JP2009238917A - Scheduling method and program of substrate processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent excessive processing to a lot even if abnormalities occur at a safety processing section. <P>SOLUTION: The first lot is subjected to pair processing, so that a virtual resource PB2 at a second processing section is used. Also, the second lot not subjected to pair processing, so that a virtual resource PB1 at the first processing section is used for a processing period at a chemical liquid processing section CHB1, and a virtual resource PB2 at the second processing section is used over a processing period over the second processing section. When the usage timing of respective resources (a)-(i) is determined by excluding the overlapping of the virtual resources PB1, PB2, excessive processing to the second lot can be prevented even if abnormalities occur at a pure water cleaning processing section ONB2. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a schedule creation method for a substrate processing apparatus for performing a predetermined process on a glass substrate (hereinafter simply referred to as a substrate) for a semiconductor wafer or a liquid crystal display device, and a program therefor.

  Conventionally, as this type of method, there is a method for determining in which order and in what order the resources of each processing unit are used before starting actual processing (see, for example, Patent Document 1). . By performing scheduling in advance in this manner, each processing step of each lot can be arranged so as to use the resources of each processing unit in a front-packed manner, so that the operating rate can be improved.

  In addition to the above-described method, as a scheduling method in a substrate processing apparatus having a space that interferes with a sub-transport mechanism that is shared by a pair of processing units and a main transport mechanism that transports a substrate, for example, the above-described interference space Is defined as a resource (see, for example, Patent Document 2). In this way, by using the interference space resource together with the resources of the main transport mechanism and the sub transport mechanism, the main transport mechanism or the sub transport mechanism does not wait for the main transport mechanism or the sub transport mechanism to finish the other operation. When the use of the resources in the interference space is completed, the other transport mechanism can be started to operate, and excessive processing of the lot due to the chemical solution due to transport waiting can be prevented.

  By the way, in the conventional apparatus, a single processing unit constituted by a pair of a pure water cleaning processing unit and a chemical solution processing unit is provided with a dual-purpose transport mechanism, and a plurality of such processing units are provided. Some have a main transport mechanism that moves along the processing unit and delivers a substrate to and from each sub transport mechanism. In such an apparatus, a schedule is set so that the sub-transport mechanism of each processing unit is occupied only while the processing is performed in each processing unit. In addition, there exists a possibility that a chemical processing part etc. may produce a bad influence by making a lot wait. On the other hand, the pure water cleaning processing unit or the like has no possibility of adversely affecting the lot even if the lot is put on standby. In the present specification, the former is referred to as “non-safe processing unit” and the latter is referred to as “safe processing unit”.

Here, FIGS. 4, 5 and 10 will be referred to to show specific examples.
First, after the chemical treatment (treatment process P1-3) is performed in the chemical treatment section CHB2 of the second treatment section, the first lot is subjected to pure water in the pure water cleaning treatment section ONB2 of the second treatment section as a pair. This is a process carried out after the cleaning process (process P1-5) is performed (FIG. 4). In the second lot, after the chemical treatment (treatment step P2-3) is performed in the chemical treatment unit CHB1 of the first treatment unit, the pure water cleaning of the second treatment unit that is not paired with the chemical treatment unit CHB1 The pure water cleaning process (processing step P2-5) is performed in the processing unit ONB2, and then carried out (FIG. 5). Here, the sub-transport mechanism LFS2 of the second processing unit is used only while processing is being performed in the second processing unit, and the sub-transport mechanism LFS1 of the first processing unit is used. , Only while the processing is being performed in the first processing unit. As shown in FIGS. 4 and 5, a schedule for each lot alone (single batch) is created, and then the schedules of the first and second lots are arranged on the same time chart (FIG. 10).
Japanese Patent No. 3758992 Japanese Patent No. 3960761

However, the conventional example having such a configuration has the following problems.
That is, when executing the process according to the schedule according to the conventional method, for example, it is assumed that an abnormality has occurred in the pure water cleaning processing unit ONB2 of the second processing unit at time T1 in FIG. At this time point T1, the second lot is being processed in parallel in the chemical processing unit CHB1 (processing step P2-3), and is then scheduled to be processed in the pure water cleaning processing unit ONB2 (processing step P2-5). However, since the second lot cannot be carried out from the chemical solution processing unit CHB1, there is a problem that the second lot is excessively processed by the chemical solution.

