JP2009249707A - Trivalent chromium-plating liquid management device - Google Patents

Trivalent chromium-plating liquid management device Download PDF

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JP2009249707A
JP2009249707A JP2008100960A JP2008100960A JP2009249707A JP 2009249707 A JP2009249707 A JP 2009249707A JP 2008100960 A JP2008100960 A JP 2008100960A JP 2008100960 A JP2008100960 A JP 2008100960A JP 2009249707 A JP2009249707 A JP 2009249707A
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supply pump
supply
glycine
amount
chromium
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JP5207454B2 (en
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Shigeo Hoshino
重夫 星野
Ryokichi Shinpo
良吉 眞保
Makoto Araki
誠 荒木
Yasushi Kino
泰 木野
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Chuo Seisakusho KK
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Chuo Seisakusho KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a trivalent chromium-plating liquid management device capable of supplying a chemical agent at an optional time point not only at a time point when reaching a fixed energizing amount and also using a hardly soluble chemical agent. <P>SOLUTION: The management device is composed of an adjusting tank 1, a chromium hydroxide storage tank 2, a glycine storage tank 3 and an ammonium hydroxide storage tank 4, a chromium hydroxide supply pump 14, a glycine supply pimp 15 and an ammonium hydroxide supply pump 16, and is provided with a control part comprising a logical control part 30, a current addition part 32, a chromium hydroxide supply pump driving part 35, a glycine supply pump driving part 36 and an ammonium supply pimp driving part 37. The required supply energizing amount at the point of time is calculated based on the supply quantity per stored unit energizing amount and the energizing amount measured by the current addition part 32 and when the energizing amount reaches the set value or the operation signal from an operation part 31 is input, each pump are driven to supply the calculated quantity of the chemical agent to be supplied. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、3価クロムめっき液に複数の薬剤を供給することにより3価クロムめっき液の組成を維持管理する3価クロムめっき液管理装置に関するものである。   The present invention relates to a trivalent chromium plating solution management apparatus for maintaining and managing the composition of a trivalent chromium plating solution by supplying a plurality of chemicals to the trivalent chromium plating solution.

クロムめっきは大気中で腐食せず光沢を失わないことから装飾用として広く使用されており、また、高い硬度と低い摩擦係数を有することから耐摩耗性を要する機械部品等に広く使用されている。このように有用なクロムめっきではあるが、従来は殆んどが有害な6価クロムを多量に含むめっき液を使用してめっきされていた。そのため、有害な6価クロムを含まないめっき液によるクロムめっきが強く望まれ、例えば特許文献1に示されるような3価クロムめっき方法が提案されている。   Chrome plating is widely used for decoration because it does not corrode in the atmosphere and does not lose its luster, and it is widely used for mechanical parts that require wear resistance because of its high hardness and low coefficient of friction. . Although it is such a useful chromium plating, most of the conventional plating has been performed using a plating solution containing a large amount of harmful hexavalent chromium. Therefore, chromium plating with a plating solution that does not contain harmful hexavalent chromium is strongly desired. For example, a trivalent chromium plating method as disclosed in Patent Document 1 has been proposed.

特許文献1に示される3価クロムめっき方法は、塩化クロムおよび塩化アンモニウムを含んで成るめっき液を用いて3価クロムめっきするにあたり、めっき液の一部を冷却装置に循環させ、この冷却装置において塩化アンモニウムの一部を晶析させ取除くことにより、めっき液中の塩化アンモニウム濃度を制御しながらめっきするものである。そして、実施例1では一定の通電量ごとに水酸化アンモニウムと塩化クロムをそれぞれ一定量ずつめっき液に添加すること、実施例2では一定の通電量ごとにアンモニア水、塩化クロム、グリシン及び硼酸をそれぞれ一定量ずつめっき液に添加することが示されている。   In the trivalent chromium plating method disclosed in Patent Document 1, in the case of trivalent chromium plating using a plating solution containing chromium chloride and ammonium chloride, a part of the plating solution is circulated through a cooling device. Plating is performed while controlling the ammonium chloride concentration in the plating solution by crystallizing and removing a part of ammonium chloride. In Example 1, ammonium hydroxide and chromium chloride are added to the plating solution in a constant amount for each constant energization amount. In Example 2, ammonia water, chromium chloride, glycine and boric acid are added for each constant energization amount. It is shown that a fixed amount of each is added to the plating solution.

一定の通電量ごとに薬剤をめっき液に添加するための装置としては、例えば特許文献2に示すようなものが知られており、こうしたものを使用することが考えられる。特許文献2に示される電気鍍金用添加剤補充装置は、被めっき物に流れる電流を検出する電流検出器と該電流検出器の出力を積分して一定積分値毎にパルスを出す積分器と積分器の出力パルスを計数して一定計数毎に出力を出す計数器と該計数器の出力により作動され一定量の添加剤を移送する定量移送装置とから構成されたものである。   As an apparatus for adding a chemical agent to a plating solution for each constant energization amount, for example, a device as shown in Patent Document 2 is known, and it is conceivable to use such a device. An additive replenishing device for electroplating disclosed in Patent Document 2 is a current detector that detects a current flowing through a workpiece, an integrator that integrates the output of the current detector, and outputs a pulse at a certain integral value. It consists of a counter that counts the output pulses of the counter and outputs an output at every fixed count, and a quantitative transfer device that is actuated by the output of the counter and transfers a constant amount of additive.

しかしながら、この特許文献2に示されるものはあらかじめ設定した一定の通電量ごとに一定量の薬剤の補給を行うものであるため、任意の時点で必要な量の薬剤の補給をすることができなかった。そのため一つの被めっき物をめっきした後に次の被めっき物をめっきする場合には、それまでに減少した成分をその時点で補給することができず、一部成分が減少したままで次の被めっき物のめっきを開始することになるという問題があった。また、複数の薬剤を補給することができないという問題があった。   However, since what is shown in this Patent Document 2 is to replenish a certain amount of medicine for every predetermined energization amount set in advance, it is not possible to replenish a necessary amount of medicine at an arbitrary time point. It was. Therefore, when plating the next workpiece after plating one workpiece, the components that have been reduced up to that point cannot be replenished at that time, and some components remain reduced while the next workpiece is plated. There was a problem that the plating of the plated product was started. There is also a problem that a plurality of drugs cannot be replenished.

