JP2020035814A - Substrate processing device, substrate processing method, and computer program - Google Patents

Abstract

To provide a substrate processing device capable of suppressing deterioration in substrate processing throughput as much as possible while suppressing excessive processing to the substrate.SOLUTION: A substrate processing device 100 comprises a plurality of tanks TA, a transfer mechanism CV, and a control unit 51. The control unit includes a setting unit 61, a scheduler 63, and an execution unit 65. The setting unit 61 sets save control information related to saving of a substrate W in each of the plurality of tanks TA. The scheduler 63 creates a schedule for defining a timing of using the plurality of tanks TA and an operation timing of the transfer mechanism CV on the basis of the save control information. The execution unit 65 causes the transfer mechanism CV and the plurality of tanks TA to process the substrate W according to the schedule. The save control information contains first control information and second control information. The first control information indicates whether the substrate W can be made to wait in the tank TA. The second control information indicates whether the tank TA is a place to which a substrate W housed in another tank can be saved.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a substrate processing apparatus, a substrate processing method, and a computer program.

  The substrate processing apparatus described in Patent Literature 1 includes a plurality of pair processing units and a control unit. Each of the pair processing units includes a safety processing unit, a non-safe processing unit, and a sub-transport mechanism. The safety processing unit can put the lot on standby. The non-safety processing unit cannot make the lot wait. The sub-transport mechanism transports the lot only between the safety processing section and the non-safe processing section. One lot includes a plurality of substrates.

  The control unit defines a virtual resource different from a real resource for each of the plurality of pair processing units. In the case of in-pair processing in which processing is performed by the safety processing unit in the same pair processing unit following processing by the non-safe processing unit in one pair processing unit, the resources of the one pair processing unit are used and the processing period Using the same pair processing unit virtual resources.

  Further, in the case of non-pair processing in which processing is performed by the safety processing unit in one pair processing unit following processing by the non-safe processing unit in the other pair processing unit, the non-safe processing unit in the other pair processing unit is used. Using the resources of the safety processing unit in one pair processing unit and the virtual resources of the other pair processing unit over the processing period of the non-safe processing unit, and further processing across different pair processing units. Over the period, the virtual resources of one pair processing unit are used.

  Then, the use timing of each resource is determined by eliminating the duplication of the virtual resources.However, if an attempt is made to arrange the non-intra-pair processing immediately after the in-pair processing, the virtual resource of one pair processing unit in the non-pair processing will be used. Since the virtual resource of one pair processing unit in the in-pair processing interferes, the non-in-pair processing cannot be arranged without an interval from the in-pair processing.

  Therefore, even if an abnormality occurs in the safety processing unit of the in-pair processing, there is a margin that the input of the lot to the non-safe processing unit of the subsequent non-pair processing can be stopped. As a result, even if an abnormality occurs in the safety processing unit, it is possible to prevent the lot from being overprocessed.

JP 2009-238917 A

  However, in the substrate processing apparatus described in Patent Literature 1, by arranging non-in-pair processing at an interval from in-pair processing, the throughput of the substrate processing apparatus (the number of processed substrates per unit time) is dared. By slightly lowering it, excessive processing for each substrate in the lot is suppressed.

  The inventor of the present application has conducted intensive studies focusing on both suppression of excessive processing of a substrate and suppression of a decrease in throughput of a substrate processing apparatus.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a substrate processing apparatus capable of suppressing a reduction in the throughput of substrate processing as much as possible while suppressing excessive processing on the substrate. , A substrate processing method, and a computer program.

  According to one aspect of the present invention, a substrate processing apparatus processes a plurality of substrates collectively. The substrate processing apparatus includes a plurality of tanks, a transfer mechanism, and a control unit. A plurality of vessels process the substrate. The transfer mechanism loads and unloads the substrate from and to the plurality of tanks. The control unit controls the plurality of tanks and the transport mechanism. The control unit includes a setting unit, a scheduler, and an execution unit. The setting unit sets evacuation control information relating to evacuation of the substrate for each of the plurality of tanks. The scheduler creates a schedule that defines the use timing of the plurality of tanks and the operation timing of the transport mechanism when processing the substrate based on the evacuation control information. The execution unit causes the transport mechanism and the plurality of tanks to execute the processing of the substrate according to the schedule. The evacuation control information includes first control information and second control information. The first control information indicates whether it is possible to make the substrate stand by in the tank. The second control information indicates whether or not the tank is a place for evacuating a substrate housed in another tank. When the save control information is changed, the scheduler changes the schedule based on the changed save control information. The execution unit causes the transport mechanism and the plurality of tanks to execute the processing of the substrate according to the changed schedule.

  In the substrate processing apparatus according to the aspect of the invention, it is preferable that the first control information indicates one of first content and second content. Preferably, the first content indicates that it is possible to make the substrate stand by in the bath. Preferably, the second content indicates that it is impossible to make the substrate wait in the bath. It is preferable that the setting unit changes the content of at least one of the first control information from the first content to the second content before the occurrence of a retreat trigger for retreating the substrate from the tank.

  In the substrate processing apparatus of the present invention, it is preferable that the plurality of tanks include a phosphoric acid tank that stores a phosphoric acid solution. It is preferable that before the occurrence of the evacuation trigger, the setting unit changes the content of the first control information set for the phosphoric acid tank from the first content to the second content.

  In the substrate processing apparatus of the present invention, it is preferable that the first control information indicates one of the first content and the second content in correspondence with the environment information. Preferably, the first content indicates that it is possible to make the substrate stand by in the bath. Preferably, the second content indicates that it is impossible to make the substrate wait in the bath. It is preferable that the environment information includes information indicating an environment where the substrate processing apparatus is placed, or information indicating a state of the substrate processing apparatus.

  In the substrate processing apparatus of the present invention, the setting unit acquires the environment information and sets the content of the first control information to one of the first content and the second content based on the environment information. It is preferable to set.

  In the substrate processing apparatus of the present invention, the setting unit acquires the environment information from a detection unit that detects the environment information, and sets the content of the first control information to the first content and the content based on the environment information. It is preferable to set any of the second contents.

  It is preferable that the substrate processing apparatus of the present invention further includes a communication unit. It is preferable that the communication unit receives the environment information from outside the substrate processing apparatus via a network. The setting unit may obtain the environment information from the communication unit, and set the content of the first control information to one of the first content and the second content based on the environment information. preferable.

  In the substrate processing apparatus of the present invention, the execution unit applies the schedule before the change to the substrate in the process, and processes the substrate in the transport mechanism and the plurality of tanks according to the schedule before the change. Is preferably continued. It is preferable that the execution unit applies the changed schedule to the unprocessed substrate, and causes the transfer mechanism and the plurality of tanks to execute the processing of the unprocessed substrate according to the changed schedule.

  It is preferable that the substrate processing apparatus of the present invention further includes an operation unit. It is preferable that the operation unit is operated by a user and receives an input from the user to change the evacuation control information. It is preferable that the setting unit changes the content of the evacuation control information in response to the operation unit receiving an input for changing the evacuation control information.

  According to another aspect of the present invention, a substrate processing method is executed by a substrate processing apparatus that collectively processes a plurality of substrates. The substrate processing apparatus includes a plurality of tanks and a transfer mechanism. A plurality of vessels process the substrate. The transfer mechanism is capable of loading and unloading substrates from and to the plurality of tanks. The substrate processing method includes setting evacuation control information relating to evacuation of the substrate for each of the plurality of tanks, and defining a use timing of the plurality of tanks and an operation timing of the transfer mechanism when processing the substrate. Creating a schedule to be performed based on the evacuation control information, causing the transport mechanism and the plurality of tanks to execute the processing of the substrate according to the schedule, and, when the evacuation control information is changed, Changing the schedule based on the evacuation control information, and causing the transport mechanism and the plurality of tanks to execute the processing of the substrate according to the changed schedule. The evacuation control information includes first control information and second control information. The first control information indicates whether it is possible to make the substrate stand by in the tank. The second control information indicates whether or not the tank is a place for evacuating a substrate housed in another tank.

  In the substrate processing method of the present invention, it is preferable that the first control information indicates one of a first content and a second content. Preferably, the first content indicates that it is possible to make the substrate stand by in the bath. Preferably, the second content indicates that it is impossible to make the substrate wait in the bath. It is preferable that at least one content of the first control information is changed from the first content to the second content before an evacuation trigger for evacuation of the substrate from the bath occurs.

  In the substrate processing method of the present invention, it is preferable that the plurality of tanks include a phosphoric acid tank that stores a phosphoric acid solution. It is preferable that the content of the first control information set for the phosphoric acid tank is changed from the first content to the second content before the occurrence of the evacuation trigger.

  In the substrate processing method of the present invention, it is preferable that the first control information indicates one of a first content and a second content. Preferably, the first content indicates that it is possible to make the substrate stand by in the bath. Preferably, the second content indicates that it is impossible to make the substrate wait in the bath. It is preferable that the first control information indicates one of the first content and the second content according to environment information. It is preferable that the environment information includes information indicating an environment where the substrate processing apparatus is placed, or information indicating a state of the substrate processing apparatus.