  The present invention has been made in view of such circumstances, and it is possible to prevent a lot from being excessively processed for a lot even if an abnormality occurs in the safety processing unit, and a schedule creation method for the transfer substrate processing apparatus and the method thereof The purpose is to provide a program.

In order to achieve such an object, the present invention has the following configuration.
That is, the invention according to claim 1 is a safety processing unit capable of waiting a lot, a non-safe processing unit capable of not waiting a lot, and a sub-transport that transports a lot only between them. Substrate processing that determines the use timing of each resource when the control unit processes a plurality of lots using the resources of each pair processing unit by a substrate processing apparatus including a plurality of pair processing units having a mechanism In the device schedule creation method, the process of defining a virtual resource for each of the plurality of pair processing units and the processing by the non-safe processing unit in one pair processing unit, followed by the safety processing unit in one pair processing unit In the case of intra-pair processing, the resources of one pair processing unit are used and the virtual resource of one pair processing unit is used over the processing period of one pair processing unit. In the case of non-in-pair processing in which processing is performed by the safety processing unit in one pair processing unit following processing by the non-safe processing unit in the other pair processing unit, the non-pair processing in the other pair processing unit Use the resources of the safety processing unit and the resources of the safety processing unit in one pair processing unit, and use the virtual resource of the other pair processing unit over the processing period in the non-safe processing unit, and process by the non-safe processing unit Over the period from the start to the end of processing by the safety processing unit, a process of using the virtual resource of one pair processing unit, and a process of determining the use timing of each resource by eliminating duplication of virtual resources It is characterized by being.

  [Operation / Effect] According to the invention described in claim 1, the control unit defines a virtual resource different from the actual resource for each of the plurality of pair processing units. In the case of in-pair processing in which processing by the safety processing unit in the same pair processing unit is performed following processing by the non-safe processing unit in one pair processing unit, the resources of one pair processing unit are used and the processing is performed. Use virtual resources of the same pair processing unit over a period of time. In addition, in the case of non-in-pair processing in which processing by the safety processing unit in one pair processing unit follows processing by the non-safe processing unit in the other pair processing unit, the non-safe processing unit in the other pair processing unit And the resources of the safety processing unit in one pair processing unit are used, the virtual resources of the other pair processing unit are used for the processing period in the non-safe processing unit, and the processing is performed across different pair processing units. The virtual resource of one pair processing unit is used over a period. Then, the duplication of virtual resources is eliminated and the use timing of each resource is determined. However, if an attempt is made to place a non-pair process immediately after an intra-pair process, the virtual resource of one pair processing unit in the non-pair process Since the virtual resource of one of the pair processing units in the intra-pair processing interferes, the non-intra-pair processing cannot be arranged unless the interval is separated from the intra-pair processing. Therefore, even if an abnormality occurs in the safety processing unit for in-pair processing, there is a room for stopping the lot from being placed in the subsequent non-safe processing unit for in-pair processing. As a result, even if an abnormality occurs in the safety processing unit, it is possible to prevent the lot from being excessively processed.

  The “resource” in the present invention refers to a pure water cleaning processing unit, a chemical processing unit, a drying processing unit, a coating processing unit, a plating processing unit, an etching processing unit, a transport mechanism for transporting a substrate, and a posture of the substrate. This indicates a posture conversion unit that converts.

  Moreover, in this invention, it is preferable that the said safety processing part is a pure water washing | cleaning processing part, and the said non-safety processing part is a chemical | medical solution processing part (Claim 2). The deionized water treatment unit has little adverse effect even if the lot is made to wait, but the chemical solution treatment unit has an adverse effect if the lot is made to wait.

  In the present invention, in the in-pair processing, it is preferable to use the resource of the sub-transport mechanism in the pair processing unit when the lot is moved between the safety processing unit and the non-safe processing unit. The sub-transport mechanism is used to move the lot within the pair, so that resource is used.