ところで、本願発明者は特許文献1に示される塩化クロム、塩化アンモニウム、グリシン、塩化アルミニウム及び硼酸を含む3価クロムめっき液、あるいはそこから塩化アルミニウムを除いた3価クロムめっき液を使用する3価クロムめっきについて実験を重ねた。その結果、特許文献1に補給する薬剤として示されている水酸化アンモニウム及び塩化クロム、あるいはアンモニア水、塩化クロム、グリシン及び硼酸に代えて、水酸化クロム、グリシン及び水酸化アンモニウムを一定の通電量ごとに補給することにより、良好な3価クロムめっきを継続することができることを見出した。また、めっき液の好適なpH値は塩化クロムの濃度により異なり、塩化クロム濃度が300g/lの場合0.1〜0.3、150g/lの場合0.4〜0.8であるとの知見を得ている。   By the way, the inventor of the present application uses a trivalent chromium plating solution containing chromium chloride, ammonium chloride, glycine, aluminum chloride and boric acid disclosed in Patent Document 1, or a trivalent chromium plating solution obtained by removing aluminum chloride therefrom. Experiments were repeated on chromium plating. As a result, instead of ammonium hydroxide and chromium chloride, or aqueous ammonia, chromium chloride, glycine and boric acid, which are shown as chemicals to be replenished in Patent Document 1, chromium hydroxide, glycine and ammonium hydroxide are used in a certain amount of current. It was found that good trivalent chromium plating can be continued by replenishing every time. Further, the preferred pH value of the plating solution varies depending on the concentration of chromium chloride, and is 0.1 to 0.3 when the chromium chloride concentration is 300 g / l, and 0.4 to 0.8 when 150 g / l. We have knowledge.

このような補給する薬剤の組み合わせは非常に良好な結果をもたらすのであるが、これらの薬剤を補給する際には水酸化クロムが溶解しにくく、特にアルカリ性である水酸化アンモニウムと同時にめっき槽に供給すると溶解しないためザラ等めっき不良を引き起こすという問題があった。
特開2002−322599号公報 実公昭46−009223号公報
Although such a combination of replenishing chemicals gives very good results, when replenishing these chemicals, chromium hydroxide is difficult to dissolve, and is supplied to the plating tank simultaneously with ammonium hydroxide, which is particularly alkaline. Then, since it did not melt | dissolve, there existed a problem of causing plating defects, such as a rough surface.
JP 2002-322599 A Japanese Utility Model Publication No. 46-009223

本発明は上記の問題点を解決し、一定の通電量に達したとき、操作信号が入力されたときのいずれのときにもそれまでの通電による成分の減少に見合う量の薬剤を供給することができ、供給する薬剤に溶解しにくい薬剤を使用することができる3価クロムめっき液管理装置を提供するためになされたものである。   The present invention solves the above-described problems, and supplies a drug in an amount commensurate with a decrease in components due to current energization at any time when an operation signal is input when a certain energization amount is reached. The present invention has been made in order to provide a trivalent chromium plating solution management apparatus that can use a drug that is difficult to dissolve in the supplied drug.

上記の問題を解決するためになされた本発明の3価クロムめっき液管理装置は、調整槽と、複数の薬剤を貯蔵する貯蔵タンクと、各貯蔵タンクから薬剤を個別に調整槽へ送る複数の供給ポンプとから構成し、めっき槽から調整槽へ取り出しためっき液に各薬剤を供給することにより、通電量に比例して減少する成分を補給する3価クロムめっき液管理装置であって、被めっき物に流れる電流を積算して通電量を計測する電流積算手段と、単位通電量当たり必要な各薬剤の供給量を記憶する記憶手段と、計測された通電量と記憶手段の内容とから計測された通電量に対して必要な各薬剤の供給量を算出する計算手段と、通電量が設定した値に達したとき信号を出力する比較手段と、操作信号が入力されたとき信号を出力する入力手段と、比較手段あるいは入力手段の出力が与えられたとき各供給ポンプを駆動して計算手段により算出された供給量の薬剤をそれぞれ供給させる複数の供給ポンプ駆動手段とを備える制御装置を設けたことを特徴とするものである。   The trivalent chromium plating solution management device of the present invention made to solve the above problems includes an adjustment tank, a storage tank that stores a plurality of drugs, and a plurality of drugs that individually send the drugs from each storage tank to the adjustment tank. A trivalent chromium plating solution management device configured to supply a component that decreases in proportion to the energization amount by supplying each chemical to the plating solution taken out from the plating tank to the adjustment tank. Measured from the current integration means for measuring the amount of energization by integrating the current flowing through the plated object, the storage means for storing the supply amount of each medicine required per unit energization amount, and the measured energization amount and the contents of the storage means Calculating means for calculating the supply amount of each medicine necessary for the energized amount, comparing means for outputting a signal when the energized amount reaches a set value, and outputting a signal when an operation signal is inputted Input means and comparator Alternatively, there is provided a control device including a plurality of supply pump driving means for driving each supply pump to supply a supply amount of medicine calculated by the calculation means when the output of the input means is given. Is.

ここにおいて、薬剤を水酸化クロム、グリシン及び水酸化アンモニウムとし、水酸化クロム供給ポンプ駆動手段を動作させ、水酸化クロム供給ポンプ駆動手段の動作完了後設定した待ち時間が経過した時点でグリシン供給ポンプ駆動手段を動作させ、グリシン供給ポンプ駆動手段の動作完了後設定した待ち時間が経過した時点で水酸化アンモニウム供給ポンプ駆動手段を動作させるシーケンス制御手段を制御装置に付加することが好ましい。   Here, the chemical is chromium hydroxide, glycine and ammonium hydroxide, the chromium hydroxide supply pump drive means is operated, and the glycine supply pump is reached when the set waiting time has elapsed after the operation of the chromium hydroxide supply pump drive means has elapsed. It is preferable to add sequence control means for operating the driving means and operating the ammonium hydroxide supply pump driving means when the set waiting time has elapsed after the operation of the glycine supply pump driving means is completed.

本発明によれば、計測された通電量とあらかじめ記憶させてある単位通電量当たり必要な各薬剤の供給量とから計測された通電量に対して必要な各薬剤の供給量を算出するようにしており、通電量が設定した値に達したとき又は操作信号が入力されたときのいずれのときにも、算出された量の薬剤を供給するので、任意の時点で成分の補給ができることになる。これにより、新たな被めっき物をめっきするときに補給すれば、常に新液と同様の条件でめっきを開始することができる効果がある。また、薬剤を水酸化クロム、グリシン及び水酸化アンモニウムとして水酸化クロム、グリシン、水酸化アンモニウムの順に間に待ち時間をとりながら供給するようにした場合には、溶解しにくい水酸化クロムの溶解が終わるまで他の薬剤、特に水酸化クロムの溶解の溶解を妨げる水酸化アンモニウムが供給されることがないので水酸化クロムが完全に溶解される利点がある。   According to the present invention, the necessary supply amount of each medicine is calculated with respect to the measured energization amount from the measured energization amount and the necessary supply amount of each medicine per unit energization amount stored in advance. Since the calculated amount of medicine is supplied when the energization amount reaches the set value or when the operation signal is input, the component can be replenished at an arbitrary time. . Thereby, if it replenishes when plating a new to-be-plated thing, there exists an effect which can always start plating on the conditions similar to a new liquid. In addition, when the chemical is supplied with chromium hydroxide, glycine and ammonium hydroxide in the order of chromium hydroxide, glycine and ammonium hydroxide, it is difficult to dissolve chromium hydroxide. There is an advantage that the chromium hydroxide is completely dissolved since no ammonium hydroxide which prevents dissolution of the dissolution of other agents, especially chromium hydroxide, is supplied until it is finished.