  In the substrate processing method of the present invention, the environment information may be acquired, and the content of the first control information may be set to one of the first content and the second content based on the environment information. preferable.

  In the substrate processing method of the present invention, the environment information is acquired from a detection unit that detects the environment information, and the content of the first control information is selected from the first content and the second content based on the environment information. Is preferably set to either of the following.

  In the substrate processing method of the present invention, the environment information is acquired from outside the substrate processing apparatus via a network, and the content of the first control information is changed to the first content and the second content based on the environment information. Is preferably set to any one of the following.

  In the substrate processing method of the present invention, the schedule before the change is applied to the substrate being processed, and the processing of the substrate being processed is continued in the transport mechanism and the plurality of tanks according to the schedule before the change. Is preferred. It is preferable that the changed schedule is applied to the unprocessed substrate, and the processing of the unprocessed substrate is performed in the transport mechanism and the plurality of tanks according to the changed schedule.

  In the substrate processing method of the present invention, it is preferable that the content of the evacuation control information is changed in response to an operation unit receiving an input for changing the evacuation control information.

  According to still another aspect of the present invention, a computer program causes a computer to execute the above-described substrate processing method.

  According to the present invention, it is possible to provide a substrate processing method and a computer program that can suppress a decrease in the throughput of substrate processing as much as possible while suppressing excessive processing from being performed on the substrate.

1 is a schematic plan view illustrating a substrate processing apparatus according to an embodiment of the present invention. It is a block diagram showing a substrate processing device concerning this embodiment. FIG. 4 is a diagram illustrating evacuation control information set in the substrate processing apparatus according to the embodiment. 4 is a time chart illustrating an example of a schedule of the substrate processing apparatus according to the embodiment. 4 is a time chart illustrating an example of a schedule of the substrate processing apparatus according to the embodiment. 4 is a time chart illustrating an example of a schedule of the substrate processing apparatus according to the embodiment. 4 is a flowchart illustrating a part of a substrate processing method in a first mode of the substrate processing apparatus according to the embodiment. 5 is a flowchart illustrating another part of the substrate processing method in the first mode of the substrate processing apparatus according to the embodiment. 9 is a flowchart showing yet another portion of the substrate processing method in the first mode of the substrate processing apparatus according to the embodiment. 4 is a flowchart illustrating a part of a substrate processing method in a second mode of the substrate processing apparatus according to the embodiment. 5 is a flowchart illustrating another part of the substrate processing method in the second mode of the substrate processing apparatus according to the embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the drawings, the same or corresponding parts have the same reference characters allotted, and description thereof will not be repeated. In the embodiment of the present invention, the X axis, the Y axis, and the Z axis are orthogonal to each other, the X axis and the Y axis are parallel to the horizontal direction, and the Z axis is parallel to the vertical direction.

  A substrate processing apparatus 100 according to an embodiment of the present invention will be described with reference to FIGS. The substrate processing apparatus 100 according to the present embodiment is of a batch type. Therefore, the substrate processing apparatus 100 processes a plurality of substrates W collectively. Specifically, the substrate processing apparatus 100 processes a plurality of lots. Each of the plurality of lots includes a plurality of substrates W. For example, one lot includes 25 substrates W. In the present embodiment, the substrate processing apparatus 100 performs a chemical solution process, a cleaning process, and a drying process on the substrate W of each lot. The substrate W is, for example, substantially disk-shaped.

  The substrate W is, for example, a semiconductor wafer, a substrate for a liquid crystal display, a substrate for a plasma display, a substrate for a field emission display (FED), a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, and a photomask. Substrate, a ceramic substrate, or a solar cell substrate.

  First, the substrate processing apparatus 100 will be described with reference to FIG. FIG. 1 is a schematic plan view showing the substrate processing apparatus 100. As shown in FIG. 1, the substrate processing apparatus 100 includes a plurality of storage units 1, a loading unit 3, a payout unit 7, a delivery mechanism 11, a buffer unit BU, a transport mechanism CV, a processing unit SP, A computer CM. The processing unit SP includes a plurality of tanks TA. The transport mechanism CV includes a first transport mechanism CTC, a second transport mechanism WTR, a sub transport mechanism LF1, a sub transport mechanism LF2, a sub transport mechanism LF3, a sub transport mechanism LF4, a sub transport mechanism LF5, And a transport mechanism LF6. The processing unit SP includes a drying processing unit 17, a first processing unit 19, a second processing unit 20, and a third processing unit 21. The drying processing unit 17 includes a tank LPD1 and a tank LPD2 among the plurality of tanks TA. The first processing unit 19 includes a tank ONB1 and a tank CHB1 among the plurality of tanks TA. The second processing unit 20 includes a tank ONB2 and a tank CHB2 among the plurality of tanks TA. The third processing unit 21 includes a tank ONB3 and a tank CHB3 among the plurality of tanks TA.

  The computer CM controls the plurality of storage units 1, the input unit 3, the payout unit 7, the transfer mechanism 11, the buffer unit BU, the transport mechanism CV, and the processing unit SP.

  Each of the plurality of storage units 1 stores a plurality of substrates W. Each substrate W is stored in the storage unit 1 in a horizontal posture. The storage unit 1 is, for example, a FOUP (Front Opening Unified Pod).

  The storage unit 1 that stores an unprocessed substrate W is placed on the input unit 3. Specifically, the loading section 3 includes a plurality of mounting tables 5. Then, the two storage sections 1 are respectively mounted on the two mounting tables 5. The loading section 3 is arranged at one end in the longitudinal direction of the substrate processing apparatus 100.

  The storage unit 1 that stores the processed substrate W is placed on the payout unit 7. Specifically, the payout unit 7 includes a plurality of mounting tables 9. Then, the two storage units 1 are respectively mounted on the two mounting tables 9. The payout unit 7 stores the processed substrate W in the storage unit 1 and pays out the entire storage unit 1. The payout unit 7 is disposed at one end in the longitudinal direction of the substrate processing apparatus 100. The payout unit 7 faces the input unit 3 in a direction orthogonal to the longitudinal direction of the substrate processing apparatus 100.

  The buffer unit BU is arranged adjacent to the input unit 3 and the payout unit 7. The buffer unit BU takes in the storage unit 1 placed in the input unit 3 together with the substrate W and places the storage unit 1 on a shelf (not shown). The buffer unit BU receives the processed substrate W, stores it in the storage unit 1, and places the storage unit 1 on a shelf. The transfer mechanism 11 is arranged in the buffer unit BU.

  The transfer mechanism 11 transfers the storage unit 1 between the input unit 3 and the payout unit 7 and the shelf. The transfer mechanism 11 transfers only the substrate W between the transfer mechanism 11 and the transport mechanism CV. Specifically, the transfer mechanism 11 transfers a lot between the transfer mechanism 11 and the transport mechanism CV. The transport mechanism CV loads and unloads lots from and to the processing unit SP. Specifically, the transport mechanism CV carries in / out the lot to / from each of the tanks TA of the processing unit SP. The processing unit SP performs a chemical solution process, a cleaning process, and a drying process on the lot.

  Specifically, the transfer mechanism 11 transfers a lot between the transfer mechanism 11 and the first transfer mechanism CTC of the transfer mechanism CV. The first transfer mechanism CTC transfers the lot to the second transfer mechanism WTR after converting the attitude of the plurality of substrates W of the lot received from the transfer mechanism 11 from the horizontal attitude to the vertical attitude. Further, after receiving the processed lot from the second transport mechanism WTR, the first transport mechanism CTC converts the attitude of the plurality of substrates W of the lot from a vertical attitude to a horizontal attitude, and sends the lot to the lot transfer mechanism 11. Hand over.

  The second transport mechanism WTR is movable from the drying processing unit 17 of the processing unit SP to the third processing unit 21 along the longitudinal direction of the substrate processing apparatus 100. Therefore, the second transport mechanism WTR loads and unloads the lot from the drying processing unit 17, the first processing unit 19, the second processing unit 20, and the third processing unit 21.

  The drying unit 17 performs a drying process on the lot. Specifically, each of the tanks LPD1 and LPD2 of the drying processing unit 17 stores a lot and performs a drying process on a plurality of substrates W in the lot. The second transport mechanism WTR loads and unloads lots from and into each of the tank LPD1 and the tank LPD2.

  A first processing unit 19 is arranged adjacent to the drying processing unit 17. The tank ONB1 of the first processing unit 19 performs, for example, a cleaning process using a rinsing liquid on a plurality of substrates W of a lot. In the present embodiment, the washing process is a washing process with pure water. The tank CHB1 performs, for example, a process using a chemical solution on a plurality of substrates W in a lot. The sub-transport mechanism LF1 and the sub-transport mechanism LF2 of the transport mechanism CV transfer the lot to and from the second transport mechanism WTR in addition to the transport of the lot in the first processing unit 19. Further, the sub-transport mechanism LF1 immerses the lot in the tank ONB1 or lifts the lot from the tank ONB1. The sub-transport mechanism LF2 immerses the lot in the tank CHB1 or lifts the lot from the tank CHB1.

