JP2009293108A - METHOD FOR PRODUCING Al-BASED ALLOY SPUTTERING TARGET MATERIAL - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for producing an Al-based alloy sputtering target material comprising a rare earth element and a high melting point element having a melting point higher than that of Al at a high yield. <P>SOLUTION: The method includes: a stage where a first powder of an Al-based alloy comprising a rare earth element produced by an atomizing process is prepared; a stage where the first powder and one or more of a second powder composed of a high melting point element X having a melting point higher than that of Al are mixed; and a stage where a powdery mixture of the first powder and the second powder is made dense. In the mixing stage, the maximum particle diameter (a) of the first powder is 10 to 200 μm, the maximum particle diameter (b) of the second powder is 10 to 150 μm and the ratio between the (a) and (b), ((a)/(b)) is 0.5 to 5. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a method for producing an Al-based alloy sputtering target material excellent in yield, and an Al-based alloy sputtering target material produced by this method.

  The Al-based alloy sputtering target material is manufactured mainly by a melting method, a spray forming method, a powder method, or the like.

  The melting method is a method of forming molten metal with a mold, and can produce alloy sputtering target materials having various compositions. However, when the amount of the alloy added is large, in the melting method, a coarse intermetallic compound is crystallized and this is the starting point, and cracks occur during casting or plastic working. Further, when a high melting point / high density element having a higher melting point and density than Al, such as Ta, is used as an alloy element, solidification segregation occurs. Therefore, when an Al-based alloy sputtering target material containing Ta or the like is manufactured by a melting method, the yield is lowered.

  The spray forming method is a method of forming a preform having a predetermined shape by atomizing a molten metal (molten metal) with a gas and depositing rapidly cooled particles in a semi-solid state. However, in an Al-based alloy containing a high melting point element such as Ta having a high melting point, clogging occurs in the molten metal nozzle as the temperature decreases. Moreover, in an Al-Ta alloy etc., since molten metal and droplet temperature become high, the particle | grains with many liquid phases will disperse at the time of deposition. As a result, the yield decreases.

  The powder method of mixing single metal powders is often used to produce an Al-based alloy having a composition that is difficult to produce by a melting method. However, since the rare earth element simple metal powder is easily oxidized, it is difficult to apply the powder method to the production of an Al-based alloy sputtering target material containing a rare earth element.

On the other hand, Patent Document 1 and Patent Document 2 disclose a method of manufacturing a sputtering target material by combining a melting method and a powder method. Among these, in Patent Document 1, first, (1) a Ge—Te alloy powder and an Sb—Te alloy powder are produced by an inert gas atomization method, and then (2) the two alloy powders are mixed and sintered. A method for producing a Ge—Sb—Te based sputtering target material is disclosed. Also, in Patent Document 2, a sputtering target material is manufactured by mixing a solid alloy powder produced by a rapid solidification method and a metal powder of simple Pt, and densifying the mixed powder by HIP (Hot Isostatic Pressing) treatment. A method is disclosed.
Japanese Patent No. 3703648 JP 2006-144124 A

  An object of the present invention is to provide a method capable of producing an Al-based alloy sputtering target material containing a rare earth element and a refractory element having a melting point higher than that of Al with a high yield.

  The production method of the present invention that has achieved the above object is a method for producing an Al-based alloy sputtering target material containing a rare earth element and a refractory element X having a melting point higher than that of Al, and is produced by an atomization method. Preparing a first powder of an Al-based alloy containing a rare earth element, mixing the first powder with one or more second powders composed of the refractory element X, and the first powder. And a step of densifying the mixed powder of the second powder, wherein in the mixing step, the maximum particle size (a) of the first powder is 10 to 200 μm, and the maximum particle size (b) of the second powder Is 10 to 150 μm, and the ratio ((a) / (b)) between (a) and (b) is 0.5 to 5.

  Here, (1) the rare earth element (hereinafter abbreviated as “REM”) is Nd and / or Y, and (2) the refractory element X is Ti, Zr, Hf, V, Nb, Ta, Cr, It is preferably at least one selected from the group consisting of Mo, W and Ni. In a preferred production method of the present invention, an Al-based alloy sputtering target material containing 1.0 to 10 atomic percent of REM and 0.5 to 5 atomic percent of other element X is produced.

  The present invention also provides an Al-based alloy sputtering target material produced by the above production method.

  According to the present invention, a first powder of an Al-REM-based Al-based alloy (hereinafter abbreviated as “Al-REM alloy”) manufactured by an atomizing method, and a refractory element (hereinafter, X When mixing with the second powder composed of the Al-REM-X-based Al-based alloy (hereinafter referred to as “Al”) by appropriately controlling the maximum particle size and ratio thereof. -REM-X alloy ") can be manufactured with good yield.