  The invention according to claim 4 is a safety processing unit capable of waiting a lot, a non-safe processing unit not capable of waiting a lot, and a sub-transport that transports a lot only between them. Substrate processing that determines the use timing of each resource when the control unit processes a plurality of lots using the resources of each pair processing unit by a substrate processing apparatus including a plurality of pair processing units having a mechanism In the apparatus schedule creation program, the step of defining a virtual resource for each of the plurality of pair processing units and the processing by the non-safe processing unit in one pair processing unit are followed by the safety processing unit in one pair processing unit. In the case of intra-pair processing for processing, the resources of one pair processing unit are used and the temporary processing of one pair processing unit is performed over the processing period of one pair processing unit. In the case of non-in-pair processing that uses resources and performs processing by the safety processing unit in one pair processing unit following processing by the non-safe processing unit in the other pair processing unit, Use the resources of the safety processing unit and the resources of the safety processing unit in one pair processing unit, and use the virtual resource of the other pair processing unit over the processing period in the non-safe processing unit, and process by the non-safe processing unit Over the period from the start to the end of the process by the safety processing unit, the step of using the virtual resource of one pair processing unit and the step of determining the use timing of each resource by eliminating duplication of virtual resources It is characterized by being executed by a computer which is a part.

  According to the schedule creation method for a substrate processing apparatus according to the present invention, in the case of in-pair processing, the control unit uses the resources of one pair processing unit, and the virtual resources of the same pair processing unit over the processing period. Is used. In the case of non-in-pair processing, the resource of the non-safe processing unit in the other pair processing unit and the resource of the safety processing unit in one pair processing unit are used, and the virtual resource of the other pair processing unit is used. It is used over the processing period in the non-safe processing unit, and further, the virtual resource of one pair processing unit is used over the processing period across different pair processing units. Then, the duplication of virtual resources is eliminated and the use timing of each resource is determined. However, if an attempt is made to place a non-pair process immediately after an intra-pair process, the virtual resource of one pair processing unit in the non-pair process Since the virtual resource of one of the pair processing units in the intra-pair processing interferes, the non-intra-pair processing cannot be arranged unless the interval is separated from the intra-pair processing. Therefore, even if an abnormality occurs in the safety processing unit for in-pair processing, there is a room for stopping the lot from being placed in the subsequent non-safe processing unit for in-pair processing. As a result, even if an abnormality occurs in the safety processing unit, it is possible to prevent the lot from being excessively processed.

An embodiment of the present invention will be described below with reference to the drawings.
FIG. 1 is a plan view illustrating a schematic configuration of the substrate processing apparatus according to the embodiment, and FIG. 2 is a block diagram illustrating a schematic configuration of the substrate processing apparatus according to the embodiment.

  This substrate processing apparatus is an apparatus for performing chemical liquid processing, cleaning processing, and drying processing on the substrate W, for example. A plurality of substrates (for example, 25 substrates) are stored in a standing posture with respect to the cassette 1. The cassette 1 storing the unprocessed substrates W is placed on the input unit 3. The input unit 3 includes two mounting tables 5 on which the cassette 1 is mounted. A payout unit 7 is provided at a position adjacent to the input unit 3. The dispensing unit 7 stores the processed substrate W in the cassette 1 and dispenses the cassette 1 together. Similar to the loading unit 3, the payout unit 7 includes two mounting bases 9 for mounting the cassette 1.

  A first transport mechanism CTC configured to be movable between these is provided at a position along the input unit 3 and the payout unit 7. The first transport mechanism CTC takes out all the substrates W stored in the cassette 1 placed on the input unit 3 and then transports them to the second transport mechanism WTR. The first transport mechanism CTC stores the processed substrate W from the second transport mechanism WTR and then stores the substrate W in the cassette 1. The second transport mechanism WTR is configured to be movable along the longitudinal direction of the substrate processing apparatus.

  A drying processing unit LPD for storing a plurality of substrates W in a low-pressure chamber and drying them is provided on the most front side in the moving direction of the second transport mechanism WTR.