  A second processing unit 20 is arranged adjacent to the first processing unit 19. The tank ONB2 of the second processing unit 20 performs, for example, a cleaning process using a rinsing liquid on a plurality of substrates W in a lot. In the present embodiment, the washing process is a washing process with pure water. The tank CHB2 performs, for example, processing of a plurality of substrates W of a lot with a chemical solution. The sub-transport mechanism LF3 and the sub-transport mechanism LF4 of the transport mechanism CV transfer the lot to and from the second transport mechanism WTR in addition to transporting the lot in the second processing unit 20. The sub-transport mechanism LF3 immerses the lot in the tank ONB2 or lifts the lot from the tank ONB2. The sub-transport mechanism LF4 immerses the lot in the tank CHB2 or lifts the lot from the tank CHB2.

  A third processing unit 21 is arranged adjacent to the second processing unit 20. The tank ONB3 of the third processing unit 21 performs, for example, a cleaning process using a rinsing liquid on a plurality of substrates W of a lot. In the present embodiment, the washing process is a washing process with pure water. The tank CHB3 performs, for example, a process using a chemical solution on a plurality of substrates W in a lot. The sub-transport mechanism LF5 and the sub-transport mechanism LF6 of the transport mechanism CV transfer the lot to and from the second transport mechanism WTR in addition to the transport of the lot in the third processing unit 21. The sub-transport mechanism LF5 immerses the lot in the tank ONB3 or lifts the lot from the tank ONB3. The sub-transport mechanism LF6 immerses the lot in the tank CHB3 or lifts the lot from the tank CHB3.

  As described above with reference to FIG. 1, the transport mechanism CV is provided for each of the tanks TA (the tanks LPD1, the LPD2, the tanks ONB1 to ONB3, and the tanks CHB1 to CHB3) of the processing unit SP. The substrate W is loaded and unloaded. Then, each of the plurality of tanks TA processes the substrate W.

  Next, the substrate processing apparatus 100 will be described with reference to FIG. FIG. 2 is a block diagram showing the substrate processing apparatus 100. As shown in FIG. 2, the substrate processing apparatus 100 further includes a detection unit 59. The detector 59 detects the environment information EV1. The detection unit 59 outputs the environment information EV1 to the control unit 51 by wire or wirelessly. The environment information EV1 includes information indicating an environment where the substrate processing apparatus 100 is placed, or information indicating a state of the substrate processing apparatus 100.

  For example, the environment information EV1 includes information indicating the atmospheric pressure. And the detection part 59 contains the barometer which detects an atmospheric pressure. For example, the environment information EV1 includes information indicating a temperature. And the detection part 59 contains the thermometer which detects a temperature. The temperature is, for example, an air temperature. The air temperature is, for example, the air temperature around an external tank that stores the chemical supplied to the tank TA. For example, the environment information EV1 includes information indicating humidity. And the detection part 59 contains a hygrometer which detects humidity. The atmospheric pressure, temperature, and humidity indicate, for example, the atmospheric pressure, temperature, and humidity of the place where the substrate processing apparatus 100 is placed, respectively.

  For example, the environment information EV1 includes information indicating vibration. And the detection part 59 contains the vibrometer which detects a vibration. The vibration is, for example, a place where the substrate processing apparatus 100 is placed or a vibration of the substrate processing apparatus 100. For example, the environment information EV1 includes information indicating the inclination of the substrate processing apparatus 100. The detection unit 59 includes an inclinometer that detects the inclination of the substrate processing apparatus 100. For example, the environment information EV1 includes information indicating the frequency of use of the components of the substrate processing apparatus 100. The “information indicating the frequency of use of the component parts” is, for example, the number of times the valve of the tank TA is opened and closed, or the number of times the pump that supplies a liquid (rinse liquid or chemical solution) to the tank TA is driven.

  The “place where the substrate processing apparatus 100 is placed” may be inside the building where the substrate processing apparatus 100 is installed, or outside the building where the substrate processing apparatus 100 is installed (for example, around the building). ). Further, the substrate processing apparatus 100 may not include the detection unit 59, and the detection unit 59 may be disposed outside the substrate processing apparatus 100.

  The computer CM of the substrate processing apparatus 100 includes a control unit 51, a storage unit 53, a communication unit 55, and an operation unit 57. The control unit 51 includes a processor such as a CPU (Central Processing Unit). The storage unit 53 includes a storage device, and stores data and computer programs. Specifically, the storage unit 53 includes a main storage device such as a semiconductor memory and an auxiliary storage device such as a semiconductor memory and / or a hard disk drive. The storage unit 53 may include a removable medium. The processor of the control unit 51 executes a computer program stored in the storage device of the storage unit 53 to control the transport mechanism CV, the processing unit SP, and the detection unit 59.

  The communication unit 55 is connected to the network NW by wire or wirelessly. The network NW includes, for example, the Internet, a LAN (Local Area Network), and a public telephone network. The communication unit 55 is a communication device, for example, a network interface controller. The communication unit 55 communicates with the external computer 300 connected to the network NW. The control unit 51 communicates with the external computer 300 via the communication unit 55.

  The external computer 300 is, for example, a host computer or a server. The host computer controls the plurality of substrate processing apparatuses 100. The external computer 300 is installed outside the substrate processing apparatus 100. The “outside of the substrate processing apparatus 100” may be the inside of the building where the substrate processing apparatus 100 is installed, or the building where the substrate processing apparatus 100 is installed, as long as it is not inside the substrate processing apparatus 100. Outside.

  The communication unit 55 receives the environment information EV2 from outside the substrate processing apparatus 100 via the network NW. Specifically, the communication unit 55 receives the environment information EV2 from the external computer 300 via the network NW.

  The environment information EV2 includes information indicating an environment where the substrate processing apparatus 100 is placed. For example, the environment information EV2 includes weather information. The weather information indicates, for example, typhoon information. The typhoon information includes, for example, information on the course and intensity of the typhoon. For example, the environment information EV2 includes earthquake prediction information. For example, the environment information EV2 includes factory alarm information. The factory alarm information indicates, for example, an alarm that predicts the occurrence of a risk in a factory where the substrate processing apparatus 100 is installed.

  Hereinafter, when it is not necessary to distinguish between the environment information EV1 and the environment information EV2, the environment information EV1 and the environment information EV2 are collectively referred to as “environment information EV”.

  The operation unit 57 is operated by a user, and receives input of various information from the user. The operation unit 57 includes, for example, a display and a pointing device, or a touch panel.

  The details of the control unit 51 will be described with reference to FIG. As shown in FIG. 2, the control unit 51 controls the transport mechanism CV and the plurality of tanks TA. Hereinafter, for convenience of explanation, the transfer mechanism CV when loading a lot into the tank TA is referred to as “loader LD”, and the transfer mechanism CV when transferring a lot from the tank TA is referred to as “unloader ULD”. is there.

  The control unit 51 includes a setting unit 61, a scheduler 63, and an execution unit 65. The setting unit 61 sets evacuation control information ES relating to evacuation of the substrate W for each of the plurality of tanks TA. The evacuation control information ES includes first control information FE and second control information SE.

  The first control information FE indicates whether or not the substrate W can be made to wait in the tank TA. The first control information FE indicates one of the first content A1 and the second content A2. The first content A1 indicates that the substrate W can be made to wait in the tank TA. The second content A2 indicates that it is impossible to make the substrate W wait in the tank TA.

  The second control information SE indicates whether or not the tank TA is a place for retreating the substrate W stored in another tank TA. The second control information SE indicates one of the third content A3 and the fourth content A4. The third content A3 indicates that the tank TA is a place for retracting the substrate W stored in another tank TA. The fourth content A4 indicates that the tank TA is not a place for retreating the substrate W stored in another tank TA.

  FIG. 3 is a diagram showing the save control information ES. As shown in FIGS. 2 and 3, the setting unit 61 stores the evacuation control information ES (first data) in each of the plurality of tanks TA (tank LPD1, tank LPD2, tanks ONB1 to ONB3, and tanks CHB1 to CHB3). Control information FE and second control information SE) are set. The setting unit 61 can set the evacuation control information ES having arbitrary contents for each tank TA.

  In the present embodiment, as an example, the setting unit 61 sets the first control information FE of the first content A1 and the second control information SE of the fourth content A4 for each of the tank LPD1 and the tank LPD2 for performing the drying process. I do. Further, as an example, the setting unit 61 sets the first control information FE of the first content A1 and the second control information SE of the third content A3 for each of the tanks ONB1 to ONB3 for performing the cleaning process. Further, as an example, the setting unit 61 sets the first control information FE of the first content A1 or the second content A2 for each of the tanks CHB1 to CHB3 performing the chemical solution processing, in correspondence with the environmental information EV. The second control information SE of the third content A3 or the fourth content A4 is set. Each save control information ES is referred to by the scheduler 63.