  The inventor of the present invention has a high yield without causing segregation of an Al-REM-X alloy sputtering target material containing a rare-earth element (REM) that is easily oxidized and a refractory element (X) having a melting point higher than that of Al. Considerations have been made to provide methods that can be manufactured. As a result, in mixing the first powder of the Al-REM alloy and the second powder of the high melting point element X, the maximum particle size (a) of the first powder and the maximum particle size (b) of the second powder, And when these ratios ((a) / (b)) were appropriately controlled, it was found that the intended purpose was achieved, and the present invention was completed. Specifically, the use of the method of the present invention prevents vibration segregation and rolling segregation during powder mixing, mixed powder transportation, and densification processing (particularly during HIP processing capsule filling), and a sputtering target material. It was found that the yield improved.

The production method of the present invention comprises:
(1) A step of preparing a first powder of an Al-REM alloy manufactured by an atomizing method,
(2) a step of mixing the first powder and a second powder composed of a high melting point element X having a melting point higher than that of Al; and (3) a mixed powder of the first powder and the second powder. Including a step of densification. Further, the dense body obtained in the above step (3) may be subjected to plastic working (forging, rolling, extrusion processing, etc.), lathe processing, milling, etc., as necessary. Hereinafter, the steps (1) to (3) will be described in detail.

[Step (1)]
In step (1), a first powder of an Al-REM alloy manufactured by an atomizing method is prepared. In the production method of the present invention, since the Al-REM alloy powder (first powder) is used instead of the metal powder of REM alone, REM oxidation can be prevented.

  The atomizing method for producing the first powder is not particularly limited, and an atomizing method (for example, a gas atomizing method, a water atomizing method, a centrifugal atomizing method, etc.) well known in the Al alloy field can be used. According to the atomization method, there are advantages such as easy control of the particle size distribution of the powder to be produced.

[Step (2)]
Next, step (2) that characterizes the method of the present invention will be described.
In the step (2), the Al-REM alloy powder (first powder) is mixed with the second powder composed of the high melting point element (X) having a higher melting point than Al. Thus, by adding the high melting point element (X) after producing the Al-REM alloy powder, the Al-REM-X alloy sputtering target material can be produced with good yield.

  The high melting point element X is an element having a higher melting point than Al. Specifically, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W group 4-6 elements, and Ni are included. Can be mentioned. These high melting point elements may contain only 1 type and may contain 2 or more types. As will be described in detail later, an Al-based alloy sputtering target material containing these elements and rare earth elements is particularly suitable for the production of an Al-based alloy reflective film of an optical information recording medium. Is known to contribute to a decrease in the thermal conductivity of Al-based alloys and an improvement in corrosion resistance. That is, the alloy composition of the Al-based alloy sputtering target material obtained by the method of the present invention and the content thereof are appropriately determined in relation to the use and characteristics of the Al alloy film obtained using the sputtering target material. is there. Details will be described later.

  The second powder composed of the refractory element X may be a single metal powder of only one refractory element or an alloy powder containing two or more refractory elements. Moreover, you may use together 2 or more types of 2nd powder from which a composition differs.

  In the production method of the present invention, the production method of the second powder is not particularly limited, and any of a mechanical pulverization method, a chemical reaction method, an electrolytic deposition method, and an atomization method can be used. For example, the second powder can be manufactured by melting a simple metal of the high melting point element X, solidifying it with a mold, and then mechanically pulverizing it.

  In the present invention, in the mixing step of the above step (2), the maximum particle size (a) of the first powder, the maximum particle size (b) of the second powder, and the ratio ((a) / (b)) A major feature is proper control. Specifically, the maximum particle size (a) of the first powder is 10 to 200 μm, the maximum particle size (b) of the second powder is 10 to 150 μm, and the ratio between (a) and (b) Mix so that ((a) / (b)) is 0.5-5. As shown in the examples described later, by appropriately controlling the maximum particle size and the ratio thereof, the powder is mixed, the mixed powder is transported, and the densification process in the step (3) (especially the HIP process). Since vibration segregation and rolling segregation during capsule filling are prevented, the yield of the sputtering target material is improved.

  Here, the maximum particle size of the powder means that when the particle size distribution of the powder is measured by the Fraunhofer method based on light diffraction / scattering and the relationship between the particle size and the frequency is clarified, the frequency on the large particle size side is 3. It means the maximum value of the particle size when 0% or less is deleted. In this example, the particle size distribution and the maximum particle size were measured by a laser diffraction / scattering type particle size analyzer “Nikkiso Co., Ltd. MICROTRAC HRA (MODEL: 9320-X100)”.

  First, the maximum particle size (a) of the first powder (Al-REM alloy powder) is 10 μm or more (preferably 50 μm or more) and 200 μm or less (preferably 150 μm or less). When (a) exceeds 200 μm, the second powder easily moves between the first powders, and segregation is likely to occur during mixing, transportation, and densification treatment. The lower limit of the maximum particle size of the alloy powder is set within a practical range.