  A first processing unit 19 is disposed at a position adjacent to the drying processing unit LPD in the moving direction of the second transport mechanism WTR. The first processing unit 19 includes a pure water cleaning processing unit ONB1 for performing a pure water cleaning process on a plurality of substrates W, and a processing liquid containing a chemical solution for the plurality of substrates W. A chemical treatment unit CHB1 for performing chemical treatment is provided. The first processing unit 19 includes a sub-transport mechanism LFS1 that delivers the substrate W to and from the second transport mechanism WTR and can be moved up and down only by the pure water cleaning processing unit ONB1 and the chemical solution processing unit CHB1.

  A second processing unit 21 is provided at a position adjacent to the first processing unit 19. The second processing unit 21 has the same configuration as the first processing unit 19 described above. That is, it includes a pure water cleaning processing unit ONB2, a chemical processing unit CHB2, and a sub-transport mechanism LFS2.

  The substrate processing apparatus configured as described above is comprehensively controlled by the control unit 25 as shown in the block diagram of FIG. The control unit 25 corresponds to the computer in the present invention.

  The control unit 25 includes a CPU, a timer, and the like, and includes a scheduling unit 27, a virtual resource processing unit 29, and a process execution instruction unit 31. The storage unit 33 connected to the control unit 25 is prepared in advance by a user of the substrate processing apparatus, and includes a recipe including a plurality of processing steps that define how to process the substrate W, and a schedule creation program And a processing program for executing the created schedule, a definition file to be described later, and the like are stored in advance.

  The scheduling unit 27 handles the substrates W stored in the cassette 1 and placed on the input unit 3 as one lot, and in accordance with a recipe stored in advance in the storage unit 33 instructed by the operator of the apparatus. Before actually starting processing, a schedule is created so that processing steps for each lot can be efficiently arranged in time series. The created schedule is stored in the storage unit 33. Note that when creating a schedule, virtual resources described later are taken into consideration.

  The virtual resource processing unit 29 refers to a definition file that describes a device configuration including whether each device processing unit is a safety processing unit or a non-safe processing unit, and includes a safety processing unit, a non-safe processing unit, A virtual resource is defined for each processing unit corresponding to a pair processing unit including a sub-transport mechanism that transports a lot only between the two. The safety processing unit is a processing unit that can make a lot stand by, and the non-safe processing unit means a processing unit that cannot make a lot stand by. Specifically, there are dry processing units LPD and pure water cleaning processing units ONB1, 2 as safety processing units, and chemical solution processing units CHB1, 2 as non-safety processing units. In this example, it is assumed that virtual resources are defined for the first processing unit 19 and the second processing unit 21, respectively.

  The resources referred to here include the first transport mechanism CTC, the second transport mechanism WTR, the drying processing unit LPD, the pure water cleaning processing units ONB1 and 2, the chemical solution processing units CHB1 and 2, the sub-transporting mechanisms LFS1 and 2, etc. A resource used for processing a lot under the control of the control unit 25. Also, the virtual resource here is a resource that is treated differently from the entity of the processing unit such as the first processing unit 19 and the second processing unit 21 and is virtually present but does not exist. In this embodiment, as will be described later, a virtual resource PB1 corresponding to the first processing unit 19 as a pair processing unit and a virtual resource PB2 corresponding to the second processing unit 21 as a pair processing unit are defined.

  The process execution instructing unit 31 instructs an operation related to processing of each processing unit at an appropriate timing based on a schedule created by the scheduling unit 27 and stored in the storage unit 33.

  Next, specific scheduling will be described with reference to FIGS. 3 is a flowchart showing a schedule operation, FIGS. 4 and 5 are time charts showing an example of a single batch schedule, and FIGS. 6 and 7 are an example of a single batch schedule including virtual resources. 8 is a time chart showing an example of an entire schedule and an example of overlapping virtual resources, and FIG. 9 is an example of an example of an entire schedule and avoiding duplication of virtual resources. It is a time chart which shows.

  In the following, in order to facilitate the understanding of the explanation, an explanation will be given by taking an example in which only two lots of the first lot and the second lot are scheduled, but the same applies to three or more lots. Can be scheduled.

