JP2009188190A - Substrate processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of easily deciding whether a processing liquid in a storage tank needs to be replaced even when using three or more kinds of processing liquids including circulation type and non-circulation type processing liquids. <P>SOLUTION: The substrate processing apparatus selectively performs one of a first supply operation to supply a chemical B, a second supply operation to supply circulating water, and a third supply operation to supply a chemical A based upon data of a recipe, decides whether the chemical B or circulating water reserved in the storage tank 16 is discharged based upon the recipe data and reserved liquid data, and rewrites reserved liquid data when the chemical B or circulating water reserved in the storage tank 16 is discharged. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a substrate processing apparatus for processing a substrate by supplying a plurality of processing liquids to the substrate.

  A substrate processing apparatus that processes a substrate by supplying a plurality of processing liquids to the substrate is described in, for example, Patent Document 1.

Further, Patent Document 2 discloses a substrate processing apparatus that uses a storage tank that stores a processing liquid and collects and circulates the processing liquid supplied to the substrate.
JP 2004-267965 A JP 2004-273984 A

  In the case of using a plurality of kinds of processing liquids in this way, the processing liquid supplied to the substrate is recovered by using a storage tank for storing the processing liquid, and the processing liquid is circulated and used and discharged after being supplied to the substrate. When using both non-circulating type processing liquids, it is not possible to determine whether or not the processing liquid stored in the storage tank should be replaced only by comparing the previous recipe with the next recipe. There is a problem.

  The present invention has been made to solve the above problems, and even when three or more kinds of treatment liquids including a circulation type and a non-circulation type treatment liquid are used, the treatment liquid in the storage tank can be replaced. It is an object of the present invention to provide a substrate processing apparatus capable of easily determining whether or not it is necessary.

  The invention according to claim 1 is a substrate processing apparatus for processing a substrate with first and second processing liquids that are repeatedly used after being supplied to the substrate and a third processing liquid that is discharged after being supplied to the substrate. A processing unit for processing the substrate, a transport unit for transporting the substrate to the processing unit, a first supply unit for supplying a first processing liquid to the substrate in the processing unit, and the processing unit A second supply means for supplying a second processing liquid to the substrate, a third supply means for supplying a third processing liquid to the substrate in the processing section, and a first processing liquid or a second A storage tank for storing the processing liquid, and a first processing liquid or a second processing liquid supplied to the substrate in the processing section is sent to the storage tank, and the first processing stored in the storage tank. The liquid or the second processing liquid is supplied to the first supply means or (2) Circulation means for feeding liquid to the supply means, drainage means for draining the third processing liquid supplied to the substrate in the processing section, recipe data indicating a plurality of recipes for sequential processing, and the storage tank Based on the storage unit storing the stored liquid data indicating whether the liquid stored in the first processing liquid or the second processing liquid, and the recipe data stored in the storage unit, A first supply operation for supplying a first treatment liquid by the first supply means; a second supply operation for supplying a second treatment liquid by the second supply means; and a second supply operation for supplying a second treatment liquid by the second supply means. An operation switching means for selectively executing any one of the third supply operations for supplying the third processing liquid, and the operation switching by the operation switching means based on the recipe data and the stored liquid data, Stored in storage tank A drainage determination means for determining whether or not to discharge the first processing liquid or the second processing liquid, and when the first processing liquid or the second processing liquid stored in the storage tank is drained And a rewriting means for rewriting the stored liquid data.

  According to a second aspect of the present invention, in the first aspect of the invention, when the supply operation is switched by the operation switching means, the processing section is washed with a processing liquid to be used next.

  According to a third aspect of the present invention, in the first aspect of the invention, when the first processing liquid or the second processing liquid stored in the storage tank is drained, the storage tank is used next. Wash with treatment solution.

  According to a fourth aspect of the present invention, in the invention according to the second aspect, the storage unit stores a cleaning time required for cleaning the processing unit with a processing liquid to be used next, and the conveying unit. Stops the operation of transporting the substrate to the processing section during the cleaning time after the start of the cleaning operation.

  According to a fifth aspect of the present invention, in the third aspect of the present invention, the storage unit drains the first processing liquid or the second processing liquid stored in the storage tank and uses it next. The drainage cleaning time required for cleaning with the processing liquid is stored, and the transporting unit performs an operation of transporting the substrate to the processing unit during the drainage cleaning time after starting the draining operation. Stop.

  According to the first aspect of the present invention, even when three or more kinds of treatment liquids including a circulation type and a non-circulation type treatment liquid are used, it is easy to determine whether or not the treatment liquid in the storage tank needs to be replaced. It becomes possible to discriminate.