  The maximum particle size (b) of the second powder (metal or alloy powder of other element X) is 10 μm or more (preferably 30 μm or more), 150 μm or less (preferably 100 μm or less, more preferably 45 μm or less). . When (b) exceeds 150 μm, the degree of mixing in the step (2) is lowered and segregation is likely to occur. The lower limit of the maximum particle size of the metal or alloy powder is set within a practical range.

  Furthermore, (a) / (b), which is the ratio of the maximum particle size of the first powder to the second powder, is 0.5 or more (preferably 0.7 or more, more preferably 2 or more), 5 or less (preferably Is 4.5 or less, more preferably 4 or less. When (a) / (b) exceeds 5, the second powder easily moves between the first powders, and segregation is likely to occur during mixing, transportation, and densification. On the other hand, when (a) / (b) is less than 0.5, when the second powder composed of the X element having a particularly high density is used, the powder becomes difficult to move and the degree of mixing in the step (2) Decreases and segregation is likely to occur.

  The above-mentioned (a), (b) and (a) / (b) indicate that the first powder and the second powder produced by the atomizing method are classified (sieved) before the step (2), for example. It is possible to control within the above range by performing.

  The mixing means of said 1st powder and 2nd powder process is not specifically limited, A well-known method, for example, a V-type mixing mill etc., can be used.

[Step (3)]
An Al-based alloy sputtering target material (dense body) can be produced by densifying the mixed powder obtained in the step (2) in the step (3). Note that the dense body obtained in the step (3) may be further processed (for example, plastic processing, lathe processing, milling, etc.) as necessary to further give the shape.

  The means for densifying the mixed powder is not particularly limited, but HIP treatment capable of obtaining a uniform dense body is preferable. The HIP treatment is preferably performed at a temperature of 400 to 600 ° C. under a pressure of 80 MPa or more, for example. It is preferable that the time for the HIP treatment is approximately in the range of 1 to 10 hours.

  Note that densification means other than HIP treatment can also be used. For example, the mixed powder may be densified together with plastic working by extrusion.

  The plastic processing, lathe processing, milling, and the like performed as necessary are not particularly limited, and well-known means can be employed.

  The method of the present invention is more suitably used for the production of a refractory element (X) alloy sputtering target material than Al-rare earth element (REM) -Al. Here, REM includes lanthanoid elements (15 elements from La to Lu), Sc (scandium), and Y (yttrium). Nd and / or Y are preferred. The high melting point element X is as described above.

  The sputtering target material obtained by the method of the present invention is particularly suitably used for the production of an Al-based alloy reflective film for optical information recording. The reflective film is described in detail in, for example, Japanese Patent Application Laid-Open No. 2005-158236. In the above publication, REM (preferably Nd and / or Y) is from 1.0 to 10.0 atomic%, and Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W and Ni. The Al-based alloy reflective film containing 0.5 to 5 atomic% of at least one selected has excellent characteristics such as low thermal conductivity, low melting temperature, high corrosion resistance and high reflectance, and is marked with a laser or the like. It is described in detail that the Al-based alloy reflective film can be formed using a sputtering target material having the same composition.

  The reflective film described in the above publication will be described in detail as follows. First, the thermal conductivity can be greatly reduced by including REM in the Al-based alloy. Among REMs, Nd and Y have a large effect of reducing thermal conductivity. A preferable range of the REM amount is 1.0 atom% or more and 10 atom% or less, more preferably 2.0 atom% or more and 7 atom% or less.

  Corrosion resistance is improved by adding at least one of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W and Ni to the Al-REM alloy. Further, these Group 4 to 6 elements and Ni can lower the thermal conductivity of the Al-based alloy. Among these elements, Ti, Hf, Ta and Cr have a great effect of improving the corrosion resistance. These preferable contents are 0.5 atomic% or more and 5 atomic% or less, and more preferably 1.0 atomic% or more and 3.0 atomic% or less.

  Therefore, when the sputtering target material obtained by the method of the present invention is used for the formation of the reflective film, the composition of the sputtering target material is set to REM (preferably Nd) so as to be the same as the composition of the reflective film. And / or Y) 1.0 to 10 atomic%, at least one refractory element selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W and Ni is 0.5. An Al-based alloy containing ˜5 atomic% may be used.

  In producing the sputtering target material having the above composition, in the step (1), the first powder of Al-REM alloy containing about 1.0 to 10 atomic% of REM is used in the step (1). What is necessary is just to use the 2nd powder of the quantity from which the said high melting point element X becomes 0.5-5 atomic%.