  Further, the recipe of the first lot in this example is as shown in FIG. 4, for example. Here, the number after the processing step P indicates the lot number, and the portion after “-” indicates the processing step number. In each of the processing steps P1-1 to P1-9, the portion corresponding to the preceding blank is a pre-operation for preparing to use the resource, and the portion corresponding to the trailing blank is a post-operation for cleaning up the used resource. is there. As shown in FIGS. 4 and 5, the resources of the pure water cleaning processing units ONB 1 and 2 and the chemical cleaning processing units CHB 1 and 2 are used in the dot-hatched portions of the sub transport mechanisms LFS 1 and 2 (resources f and i). It is a processing step accompanying the case.

  The process P1-1 is a transport process by the first transport mechanism CTC (resource a), the process P1-2 is a transport process by the second transport mechanism WTR (resource b), and the process P1-3 is The chemical processing by the chemical processing section CHB2 (resource h) of the second processing section 21, the processing step P1-4 is a transport processing by the sub transport mechanism LFS2 (resource i), and the processing step P1-5 is the first processing step P1-5. 2 is a pure water cleaning process by the pure water cleaning processing unit ONB2 (resource g) of the processing unit 21, and the process step P1-6 is a transfer process by the second transfer mechanism WTR (resource b), and the process step P1-7. Is a drying process by the drying processing unit LPD (resource c), the process step P1-8 is a transfer process by the second transfer mechanism WTR (resource b), and the process step P1-9 is the first transfer mechanism CTC It is a conveyance process by (resource a). Thus, the recipe of the first lot is “in-pair processing” using the pure water cleaning processing section ONB2 and the chemical processing section CHB2 of the second processing section 21, and the second processing section 21 is in the present invention. This corresponds to “one pair processing unit”.

Further, the recipe of the second lot in this example is as shown in FIG. 5, for example.
The process P2-1 is a transport process by the first transport mechanism CTC (resource a), the process P2-2 is a transport process by the second transport mechanism WTR (resource b), and the process P2-3 is The chemical processing by the chemical processing section CHB1 (resource e) of the first processing section 19, the processing step P2-4 is a transport processing by the second transport mechanism WTR (resource b), and the processing step P2-5 is This is a pure water cleaning process by the pure water cleaning processing unit ONB2 (resource g) of the second processing unit 21, and the processing process P2-6 is a transport process by the first transport mechanism WTR (resource b), and the processing process P2- 7 is a drying process by the drying processing unit LPD (resource c), a process step P2-8 is a transfer process by the second transfer mechanism WTR (resource b), and a process step P2-9 is the first transfer mechanism. CT A conveying process by (resource a). Thus, the recipe of the second lot is “non-pair processing” using the chemical solution processing unit CHB1 of the first processing unit 19 and the pure water cleaning processing unit ONB2 of the second processing unit 21. The first processing unit 19 corresponds to the “other pair processing unit” in the present invention.

Steps S1-S3
The operator of the apparatus places the cassette 1 storing the unprocessed substrates W on the placing table 5 of the loading table 3 (Step S1). The above-described recipe is instructed from an instruction unit (not shown) (step S2). Then, the control part 25 reads the recipe data memorize | stored in the memory | storage part 33 (step S3).

Step S4
The scheduling unit 27 creates a single batch schedule for each of the first lot and the second lot based on the read recipe data. Specifically, the time calculation of each processing step P1-1 to P1-9 is performed for the first lot, and the schedule is based on the time required for each processing step P1-1 to P1-9 as shown in FIG. Create Moreover, while calculating the time of each process process P2-1 to P2-9 about a 2nd lot, as shown in FIG. 5, a schedule is produced based on the time which each process process P2-1 to P2-9 requires.

Step S5
As shown in FIGS. 6 and 7, the virtual resource processing unit 29 adds a schedule for using the virtual resources PB1 and PB2 during the schedule of the first lot and the schedule of the second lot. Specifically, since there is “in-pair processing” in the schedule of the first lot, in addition to the use of resources g and h of the second processing unit 21 (pure water cleaning processing unit ONB2, chemical solution processing unit CHB2). The virtual resource PB2 is scheduled to be used over the processing period in the second processing unit 21.