  The scheduler 63 creates the schedule SC based on the recipe and the evacuation control information ES. The schedule SC defines the use timing of the plurality of tanks TA and the operation timing of the transport mechanism CV when processing a plurality of lots. That is, the schedule SC defines the use timing of the plurality of tanks TA and the operation timing of the transport mechanism CV when processing the substrate W. The schedule SC includes a plurality of individual schedules arranged on a time axis. The individual schedule defines the use timing of the plurality of tanks TA and the operation timing of the transport mechanism CV when processing one lot. That is, the individual schedule is determined for each lot. The recipe defines the processing content and processing procedure of the lot.

  Specifically, the scheduler 63 creates the schedule SC1 or the schedule SC2 according to the evacuation control information ES. However, when the save control information ES is changed, the scheduler 63 creates the schedule SC3 in consideration of the change time of the save control information ES.

  The schedule SC1 indicates a schedule in which a plurality of different tanks TA are used in parallel without any restriction, and the plurality of tanks TA are used in parallel. Therefore, in the schedule SC1, a plurality of tanks TA can be used in parallel as much as possible, so that a decrease in the throughput of processing the substrate W can be suppressed. The throughput is the number of processed substrates W per unit time.

  The schedule SC2 indicates a schedule in which the use of a plurality of different tanks TA in parallel is restricted, and the parallel use of a specific tank TA is prohibited. Therefore, in the schedule SC2, the lot stored in a certain tank TA can be immediately retreated to another tank TA (vacant tank TA) in response to the occurrence of the retraction trigger TG. As a result, it is possible to prevent an excessive process from being performed on each substrate W of the lot with a chemical solution.

  Specifically, the schedule SC2 includes a tank TA (for example, the tank CHB1) in which the first control information FE of the second content A2 (standby is not possible) is set, and the second control information SE of the third content A3 (evacuation place). Indicates a schedule that is not used in parallel with the tank TA (eg, the tank ONB1) in which is set. Therefore, in the schedule SC2, the lot stored in the tank TA in which the first control information FE of the second content A2 (standby is impossible) is set, immediately after the evacuation trigger TG is generated, the third content A3 (the evacuation location). ) Can be evacuated to the tank TA in which the second control information SE is set.

  The retreat trigger TG is a trigger for retreating the substrate W from the tank TA. Specifically, the retreat trigger TG is a trigger for retreating the substrate W stored in the tank TA in which the first control information FE of the second content A2 (standby is not possible) is set from the tank TA. . The computer CM generates an evacuation trigger TG when a situation occurs in which the substrate W is retracted from the tank TA in order to suppress excessive processing of the substrate W by the chemical solution. Further, the computer CM may receive the evacuation trigger TG from the external computer 300.

  In the schedule SC3, there is no restriction on the use of a plurality of different tanks TA in parallel, and a plurality of different tanks TA are used in parallel and a part in which the plurality of tanks TA are used in parallel. In particular, there is shown a schedule having a part where the specific tank TA is restricted and the parallel use of the specific tank TA is prohibited.

  The schedules SC1 to SC3 are examples of the schedule SC.

  The execution unit 65 causes the transport mechanism CV and the plurality of tanks TA to execute the processing of the lot according to the schedule SC. That is, the execution unit 65 causes the transport mechanism CV and the plurality of tanks TA to execute the processing of the substrate W according to the schedule SC.

  When at least one piece of evacuation control information ES has been changed, the scheduler 63 changes the schedule SC based on the changed evacuation control information ES. In the present embodiment, when the content of at least one first control information FE is changed, the scheduler 63 changes the schedule SC based on the evacuation control information ES including the changed first control information FE. Then, the execution unit 65 causes the transport mechanism CV and the plurality of tanks TA to execute the lot processing according to the changed schedule SC. That is, the execution unit 65 causes the transport mechanism CV and the plurality of tanks TA to execute the processing of the substrate W according to the changed schedule SC.

  That is, when at least one evacuation control information ES is changed, the scheduler 63 creates the schedule SC3. Then, the execution unit 65 causes the transport mechanism CV and the plurality of tanks TA to execute the processing of the lot according to the schedule SC3.

  Specifically, when at least one piece of the evacuation control information ES (specifically, at least one piece of the first control information FE) is changed and the schedule SC is changed, the execution unit 65 executes The schedule SC before the change is applied to the lot, and the processing of the lot being processed is continued in the transport mechanism CV and the plurality of tanks TA according to the schedule SC before the change. That is, the execution unit 65 applies the schedule SC before the change to the substrate W in the course of processing, and causes the transport mechanism CV and the plurality of tanks TA to continue the processing of the substrate W in the course of the processing according to the schedule SC before the change. . Then, the execution unit 65 applies the changed schedule SC to the unprocessed lot among the plurality of lots, and processes the unprocessed lot in the transport mechanism CV and the plurality of tanks TA according to the changed schedule SC. Is executed. That is, the execution unit 65 applies the changed schedule SC to the unprocessed substrate W, and causes the transport mechanism CV and the plurality of tanks TA to execute the processing of the unprocessed substrate W according to the changed schedule SC. .

  Therefore, according to the present embodiment, even when the evacuation control information ES is changed during the processing of the lot and the schedule SC is changed, the batch processing based on the schedule SC can be smoothly continued without the schedule SC breaking down. . Batch processing indicates that a plurality of lots are processed in parallel.

  In addition, since it is not necessary to change the schedule after all the lots are paid out and the substrate processing apparatus 100 is stopped, it is possible to suppress a decrease in the throughput of the processing of the substrate W.

  When the retreat trigger TG occurs during the processing of each lot in accordance with the schedule SC2 in which the priority is given to the suppression of the excessive processing of the substrate W by the chemical solution, the execution unit 65 sets the first content A2 (standby not possible) to the first content. From the tank TA (for example, the tanks CHB1 to CHB3) in which the control information FE is set, the tank TA (for example, the tanks ONB1 to ONB3) in which the second control information SE of the third content A3 (evacuation place) is set. The transport mechanism CV is controlled so as to retract the lot. As a result, it is possible to prevent each substrate W of the lot from being excessively processed by the chemical solution.

  As described above with reference to FIGS. 2 and 3, according to the present embodiment, the evacuation control information ES (the first control information FE and the second control information SE) is provided for each of the plurality of tanks TA. Is set.

  Therefore, when the first control information FE set for each tank TA indicates the first content A1 (standby possible), the scheduler 63 can create the schedule SC1 with priority given to the throughput of the processing of the substrate W. . As a result, a decrease in the throughput of the processing of the substrate W can be suppressed.

  On the other hand, when the first control information FE set for a certain tank TA indicates the second content A2 (standby not possible), the scheduler 63 changes the lot stored in the tank TA in response to the occurrence of the evacuation trigger TG. The schedule SC2 can be created so that the user can immediately retreat to another tank TA. As a result, it is possible to prevent an excessive process from being performed on each substrate W of the lot with a chemical solution.

  In addition, in this embodiment, when the content of the evacuation control information ES is changed, the schedule SC is changed, and the lot is processed according to the changed schedule SC. Therefore, depending on whether the first control information FE of the evacuation control information ES indicates the first content A1 or the second content A2, the schedule SC1 that gives priority to the improvement of the throughput of the processing of the substrate W, or the chemical liquid is used. A schedule SC2 that prioritizes suppression of excessive processing on the substrate W is created. As a result, an appropriate schedule SC is created in accordance with the content of the evacuation control information ES, and it is possible to reduce the throughput of the processing of the substrate W while suppressing the excessive processing of the substrate W by the chemical solution. It can be suppressed as much as possible.

  In addition, in the present embodiment, before the occurrence of the evacuation trigger TG, the setting unit 61 sets the content of at least one of the plurality of first control information FEs set in the plurality of tanks TA to the first. The first content A1 (standby possible) is changed to the second content A2 (standby impossible). Therefore, before the occurrence of the retreat trigger TG, a schedule SC2 that prioritizes suppression of excessive processing on the substrate W is created, and the lot is processed according to the schedule SC2. As a result, when the retreat trigger TG occurs, the lot can be reliably retreated from the tank TA, and the overtreatment of each substrate W of the lot with the chemical can be further effectively suppressed.

  Further, in the present embodiment, the first control information FE indicates one of the first content A1 (standby is possible) and the second content A2 (standby is not possible) corresponding to the environment information EV. Therefore, a suitable schedule SC according to the environment information EV is created, and each lot is processed according to the schedule SC according to the environment information EV. As a result, each lot can be processed more appropriately.

