja)
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JP2009505124A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2006/065070 external-priority patent/WO2007017473A1/de
Publication of JP2009505124A publication Critical patent/JP2009505124A/ja
Publication of JP2009505124A5 publication Critical patent/JP2009505124A5/ja
Pending legal-status Critical Current

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JP2008525556A 2005-08-10 2006-08-04 像投影システム、特に、マイクロリソグラフィ投影露光装置の投影対物レンズ Pending JP2009505124A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70690305P 2005-08-10 2005-08-10
PCT/EP2006/065070 WO2007017473A1 (de) 2005-08-10 2006-08-04 Abbildungssystem, insbesondere projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
JP2009505124A JP2009505124A (ja) 2009-02-05
JP2009505124A5 true JP2009505124A5 (https=) 2009-07-16

Family

ID=37188852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008525556A Pending JP2009505124A (ja) 2005-08-10 2006-08-04 像投影システム、特に、マイクロリソグラフィ投影露光装置の投影対物レンズ

Country Status (7)

Country Link
US (1) US20080182210A1 (https=)
EP (1) EP1913445B1 (https=)
JP (1) JP2009505124A (https=)
KR (1) KR20080028429A (https=)
CN (1) CN101243359B (https=)
AT (1) ATE511124T1 (https=)
WO (1) WO2007017473A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
CN114326075B (zh) * 2021-12-10 2023-12-19 肯维捷斯(武汉)科技有限公司 一种生物样品的数字显微成像系统及镜检方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
JP2003021619A (ja) * 2001-07-05 2003-01-24 Canon Inc 蛍石及びその分析法、製造法、光学特性評価法
EP1411375A4 (en) * 2001-07-18 2007-03-21 Nikon Corp OPTICAL ELEMENT COMPRISING A LANTHANE FLUORIDE FILM
US7092069B2 (en) * 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system
KR20050057110A (ko) * 2002-09-03 2005-06-16 칼 짜이스 에스엠테 아게 복굴절 렌즈를 구비한 대물렌즈
EP1646074A4 (en) * 2003-07-09 2007-10-03 Nikon Corp EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
WO2005059617A2 (en) 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法

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