  According to the second aspect of the present invention, the processing section can be cleaned after the supply operation is switched.

  According to invention of Claim 3, it becomes possible to wash | clean a storage tank after process liquid drainage.

  According to the fourth and fifth aspects of the present invention, it is possible to effectively prevent the substrate from being conveyed during the cleaning operation.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a schematic view of a substrate processing apparatus according to the present invention.

  As shown in Table 1, this substrate processing apparatus includes a recipe 1 for processing with a chemical A discharged after being supplied to the substrate, a recipe 2 for processing with a chemical B that is repeatedly used after being supplied to the substrate, and a substrate. Recipe 2 for processing with pure water (hereinafter referred to as “circulated water”) repeatedly used after being supplied to the substrate, and Recipe 4 for processing with pure water (hereinafter referred to as “straight water”) discharged after being supplied to the substrate. The substrate can be processed by the four types of recipes. In this embodiment, the chemical liquid A and the chemical liquid B are different cleaning liquids.

この基板処理装置は、基板Ｗを処理するための処理部としての処理槽１１と、この処理部に基板Ｗを搬送する搬送手段としての複数の搬送ローラ１２と、貯留タンク１６とを供える。この基板処理装置においては、搬送ローラ１２により搬送される基板Ｗの表面に、スプレーノズル１３、１４、１５のいずれかから、薬液Ａ、薬液Ｂ、循環水、直水のいずれかがスプレーされ、その基板Ｗが処理される構成となっている。

The substrate processing apparatus includes a processing tank 11 as a processing unit for processing the substrate W, a plurality of transport rollers 12 as transport means for transporting the substrate W to the processing unit, and a storage tank 16. In this substrate processing apparatus, any one of the chemical liquid A, the chemical liquid B, the circulating water, and the direct water is sprayed from any one of the spray nozzles 13, 14, 15 on the surface of the substrate W conveyed by the conveying roller 12. The substrate W is processed.

  The chemical solution A is supplied from the supply portion 26 of the chemical solution A to the spray nozzle 13 via the on-off valve 21 and the pipe line 41 and sprayed on the surface of the substrate W from the spray nozzle 13. The chemical solution A after being supplied to the substrate W passes through the on-off valve 31, the pipe line 43 and the pipe line 45 from the processing tank 11 and is discharged from the on-off valve 24.

  The chemical solution B is stored in the storage tank 16 from the supply portion 27 of the chemical solution B via the on-off valve 22 and the conduit 42. The chemical solution B stored in the storage tank 16 is sucked through the conduit 46 by the action of the pump 51, supplied to the spray nozzle 14 through the on-off valve 33 and the conduit 49, and from the spray nozzle 14 to the substrate W. Sprayed on the surface. The chemical solution B after being supplied to the substrate W passes through the on-off valve 32 and the conduit 44 from the processing tank 11 and is collected in the storage tank 16. The liquid level of the chemical solution B in the storage tank 16 is constantly monitored by the three sensors 17, 18, and 19. Note that when the chemical solution B in the storage tank 16 is discharged, the chemical solution B passes through the conduit 45 and is discharged from the on-off valve 24.

  The circulating water is supplied to the spray nozzle 14 via the on-off valve 34, the pipe line 47 and the pipe line 49 when the substrate W is not present in the processing tank 11, and is sprayed into the processing tank 11 from the spray nozzle 14. The circulating water sprayed into the treatment tank 11 is collected in the storage tank 16 via the opening / closing valve 32 and the pipe 44 and stored in a predetermined amount. When the substrate W is transported into the processing tank 11 by the transport roller 12, the circulating water stored in the storage tank 16 is sprayed by the action of the pump 51 through the conduit 46, the on-off valve 33 and the conduit 49. 14 is sprayed onto the surface of the substrate W from the spray nozzle 14. The circulating water supplied to the substrate W passes through the on-off valve 32 and the pipe line 49 from the processing tank 11 and is collected in the storage tank 16.

  The circulating water is supplied from the pure water supply unit 28 to the spray nozzle 14 via the on-off valve 34, the pipe line 47 and the pipe line 49, and sprayed with the spray nozzle 14. The circulating water supplied to the substrate W passes through the on-off valve 32 and the pipe 44 from the processing tank 11 and is collected in the storage tank 16. The chemical solution B stored in the storage tank 16 is sucked through the conduit 46 by the action of the pump 51, supplied to the spray nozzle 14 through the on-off valve 33 and the conduit 49, and from the spray nozzle 14 to the substrate W. Sprayed on the surface. The level of circulating water in the storage tank 16 is constantly monitored by the three sensors 17, 18, 19. When the circulating water in the storage tank 16 is discharged, the circulating water passes through the pipe 45 and is discharged from the on-off valve 25.