次に、本発明を実施するための最良の形態について、図を参照しながら具体的に説明する。
図1は本発明の3価クロムめっき液管理装置の構成を示す図であって、調整槽1と水酸化クロム貯蔵タンク2、グリシン貯蔵タンク3、水酸化アンモニウム貯蔵タンク4、塩酸貯蔵タンク5及び純水貯蔵タンク6から構成したものである。調整槽1上にはpH測定電極7を取り付けたpH測定槽8が設けてあり、pH測定ポンプ9により調整槽1内のめっき液をpH測定槽8を通して循環させるように配管してある。
Next, the best mode for carrying out the present invention will be specifically described with reference to the drawings.
FIG. 1 is a diagram showing a configuration of a trivalent chromium plating solution management apparatus according to the present invention, in which an adjustment tank 1, a chromium hydroxide storage tank 2, a glycine storage tank 3, an ammonium hydroxide storage tank 4, a hydrochloric acid storage tank 5 and This is composed of a pure water storage tank 6. On the adjustment tank 1, a pH measurement tank 8 provided with a pH measurement electrode 7 is provided, and piping is provided so that the plating solution in the adjustment tank 1 is circulated through the pH measurement tank 8 by a pH measurement pump 9.

調整槽1には攪拌機10が設けてあり、温度センサー11及びヒーター12を設けて温度調整するようにしてある。水酸化クロム貯蔵タンク2には攪拌機13が設けてあり、水酸化クロム供給ポンプ14を設けて水酸化クロム貯蔵タンク2内の水酸化クロムを調整槽1に供給するように配管してある。攪拌機10には回転翼式のものが使用可能であるが、攪拌機13にはマグネットスターラーと呼ばれる磁気でタンク外から攪拌子を駆動する方式のものを使用するのが望ましい。   The adjustment tank 1 is provided with a stirrer 10, and a temperature sensor 11 and a heater 12 are provided to adjust the temperature. The chromium hydroxide storage tank 2 is provided with a stirrer 13, and is provided with a chromium hydroxide supply pump 14 so as to supply chromium hydroxide in the chromium hydroxide storage tank 2 to the adjustment tank 1. The stirrer 10 can be of a rotary blade type, but the stirrer 13 is preferably a magnet stirrer that drives a stirrer from outside the tank by magnetism.

15、16、17及び18はそれぞれグリシン供給ポンプ、水酸化アンモニウム供給ポンプ、塩酸供給ポンプ及び純水供給ポンプであり、各ポンプによりグリシン貯蔵タンク3、水酸化アンモニウム貯蔵タンク4、塩酸貯蔵タンク5及び純水貯蔵タンク6からグリシン、水酸化アンモニウム、塩酸及び純水を調整槽1に供給するように配管してある。水酸化クロム、グリシン及び水酸化アンモニウムは電析あるいは分解により通電量に比例して消費される成分を補うために供給する薬剤であり、供給量を精密に制御する必要があることから水酸化クロム供給ポンプ14、グリシン供給ポンプ15及び水酸化アンモニウム供給ポンプ16は一定時間あたりの送液量が一定の定量ポンプとしてある。   15, 16, 17 and 18 are a glycine supply pump, an ammonium hydroxide supply pump, a hydrochloric acid supply pump and a pure water supply pump, respectively. The glycine storage tank 3, ammonium hydroxide storage tank 4, hydrochloric acid storage tank 5 and Pipes are provided so that glycine, ammonium hydroxide, hydrochloric acid and pure water are supplied from the pure water storage tank 6 to the adjustment tank 1. Chromium hydroxide, glycine and ammonium hydroxide are chemicals supplied to supplement the components consumed in proportion to the amount of electricity applied by electrodeposition or decomposition, and it is necessary to precisely control the supply amount. The supply pump 14, the glycine supply pump 15, and the ammonium hydroxide supply pump 16 serve as a metering pump having a constant liquid feeding amount per fixed time.

図1において、鎖線より左側は管理対象となるめっき液によりめっきが行われるめっき槽であり、調整槽1からフィルタ19を通してめっき槽20にめっき液を送る循環ポンプ21が設けてある。めっき槽20と調整槽1との間にはめっき槽20のオーバーフロー22から調整槽1にめっき液を流す配管が設けてある。めっき槽20には温度センサー23、ヒーター24の他図示しないが陽極、攪拌機、ハンガー受け等通常のめっき槽と同様の機器、装置等が設けられる。図中25、26は循環ポンプ21の前後に設けたバルブ、27はフィルター19の入り口側に設けた圧力計であり、メンテナンスの際に使用するものである。また、28は調整槽1に設けた液面センサーである。   In FIG. 1, the left side of the chain line is a plating tank in which plating is performed with a plating solution to be managed, and a circulation pump 21 that sends the plating solution from the adjustment tank 1 through the filter 19 to the plating tank 20 is provided. Between the plating tank 20 and the adjustment tank 1, a pipe for flowing the plating solution from the overflow 22 of the plating tank 20 to the adjustment tank 1 is provided. In addition to the temperature sensor 23 and the heater 24, the plating tank 20 is provided with equipment, devices, and the like similar to those of a normal plating tank, such as an anode, a stirrer, and a hanger receiver (not shown). In the figure, 25 and 26 are valves provided before and after the circulation pump 21, and 27 is a pressure gauge provided on the inlet side of the filter 19, which is used for maintenance. Reference numeral 28 denotes a liquid level sensor provided in the adjustment tank 1.

図2はpH測定ポンプ9、水酸化クロム供給ポンプ14、グリシン供給ポンプ15、水酸化アンモニウム供給ポンプ16、塩酸供給ポンプ17、純水供給ポンプ18等のポンプ及び攪拌機10、13を制御する制御装置の構成を示すブロック図である。この制御装置は論理制御部30、操作部31、電流積算部32、pH計測部33、pH測定ポンプ駆動部34、水酸化クロム供給ポンプ駆動部35、グリシン供給ポンプ駆動部36、水酸化アンモニウム供給ポンプ駆動部37、塩酸供給ポンプ駆動部38、純水供給ポンプ駆動部39、循環ポンプ駆動部40、攪拌機駆動部41及び42から構成してある。ここで攪拌機駆動部41及び42はそれぞれ攪拌機10及び13を駆動するものである。   FIG. 2 shows a control device for controlling the agitators 10 and 13 such as a pH measuring pump 9, a chromium hydroxide supply pump 14, a glycine supply pump 15, an ammonium hydroxide supply pump 16, a hydrochloric acid supply pump 17, and a pure water supply pump 18. It is a block diagram which shows the structure of these. The control device includes a logic control unit 30, an operation unit 31, a current integration unit 32, a pH measurement unit 33, a pH measurement pump drive unit 34, a chromium hydroxide supply pump drive unit 35, a glycine supply pump drive unit 36, and an ammonium hydroxide supply. The pump drive unit 37, the hydrochloric acid supply pump drive unit 38, the pure water supply pump drive unit 39, the circulation pump drive unit 40, and the stirrer drive units 41 and 42 are configured. Here, the stirrer driving units 41 and 42 drive the stirrers 10 and 13, respectively.

