JP2009239286A5 - - Google Patents
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- Publication number
- JP2009239286A5 JP2009239286A5 JP2009074674A JP2009074674A JP2009239286A5 JP 2009239286 A5 JP2009239286 A5 JP 2009239286A5 JP 2009074674 A JP2009074674 A JP 2009074674A JP 2009074674 A JP2009074674 A JP 2009074674A JP 2009239286 A5 JP2009239286 A5 JP 2009239286A5
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- immersion system
- liquid recovery
- recovery port
- optical path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims 69
- 238000011084 recovery Methods 0.000 claims 38
- 238000007654 immersion Methods 0.000 claims 37
- 230000003287 optical effect Effects 0.000 claims 22
- 239000000758 substrate Substances 0.000 claims 12
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US6481008P | 2008-03-27 | 2008-03-27 | |
| US12/382,742 US8233139B2 (en) | 2008-03-27 | 2009-03-23 | Immersion system, exposure apparatus, exposing method, and device fabricating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009239286A JP2009239286A (ja) | 2009-10-15 |
| JP2009239286A5 true JP2009239286A5 (cg-RX-API-DMAC7.html) | 2013-03-14 |
Family
ID=40793250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009074674A Pending JP2009239286A (ja) | 2008-03-27 | 2009-03-25 | 液浸システム、露光装置、露光方法、及びデバイス製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8233139B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2009239286A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20100133446A (cg-RX-API-DMAC7.html) |
| TW (1) | TW200947145A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2009119898A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI439813B (zh) * | 2006-05-10 | 2014-06-01 | 尼康股份有限公司 | A method of manufacturing an exposure apparatus and an element |
| US8233139B2 (en) * | 2008-03-27 | 2012-07-31 | Nikon Corporation | Immersion system, exposure apparatus, exposing method, and device fabricating method |
| US8896806B2 (en) | 2008-12-29 | 2014-11-25 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| EP2523210A1 (en) * | 2010-01-08 | 2012-11-14 | Nikon Corporation | Liquid-immersion member, exposing device, exposing method, and device manufacturing method |
| NL2009692A (en) * | 2011-12-07 | 2013-06-10 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
| US9323160B2 (en) * | 2012-04-10 | 2016-04-26 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium |
| US9823580B2 (en) | 2012-07-20 | 2017-11-21 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
| US9494870B2 (en) | 2012-10-12 | 2016-11-15 | Nikon Corporation | Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
| US9720331B2 (en) | 2012-12-27 | 2017-08-01 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
| JP2017520792A (ja) | 2014-07-01 | 2017-07-27 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置及びリソグラフィ装置を製造する方法 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1244021C (zh) | 1996-11-28 | 2006-03-01 | 株式会社尼康 | 光刻装置和曝光方法 |
| USRE40043E1 (en) | 1997-03-10 | 2008-02-05 | Asml Netherlands B.V. | Positioning device having two object holders |
| US6897963B1 (en) | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
| US6208407B1 (en) | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
| IL138374A (en) | 1998-03-11 | 2004-07-25 | Nikon Corp | An ultraviolet laser device and an exposure device that includes such a device |
| WO2001035168A1 (en) | 1999-11-10 | 2001-05-17 | Massachusetts Institute Of Technology | Interference lithography utilizing phase-locked scanning beams |
| JP4714403B2 (ja) | 2001-02-27 | 2011-06-29 | エーエスエムエル ユーエス，インコーポレイテッド | デュアルレチクルイメージを露光する方法および装置 |
| TW529172B (en) | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
| US7362508B2 (en) | 2002-08-23 | 2008-04-22 | Nikon Corporation | Projection optical system and method for photolithography and exposure apparatus and method using same |
| KR101497289B1 (ko) | 2003-04-10 | 2015-02-27 | 가부시키가이샤 니콘 | 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템 |
| EP2270599A1 (en) | 2003-05-13 | 2011-01-05 | ASML Netherlands BV | Lithographic apparatus |
| TWI295414B (en) * | 2003-05-13 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| KR101523180B1 (ko) | 2003-09-03 | 2015-05-26 | 가부시키가이샤 니콘 | 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법 |
| JP4378136B2 (ja) | 2003-09-04 | 2009-12-02 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| JP4525676B2 (ja) * | 2004-03-25 | 2010-08-18 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
| EP1768169B9 (en) | 2004-06-04 | 2013-03-06 | Nikon Corporation | Exposure apparatus, exposure method, and device producing method |
| JP4543767B2 (ja) | 2004-06-10 | 2010-09-15 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| US7701550B2 (en) | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| TWI506674B (zh) | 2004-09-17 | 2015-11-01 | 尼康股份有限公司 | Exposure apparatus, exposure method, and device manufacturing method |
| US7161654B2 (en) * | 2004-12-02 | 2007-01-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP5005226B2 (ja) * | 2005-01-31 | 2012-08-22 | 株式会社ニコン | 露光装置及びデバイス製造方法、液体保持方法 |
| US7411654B2 (en) | 2005-04-05 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4802604B2 (ja) * | 2005-08-17 | 2011-10-26 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
| US7751026B2 (en) | 2005-08-25 | 2010-07-06 | Nikon Corporation | Apparatus and method for recovering fluid for immersion lithography |
| US7804577B2 (en) | 2005-11-16 | 2010-09-28 | Asml Netherlands B.V. | Lithographic apparatus |
| US7864292B2 (en) * | 2005-11-16 | 2011-01-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| TWI439813B (zh) | 2006-05-10 | 2014-06-01 | 尼康股份有限公司 | A method of manufacturing an exposure apparatus and an element |
| JP2007335662A (ja) * | 2006-06-15 | 2007-12-27 | Canon Inc | 露光装置 |
| JP2008034801A (ja) * | 2006-06-30 | 2008-02-14 | Canon Inc | 露光装置およびデバイス製造方法 |
| US8134685B2 (en) | 2007-03-23 | 2012-03-13 | Nikon Corporation | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
| US20090122282A1 (en) | 2007-05-21 | 2009-05-14 | Nikon Corporation | Exposure apparatus, liquid immersion system, exposing method, and device fabricating method |
| US8233139B2 (en) * | 2008-03-27 | 2012-07-31 | Nikon Corporation | Immersion system, exposure apparatus, exposing method, and device fabricating method |
-
2009
- 2009-03-23 US US12/382,742 patent/US8233139B2/en not_active Expired - Fee Related
- 2009-03-25 JP JP2009074674A patent/JP2009239286A/ja active Pending
- 2009-03-26 KR KR1020107023702A patent/KR20100133446A/ko not_active Withdrawn
- 2009-03-26 WO PCT/JP2009/056843 patent/WO2009119898A1/en not_active Ceased
- 2009-03-26 TW TW098109833A patent/TW200947145A/zh unknown
-
2012
- 2012-06-20 US US13/528,379 patent/US20120300181A1/en not_active Abandoned