  For example, the plurality of tanks TA include a phosphoric acid tank containing a phosphoric acid solution. Specifically, each of the tanks CHB1 to CHB3 is a phosphoric acid tank. Then, before the occurrence of the evacuation trigger TG, the setting unit 61 changes the content of the first control information FE set for the phosphoric acid tank from the first content A1 (standby possible) to the second content A2 (standby impossible). I do. In particular, when a typhoon is expected to arrive in the area where the substrate processing apparatus 100 is installed, before the evacuation trigger TG occurs, the setting unit 61 sets the first control set for the phosphoric acid tank. It is effective to change the content of the information FE from the first content A1 to the second content A2. The reason why the change of the content of the first control information FE is effective is as follows.

  That is, when the substrate W is etched using a phosphoric acid solution, it is necessary to treat the substrate W in a phosphoric acid bath at a temperature close to the boiling point of the phosphoric acid solution in order to secure a sufficient etching rate. On the other hand, when a typhoon arrives or approaches, the atmospheric pressure around the substrate processing apparatus 100 decreases. That is, the atmospheric pressure around the phosphoric acid tank decreases. When the atmospheric pressure around the phosphoric acid tank decreases, the boiling point of the phosphoric acid solution decreases. Therefore, when the heating temperature of the phosphoric acid solution is the same as before the decrease in the atmospheric pressure, the phosphoric acid solution is heated at a temperature higher than the boiling point of the phosphoric acid solution. As a result, the possibility of bumping of the phosphoric acid solution increases as compared to before the atmospheric pressure decreases.

  Then, in an environment where the possibility of bumping of the phosphoric acid liquid is high, if the first control information FE of the first content A1 (standby possible) is set for the phosphoric acid tank, when the evacuation trigger TG occurs. There is a possibility that the substrate W cannot be evacuated from the phosphoric acid bath. As a result, the substrate W may be excessively treated with the phosphoric acid solution. Therefore, by setting the first control information FE having the second content A2 (standby not possible) in the phosphoric acid tank before the occurrence of the evacuation trigger TG, the schedule SC2 is created, and immediately when the evacuation trigger TG occurs. The substrate W is retracted from the phosphoric acid bath. As a result, excessive treatment of the substrate W with the phosphoric acid solution can be suppressed.

  Note that “when a typhoon is expected to arrive in the area where the substrate processing apparatus 100 is installed” is, for example, when the atmospheric pressure indicated by the environment information EV1 becomes equal to or less than the threshold pressure TH1, and when the environment information EV2 is set. Is the case where the weather information indicates that the typhoon is approaching, or the case where the user senses the approach of the typhoon based on various information.

  Further, in the present embodiment, the control unit 51 has a first mode and a second mode. The first mode is a mode in which the environment information EV1 is acquired and the evacuation control information ES is set in each tank TA based on the environment information EV1. The second mode indicates a mode in which the evacuation control information ES is set in each tank TA based on an input from the operation unit 57.

  In the first mode, the setting unit 61 acquires the environment information EV1, and changes the content of the first control information FE into the first content A1 (standby possible) and the second content A2 (standby impossible) based on the environment information EV1. Set to one of them.

  Therefore, in the first mode, the content of the first control information FE is set not automatically but automatically according to the environment information EV1 or EV2. Therefore, it is possible to suppress a situation in which the content of the first control information FE is not appropriately set according to the environment where the substrate processing apparatus 100 is placed due to the user forgetting to change the setting or missing the risk sign. That is, it is possible to suppress a situation in which the schedule SC is not appropriately created in accordance with the environment where the substrate processing apparatus 100 is placed due to the user forgetting to change the setting or missing the risk sign.

  Specifically, in the first mode, the setting unit 61 acquires the environment information EV1 from the detection unit 59. Then, the setting unit 61 sets the content of the first control information FE to one of the first content A1 and the second content A2 based on the environment information EV1. Therefore, according to the present embodiment, the setting unit 61 can appropriately set the content of the first control information FE in accordance with the environment information EV1 that is the detection result of the detection unit 59.

  For example, when the atmospheric pressure indicated by the environment information EV1 becomes equal to or less than the threshold pressure TH1, the setting unit 61 sets the first control information FE having the second content A2 (standby not possible) for the phosphoric acid tank. As a result, the schedule SC2 is created, and the excessive treatment of the substrate W with the phosphoric acid solution can be suppressed. On the other hand, when the atmospheric pressure indicated by the environment information EV1 becomes larger than the threshold pressure TH1, the setting unit 61 sets the first control information FE having the first content A1 (standby possible) for the phosphoric acid tank. As a result, the schedule SC1 is created, and a decrease in the throughput of the processing of the substrate W can be suppressed.

  For example, when the decrease in the atmospheric pressure indicated by the environment information EV1 occurs continuously for the threshold time TH2, the setting unit 61 sets the first control information FE having the second content A2 (standby not possible) for the phosphoric acid tank. On the other hand, when the increase in the atmospheric pressure indicated by the environment information EV1 occurs continuously for the threshold time TH2, the setting unit 61 sets the first control information FE having the first content A1 (standby possible) for the phosphoric acid tank.

  Each of the threshold pressure TH1 and the threshold time TH2 is an example of a criterion value that is compared with the environment information EV in order to determine the possibility of occurrence of the evacuation trigger TG.

  In the first mode, the communication unit 55 receives the environment information EV2 from the network NW. Then, the setting unit 61 acquires the environment information EV2 from the communication unit 55, and sets the content of the first control information FE to one of the first content A1 and the second content A2 based on the environment information EV2. . That is, the setting unit 61 acquires the environment information EV2 from outside the substrate processing apparatus 100 via the network NW. Then, the setting unit 61 sets the content of the first control information FE to one of the first content A1 and the second content A2 based on the environment information EV2. Therefore, according to the present embodiment, the content of the first control information FE can be appropriately set based on the environment information EV2 acquired from the network NW.

  For example, when the weather information indicated by the environment information EV2 indicates the approach of a typhoon, the setting unit 61 sets the first control information FE having the second content A2 (standby not possible) for the phosphoric acid tank. As a result, the schedule SC2 is created, and the excessive treatment of the substrate W with the phosphoric acid solution can be suppressed. On the other hand, when the weather information indicated by the environment information EV2 indicates that the typhoon has disappeared or the course has been changed, the setting unit 61 sets the first control information FE having the first content A1 (standby possible) in the phosphoric acid tank. As a result, the schedule SC1 is created, and a decrease in the throughput of the processing of the substrate W can be suppressed.

  On the other hand, in the second mode, the operation unit 57 receives an input for changing the evacuation control information ES from the user. Then, in response to the operation unit 57 receiving an input for changing the evacuation control information ES, the setting unit 61 changes the content of the evacuation control information ES. Therefore, according to the present embodiment, the user can manually change the evacuation control information ES in consideration of the environment where the substrate processing apparatus 100 is placed and the risk sign.

  In particular, in the present embodiment, even when the user manually changes the evacuation control information ES and the schedule SC is changed, the execution unit 65 executes the processing of the lot being processed according to the schedule SC before the change, and performs the change. An unprocessed lot is processed according to the later schedule SC. Therefore, according to the present embodiment, even if the evacuation control information ES is manually changed during the processing of the lot and the schedule SC is changed, the batch processing based on the schedule SC can be smoothly performed without the schedule SC breaking down. Can continue.

  Here, for example, when the user senses the approach of the typhoon based on various information, the operation unit 57 changes the content of the first control information FE set in the phosphoric acid tank by the user from the first content A1 (standby possible). An input indicating that the content is changed to the second content A2 (standby not possible) is received. Therefore, the setting unit 61 changes the content of the first control information FE from the first content A1 to the second content A2. As a result, the schedule SC2 is created, and the excessive treatment of the substrate W with the phosphoric acid solution can be suppressed.

  For example, when the user senses the disappearance of the typhoon or the course change based on various information, the operation unit 57 changes the content of the first control information FE set in the phosphoric acid tank from the second content A2 (standby not possible) to the first content. An input indicating a change to the content A1 (standby possible) is received from the user. Therefore, the setting unit 61 changes the content of the first control information FE from the second content A2 to the first content A1. As a result, the schedule SC1 is created, and a decrease in the throughput of the processing of the substrate W can be suppressed.

  Next, the schedules SC1 to SC3 created by the scheduler 63 will be described with reference to FIG. 2 and FIGS. 4 to 6, the number after the processing step P indicates a lot number, and the number after “-” indicates the number of the processing step. The vertical axis indicates resources, and the horizontal axis indicates time t. The resource indicates an object to be controlled by the control unit 51.

  FIG. 4 is a time chart showing the schedule SC1. The schedule SC1 gives priority to the processing throughput of the substrate W.

  As shown in FIGS. 2 and 4, in the schedule SC1, the processing steps P1-1 to P1-5, the processing steps P2-1 to P2-5, the processing steps P3-1 to P3-5, Processing steps P4-1 to P4-5, processing steps P5-1 to P5-5, processing steps P2-1 to P2-5,... Are arranged on a time axis.