操作部31は押しボタンスイッチ及び表示器の機能を有するもので、いわゆるタッチパネルで構成することができ、各種パラメータ、運転操作等の入力した信号を論理制御部30に送り、論理制御部30から送られる入力応答、運転状態等の情報を表示するものとしてある。電流積算部32には分流器等で検出される被めっき物に流れる電流の瞬時値が入力してあり、その電流値を積算した通電量を論理制御部30に送るようにしてある。pH計測部にはpH測定電極7の信号が入力してあり、計測したpH値を論理制御部30に送るようにしてある。   The operation unit 31 has a function of a push button switch and a display, and can be configured by a so-called touch panel. The input unit 31 sends signals such as various parameters and driving operations to the logic control unit 30 and sends them from the logic control unit 30. Information such as input response, operation status, and the like are displayed. An instantaneous value of the current flowing through the object to be plated, which is detected by a shunt or the like, is input to the current integrating unit 32, and an energization amount obtained by integrating the current value is sent to the logic control unit 30. A signal of the pH measurement electrode 7 is input to the pH measurement unit, and the measured pH value is sent to the logic control unit 30.

pH測定ポンプ駆動部34、水酸化クロム供給ポンプ駆動部35、グリシン供給ポンプ駆動部36、水酸化アンモニウム供給ポンプ駆動部37、塩酸供給ポンプ駆動部38、純水供給ポンプ駆動部39、循環ポンプ駆動部40、攪拌機駆動部41、42には論理制御部30から信号を送るようにしてあり、論理制御部30の信号が与えられるとそれぞれのポンプ、攪拌機に電力を供給して駆動する。その他図示していないがインターフェイスを介して温度センサー11及びヒーター12を論理制御部30に接続しておけば、論理制御部30によりヒーター12をオン、オフして調整槽1の温度制御をすることができる。   pH measurement pump drive unit 34, chromium hydroxide supply pump drive unit 35, glycine supply pump drive unit 36, ammonium hydroxide supply pump drive unit 37, hydrochloric acid supply pump drive unit 38, pure water supply pump drive unit 39, circulation pump drive A signal is sent from the logic control unit 30 to the unit 40 and the stirrer driving units 41 and 42. When a signal from the logic control unit 30 is given, power is supplied to each pump and stirrer to drive them. Although not shown, if the temperature sensor 11 and the heater 12 are connected to the logic control unit 30 through an interface, the heater 12 is turned on and off by the logic control unit 30 to control the temperature of the adjustment tank 1. Can do.

以下このように構成された3価クロムめっき液管理装置の動作について説明する。まず運転に先立ち、操作部31から各種パラメータを入力する。入力する必要のあるパラメータは通電量、水酸化クロム、グリシン及び水酸化アンモニウムの各供給量、塩酸補給開始pH値、水酸化アンモニウム補給開始pH値、pH調整判定時間、待ち時間1ないし5の時間、水酸化クロム供給ポンプ14、グリシン供給ポンプ15及び水酸化アンモニウム供給ポンプ16の各送液ポンプの単位時間あたりの送液量である。ここで入力する通電量は、この通電量になるごとに各薬剤を供給するという値であり、水酸化クロム、グリシン及び水酸化アンモニウムの供給量は単位通電量当たり供給すべき各薬剤の供給量である。   The operation of the trivalent chromium plating solution management apparatus configured as described above will be described below. First, various parameters are input from the operation unit 31 prior to driving. The parameters that need to be input are the energization amount, supply amounts of chromium hydroxide, glycine and ammonium hydroxide, hydrochloric acid replenishment start pH value, ammonium hydroxide replenishment start pH value, pH adjustment determination time, waiting time 1 to 5 , The amount of liquid feed per unit time of the liquid feed pumps of the chromium hydroxide supply pump 14, the glycine supply pump 15, and the ammonium hydroxide supply pump 16. The energization amount input here is a value that each drug is supplied every time the energization amount is reached, and the supply amount of chromium hydroxide, glycine, and ammonium hydroxide is the supply amount of each drug to be supplied per unit energization amount. It is.

待ち時間1は攪拌機10、13運転開始後水酸化クロム供給ポンプ14運転開始までの時間、待ち時間2は水酸化クロム供給ポンプ14停止後グリシン供給ポンプ15運転開始までの時間、待ち時間3はグリシン供給ポンプ15停止後水酸化アンモニウム供給ポンプ16運転開始までの時間、待ち時間4は水酸化アンモニウム供給ポンプ16停止後循環ポンプ21運転開始までの時間であり、待ち時間5は循環ポンプ21運転開始後水酸化アンモニウム供給ポンプ16又は塩酸供給ポンプ17運転開始までの時間である。また、めっき液のpHは、塩化クロム濃度が300g/lであれば0.1〜0.3、150g/lであれば0.4〜0.8とすることが好ましいので、塩酸補給開始pH値は0.3〜0.8に、水酸化アンモニウム補給開始pH値は0.1〜0.4にそれぞれ設定することになる。   Waiting time 1 is the time from the start of operation of the agitators 10 and 13 to the start of operation of the chromium hydroxide supply pump 14, waiting time 2 is the time from the stop of the chromium hydroxide supply pump 14 to the start of operation of the glycine supply pump 15, and waiting time 3 is glycine The time until the operation of the ammonium hydroxide supply pump 16 starts after the supply pump 15 stops, the waiting time 4 is the time from the stop of the ammonium hydroxide supply pump 16 until the operation of the circulation pump 21 starts, and the waiting time 5 after the operation of the circulation pump 21 starts This is the time until the operation of the ammonium hydroxide supply pump 16 or the hydrochloric acid supply pump 17 starts. The pH of the plating solution is preferably 0.1 to 0.3 if the chromium chloride concentration is 300 g / l, and 0.4 to 0.8 if the chromium chloride concentration is 150 g / l. The value is set to 0.3 to 0.8, and the ammonium hydroxide replenishment start pH value is set to 0.1 to 0.4.

