JP2009194224A5 - - Google Patents

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Publication number
JP2009194224A5
JP2009194224A5 JP2008034903A JP2008034903A JP2009194224A5 JP 2009194224 A5 JP2009194224 A5 JP 2009194224A5 JP 2008034903 A JP2008034903 A JP 2008034903A JP 2008034903 A JP2008034903 A JP 2008034903A JP 2009194224 A5 JP2009194224 A5 JP 2009194224A5
Authority
JP
Japan
Prior art keywords
band gap
metal oxide
magnetization
fixed
barrier layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008034903A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009194224A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008034903A priority Critical patent/JP2009194224A/ja
Priority claimed from JP2008034903A external-priority patent/JP2009194224A/ja
Priority to US12/371,011 priority patent/US20090207532A1/en
Publication of JP2009194224A publication Critical patent/JP2009194224A/ja
Publication of JP2009194224A5 publication Critical patent/JP2009194224A5/ja
Pending legal-status Critical Current

Links

JP2008034903A 2008-02-15 2008-02-15 磁気抵抗効果素子、ヘッドスライダ、磁気情報再生装置および磁気抵抗効果メモリ Pending JP2009194224A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008034903A JP2009194224A (ja) 2008-02-15 2008-02-15 磁気抵抗効果素子、ヘッドスライダ、磁気情報再生装置および磁気抵抗効果メモリ
US12/371,011 US20090207532A1 (en) 2008-02-15 2009-02-13 Magneto resistance effect device, head slider, magnetic information storage apparatus, and magneto resistance effect memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008034903A JP2009194224A (ja) 2008-02-15 2008-02-15 磁気抵抗効果素子、ヘッドスライダ、磁気情報再生装置および磁気抵抗効果メモリ

Publications (2)

Publication Number Publication Date
JP2009194224A JP2009194224A (ja) 2009-08-27
JP2009194224A5 true JP2009194224A5 (enExample) 2010-11-11

Family

ID=40954894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008034903A Pending JP2009194224A (ja) 2008-02-15 2008-02-15 磁気抵抗効果素子、ヘッドスライダ、磁気情報再生装置および磁気抵抗効果メモリ

Country Status (2)

Country Link
US (1) US20090207532A1 (enExample)
JP (1) JP2009194224A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5480321B2 (ja) 2012-03-21 2014-04-23 株式会社東芝 磁気メモリ及びその製造方法
JP5924309B2 (ja) * 2013-06-27 2016-05-25 Jfeスチール株式会社 移動式ラインカメラの光学系画像補正方法
CN108511602B (zh) * 2017-02-28 2021-07-13 中电海康集团有限公司 Mtj单元及stt-mram

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6480365B1 (en) * 1999-12-09 2002-11-12 International Business Machines Corporation Spin valve transistor using a magnetic tunnel junction
JP2001345497A (ja) * 2000-06-01 2001-12-14 Canon Inc 強磁性スピントンネル効果素子
JP2002319722A (ja) * 2001-01-22 2002-10-31 Matsushita Electric Ind Co Ltd 磁気抵抗効果素子とその製造方法
US6528896B2 (en) * 2001-06-21 2003-03-04 Samsung Electronics Co., Ltd. Scalable two transistor memory device
DE10202903B4 (de) * 2002-01-25 2009-01-22 Qimonda Ag Magnetoresistive Speicherzelle mit polaritätsabhängigem Widerstand und Speicherzelle
US7252852B1 (en) * 2003-12-12 2007-08-07 International Business Machines Corporation Mg-Zn oxide tunnel barriers and method of formation
US7300711B2 (en) * 2004-10-29 2007-11-27 International Business Machines Corporation Magnetic tunnel junctions with high tunneling magnetoresistance using non-bcc magnetic materials
US7443639B2 (en) * 2005-04-04 2008-10-28 International Business Machines Corporation Magnetic tunnel junctions including crystalline and amorphous tunnel barrier materials
US7230265B2 (en) * 2005-05-16 2007-06-12 International Business Machines Corporation Spin-polarization devices using rare earth-transition metal alloys
TWI267944B (en) * 2005-08-03 2006-12-01 Ind Tech Res Inst Non-volatile memory device and fabricating method thereof
US8063459B2 (en) * 2007-02-12 2011-11-22 Avalanche Technologies, Inc. Non-volatile magnetic memory element with graded layer
JP4834834B2 (ja) * 2006-05-08 2011-12-14 国立大学法人東北大学 トンネル磁気抵抗素子、不揮発性磁気メモリ、発光素子および3端子素子
US7851840B2 (en) * 2006-09-13 2010-12-14 Grandis Inc. Devices and circuits based on magnetic tunnel junctions utilizing a multilayer barrier
US7715156B2 (en) * 2007-01-12 2010-05-11 Tdk Corporation Tunnel magnetoresistive effect element and thin-film magnetic head with tunnel magnetoresistive effect read head element
US8289663B2 (en) * 2008-04-25 2012-10-16 Headway Technologies, Inc. Ultra low RA (resistance x area) sensors having a multilayer non-magnetic spacer between pinned and free layers
US8059374B2 (en) * 2009-01-14 2011-11-15 Headway Technologies, Inc. TMR device with novel free layer structure

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