  The processing step P1-1 is a step in which the loader LD carries the lot into the tank CHB1. The processing step P1-2 is a step in which the tank CHB1 processes the lot with a chemical. The processing step P1-3 is a step in which the tank ONB1 cleans the lot with a rinsing liquid. Processing step P1-4 shows a step in which the tank LPD1 dries the lot. The processing step P1-5 indicates a step in which the unloader ULD carries out the lot from the tank LPD1.

  Except for a different lot, the processing steps P2-1 to P2-5 are the same as the processing steps P1-1 to P1-5, respectively. In this respect, processing steps P3-1 to P3-5, processing steps P4-1 to P4-5, processing steps P5-1 to P5-5, and processing steps P6-1 to P6-1 The same applies to P6-5.

  In the schedule SC1, the second control information SE having the third content A3 (evacuation location) is set for the tank ONB1. On the other hand, in the schedule SC1, the first control information FE having the first content A1 (standby possible) is set for the tank CHB1. Therefore, the tank CHB1 and the tank ONB1 are used in parallel. As a result, the throughput of processing the substrate W can be improved. Note that, for example, the schedule SC1 is also created in the second processing unit 20 and the third processing unit 21, and the lot is processed in parallel by the first processing unit 19 to the third processing unit 21.

  FIG. 5 is a time chart showing the schedule SC2. In the schedule SC2, priority is given to suppression of excessive processing of the substrate W by the chemical solution.

  As shown in FIG. 5, in the schedule SC2, similarly to the schedule SC1 shown in FIG. 4, the processing steps P1-1 to P1-5, the processing steps P2-1 to P2-5, and the processing step P3-1. To P5-5, P4-1 to P4-5,... Are arranged on a time axis.

  However, in the schedule SC2, the first control information FE of the second content A2 (standby not possible) is set for the tank CHB1. Further, the second control information SE of the third content A3 (evacuation location) is set for the tank ONB1. Therefore, the tank CHB1 and the tank ONB1 are not used in parallel. As a result, the substrate W in the tank CHB1 can be immediately retracted to the tank ONB1 when the retreat trigger TG occurs, and the excessive processing of the substrate W by the chemical can be suppressed. Note that, for example, the schedule SC2 is also created in the second processing unit 20 and the third processing unit 21, and the lot is processed in parallel by the first processing unit 19 to the third processing unit 21.

  FIG. 6 is a time chart showing the schedule SC3. The schedule SC3 takes into account the change time of the evacuation control information ES.

  As shown in FIG. 6, in the schedule SC3, similarly to the schedule SC1 shown in FIG. 4 and the schedule SC2 shown in FIG. 5, the processing steps P1-1 to P1-5, the processing steps P2-1 to P2- 5, processing steps P3-1 to P3-5, processing steps P4-1 to P4-5, processing steps P5-1 to P5-5,... Are arranged on a time axis. Specifically, the schedule SC3 is a composite schedule of the schedule SC1 and the schedule SC2.

  The time tc indicates the time at which the evacuation control information ES was changed. Specifically, at time tc, the content of the first control information FE is changed from the first content A1 (standby possible) to the second content A2 (standby impossible). Therefore, the scheduler 63 changes the schedule SC1 to the schedule SC2.

  However, at the time tc, the lot with the lot number 1 and the lot with the lot number 2 are being processed according to the schedule SC1. Therefore, the execution unit 65 causes the transport mechanism CV and the tanks LPD1, ONB1, and CHB1 to continue the processing of the lot with the lot number 1 and the lot with the lot number 2 according to the schedule SC1 before the change.

  On the other hand, at time tc, lots with other lot numbers (lot numbers 3, 4,...) Are unprocessed. Therefore, the execution unit 65 applies the changed schedule SC2 to the lots with the unprocessed lot numbers (lot numbers 3, 4,...), And according to the changed schedule SC2, the transport mechanism CV and the tanks LPD1,. The ONB 1 and the CHB 1 execute the processing of the unprocessed lot numbers (lot numbers 3, 4,...).

  As described above with reference to FIG. 6, according to the present embodiment, even if the evacuation control information ES is changed at the time tc during the processing of the lot and the schedule SC1 is changed to the schedule SC2, The execution timing of the schedule SC2 is adjusted. In other words, the change of the evacuation control information ES (specifically, the first control information FE) is not reflected in the processing of the lot being processed, but is reflected in the processing of the unprocessed lot. Therefore, the schedule SC1 and the schedule SC2 do not fail. Then, a batch process based on the schedule SC3 in which the schedule SC1 and the schedule SC2 are combined is smoothly executed. Note that, for example, the schedule SC3 is also created in the second processing unit 20 and the third processing unit 21, and the lot is processed in parallel by the first processing unit 19 to the third processing unit 21.

  Next, a substrate processing method executed in the first mode will be described with reference to FIG. 2 and FIGS. 7 to 9 are flowcharts illustrating a substrate processing method in the first mode of the substrate processing apparatus 100. As shown in FIGS. 7 to 9, the substrate processing method includes steps S1 to S39. The substrate processing method is executed by the substrate processing apparatus 100. Specifically, the computer CM executes the substrate processing method by executing a computer program.

  As shown in FIGS. 2 and 7, in step S1, the setting unit 61 of the control unit 51 of the computer CM sets the evacuation control information ES for each tank TA. In the description of FIGS. 7 to 9, the evacuation control information ES is set for each tank TA as shown in FIG. The first control information FE having the first content A1 (standby possible) is set for each of the tanks CHB1 to CHB3.

  In step S3, the scheduler 63 of the control unit 51 creates a schedule SC based on the recipe and the save control information ES.

  In step S5, the execution unit 65 of the control unit 51 executes a batch process according to the schedule SC.

  In step S7, the setting unit 61 acquires the environment information EV from the detection unit 59 or the external computer 300.

  In step S9, the setting unit 61 determines whether the environment information EV satisfies the first condition FCD. The first condition FCD is a condition for determining the possibility of occurrence of the evacuation trigger TG. When the first condition FCD is satisfied, it indicates that there is a high possibility that the retreat trigger TG will occur in the environment where the substrate processing apparatus 100 is placed. On the other hand, if the first condition FCD is not satisfied, it indicates that the possibility that the retreat trigger TG will occur in the environment where the substrate processing apparatus 100 is placed is low.

  The first condition FCD includes a criterion value that is compared with the environment information EV to determine the possibility of the occurrence of the evacuation trigger TG. For example, the first condition FCD is that “the atmospheric pressure indicated by the environment information EV1 is equal to or less than the threshold pressure TH1” when each of the tanks CHB1 to CHB3 is a phosphoric acid tank. The “threshold pressure TH1” corresponds to an example of a determination reference value.

  If it is determined in step S9 that the environment information EV does not satisfy the first condition FCD, the process proceeds to step S11.

  In step S11, the setting unit 61 determines whether or not processing of all lots has been completed.

  If it is determined in step S11 that the processing for all lots has been completed, the processing ends.

  On the other hand, if it is determined in step S11 that the processing for all lots has not been completed, the processing proceeds to step S7.

  If it is determined in step S9 that the environment information EV satisfies the first condition FCD, the process proceeds to step S13 in FIG.

  As shown in FIG. 8, in step S13, the setting unit 61 changes the evacuation control information ES. Specifically, the setting unit 61 changes the content of the first control information FE set in each of the tanks CHB1 to CHB3 from the first content A1 (standby possible) to the second content A2 (standby impossible).

  In step S15, the scheduler 63 changes the schedule SC based on the changed evacuation control information ES.

  In step S17, the execution unit 65 of the control unit 51 determines whether the processing timing of the unprocessed lot has arrived.

  If it is determined in step S17 that the processing timing of the unprocessed lot has not arrived, the process repeats step S17. Therefore, the execution unit 65 causes the transport mechanism CV and each tank TA to continue processing the lot being processed according to the schedule SC before the change.

  On the other hand, if it is determined in step S17 that the processing timing of the unprocessed lot has arrived, the process proceeds to step S19.

  In step S19, the execution unit 65 causes the transport mechanism CV and each tank TA to execute processing of an unprocessed lot according to the changed schedule.

  In step S21, the setting unit 61 acquires the environment information EV from the detection unit 59 or the external computer 300.

  In step S23, the setting unit 61 determines whether the environment information EV satisfies the second condition SCD. The second condition SCD is a condition for determining the possibility of occurrence of the evacuation trigger TG. When the second condition SCD is satisfied, it indicates that the possibility of the occurrence of the retreat trigger TG is low in the environment where the substrate processing apparatus 100 is placed. On the other hand, if the second condition SCD is not satisfied, it indicates that there is a high possibility that the retreat trigger TG will occur in the environment where the substrate processing apparatus 100 is placed.

  The second condition SCD includes a criterion value that is compared with the environment information EV to determine the possibility of occurrence of the evacuation trigger TG. For example, the second condition SCD is that “the atmospheric pressure indicated by the environment information EV1 is higher than the threshold pressure TH1” when each of the tanks CHB1 to CHB3 is a phosphoric acid tank. The “threshold pressure TH1” corresponds to an example of a determination reference value.