このように各種パラメータを入力すると、論理制御部30は入力された水酸化クロム、グリシン及び水酸化アンモニウムの単位通電量当たりの供給量と、入力された水酸化クロム供給ポンプ14、グリシン供給ポンプ15及び水酸化アンモニウム供給ポンプ16の単位時間当たりの送液量とから、入力された単位通電量当たりの供給量に相当する量の水酸化クロム、グリシン及び水酸化アンモニウムをそれぞれ送液するのに必要な、水酸化クロム供給ポンプ14、グリシン供給ポンプ15及び水酸化アンモニウム供給ポンプ16の各運転時間を算出して記憶する。   When various parameters are input in this way, the logic control unit 30 inputs the input amount of chromium hydroxide, glycine and ammonium hydroxide per unit energization amount, and the input chromium hydroxide supply pump 14 and glycine supply pump 15. And the amount of chromium hydroxide, glycine, and ammonium hydroxide corresponding to the supplied amount per unit energization amount from the amount of liquid fed per unit time of the ammonium hydroxide supply pump 16 The operation times of the chromium hydroxide supply pump 14, the glycine supply pump 15 and the ammonium hydroxide supply pump 16 are calculated and stored.

ここでめっきを開始し、3価クロムめっき液管理装置を運転すると、論理制御部30から循環ポンプ駆動部40と攪拌機駆動部41に信号が送られ、循環ポンプ21と攪拌機10が運転される。これにより調整槽1内のめっき液はフィルタ19を通して循環ポンプ21によりめっき槽20に送られ、めっき槽20内のめっき液はオーバーフロー22から調整槽1に流れて調整槽1とめっき槽20の間でめっき液が循環し、めっき槽20内のめっき液と調整槽1内のめっき液とは均一な状態が保たれる。また、調整槽1内のめっき液は攪拌機10により攪拌される。   When plating is started and the trivalent chromium plating solution management apparatus is operated, a signal is sent from the logic control unit 30 to the circulation pump drive unit 40 and the agitator drive unit 41, and the circulation pump 21 and the agitator 10 are operated. Thereby, the plating solution in the adjustment tank 1 is sent to the plating tank 20 by the circulation pump 21 through the filter 19, and the plating solution in the plating tank 20 flows from the overflow 22 to the adjustment tank 1 and between the adjustment tank 1 and the plating tank 20. Thus, the plating solution circulates, and the plating solution in the plating tank 20 and the plating solution in the adjustment tank 1 are kept in a uniform state. Further, the plating solution in the adjustment tank 1 is stirred by the stirrer 10.

めっき槽20内の図示しない被めっき物に流れる電流は電流積算部32で積算され、通電量が論理制御部30に送られる。通電量が入力された通電量に達すると、論理制御部30から循環ポンプ駆動部40に信号が送られなくなり、攪拌機駆動部41、42に信号が送られるので、循環ポンプ21は停止し、攪拌機10、13が運転される。これにより調整槽1とめっき槽20の間のめっき液の循環が止まり、水酸化クロム貯蔵タンク2内の水酸化クロムが攪拌される。   The current flowing in the plating object (not shown) in the plating tank 20 is integrated by the current integration unit 32, and the energization amount is sent to the logic control unit 30. When the energization amount reaches the input energization amount, no signal is sent from the logic control unit 30 to the circulation pump drive unit 40, and no signal is sent to the agitator drive units 41, 42. Therefore, the circulation pump 21 stops and the agitator 10 and 13 are operated. Thereby, the circulation of the plating solution between the adjustment tank 1 and the plating tank 20 is stopped, and the chromium hydroxide in the chromium hydroxide storage tank 2 is stirred.

攪拌機13の運転開始後待ち時間1が経過すると、論理制御部30から水酸化クロム供給ポンプ駆動部35に信号が送られ、水酸化クロム供給ポンプ14が一定時間運転される。これにより水酸化クロム貯蔵タンク2内の水酸化クロムが調整槽1に送られる。待ち時間1は水酸化クロム貯蔵タンク2内の水酸化クロムが均一になる時間である。この水酸化クロム供給ポンプ14が運転される時間は論理制御部30で算出、記憶された水酸化クロムの単位通電量当たりの供給量を送るのに必要な水酸化クロム供給ポンプ14の運転時間と、通電量とから算出されるので、通電量に見合う量の水酸化クロムが送られることになる。調整槽1内のめっき液は強酸性であり、攪拌機10により攪拌されているので、水酸化クロム供給ポンプ14により送られた水酸化クロムはめっき液に溶解する。   When the waiting time 1 after the start of the operation of the stirrer 13 has elapsed, a signal is sent from the logic control unit 30 to the chromium hydroxide supply pump drive unit 35, and the chromium hydroxide supply pump 14 is operated for a predetermined time. Thereby, the chromium hydroxide in the chromium hydroxide storage tank 2 is sent to the adjustment tank 1. The waiting time 1 is a time during which the chromium hydroxide in the chromium hydroxide storage tank 2 becomes uniform. The operation time of the chromium hydroxide supply pump 14 is calculated by the logic control unit 30, and the operation time of the chromium hydroxide supply pump 14 required to send the stored supply amount per unit energization amount of chromium hydroxide is Since it is calculated from the energization amount, an amount of chromium hydroxide commensurate with the energization amount is sent. Since the plating solution in the adjustment tank 1 is strongly acidic and is stirred by the stirrer 10, the chromium hydroxide sent by the chromium hydroxide supply pump 14 is dissolved in the plating solution.

水酸化クロム供給ポンプ14の運転終了後待ち時間2が経過すると、論理制御部30からグリシン供給ポンプ駆動部36に信号が送られ、グリシン供給ポンプ15が一定時間運転される。これによりグリシン貯蔵タンク3内のグリシンが調整槽1に送られる。待ち時間2は調整槽1に送られた水酸化クロムがめっき液に溶解する時間である。グリシン供給ポンプ15が運転される時間は論理制御部30で算出、記憶されたグリシンの単位通電量当たりの供給量を送るのに必要なグリシン供給ポンプ15の運転時間と、通電量とから算出されるので、通電量に見合う量のグリシンが送られることになる。調整槽1内のめっき液は攪拌機10により攪拌されており、グリシン供給ポンプ15により送られたグリシンはめっき液に混合される。   When the waiting time 2 after the operation of the chromium hydroxide supply pump 14 has elapsed, a signal is sent from the logic control unit 30 to the glycine supply pump drive unit 36, and the glycine supply pump 15 is operated for a certain period of time. Thereby, the glycine in the glycine storage tank 3 is sent to the adjustment tank 1. The waiting time 2 is the time for the chromium hydroxide sent to the adjustment tank 1 to dissolve in the plating solution. The time for which the glycine supply pump 15 is operated is calculated by the logic control unit 30 and is calculated from the operation time of the glycine supply pump 15 necessary for sending the stored supply amount per unit energization amount of glycine and the energization amount. Therefore, an amount of glycine corresponding to the energization amount is sent. The plating solution in the adjustment tank 1 is stirred by the stirrer 10, and the glycine fed by the glycine supply pump 15 is mixed with the plating solution.