  In addition, since there is “non-in-pair processing” in the schedule of the second lot, the resource e of the chemical solution processing unit CHB1 of the first processing unit 19 and the resource g of the pure water cleaning processing unit ONB2 of the second processing unit 21 In addition, the virtual resource PB1 of the first processing unit 19 is used over the processing period of the chemical processing unit CHB1, and the pure water of the second processing unit 21 is started from the start of processing of the chemical processing unit CHB1 of the first processing unit 19. A schedule is added so that the virtual resource PB2 is used over a period until the processing of the cleaning processing unit ONB2 ends.

Step 6
The scheduling unit 27 schedules the single batch schedule (FIG. 6) of the first lot and the single batch schedule (FIG. 7) of the second lot on one time chart. In this case, the use timing is determined so that the virtual resources PB1 and PB1 do not overlap in time as well as the resources a to i do not overlap in time in the first lot and the second lot. To do.

  For example, when the use timing of each resource ai is used as in the conventional example shown in FIG. 10, interference occurs in the virtual resource PB2 as shown in FIG. Therefore, a schedule cannot be formed at the use timing as in the conventional example. Therefore, when the duplication of the virtual resource PB2 is eliminated and the single batch schedule of the second lot is arranged so as to avoid the interference, the result is as shown in FIG.

  When the entire schedule is completed as described above, the process execution instructing unit 31 controls each resource according to the schedule and actually performs the process on the lot sequentially. At that time, it is assumed that an abnormality has occurred in the pure water cleaning processing unit ONB2 of the second processing unit 21 at the same time T1 as in the conventional example. At this time T1, since the processing step P2-3 (processing of the second lot by the chemical solution processing unit CHB1) is not performed, the control unit 25 stops the second lot in the processing step P2-1. You can make room. Therefore, it is possible to prevent the second lot from being overtreated with the chemical solution.

  As described above, according to the present embodiment, the control unit 25 uses the resources g to i of the second processing unit 21 since the first lot is in-pair processing, and the same second over the processing period. The virtual resource PB2 of the processing unit 21 is used. Further, since the processing of the second lot is non-pair processing, the resource e of the chemical processing unit CHB1 of the first processing unit 19 and the resource g of the pure water cleaning processing unit ONB1 of the second processing unit 19 are used. At the same time, the virtual resource PB1 of the first processing unit 19 is used over the processing period in the chemical processing unit CHB1, and the virtual resource PB2 of the second processing unit 21 is used over the processing period across the second processing unit 21. Then, the duplication of the virtual resources PB1 and PB2 is eliminated and the use timing of each resource ai is determined, but the non-in-pair processing (processing step) immediately after the in-pair processing (processing steps P1-3 and P1-5). When trying to arrange P2-3, P2-5), the virtual resource PB2 of the second processing unit 21 in the non-in-pair processing and the second processing unit 21 in the paired processing (processing steps P1-3, P1-5) Since the virtual resource PB2 of the non-pair will interfere with each other, the non-in-pair processing (processing steps P2-3 and P2-5) is arranged if there is no space between the in-pair processing (processing steps P1-3 and P1-5). Can not do it. Therefore, even if an abnormality occurs in the pure water cleaning processing section ONB2 in the in-pair processing (processing steps P1-3, P1-5), the chemical solution in the subsequent non-paired processing (processing steps P2-3, P2-5) There is a margin in which the second lot can be stopped in the processing unit CHB1. As a result, it is possible to prevent the second lot from being overprocessed even if an abnormality occurs in the pure water cleaning processing section ONB2.

  The present invention is not limited to the above embodiment, and can be modified as follows.

  (1) The recipe in the Example mentioned above is an example, and even if it is a recipe other than the above, there exists the same effect.

  (2) The configuration of the substrate processing apparatus in the above-described embodiment is an example, and the same effect can be obtained even with a substrate processing apparatus having a configuration other than the above.

  (3) In the above-described embodiment, the first lot that is the intra-pair process precedes the second lot that is the non-pair intra-process, but the second lot precedes the first lot. Even if is followed, the above-described effect can be achieved by avoiding duplication of the virtual resources PB1 and PB2.

