JP2009276269A5 - - Google Patents

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Publication number
JP2009276269A5
JP2009276269A5 JP2008129231A JP2008129231A JP2009276269A5 JP 2009276269 A5 JP2009276269 A5 JP 2009276269A5 JP 2008129231 A JP2008129231 A JP 2008129231A JP 2008129231 A JP2008129231 A JP 2008129231A JP 2009276269 A5 JP2009276269 A5 JP 2009276269A5
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JP
Japan
Prior art keywords
light
surface shape
measured
shape measuring
substrate
Prior art date
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Granted
Application number
JP2008129231A
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English (en)
Japanese (ja)
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JP2009276269A (ja
JP5268425B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2008129231A priority Critical patent/JP5268425B2/ja
Priority claimed from JP2008129231A external-priority patent/JP5268425B2/ja
Priority to US12/465,567 priority patent/US7952725B2/en
Priority to KR1020090042578A priority patent/KR101045482B1/ko
Publication of JP2009276269A publication Critical patent/JP2009276269A/ja
Publication of JP2009276269A5 publication Critical patent/JP2009276269A5/ja
Application granted granted Critical
Publication of JP5268425B2 publication Critical patent/JP5268425B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008129231A 2008-05-16 2008-05-16 表面形状測定装置及び露光装置 Expired - Fee Related JP5268425B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008129231A JP5268425B2 (ja) 2008-05-16 2008-05-16 表面形状測定装置及び露光装置
US12/465,567 US7952725B2 (en) 2008-05-16 2009-05-13 Surface shape measurement apparatus and exposure apparatus
KR1020090042578A KR101045482B1 (ko) 2008-05-16 2009-05-15 표면 형상 측정 장치 및 노광 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008129231A JP5268425B2 (ja) 2008-05-16 2008-05-16 表面形状測定装置及び露光装置

Publications (3)

Publication Number Publication Date
JP2009276269A JP2009276269A (ja) 2009-11-26
JP2009276269A5 true JP2009276269A5 (enExample) 2011-06-30
JP5268425B2 JP5268425B2 (ja) 2013-08-21

Family

ID=41316492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008129231A Expired - Fee Related JP5268425B2 (ja) 2008-05-16 2008-05-16 表面形状測定装置及び露光装置

Country Status (3)

Country Link
US (1) US7952725B2 (enExample)
JP (1) JP5268425B2 (enExample)
KR (1) KR101045482B1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2007361A (en) * 2010-09-29 2012-04-02 Asml Netherlands Bv Inspection apparatus and method, lithographic apparatus and lithographic processing cell.
CN102486623A (zh) * 2010-12-03 2012-06-06 上海微电子装备有限公司 用于光刻设备的调焦测控装置及方法
NL2009273A (en) 2011-08-31 2013-03-04 Asml Netherlands Bv Level sensor arrangement for lithographic apparatus, lithographic apparatus and device manufacturing method.
WO2013043818A1 (en) * 2011-09-23 2013-03-28 The Trustees Of Columbia University In The City Of New York Microsphere superlens based superresolution imaging platform
KR101358287B1 (ko) * 2012-04-27 2014-02-05 (주)하드램 레이저 빔 스캔 장치의 캘리브레이션 시스템
TW201505743A (zh) * 2013-08-13 2015-02-16 Hon Hai Prec Ind Co Ltd 雷射加工裝置
CN107588728B (zh) * 2017-08-24 2019-10-29 中国科学院长春光学精密机械与物理研究所 用于扫描干涉场曝光系统的精密光栅位移测量系统及方法
CN111243945B (zh) * 2020-01-15 2022-11-22 合肥维信诺科技有限公司 一种图形化、蚀刻、显示面板的制作方法及显示面板
KR102804207B1 (ko) * 2022-10-04 2025-05-09 세메스 주식회사 기판 검사 장치 및 방법
KR102738312B1 (ko) * 2023-10-31 2024-12-03 정창수 기판 뒷면 반사 영향을 받지 않는 광학적 박막 분석 장치 및 그에 의한 분석 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4606638A (en) * 1983-11-03 1986-08-19 Zygo Corporation Distance measuring interferometer and method of use
US4861162A (en) * 1985-05-16 1989-08-29 Canon Kabushiki Kaisha Alignment of an object
JP3309927B2 (ja) 1993-03-03 2002-07-29 株式会社ニコン 露光方法、走査型露光装置、及びデバイス製造方法
US6002480A (en) * 1997-06-02 1999-12-14 Izatt; Joseph A. Depth-resolved spectroscopic optical coherence tomography
JP4246326B2 (ja) * 1999-08-27 2009-04-02 東レエンジニアリング株式会社 表面形状測定方法及びその装置
KR100487055B1 (ko) * 2000-01-28 2005-05-04 아사히 가세이 가부시키가이샤 광열 변환 분광 분석 장치
JP2001241916A (ja) * 2000-02-28 2001-09-07 Fuji Photo Optical Co Ltd 斜入射干渉計用光学系およびこれを用いた装置
JP2002286409A (ja) * 2001-03-26 2002-10-03 Fuji Photo Optical Co Ltd 干渉計装置
SG103865A1 (en) * 2001-06-01 2004-05-26 Toshiba Kk Film quality inspecting method and film quality inspecting apparatus
JP4096303B2 (ja) 2001-12-28 2008-06-04 エスアイアイ・ナノテクノロジー株式会社 走査型プローブ顕微鏡
US7292346B2 (en) * 2003-09-15 2007-11-06 Zygo Corporation Triangulation methods and systems for profiling surfaces through a thin film coating
KR100831806B1 (ko) * 2004-04-19 2008-05-28 아리스트 인스트루먼트, 인크. 박막 및 ｃｄ 측정들을 위한 빔 프로파일 복합 반사율시스템 및 방법

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