グリシン供給ポンプ15の運転終了後待ち時間3が経過すると、論理制御部30から水酸化アンモニウム供給ポンプ駆動部37に信号が送られ、水酸化アンモニウム供給ポンプ16が一定時間運転される。これにより水酸化アンモニウム貯蔵タンク4内の水酸化アンモニウムが調整槽1に送られる。待ち時間3は調整槽1に送られたグリシンがめっき液に混合される時間である。水酸化アンモニウム供給ポンプ16が運転される時間は論理制御部30で算出、記憶された水酸化アンモニウムの単位通電量当たりの供給量を送るのに必要な水酸化アンモニウム供給ポンプ16の運転時間と、通電量とから算出されるので、通電量に見合う量の水酸化アンモニウムが送られることになる。調整槽1内のめっき液は攪拌機10により攪拌されており、水酸化アンモニウム供給ポンプ16により送られた水酸化アンモニウムはめっき液に混合される。   When the waiting time 3 after the operation of the glycine supply pump 15 ends, a signal is sent from the logic control unit 30 to the ammonium hydroxide supply pump drive unit 37, and the ammonium hydroxide supply pump 16 is operated for a predetermined time. Thereby, the ammonium hydroxide in the ammonium hydroxide storage tank 4 is sent to the adjustment tank 1. The waiting time 3 is a time during which glycine sent to the adjustment tank 1 is mixed with the plating solution. The time for which the ammonium hydroxide supply pump 16 is operated is calculated by the logic control unit 30, and the operation time of the ammonium hydroxide supply pump 16 necessary for sending the stored supply amount per unit current of ammonium hydroxide, Since it is calculated from the energization amount, an amount of ammonium hydroxide commensurate with the energization amount is sent. The plating solution in the adjustment tank 1 is stirred by the stirrer 10, and the ammonium hydroxide sent by the ammonium hydroxide supply pump 16 is mixed with the plating solution.

水酸化アンモニウム供給ポンプ16の運転終了後待ち時間4が経過すると、論理制御部30からpH測定ポンプ駆動部34と循環ポンプ駆動部40に信号が送られ、pH測定ポンプ9と循環ポンプ21が運転される。これにより、水酸化クロム、グリシン及び水酸化アンモニウムの供給によって通電による成分の減少分が補給された調整槽1内のめっき液は循環ポンプ21によりめっき槽20に送られ、成分が減少しためっき槽20内のめっき液はオーバーフロー22から調整槽1に流れるので、めっき槽20内のめっき液と調整槽1内のめっき液が均一になり、めっき槽20内のめっき液に減少分の成分が補給されることになる。待ち時間4は水酸化アンモニウムがめっき液に混合される時間である。   When the waiting time 4 after the operation of the ammonium hydroxide supply pump 16 has elapsed, a signal is sent from the logic control unit 30 to the pH measurement pump drive unit 34 and the circulation pump drive unit 40, and the pH measurement pump 9 and the circulation pump 21 are operated. Is done. As a result, the plating solution in the adjustment tank 1 in which the decrease in the components due to energization is supplied by the supply of chromium hydroxide, glycine and ammonium hydroxide is sent to the plating tank 20 by the circulation pump 21, and the plating tank in which the components are reduced. Since the plating solution in 20 flows from the overflow 22 to the adjustment tank 1, the plating solution in the plating tank 20 and the plating solution in the adjustment tank 1 become uniform, and the components for reduction are supplied to the plating solution in the plating tank 20. Will be. The waiting time 4 is a time during which ammonium hydroxide is mixed with the plating solution.

pH測定ポンプ9と循環ポンプ21の運転開始後入力された待ち時間5が経過すると、論理制御部30でpH計測部33から送られるpH値と塩酸補給開始pH値及び水酸化アンモニウム補給開始pH値とが比較され、pH値が塩酸補給開始pH値より高ければ塩酸供給ポンプ駆動部38に、pH値が水酸化アンモニウム補給開始pH値より低ければ水酸化アンモニウム供給ポンプ駆動部37にそれぞれ論理制御部30から信号が送られる。これにより塩酸供給ポンプ17又は水酸化アンモニウム供給ポンプ16が運転される。待ち時間5はめっき槽20内のめっき液と調整槽1内のめっき液が均一になり、pH測定電極7及びpH計測部33が安定するまでの時間である。   When the waiting time 5 input after the operation of the pH measuring pump 9 and the circulation pump 21 has elapsed, the pH value sent from the pH measuring unit 33 by the logic control unit 30, the hydrochloric acid replenishment start pH value, and the ammonium hydroxide replenishment start pH value. If the pH value is higher than the hydrochloric acid replenishment start pH value, the hydrochloric acid supply pump drive unit 38, and if the pH value is lower than the ammonium hydroxide replenishment start pH value, the logic control unit is connected to the ammonium hydroxide supply pump drive unit 37, respectively. A signal is sent from 30. Thereby, the hydrochloric acid supply pump 17 or the ammonium hydroxide supply pump 16 is operated. The waiting time 5 is a time until the plating solution in the plating tank 20 and the plating solution in the adjustment tank 1 become uniform and the pH measurement electrode 7 and the pH measurement unit 33 are stabilized.

論理制御部30では引き続きpH値と塩酸補給開始pH値及び水酸化アンモニウム補給開始pH値との比較が継続され、塩酸供給ポンプ17が運転された後pH値が塩酸補給開始pH値より低くなったとき、あるいは水酸化アンモニウム供給ポンプ16が運転された後pH値が水酸化アンモニウム補給開始pH値より高くなったときからpH調整判定時間を超える時間その状態が継続すれば、論理制御部30から塩酸供給ポンプ駆動部38あるいは水酸化アンモニウム供給ポンプ駆動部37に信号が送れられなくなり、塩酸供給ポンプ17あるいは水酸化アンモニウム供給ポンプ16が停止して塩酸あるいは水酸化アンモニウムの供給が停止する。   The logic controller 30 continued to compare the pH value with the hydrochloric acid replenishment start pH value and the ammonium hydroxide replenishment start pH value, and after the hydrochloric acid supply pump 17 was operated, the pH value became lower than the hydrochloric acid replenishment start pH value. Or after the ammonium hydroxide supply pump 16 is operated, if the state continues for a time exceeding the pH adjustment determination time after the pH value becomes higher than the ammonium hydroxide replenishment start pH value, the logic controller 30 sends hydrochloric acid. No signal is sent to the supply pump drive unit 38 or the ammonium hydroxide supply pump drive unit 37, the hydrochloric acid supply pump 17 or the ammonium hydroxide supply pump 16 stops, and the supply of hydrochloric acid or ammonium hydroxide stops.

