JP2009246366A5 - - Google Patents

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Publication number

JP2009246366A5

JP2009246366A5 JP2009080291A JP2009080291A JP2009246366A5 JP 2009246366 A5 JP2009246366 A5 JP 2009246366A5 JP 2009080291 A JP2009080291 A JP 2009080291A JP 2009080291 A JP2009080291 A JP 2009080291A JP 2009246366 A5 JP2009246366 A5 JP 2009246366A5

Authority

JP

Japan

Prior art keywords

layer

strain

substrate

deformable

strain structure

Prior art date

2009-03-27

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Granted

Links

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• 239000000758 substrate Substances 0.000 claims description 34
• 238000000034 method Methods 0.000 claims description 33
• 239000000463 material Substances 0.000 claims description 17
• 229910052710 silicon Inorganic materials 0.000 claims description 8
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
• 239000010703 silicon Substances 0.000 claims description 7
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
• 239000010453 quartz Substances 0.000 claims description 2
• 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
• 239000000126 substance Substances 0.000 claims description 2
• 239000010410 layer Substances 0.000 claims 34
• 230000007704 transition Effects 0.000 claims 6
• 150000001875 compounds Chemical class 0.000 claims 5
• NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 claims 4
• RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
• 239000013078 crystal Substances 0.000 claims 2
• 229910052451 lead zirconate titanate Inorganic materials 0.000 claims 2
• QRNPTSGPQSOPQK-UHFFFAOYSA-N magnesium zirconium Chemical compound [Mg].[Zr] QRNPTSGPQSOPQK-UHFFFAOYSA-N 0.000 claims 2
• LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims 2
• 239000002344 surface layer Substances 0.000 claims 2
• WKBPZYKAUNRMKP-UHFFFAOYSA-N 1-[2-(2,4-dichlorophenyl)pentyl]1,2,4-triazole Chemical compound C=1C=C(Cl)C=C(Cl)C=1C(CCC)CN1C=NC=N1 WKBPZYKAUNRMKP-UHFFFAOYSA-N 0.000 claims 1
• WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims 1
• 229910017119 AlPO Inorganic materials 0.000 claims 1
• 229910013641 LiNbO 3 Inorganic materials 0.000 claims 1
• 229910001329 Terfenol-D Inorganic materials 0.000 claims 1
• XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 1
• 239000002253 acid Substances 0.000 claims 1
• JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims 1
• 229910002113 barium titanate Inorganic materials 0.000 claims 1
• 239000000919 ceramic Substances 0.000 claims 1
• 229910017052 cobalt Inorganic materials 0.000 claims 1
• 239000010941 cobalt Substances 0.000 claims 1
• GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
• 230000004907 flux Effects 0.000 claims 1
• 229910000154 gallium phosphate Inorganic materials 0.000 claims 1
• LWFNJDOYCSNXDO-UHFFFAOYSA-K gallium;phosphate Chemical compound [Ga+3].[O-]P([O-])([O-])=O LWFNJDOYCSNXDO-UHFFFAOYSA-K 0.000 claims 1
• HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims 1
• QNZFKUWECYSYPS-UHFFFAOYSA-N lead zirconium Chemical compound [Zr].[Pb] QNZFKUWECYSYPS-UHFFFAOYSA-N 0.000 claims 1
• GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims 1
• 238000004519 manufacturing process Methods 0.000 claims 1
• 230000003287 optical effect Effects 0.000 claims 1
• ZBSCCQXBYNSKPV-UHFFFAOYSA-N oxolead;oxomagnesium;2,4,5-trioxa-1$l^{5},3$l^{5}-diniobabicyclo[1.1.1]pentane 1,3-dioxide Chemical class [Mg]=O.[Pb]=O.[Pb]=O.[Pb]=O.O1[Nb]2(=O)O[Nb]1(=O)O2 ZBSCCQXBYNSKPV-UHFFFAOYSA-N 0.000 claims 1
• UKDIAJWKFXFVFG-UHFFFAOYSA-N potassium;oxido(dioxo)niobium Chemical compound [K+].[O-][Nb](=O)=O UKDIAJWKFXFVFG-UHFFFAOYSA-N 0.000 claims 1
• 239000004065 semiconductor Substances 0.000 claims 1
• 239000011734 sodium Substances 0.000 claims 1
• XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 claims 1
• 239000011031 topaz Substances 0.000 claims 1
• 229910052853 topaz Inorganic materials 0.000 claims 1
• 235000012239 silicon dioxide Nutrition 0.000 description 2
• 229910004298 SiO 2 Inorganic materials 0.000 description 1
• 229910052681 coesite Inorganic materials 0.000 description 1
• 230000008878 coupling Effects 0.000 description 1
• 238000010168 coupling process Methods 0.000 description 1
• 238000005859 coupling reaction Methods 0.000 description 1
• 229910052906 cristobalite Inorganic materials 0.000 description 1
• 238000005530 etching Methods 0.000 description 1
• 239000000377 silicon dioxide Substances 0.000 description 1
• 229910052682 stishovite Inorganic materials 0.000 description 1
• 229910052905 tridymite Inorganic materials 0.000 description 1