  Direct water is supplied from the pure water supply unit 28 to the spray nozzle 15 via the on-off valve 35 and the pipe 48, and sprayed on the surface of the substrate W from the spray nozzle 15. The direct water supplied to the substrate W passes through the on-off valve 31, the pipe line 43 and the pipe line 45 from the processing tank 11 and is discharged from the on-off valve 25.

  As described above, the chemical liquid A and the chemical liquid B are discharged through the on-off valve 24, and the circulating water and direct water are discharged through the on-off valve 25. On the other hand, the circulating water and direct water used for the replacement cleaning described later are discharged through the on-off valve 23.

  FIG. 2 is a block diagram showing the main electrical configuration of the substrate processing apparatus according to the present invention.

  The substrate processing apparatus includes a control unit 60 including a ROM 62 that stores an operation program necessary for controlling the apparatus, a RAM 63 that temporarily stores data and the like during control, and a CPU 61 that executes a logical operation. The control unit 60 functions as an operation switching unit, a drainage determining unit, and a rewriting unit according to the present invention. The RAM 63 in the controller 60 functions as a storage unit according to the present invention.

  In this substrate processing apparatus, recipe data (refer to Table 1) indicating a plurality of recipes for performing sequential processing, and stored liquid data indicating whether the liquid stored in the storage tank 16 is the chemical solution B or the circulating water. From this, it is determined whether or not the liquid in the storage tank 16 is to be replaced, and if necessary, drainage, cleaning of the storage tank 16 and liquid supply are automatically executed. In addition, when the recipe is changed, the processing tank 11 and the like are also cleaned.

  At this time, all of the above-described cleanings are replacement cleanings by supplying the processing liquid used in the next recipe to the processing tank 11, the storage tank 16, various pipes, and the transport roller 12. However, when the recipe 3 using the circulating water is subsequently executed after the recipe 4 using the direct water, the treatment tank 11 and the like are in a clean state, and thus the cleaning is not executed.

  Next, the processing liquid exchange operation of the substrate processing apparatus described above will be described. 3 to 6 are flowcharts showing the processing liquid replacement operation.

  At the time of processing liquid exchange, first, initial setting is performed (step S1). At the time of this initial setting, the recipe data indicating a plurality of recipes that are sequentially processed and the stored liquid data indicating the processing liquid stored in the storage tank 16 stored in the RAM 63 of the control unit 60 are confirmed. Then, the number of the recipe to be executed next is confirmed (step S2). And it is determined whether the recipe which should be performed next is the recipe 2 by the chemical | medical solution B which uses the storage tank 16, or the recipe 3 by circulating water (step S3).

  If the recipe to be executed next is the recipe 2 using the chemical solution B or the recipe 3 using the circulating water using the storage tank, the contents of the storage tank 16, that is, the processing liquid stored in the storage tank 16 The type is confirmed (step S4). Then, it is confirmed whether or not the processing liquid used in the next recipe is the same as the processing liquid stored in the storage tank 16 (step S5). If the processing liquid used in the next recipe and the processing liquid stored in the storage tank 16 are the same, whether the previous recipe number and the next recipe number are the same, that is, Then, it is confirmed whether or not the processing solution used is the same (step S6).

  When the number of the previous recipe is the same as the number of the next recipe, a substrate W insertion command is issued (step S7), and the processing by the next recipe is started (step S8). Then, after the processing is completed, it is determined whether or not the substrate processing is to be continued (step S9). If there is processing for the next substrate, the process returns to step S2. On the other hand, when there is no substrate processing, the processing ends.

  In step S3, when the recipe to be executed next is the recipe 1 with the chemical solution A or the recipe 4 with the straight water without using the storage tank 16, as shown in FIG. It is confirmed whether or not the recipe numbers are the same, that is, whether or not the processing solutions used are the same (step S11). If the number of the previous recipe is the same as the number of the next recipe, the process moves to step S7 shown in FIG. 3 and processing by the next recipe is started.

  If the number of the previous recipe is different from the number of the next recipe, it is confirmed whether or not the previous recipe is a recipe 4 using straight water (step S12). And when the last recipe is the recipe 4, it moves to step S7 shown in FIG. 3, and starts the process by the next recipe.

  If it is determined in step S12 that the previous recipe is not recipe 4, a substrate loading prohibition command is issued, and the transfer operation of the substrate W to the processing tank 11 by the transfer roller 12 is stopped (step S13). Then, it is confirmed that the discharge operation of the substrate W is completed and the substrate W is completely discharged from the processing tank 11 (step S14).