待ち時間5が経過した時点でpH値が塩酸補給開始pH値より低く、水酸化アンモニウム補給開始pH値より高ければpH値は所定の範囲にあることになり、塩酸供給ポンプ駆動部38、水酸化アンモニウム供給ポンプ駆動部37のいずれにも信号は送られず、塩酸供給ポンプ17、水酸化アンモニウム供給ポンプ16はいずれも運転されることはない。これによりめっき液のpH値が所定の範囲であればそのまま、所定の範囲を外れていれば塩酸あるいは水酸化アンモニウムが供給され、pH値は塩化クロムの濃度に応じた所定の範囲に調整される。さらに、めっき液の量が減少した場合には、論理制御部30から純水供給ポンプ駆動部39に信号が送られ、純水供給ポンプ18が運転されて純水が調整槽1に送られ、めっき液の量が維持される。   If the pH value is lower than the hydrochloric acid replenishment start pH value when the waiting time 5 has elapsed and is higher than the ammonium hydroxide replenishment start pH value, the pH value is within a predetermined range. No signal is sent to any of the ammonium supply pump drive units 37, and neither the hydrochloric acid supply pump 17 nor the ammonium hydroxide supply pump 16 is operated. Thus, if the pH value of the plating solution is within a predetermined range, hydrochloric acid or ammonium hydroxide is supplied as it is outside the predetermined range, and the pH value is adjusted to a predetermined range according to the concentration of chromium chloride. . Further, when the amount of the plating solution decreases, a signal is sent from the logic control unit 30 to the pure water supply pump drive unit 39, the pure water supply pump 18 is operated, and pure water is sent to the adjustment tank 1, The amount of plating solution is maintained.

このようにして、被めっき物に流れた電流の通電量が入力した通電量に達するごとに消費された成分を補うように水酸化クロム、グリシン及び水酸化アンモニウムが供給され、pHを所定の範囲に保つように塩酸あるいは水酸化アンモニウムが供給され、めっき液の量を維持するように純水が供給されるのであるが、任意の時点で操作部31から補給指令を入力した場合には、上記と同様の順序で各供給動作を行うように論理制御部30が水酸化クロム供給ポンプ駆動部35その他に信号を送り、水酸化クロム供給ポンプ14その他が順次運転される。   In this way, chromium hydroxide, glycine and ammonium hydroxide are supplied so as to supplement the consumed components every time the energization amount of the current flowing through the workpiece reaches the input energization amount, and the pH is set within a predetermined range. Hydrochloric acid or ammonium hydroxide is supplied so that the amount of the plating solution is maintained, and pure water is supplied so as to maintain the amount of the plating solution. The logic control unit 30 sends a signal to the chromium hydroxide supply pump drive unit 35 and the like so as to perform the respective supply operations in the same order as described above, and the chromium hydroxide supply pump 14 and the like are sequentially operated.

このときの水酸化クロム供給ポンプ14が運転される時間は論理制御部30で算出、記憶された水酸化クロムの単位通電量当たりの供給量を送るのに必要な水酸化クロム供給ポンプ14の運転時間と、前回補給されてから補給指令を入力した時点までの通電量とから算出されるので、前回補給されてから補給指令を入力した時点までの間に消費された成分を補給するのに必要な量の水酸化クロムが供給されることになる。グリシン供給ポンプ15及び水酸化アンモニウム供給ポンプ16が運転される時間も同様に算出されるので、その間に消費された成分を補給するのに必要な量のグリシン及び水酸化アンモニウムが供給されることになる。   The operation time of the chromium hydroxide supply pump 14 at this time is calculated by the logic control unit 30, and the operation of the chromium hydroxide supply pump 14 necessary for sending the stored supply amount per unit energization amount of chromium hydroxide is performed. Since it is calculated from the time and the amount of energization from when it was last replenished to when the replenishment command was entered, it is necessary to replenish the components consumed between the last replenishment and when the replenishment command was entered A large amount of chromium hydroxide is supplied. Since the operation time of the glycine supply pump 15 and the ammonium hydroxide supply pump 16 is calculated in the same manner, the amount of glycine and ammonium hydroxide necessary to replenish the components consumed during the operation is supplied. Become.

以上の説明によっても明らかなように、本発明の3価クロムめっき液管理装置では、通電量が設定した一定値に達したとき又は操作信号が入力されたときのいずれのときにも、それまでの通電により減少した成分を補給するのに必要な量の薬剤を供給するので、新規に被めっき物のめっきを開始するときに操作信号を入力すれば、成分の不足がないめっき液でめっきすることができる利点がある。補給する水酸化クロム、グリシン及び水酸化アンモニウムは順を追ってめっき槽とは別に設けた調整槽でめっき液に溶解、混合するので、溶解しにくい水酸化クロムも完全に溶解する利点がある。また、全ての薬剤を供給後めっき槽に送るので、被めっき物は成分の一部だけが補給された不完全なめっき液でめっきされることはない。   As is apparent from the above description, in the trivalent chromium plating solution management device of the present invention, any time when the energization amount reaches a set constant value or when an operation signal is input, The amount of chemicals required to replenish the components reduced by energization is supplied, so if an operation signal is input when starting plating of a new plating object, plating is performed with a plating solution that does not have insufficient components. There are advantages that can be made. Since chromium hydroxide, glycine and ammonium hydroxide to be replenished are dissolved and mixed in the plating solution in an adjusting tank provided separately from the plating tank in order, there is an advantage that chromium hydroxide which is difficult to dissolve is completely dissolved. Further, since all the chemicals are supplied to the plating tank, the object to be plated is not plated with an incomplete plating solution in which only a part of the components is replenished.

なお、めっき液は硼酸あるいは硼酸と塩化アルミニウムを含むものであるが、硼酸と塩化アルミニウムが電析あるいは分解により減少することはなく、汲み出しによってのみ減少するものである。したがって、こうした汲み出しにより減少する成分に関しては、あらかじめ汲み出し量を予測して一定時間ごとに薬剤を供給する等の方法によりその量を維持することができる。   The plating solution contains boric acid or boric acid and aluminum chloride, but boric acid and aluminum chloride are not reduced by electrodeposition or decomposition, but are reduced only by pumping. Therefore, the amount of the component that is reduced by the pumping can be maintained by a method such as predicting the pumping amount in advance and supplying the medicine at regular intervals.

本発明の3価クロムめっき液管理装置の構成を示す図である。It is a figure which shows the structure of the trivalent chromium plating solution management apparatus of this invention. 制御装置の構成を示すブロック図である。It is a block diagram which shows the structure of a control apparatus.