  If it is determined in step S23 that the environment information EV does not satisfy the second condition SCD, the process proceeds to step S25.

  In step S25, the setting unit 61 determines whether the processing for all lots has been completed.

  If it is determined in step S25 that the processing for all lots has been completed, the processing ends.

  On the other hand, if it is determined in step S25 that the processing for all lots has not been completed, the processing proceeds to step S21.

  If it is determined in step S23 that the environment information EV satisfies the second condition SCD, the process proceeds to step S27 in FIG.

  As shown in FIG. 9, in step S27, the setting unit 61 changes the evacuation control information ES. Specifically, the setting unit 61 changes the content of the first control information FE set in each of the tanks CHB1 to CHB3 from the second content A2 (standby not possible) to the first content A1 (standby possible).

  In step S29, the scheduler 63 changes the schedule SC based on the changed evacuation control information ES.

  In step S31, the execution unit 65 of the control unit 51 determines whether the processing timing of an unprocessed lot has arrived.

  If it is determined in step S31 that the processing timing of the unprocessed lot has not arrived, the process repeats step S31. Therefore, the execution unit 65 causes the transport mechanism CV and each tank TA to continue processing the lot being processed according to the schedule SC before the change.

  On the other hand, if it is determined in step S31 that the processing timing of the unprocessed lot has arrived, the process proceeds to step S33.

  In step S33, the execution unit 65 causes the transport mechanism CV and each tank TA to execute processing of an unprocessed lot according to the changed schedule.

  In step S35, the setting unit 61 acquires the environment information EV from the detection unit 59 or the external computer 300.

  In step S37, the setting unit 61 determines whether or not the environment information EV satisfies the first condition FCD.

  If it is determined in step S37 that the environment information EV does not satisfy the first condition FCD, the process proceeds to step S39.

  In step S39, the setting unit 61 determines whether the processing of all lots has been completed.

  If it is determined in step S39 that the processing for all lots has been completed, the processing ends.

  On the other hand, if it is determined in step S39 that the processing for all lots has not been completed, the processing proceeds to step S35.

  If it is determined in step S37 that the environment information EV satisfies the first condition FCD, the process proceeds to step S13 in FIG.

  As described above with reference to FIGS. 7 to 9, in the first mode, the evacuation control information ES is automatically changed based on the environment information EV acquired from the detection unit 59 or the external computer 300.

  The determination reference values included in the first condition FCD and the second condition SCD are stored in the storage unit 53. Further, the determination reference value can be changed by an input from the operation unit 57.

  Next, a substrate processing method executed in the second mode will be described with reference to FIGS. 2, 10, and 11. FIG. 10 and 11 are flowcharts illustrating a substrate processing method of the substrate processing apparatus 100 in the second mode. As shown in FIGS. 10 and 11, the substrate processing method includes steps S51 to S65. The substrate processing method is executed by the substrate processing apparatus 100. Specifically, the computer CM executes the computer program to execute the substrate processing method.

  As shown in FIGS. 2 and 10, in step S51, the setting unit 61 of the control unit 51 of the computer CM sets the evacuation control information ES for each tank TA.

  In step S53, the scheduler 63 of the control unit 51 creates a schedule SC based on the recipe and the evacuation control information ES.

  In step S55, the execution unit 65 of the control unit 51 executes a batch process according to the schedule SC.

  In step S57, the setting unit 61 determines whether the evacuation control information ES has been changed by an input from the operation unit 57 by a user operation.

  If it is determined in step S57 that the evacuation control information ES has not been changed, the process proceeds to step S59.

  In step S59, the setting unit 61 determines whether the processing for all lots has been completed.

  If it is determined in step S59 that the processing for all lots has been completed, the processing ends.

  On the other hand, if it is determined in step S59 that the processing for all lots has not been completed, the processing proceeds to step S57.

  If it is determined in step S57 that the evacuation control information ES has been changed, the process proceeds to step S61 in FIG.

  As shown in FIG. 11, in step S61, the scheduler 63 changes the schedule SC based on the changed save control information ES.

  In step S63, the execution unit 65 of the control unit 51 determines whether the processing timing of an unprocessed lot has arrived.

  If it is determined in step S63 that the processing timing of the unprocessed lot has not arrived, the process repeats step S63. Therefore, the execution unit 65 causes the transport mechanism CV and each tank TA to continue processing the lot being processed according to the schedule SC before the change.

  On the other hand, if it is determined in step S63 that the processing timing of the unprocessed lot has arrived, the process proceeds to step S65.

  In step S65, the execution unit 65 causes the transport mechanism CV and each tank TA to execute processing of an unprocessed lot according to the changed schedule. Then, the process proceeds to step S57 in FIG.

  As described above with reference to FIGS. 10 and 11, in the second mode, the evacuation control information ES is manually changed based on an input from the operation unit 57 by a user operation.

  Next, the operations of the processing unit SP and the control unit 51 will be described in relation to the storage unit 53 with reference to FIG. As shown in FIG. 2, the processing unit SP further includes a control unit 16. The control unit 16 controls the drying processing unit 17, the first processing unit 19, the second processing unit 20, and the third processing unit 21 under the control of the control unit 51. The control unit 16 is a computer including a processor and a storage device.

  The storage unit 53 of the computer CM has a first area 71, a second area 73, an evacuation control area 75, a recipe area 77, and a program area 79. The evacuation control area 75 stores evacuation control information ES set in each of the plurality of tanks TA. A plurality of recipes are stored in the recipe area 77.

  In the first area 71, the recipe is copied from the recipe area 77, and the evacuation control information ES is copied from the evacuation control area 75. In the second area 73, the recipe and the save control information ES are copied from the first area 71.

  The program area 79 stores a computer program for executing the substrate processing method described with reference to FIGS. The storage unit 53 is an example of a “non-temporary computer-readable storage medium storing a computer program for causing a computer to execute the substrate processing method”.

  First, an example of the operation of the setting unit 61 of the control unit 51 in the first mode will be described. The setting unit 61 reads out a specific recipe from the recipe area 77 and copies it to the first area 71 when the substrate processing apparatus 100 is started. The setting unit 61 reads the evacuation control information ES from the evacuation control area 75 and copies it to the first area 71 when the substrate processing apparatus 100 is started.

  In addition, the setting unit 61 acquires the environment information EV from the detection unit 59 and the external computer 300 at predetermined time intervals. Then, the setting unit 61 changes the content of the evacuation control information ES stored in the first area 71 according to the environment information EV. For example, when the environment information EV satisfies the first condition FCD in a case where the first control information FE having the first content A1 (standby possible) is stored in the first area 71, the setting unit 61 sets the first control information The content of the FE is changed from the first content A1 to the second content A2 (standby not possible). For example, if the first area 71 stores the first control information FE having the second content A2 (standby is not possible) and the environment information EV satisfies the second condition SCD, the content of the first control information FE is changed to the second content A2. 2 The content A2 is changed to the first content A1 (standby possible).

  Next, an example of the operation of the setting unit 61 in the second mode will be described. The operation of the setting unit 61 when starting the substrate processing apparatus 100 in the second mode is the same as the operation of the setting unit 61 when starting the substrate processing apparatus 100 in the first mode.

  The operation unit 57 receives an input of the evacuation control information ES from the user. Then, the setting unit 61 changes the content of the evacuation control information ES stored in the first area 71 to the content of the evacuation control information ES input to the operation unit 57. For example, when the first control information FE of the first content A1 (standby is possible) is stored in the first area 71, the first control information FE of the second content A2 (standby is not possible) is input to the operation unit 57. Then, the setting unit 61 changes the content of the first control information FE stored in the first area 71 from the first content A1 to the second content A2. For example, when the first area 71 stores the first control information FE of the second content A2 (standby not possible), the first control information FE of the first content A1 (standby possible) is input to the operation unit 57. Then, the setting unit 61 changes the content of the first control information FE stored in the first area 71 from the second content A2 to the first content A1.

  Next, an example of the operation of the scheduler 63 and the execution unit 65 of the control unit 51 in each of the first mode and the second mode will be described.

  The scheduler 63 copies the recipe and the evacuation control information ES stored in the first area 71 to the second area 73 each time a new lot is delivered to the first tank TA. In other words, when the timing of loading a new lot into the first tank TA has not arrived, the recipe and the evacuation control information ES stored in the first area 71 are not copied to the second area 73. The “first tank TA” indicates a tank TA in which a lot is initially input. For example, in the examples of FIGS. 4 to 6, the “first tank TA” is the tank CHB1.

  Then, the scheduler 63 creates a new schedule SC based on the recipe and the evacuation control information ES stored in the second area 73 each time a new lot is delivered to the first tank TA. In other words, a new schedule SC is not created when the timing of loading a new lot into the first tank TA has not arrived.