  When the substrate W dispensing operation is completed, replacement cleaning is performed (step S15). As described above, this replacement cleaning is performed by supplying the processing liquid used in the next recipe to the processing tank 11, various pipes, or the conveyance roller 12. When the insertion prohibition time has elapsed (step S16), the process moves to step S7 shown in FIG. 3, and processing by the next recipe is started. The charging prohibition time is a cleaning time required for cleaning the processing tank 11 and the like with the processing liquid to be used next, and is stored in the RAM 63 in the control unit 60.

  Note that the above-described conditions for prohibiting substrate loading and completing the dispensing operation differ depending on the upstream apparatus of the substrate processing apparatus. In other words, if the upstream apparatus of the substrate processing apparatus is a problem-free apparatus that holds the substrate W, the replacement cleaning is performed when the substrate W is completely discharged from the substrate processing apparatus. do it. On the other hand, for example, when the upstream apparatus is a hot plate or the like that heat-processes the substrate W, the substrate W may be overbaked by the replacement cleaning process of the substrate processing apparatus. In this case, the upstream apparatus is also prohibited from loading the substrate W, and the replacement cleaning is performed when the substrate W is completely discharged from both the upstream apparatus and the substrate processing apparatus. There is a need.

  If it is determined in step S5 in FIG. 3 that the processing liquid used in the next recipe is different from the processing liquid stored in the storage tank 16, a substrate loading prohibition command is issued as shown in FIG. Then, the transfer operation of the substrate W to the processing tank 11 by the transfer roller 12 is stopped (step S21). Then, it is confirmed that the discharge operation of the substrate W is completed and the substrate W is completely discharged from the processing tank 11 (step S22).

  Next, the processing liquid in the storage tank 16 is discharged (step S23), and replacement cleaning is executed (step S24). As described above, this replacement cleaning is performed by supplying the processing liquid used in the next recipe to the storage tank 16 and various pipes.

  When the replacement cleaning is completed, the processing liquid used in the next recipe is stored in the storage tank 16 based on the recipe data stored in the RAM 63 in the control unit 60 (step S25). Further, the stored liquid data indicating whether the liquid stored in the storage tank 16 stored in the RAM 63 in the control unit 60 is the chemical liquid B or the circulating water is rewritten (step S26).

  Thereafter, if the insertion prohibition time has elapsed (step S27), the process moves to step S8 shown in FIG. 3, and processing by the next recipe is started. During the charging prohibition time, the processing liquid in the storage tank 16 is discharged, the storage tank 16 and the like are washed with the processing liquid to be used next, and the processing liquid to be used in the next recipe is poured into the storage tank 16. The drainage cleaning time required for the control unit 60 is stored in the RAM 63 of the control unit 60.

  If it is determined in step S6 in FIG. 3 that the number of the previous recipe is not the same as the number of the next recipe, a substrate insertion prohibition command is issued as shown in FIG. The conveying operation to the processing tank 11 is stopped (step S31). Then, it is confirmed that the discharge operation of the substrate W is completed and the substrate W is completely discharged from the processing tank 11 (step S32).

  When the discharge operation of the substrate W is completed, replacement cleaning is performed (step S33). This replacement cleaning is executed by supplying the processing liquid used in the next recipe to the processing tank 11, various pipes, or the conveyance roller 12 as in the case described above. If the prohibition time has elapsed (step S34), the process moves to step S8 shown in FIG. 3, and processing by the next recipe is started.

  The above operation will be described with a specific treatment liquid.

  If the previous recipe is recipe 1 using chemical solution A, chemical solution B is stored in the storage tank 16, and the next recipe is recipe 3 using circulating water, the recipe 1 ends. Thereafter, the on-off valve 24 shown in FIG. 1 is opened, and the chemical solution B in the storage tank 16 is discharged. Next, the on-off valve 24 is closed, the on-off valve 31 is closed, and the on-off valve 32 is opened. Thereafter, the on-off valve 34 is opened, and pure water is sprayed into the treatment tank 11 from the pure water supply unit 28 via the pipe lines 47 and 49 and the spray nozzle 14, and this pure water is supplied to the on-off valve 32 and the pipe line. It is stored in the storage tank 16 via 44. Then, the opening / closing valve 33 is opened, and the pure water is circulated in the circulation path including the storage tank 16, the pipelines 46 and 49, the spray nozzle 14, the treatment tank 11, and the pipeline 44 by the action of the pump 51.