It is the top view which showed schematic structure of the substrate processing apparatus which concerns on an Example. It is the block diagram which showed schematic structure of the substrate processing apparatus which concerns on an Example. It is a flowchart which shows schedule operation | movement. It is a time chart which shows the example of a schedule of a single batch. It is a time chart which shows the example of a schedule of a single batch. It is a time chart which shows the example of a schedule of a single batch including a virtual resource. It is a time chart which shows the example of a schedule of a single batch including a virtual resource. It is a time chart which shows the example of the whole schedule and shows the example which the virtual resource overlapped. It is a time chart which shows the example of the whole schedule and shows the example which avoided duplication of virtual resources. It is the time chart which showed the example of the whole schedule by a prior art example.

Explanation of symbols

W ... Substrate 1 ... Cassette 3 ... Loading unit 5 ... Mounting table CTC ... First transport mechanism WTR ... Second transport mechanism LPD ... Drying processing unit 19 ... First processing unit ONB1 ... Pure water cleaning processing unit CHB1 ... Chemical solution processing unit LFS1 ... Sub-transport mechanism 21 ... Second processing section ONB2 ... Pure water cleaning processing section CHB2 ... Chemical solution processing section LFS2 ... Sub-transport mechanism 25 ... Control section 27 ... Scheduling section 29 ... Virtual resource processing section 31 ... Processing execution instruction section 33 ... Storage Part PB1, PB2 ... Virtual resources

Claims (4)

A plurality of pair processing units including a safety processing unit capable of waiting for a lot, a non-safe processing unit capable of not waiting for a lot, and a sub-transport mechanism for transporting a lot only between them With the substrate processing apparatus provided, when the control unit processes a plurality of lots while using the resources of each pair processing unit, the substrate processing apparatus schedule creation method for determining the use timing of each resource,
Defining a virtual resource for each of the plurality of pair processing units;
In the case of in-pair processing in which processing by the safety processing unit in one pair processing unit is performed following processing by the non-safe processing unit in one pair processing unit, the resources of one pair processing unit are used and The virtual resource of one pair processing unit is used over the processing period of the pair processing unit, and the processing by the safety processing unit in one pair processing unit is performed following the processing by the non-safe processing unit in the other pair processing unit. In the case of non-in-pair processing, the resource of the non-safe processing unit in the other pair processing unit and the resource of the safety processing unit in one pair processing unit are used, and the virtual resource of the other pair processing unit is non-safe A virtual resource of one pair processing unit is used over a processing period in the processing unit and over a period from the processing start by the non-safe processing unit to the processing end by the safety processing unit. And the process to be used,
The process of determining when to use each resource by eliminating duplication of virtual resources;
A method of creating a schedule for a substrate processing apparatus, comprising: In the schedule preparation method of the substrate processing apparatus of Claim 1,
The safety processing unit is a pure water cleaning processing unit,
The non-safe processing section is a chemical processing section, and a substrate processing apparatus schedule creation method. In the schedule preparation method of the substrate processing apparatus of Claim 1 or 2,
In the in-pair processing, the substrate processing apparatus schedule creation method uses resources of the sub-transport mechanism in the pair processing unit when the lot is moved between the safety processing unit and the non-safe processing unit. A plurality of pair processing units including a safety processing unit capable of waiting for a lot, a non-safe processing unit capable of not waiting for a lot, and a sub-transport mechanism for transporting a lot only between them With the substrate processing apparatus provided, when the control unit processes a plurality of lots while using the resources of each pair processing unit, in the schedule creation program of the substrate processing apparatus that determines the use timing of each resource,
Defining a virtual resource for each of the plurality of pair processing units;
In the case of in-pair processing in which processing by the safety processing unit in one pair processing unit is performed following processing by the non-safe processing unit in one pair processing unit, the resources of one pair processing unit are used and The virtual resource of one pair processing unit is used over the processing period of the pair processing unit, and the processing by the safety processing unit in one pair processing unit is performed following the processing by the non-safe processing unit in the other pair processing unit. In the case of non-in-pair processing, the resource of the non-safe processing unit in the other pair processing unit and the resource of the safety processing unit in one pair processing unit are used, and the virtual resource of the other pair processing unit is non-safe A virtual resource of one pair processing unit is used over a processing period in the processing unit and over a period from the processing start by the non-safe processing unit to the processing end by the safety processing unit. The method comprising the steps of use,
Determining when to use each resource by eliminating duplication of virtual resources;
Is executed by a computer which is the control unit.

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