  Then, the execution unit 65 of the control unit 51 controls the transport mechanism CV and the control unit 16 (each tank TA) so that the lot newly introduced into the first tank TA is processed according to the new schedule SC. Control. On the other hand, the lot being processed in the tank TA is processed according to the schedule SC created when the lot being processed is carried into the first tank TA. As a result, according to the present embodiment, the batch processing can be smoothly performed without the schedule SC breaking.

  As described above with reference to FIGS. 1 to 11, according to the present embodiment, it is possible to reduce the throughput of the processing of the substrate W while suppressing the excessive processing performed on the substrate W. It can be suppressed as much as possible.

  Note that, for example, the control unit 51 collects and analyzes various types of environment information EV1 and environment information EV2, and predicts or detects a decrease in atmospheric pressure without requiring a determination reference value input by a user. Is also good. For example, the control unit 51 may analyze language information included in environmental information EV2 such as weather information to predict or detect a decrease in atmospheric pressure. For example, the control unit 51 may predict or detect a decrease in the atmospheric pressure by analyzing image information such as a weather chart, a forecast weather chart, and an atmospheric pressure map. For example, the control unit 51 receives two or more pieces of environmental information EV, applies two or more determination criteria to one piece of environmental information EV, or determines a combination of a plurality of patterns of the atmospheric pressure decrease and rise based on a combination thereof. The prediction method with the highest accuracy may be learned by performing the prediction and comparing it with the actual atmospheric pressure change tendency. When learning the prediction method, the control unit 51 may improve the learning accuracy by correcting the prediction method by feeding back the actual atmospheric pressure change tendency to the prediction method.

  The embodiment of the invention has been described with reference to the drawings. However, the present invention is not limited to the above embodiment, and can be implemented in various modes without departing from the gist thereof. Further, a plurality of constituent elements disclosed in the above embodiment can be appropriately modified. For example, one component of all the components shown in one embodiment may be added to the components of another embodiment, or some configuration of all the components shown in one embodiment may be added. Elements may be omitted from embodiments.

  In addition, the drawings schematically show each component as a main body in order to facilitate understanding of the invention, and the thickness, length, number, interval, and the like of each component shown in the drawings are shown in the drawings. For some reasons, it may be different from the actual one. The configuration of each component shown in the above embodiment is an example, and is not particularly limited. Needless to say, various changes can be made without substantially departing from the effects of the present invention. .

  The present invention relates to a substrate processing apparatus, a substrate processing method, and a computer program, and has industrial applicability.

Reference Signs List 51 control unit 55 communication unit 57 operation unit 59 detection unit 61 setting unit 63 scheduler 65 execution unit 100 substrate processing apparatus TA, LPD1, LPD2, CHB1 to CHB3, ONB1 to ONB3 tank CV transport mechanism W board ES evacuation control information FE first Control information SE Second control information A1 First content (standby possible)
A2 2nd content (standby not possible)
A3 Third contents (evacuation place)
A4 4th content (non-evacuation place)

Claims (19)

A substrate processing apparatus that collectively processes a plurality of substrates,
A plurality of tanks for processing substrates,
A transport mechanism for loading and unloading the substrate from and to the plurality of tanks,
A control unit for controlling the plurality of tanks and the transport mechanism,
The control unit includes:
A setting unit that sets evacuation control information related to evacuation of the substrate for each of the plurality of tanks;
A scheduler that creates a schedule that defines the use timing of the plurality of tanks and the operation timing of the transport mechanism when processing a substrate, based on the evacuation control information,
An execution unit configured to execute the processing of the substrate according to the schedule in the transport mechanism and the plurality of tanks,
The evacuation control information includes:
First control information indicating whether or not it is possible to hold the substrate in the tank;
And second control information indicating whether or not the tank is a place for retreating a substrate housed in another tank.
When the evacuation control information is changed, the scheduler changes the schedule based on the changed evacuation control information,
The substrate processing apparatus, wherein the execution unit causes the transport mechanism and the plurality of tanks to execute the processing of the substrate according to the changed schedule. The first control information indicates one of first content and second content,
The first content indicates that it is possible to make the substrate stand by in the tank,
The second content indicates that it is impossible to make the substrate wait in the tank,
2. The method according to claim 1, wherein the setting unit changes the content of at least one of the first control information from the first content to the second content before a retreat trigger for retreating the substrate from the tank occurs. 3. Substrate processing equipment. The plurality of tanks include a phosphoric acid tank containing a phosphoric acid solution,
3. The substrate according to claim 2, wherein before the occurrence of the evacuation trigger, the setting unit changes the content of the first control information set for the phosphoric acid tank from the first content to the second content. 4. Processing equipment. The first control information indicates one of a first content and a second content in accordance with the environment information,
The first content indicates that it is possible to make the substrate stand by in the tank,
The second content indicates that it is impossible to make the substrate wait in the tank,
The substrate processing apparatus according to claim 1, wherein the environment information includes information indicating an environment where the substrate processing apparatus is placed or information indicating a state of the substrate processing apparatus.   The method according to claim 4, wherein the setting unit acquires the environment information and sets the content of the first control information to one of the first content and the second content based on the environment information. Substrate processing equipment.   The setting unit acquires the environment information from a detection unit that detects the environment information, and sets the content of the first control information to one of the first content and the second content based on the environment information. The substrate processing apparatus according to claim 5, wherein: A communication unit that receives the environment information from outside the substrate processing apparatus via a network,
The setting unit acquires the environment information from the communication unit, and sets the content of the first control information to one of the first content and the second content based on the environment information. Item 6. A substrate processing apparatus according to item 5. The execution unit,
Applying the schedule before the change to the substrate in the process, causing the transport mechanism and the plurality of tanks to continue the processing of the substrate in the process according to the schedule before the change,
8. The unprocessed substrate is applied with the changed schedule, and the processing of the unprocessed substrate is performed in the transport mechanism and the plurality of tanks according to the changed schedule. The substrate processing apparatus according to claim 1. An operation unit that is operated by a user and further receives an input for changing the evacuation control information from the user,
9. The substrate processing apparatus according to claim 8, wherein the setting unit changes the content of the evacuation control information in response to the operation unit receiving an input to change the evacuation control information. A substrate processing method performed by a substrate processing apparatus that collectively processes a plurality of substrates,
The substrate processing apparatus includes:
A plurality of tanks for processing substrates,
A transport mechanism for loading and unloading the substrate to and from the plurality of tanks,
Setting evacuation control information for evacuation of the substrate for each of the plurality of tanks;
Creating a schedule that defines the use timing of the plurality of tanks and the operation timing of the transport mechanism when processing the substrate, based on the evacuation control information,
Causing the transport mechanism and the plurality of tanks to execute processing of the substrate according to the schedule;
When the evacuation control information is changed, changing the schedule based on the changed evacuation control information;
Causing the transport mechanism and the plurality of tanks to perform the processing of the substrate according to the changed schedule.
The evacuation control information includes:
First control information indicating whether or not it is possible to hold the substrate in the tank;
A second control information indicating whether or not the tank is a place for retreating a substrate housed in another tank. The first control information indicates one of first content and second content,
The first content indicates that it is possible to make the substrate stand by in the tank,
The second content indicates that it is impossible to make the substrate wait in the tank,
11. The substrate processing method according to claim 10, wherein at least one content of the first control information is changed from the first content to the second content before an evacuation trigger for evacuation of the substrate from the tank occurs. The plurality of tanks include a phosphoric acid tank containing a phosphoric acid solution,
12. The substrate processing method according to claim 11, wherein the content of the first control information set for the phosphoric acid tank is changed from the first content to the second content before the occurrence of the evacuation trigger. The first control information indicates one of first content and second content,
The first content indicates that it is possible to make the substrate stand by in the tank,
The second content indicates that it is impossible to make the substrate wait in the tank,
The first control information indicates one of the first content and the second content in accordance with the environment information,
The substrate processing method according to claim 10, wherein the environment information includes information indicating an environment where the substrate processing apparatus is placed or information indicating a state of the substrate processing apparatus.   14. The substrate processing method according to claim 13, wherein the environment information is acquired, and the content of the first control information is set to one of the first content and the second content based on the environment information. .   Acquiring the environment information from a detection unit that detects the environment information, and setting the content of the first control information to one of the first content and the second content based on the environment information; The substrate processing method according to claim 14.   The environment information is acquired from outside the substrate processing apparatus via a network, and the content of the first control information is set to one of the first content and the second content based on the environment information. The substrate processing method according to claim 14, wherein Applying the schedule before the change to the substrate in the process, causing the transport mechanism and the plurality of tanks to continue the processing of the substrate in the process according to the schedule before the change,
17. The unprocessed substrate is applied with the changed schedule, and the processing of the unprocessed substrate is performed in the transport mechanism and the plurality of tanks according to the changed schedule. The substrate processing method according to any one of the above.   18. The substrate processing method according to claim 17, wherein the content of the evacuation control information is changed in response to an operation unit receiving an input for changing the evacuation control information.   A computer program for causing a computer to execute the substrate processing method according to claim 10.

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