  Note that the composition of the sputtering target material obtained by the above-described method of the present invention is a preferred embodiment and is not intended to be limited thereto. The present invention discloses a method capable of producing an Al-REM-X alloy sputtering target material containing a rare earth element (REM) and a higher melting point element (X) than Al with a high yield, and the composition and content thereof are as follows. This is because it is appropriately determined appropriately according to the application and characteristics of the reflective film obtained using the sputtering target material. Therefore, when a reflective film having a composition different from that described in the above publication is manufactured, the composition of the sputtering target material may be set according to the composition of the different reflective film, and such a composition is also included in the scope of the present invention. The

  EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited by the following examples, and appropriate modifications are made within a range that can meet the above and the following purposes. Of course, it is possible to implement them, and they are all included in the technical scope of the present invention.

Example 1
The Al-6 atomic% Nd-1 atomic% Ta alloy sputtering target material was manufactured by various methods, and the yield was evaluated.

  First, an Al-6.06 atomic% Nd alloy powder (first powder) was produced by a nitrogen gas atomization method. To this first powder, the second powder was added in an amount such that Ta was 1 atomic%, and mixed with a V-type mixing mill. The maximum particle size (a) of the first powder and the maximum particle size (b) of the second powder were adjusted with a sieve as shown in Table 1 below. The maximum particle size was measured by the method described above.

  Next, this mixed powder was filled into a capsule tube, and deaerated and sealed. Then, HIP process was carried out under the conditions of a maximum temperature of 550 ° C., a holding time of 2 hours, and a pressure of 85 MPa to produce an Al-6 atomic% Nd-1 atomic% Ta alloy sputtering target material.

  For comparison, an Al-6 atomic% Nd-1 atomic% Ta alloy sputtering target material was manufactured using the melting method and spray forming method described below.

  The dissolution method was performed as follows. Using a vacuum induction melting furnace, using a refractory crucible such as alumina or spinel, melting in an inert gas (Ar) atmosphere at a melting temperature of 1350 ° C, copper mold or iron mold (210 mm x 210 mm x height 50 mm) Cast into. The bottom (5 to 10 mm) of the resulting ingot was cut off, then cut to a thickness of 10 mm (product thickness 5 mm + 5 mm), and an Al-6 atomic% Nd-1 atomic% Ta alloy sputtering target by lathing. Made the material.

  The spray forming method was performed as follows. Using a spray forming apparatus (manufactured by Sumitomo Heavy Industries, Ltd.), droplets were formed by nitrogen gas atomization and deposited on the collector under conditions of a hot water temperature of 1300 ° C. and a molten metal nozzle inner diameter of 5.5 mm. The preform obtained was put into a capsule tube, degassed and sealed, and then subjected to HIP treatment under conditions of a temperature of 550 ° C., a pressure of 85 MPa, and a holding time of 2 hours. The obtained dense body was forged and rolled, then cut to a thickness of 10 mm (product thickness 5 mm + 5 mm), and an Al-6 atomic% Nd-1 atomic% Ta alloy sputtering target material was manufactured by lathing.

  The product yield of the sputtering target material thus obtained was evaluated by product weight / dissolved weight.

  These results are shown in Table 1. In this example, according to the general criteria, a yield of 40% or more was evaluated as pass (◯), and a yield of less than 40% was evaluated as reject (x). The yield loss includes not only those caused by segregation but also those produced during plastic working or machining.

  As is clear from the results of Table 1, the maximum particle size (a) of the first powder, the maximum particle size (b) of the second powder, and (a) / (b) at the time of mixing are the requirements specified by the present invention. No. produced by a method satisfying 3, 4, 6, 9, and 10 all improved product yield.

  On the other hand, if any of the above requirements defined in the present invention does not satisfy the scope of the present invention. For all of 5, 7, and 8, the product yield decreased. Moreover, the desired product yield was not obtained by the conventional dissolution method (No. 1) or spray forming method (No. 2).

Claims (5)

A method for producing an Al-based alloy sputtering target material comprising a rare earth element and a refractory element X having a melting point higher than that of Al,
Preparing a first powder of an Al-based alloy containing a rare earth element manufactured by an atomizing method;
Mixing the first powder and one or more second powders composed of the refractory element X; and densifying the mixed powder of the first powder and the second powder;
In the mixing step, the maximum particle size (a) of the first powder is 10 to 200 μm, the maximum particle size (b) of the second powder is 10 to 150 μm, and (a) and (b) The method for producing an Al-based alloy sputtering target material, wherein the ratio ((a) / (b)) is 0.5 to 5.   The manufacturing method according to claim 1, wherein the rare earth element is Nd and / or Y.   The method according to claim 1, wherein the high melting point element X is at least one selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, and Ni.   The production method according to any one of claims 1 to 3, wherein an Al-based alloy sputtering target material containing 1.0 to 10 atomic percent of the rare earth element and 0.5 to 5 atomic percent of the refractory element X is produced. .   An Al-based alloy sputtering target material produced by the production method according to claim 1.