  In this state, if a certain time elapses, the on-off valve 23 is opened and the pure water in the storage tank 16 is discharged. Thereafter, the on-off valve 23 is closed, the on-off valve 35 is opened, and pure water is sprayed into the treatment tank 11 from the pure water supply section 28 via the pipe line 48 and the spray nozzle 15. The gas is stored in the storage tank 16 via the on-off valve 32 and the pipe 44. If a predetermined amount of pure water is stored in the storage tank 16, this is circulated and the recipe 3 using the circulating water is executed.

  Moreover, when the previous recipe is the recipe 2 using the chemical solution B, the chemical solution B is stored in the storage tank 16, and the next recipe is the recipe 4 using the direct water, the recipe 2 is used. After the end, the on-off valve 32 is closed and the on-off valve 31 and the on-off valve 23 are opened. Next, the on-off valve 34 is opened, and pure water is sprayed into the treatment tank 11 from the pure water supply unit 28 via the pipelines 47 and 49 and the spray nozzle 14.

  If a certain time has passed in this state, the on-off valve 34 is closed to stop the supply of pure water. Then, the on-off valve 35 is opened, and the recipe 4 using direct water is executed.

  In the above-described embodiment, four types of treatment liquids are used, that is, the chemical solution A, the chemical solution B, the circulating water, and the straight water, but three or more types of treatment solutions may be used.

1 is a schematic diagram of a substrate processing apparatus according to the present invention. It is a block diagram which shows the main electrical structures of the substrate processing apparatus which concerns on this invention. It is a flowchart which shows the replacement | exchange operation | movement of a process liquid. It is a flowchart which shows the replacement | exchange operation | movement of a process liquid. It is a flowchart which shows the replacement | exchange operation | movement of a process liquid. It is a flowchart which shows the replacement | exchange operation | movement of a process liquid.

Explanation of symbols

DESCRIPTION OF SYMBOLS 11 Processing tank 12 Conveyance roller 13 Spray nozzle 14 Spray nozzle 15 Spray nozzle 16 Storage tank 26 Supply part of chemical | medical solution A 27 Supply part of chemical | medical solution B 28 Supply part of pure water 51 Pump 60 Control part 61 CPU
62 ROM
63 RAM

Claims (5)

A substrate processing apparatus for processing a substrate with first and second processing liquids that are repeatedly used after being supplied to the substrate and a third processing liquid that is discharged after being supplied to the substrate,
A processing unit for processing the substrate;
Transport means for transporting the substrate to the processing section;
First supply means for supplying a first processing liquid to the substrate in the processing unit;
A second supply means for supplying a second processing liquid to the substrate in the processing section;
Third supply means for supplying a third processing liquid to the substrate in the processing unit;
A storage tank for storing the first processing liquid or the second processing liquid;
In the processing section, the first processing liquid or the second processing liquid supplied to the substrate is sent to the storage tank, and the first processing liquid or the second processing liquid stored in the storage tank is sent to the storage tank. A circulation means for feeding liquid to the first supply means or the second supply means;
A draining means for draining the third processing liquid supplied to the substrate in the processing section;
Storage means for storing recipe data indicating a plurality of recipes to be sequentially processed and storage liquid data indicating whether the liquid stored in the storage tank is the first processing liquid or the second processing liquid When,
Based on the recipe data stored in the storage means, a first supply operation for supplying the first treatment liquid by the first supply means, and a second treatment liquid by the second supply means. An operation switching means for selectively executing either a second supply operation or a third supply operation for supplying a third processing liquid by the third supply means;
When switching the operation by the operation switching means, it is determined whether to drain the first processing liquid or the second processing liquid stored in the storage tank based on the recipe data and the stored liquid data. Drainage determination means for
Rewriting means for rewriting the stored liquid data when the first processing liquid or the second processing liquid stored in the storage tank is drained;
A substrate processing apparatus characterized by comprising: The substrate processing apparatus according to claim 1,
A substrate processing apparatus for cleaning the processing section with a processing liquid to be used next when the supply operation is switched by the operation switching means. The substrate processing apparatus according to claim 1,
A substrate processing apparatus for cleaning the storage tank with a processing liquid to be used next when the first processing liquid or the second processing liquid stored in the storage tank is drained. The substrate processing apparatus according to claim 2,
The storage means stores a cleaning time required for cleaning the processing unit with a processing solution to be used next,
The substrate processing apparatus, wherein the transport unit stops the operation of transporting the substrate to the processing unit during the cleaning time after the cleaning operation is started. The substrate processing apparatus according to claim 3,
The storage means stores a drainage cleaning time required for draining the first processing liquid or the second processing liquid stored in the storage tank and cleaning with the processing liquid to be used next,
The substrate processing apparatus, wherein the transport unit stops the operation of transporting the substrate to the processing unit during the drain cleaning time after the drain operation is started.

Images