符号の説明Explanation of symbols

1 調整槽
2 水酸化クロム貯蔵タンク
3 グリシン貯蔵タンク
4 水酸化アンモニウム貯蔵タンク
5 塩酸貯蔵タンク
6 純水貯蔵タンク
7 pH測定電極
8 pH測定槽
9 pH測定ポンプ
10 攪拌機
11 温度センサー
12 ヒーター
13 攪拌機
14 水酸化クロム供給ポンプ
15 グリシン供給ポンプ
16 水酸化アンモニウム供給ポンプ
17 塩酸供給ポンプ
18 純水供給ポンプ
19 フィルタ
20 めっき槽
21 循環ポンプ
22 オーバーフロー
23 温度センサー
24 ヒーター
25、26 バルブ
27 圧力計
28 液面センサー
30 論理制御部
31 操作部
32 電流積算部
33 pH計測部
34 pH測定ポンプ駆動部
35 水酸化クロム供給ポンプ駆動部
36 グリシン供給ポンプ駆動部
37 水酸化アンモニウム供給ポンプ駆動部
38 塩酸供給ポンプ駆動部
39 純水供給ポンプ駆動部
40 循環ポンプ駆動部
41、42 攪拌機駆動部
DESCRIPTION OF SYMBOLS 1 Adjustment tank 2 Chromium hydroxide storage tank 3 Glycine storage tank 4 Ammonium hydroxide storage tank 5 Hydrochloric acid storage tank 6 Pure water storage tank 7 pH measurement electrode 8 pH measurement tank 9 pH measurement pump 10 Stirrer 11 Temperature sensor 12 Heater 13 Stirrer 14 Chromium hydroxide supply pump 15 Glycine supply pump 16 Ammonium hydroxide supply pump 17 Hydrochloric acid supply pump 18 Pure water supply pump 19 Filter 20 Plating tank 21 Circulation pump 22 Overflow 23 Temperature sensor 24 Heater 25, 26 Valve 27 Pressure gauge 28 Liquid level sensor DESCRIPTION OF SYMBOLS 30 Logic control part 31 Operation part 32 Current integration part 33 pH measurement part 34 pH measurement pump drive part 35 Chromium hydroxide supply pump drive part 36 Glycine supply pump drive part 37 Ammonium hydroxide supply pump drive part 38 Hydrochloric acid supply pump drive unit 39 Pure water supply pump drive unit 40 Circulation pump drive unit 41, 42 Stirrer drive unit

Claims (2)

調整槽と、複数の薬剤を貯蔵する貯蔵タンクと、各貯蔵タンクから薬剤を個別に調整槽へ送る複数の供給ポンプとから構成し、めっき槽から調整槽へ取り出しためっき液に各薬剤を供給することにより、通電量に比例して減少する成分を補給する3価クロムめっき液管理装置であって、被めっき物に流れる電流を積算して通電量を計測する電流積算手段と、単位通電量当たり必要な各薬剤の供給量を記憶する記憶手段と、計測された通電量と記憶手段の内容とから計測された通電量に対して必要な各薬剤の供給量を算出する計算手段と、通電量が設定した値に達したとき信号を出力する比較手段と、操作信号が入力されたとき信号を出力する入力手段と、比較手段あるいは入力手段の出力が与えられたとき各供給ポンプを駆動して計算手段により算出された供給量の薬剤をそれぞれ供給させる複数の供給ポンプ駆動手段とを備える制御装置を設けたことを特徴とする3価クロムめっき液管理装置。   Consists of an adjustment tank, a storage tank that stores multiple chemicals, and a plurality of supply pumps that individually send the chemicals from each storage tank to the adjustment tank, and supplies each chemical to the plating solution taken out from the plating tank to the adjustment tank A trivalent chromium plating solution management device that replenishes a component that decreases in proportion to the energization amount, integrating current flowing through the object to be plated and measuring the energization amount, and a unit energization amount Storage means for storing the required supply amount of each medicine, calculation means for calculating the required supply amount of each medicine from the measured energization amount and the content of the storage means, and energization Comparing means for outputting a signal when the amount reaches a set value, input means for outputting a signal when an operation signal is input, and each supply pump is driven when the output of the comparing means or the input means is given. To the calculation means Trivalent chromium plating solution control apparatus, wherein a control device is provided comprising a plurality of supply-pump driving means for supplying respectively calculated supply amount of drug Ri. 薬剤を水酸化クロム、グリシン及び水酸化アンモニウムとし、水酸化クロム供給ポンプ駆動手段を動作させ、水酸化クロム供給ポンプ駆動手段の動作完了後設定した待ち時間が経過した時点でグリシン供給ポンプ駆動手段を動作させ、グリシン供給ポンプ駆動手段の動作完了後設定した待ち時間が経過した時点で水酸化アンモニウム供給ポンプ駆動手段を動作させるシーケンス制御手段を制御装置に付加したことを特徴とする請求項1に記載の3価クロムめっき液管理装置。   The drug is chromium hydroxide, glycine and ammonium hydroxide, the chromium hydroxide supply pump drive means is operated, and the glycine supply pump drive means is turned on when the set waiting time has elapsed after the operation of the chromium hydroxide supply pump drive means has elapsed. The sequence control means for operating the ammonium hydroxide supply pump drive means when the waiting time set after the operation of the glycine supply pump drive means is completed has been added to the control device. Trivalent chromium plating solution management device.
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CN105506724A (en) * 2015-12-02 2016-04-20 贵州钢绳股份有限公司 Plating solution adding method and device
WO2020120537A1 (en) * 2018-12-11 2020-06-18 Atotech Deutschland Gmbh A method for depositing a chromium or chromium alloy layer and plating apparatus
US12006585B2 (en) 2018-12-11 2024-06-11 Atotech Deutschland Gmbh Method for depositing a chromium or chromium alloy layer and plating apparatus

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JPH02217499A (en) * 1989-02-20 1990-08-30 Nippon Steel Corp Method for controlling concentration of electroplating bath of alloy
JP2002322599A (en) * 2001-04-23 2002-11-08 Shigeo Hoshino Method for plating with trivalent chromium
JP2006249518A (en) * 2005-03-11 2006-09-21 Koka Chrom Kogyo Kk Method for supplying chromium ion to trivalent chromium plating bath

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JPH01119700A (en) * 1987-10-30 1989-05-11 Nisshin Steel Co Ltd Method for administrating concentration of bright plating agent in plating bath for continuous electroplating line
JPH02217499A (en) * 1989-02-20 1990-08-30 Nippon Steel Corp Method for controlling concentration of electroplating bath of alloy
JP2002322599A (en) * 2001-04-23 2002-11-08 Shigeo Hoshino Method for plating with trivalent chromium
JP2006249518A (en) * 2005-03-11 2006-09-21 Koka Chrom Kogyo Kk Method for supplying chromium ion to trivalent chromium plating bath

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105506724A (en) * 2015-12-02 2016-04-20 贵州钢绳股份有限公司 Plating solution adding method and device
WO2020120537A1 (en) * 2018-12-11 2020-06-18 Atotech Deutschland Gmbh A method for depositing a chromium or chromium alloy layer and plating apparatus
CN113166961A (en) * 2018-12-11 2021-07-23 德国艾托特克公司 Method for depositing chromium or chromium alloy layer and electroplating device
JP2022511958A (en) * 2018-12-11 2022-02-01 アトテック ドイチェランド ゲーエムベーハー Methods and Plating Equipment for Precipitating Chromium Layers or Chromium Alloy Layers
JP7154415B2 (en) 2018-12-11 2022-10-17 アトテック ドイチェランド ゲーエムベーハー ウント コ カーゲー Method and plating apparatus for depositing chromium or chromium alloy layers
US12006585B2 (en) 2018-12-11 2024-06-11 Atotech Deutschland Gmbh Method for depositing a chromium or chromium alloy layer and plating apparatus

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