JP2006202811A - Substrate processing equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide substrate processing equipment in which throughput of substrate processing being carried out by immersing a substrate into processing liquid stored in a processing tank can be enhanced furthermore. <P>SOLUTION: During an interval from time t1 to t4, pure water in a processing tank, an external tank, a branch discharge pipe, and a discharge pipe is discharged to a waste liquid drain. While discharging pure water, a processing for supplying sulufric acid to the processing tank is started at time t3. An in-in circulation processing is started at time t4 while supplying sulfuric acid. Subsequently, temperature regulation processing is started at time t5 earlier than time t6 when out-in circulation processing is started. Consequently, the starting timing of circulation processing and temperature regulation processing can be quickened as compared with prior art liquid exchange processing. Liquid exchange processing time for supplying sulfuric acid to the processing tank and regulating the temperature to a predetermined level can thereby be shortened. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  In the present invention, pure water and chemicals stored in a processing tank (hereinafter collectively referred to as “processing liquid”) are used for semiconductor substrates, glass substrates for liquid crystal display devices, glass substrates for photomasks, optical disk substrates, etc. The present invention relates to a substrate processing apparatus that performs predetermined processing by immersing a substrate (referred to as a “substrate”), and more particularly, to an improvement in the replacement procedure of a processing liquid stored in a processing tank.

  2. Description of the Related Art Conventionally, there has been known a substrate processing apparatus that performs predetermined processing by immersing a substrate in a processing solution stored in a processing tank (for example, Patent Document 1).

Japanese Patent No. 3530426

  Here, the liquid exchange process for exchanging the processing liquid stored in the substrate processing tank of the substrate processing apparatus of Patent Document 1 and maintaining the temperature of the replaced processing liquid at a temperature suitable for the substrate processing is as follows. Executed.

  That is, in the liquid exchange process, the processing liquid in (1) the substrate processing tank and (2) the overflow liquid recovery unit is discharged out of the apparatus in this order. Next, (3) after the processing liquid is discharged from the substrate processing tank and the overflow liquid recovery unit, a new processing liquid is supplied to the substrate processing tank, and (4) the processing liquid is supplied to the substrate processing tank. After the liquid overflows and is recovered in the overflow liquid recovery part, a circulation process for supplying the processing liquid from the overflow liquid recovery part to the substrate processing tank again is started. (5) Subsequently, after the circulation process is started, the operation of the temperature adjustment unit is started to adjust the temperature of the processing liquid. Then, when a predetermined amount of the processing liquid is maintained at a predetermined temperature in the substrate processing tank, the liquid exchange process is completed, and the substrate can be processed with the replaced processing liquid on the substrate. As described above, in the liquid exchange process of Patent Document 1, it is necessary to sequentially execute the above (1) to (5).

  However, in order to further improve the throughput of the substrate processing, the time required for this liquid exchange processing also becomes a problem.

  Therefore, an object of the present invention is to provide a substrate processing apparatus that can further improve the throughput of substrate processing performed by immersing the substrate in a processing solution stored in a processing tank.

  In order to solve the above problems, the invention of claim 1 is a substrate processing apparatus for processing a substrate, wherein a processing tank for storing a processing liquid and a first supply unit for supplying the processing liquid to the processing tank are provided. And an outer tank that is provided outside the processing tank and collects the processing liquid overflowing from the processing tank, a first discharge pipe that discharges the processing liquid stored in the processing tank, and the first discharge pipe. A first valve provided, a second discharge pipe for discharging the processing liquid stored in the outer tank, a second valve provided in the second discharge pipe, the first discharge pipe, and the second discharge pipe. A common discharge pipe that is connected to each and discharges the processing liquid discharged through the first discharge pipe and the second discharge pipe, and is discharged through the first discharge pipe and the second discharge pipe. A second supply unit for supplying the treated liquid to the treatment tank, the common discharge pipe, and the 2 a supply pipe connected to the supply section; a third valve provided in the supply pipe; a temperature control section provided in the supply pipe for regulating the temperature of the processing liquid flowing through the supply pipe; and the common discharge pipe 4, a fourth valve provided at a position downstream of the position where the supply pipe is connected, supply of the processing liquid from the first supply unit, the first valve, the second valve, and the third valve. And a control unit that controls the opening / closing operation of the fourth valve, and the control unit opens the first valve, the third valve, and the fourth valve and stores them in the processing tank. The discharged first processing liquid is discharged through the first discharge pipe and the common discharge pipe, and the first processing liquid remaining in the supply pipe is discharged through the supply pipe and the common discharge pipe, Second processing from the first supply unit to the processing tank The first valve is opened and the first processing liquid stored in the outer tub is discharged through the second discharge pipe and the common discharge pipe, and the processing is performed from the first supply section. The second processing liquid stored in the processing tank by opening the first valve and the third valve while supplying the second processing liquid to the tank, the first discharge pipe, the common discharge pipe, and the A first circulation process is performed to circulate from the second supply unit to the treatment tank via a supply pipe, and the first circulation process is stopped based on a recovery amount of the second treatment liquid collected in the outer tank. The second processing liquid collected in the outer tank by opening the second valve and the third valve while supplying the second processing liquid from the first supply unit to the processing tank From the second supply section via the discharge pipe, the common discharge pipe, and the supply pipe A second circulation process for circulation to the treatment tank is performed.

  Moreover, the invention of claim 2 is the substrate processing apparatus according to claim 1, wherein the control unit is configured to control the first processing liquid based on a storage amount of the second processing liquid stored in the processing tank. Each of the circulation processing and the operation of the temperature control unit is started.

  According to a third aspect of the present invention, in the substrate processing apparatus according to the first aspect, the control unit starts the operation of the temperature control unit after the first circulation processing is started. To do.

  According to a fourth aspect of the invention, there is provided the substrate processing apparatus according to any one of the first to third aspects, further comprising a recovery amount detection sensor that detects a recovery amount of the second processing liquid in the outer tank. It is characterized by.

  The substrate processing apparatus according to any one of claims 2 to 4 further includes a storage amount detection sensor that detects a storage amount of the second processing liquid in the processing tank. It is characterized by.

  According to the first to fifth aspects of the present invention, the discharging process of the first processing liquid and the supply process of the second processing liquid to the processing tank are performed in parallel, and the second processing liquid is removed from the processing tank. In the first stage opening that overflows to the tank, the temperature of the second treatment liquid discharged from the treatment tank is adjusted, and then the first circulation process is performed to circulate from the second supply unit to the treatment tank. The liquid exchange time for the second processing liquid can be shortened, and as a result, the throughput of the substrate processing can be further improved.

  In particular, according to the second aspect of the present invention, the first circulation process and the operation of the temperature adjustment unit can be started at an appropriate timing based on the storage amount of the second processing liquid.

  In particular, according to the third aspect of the invention, the operation of the temperature control unit can be started at the stage where the second processing liquid flows through the temperature control unit. Therefore, the temperature of the second processing liquid can be reliably controlled.

  In particular, according to the invention described in claim 4, it is possible to switch from the first circulation process to the second circulation process based on the collection amount of the second processing liquid measured by the collection amount detection sensor.

  In particular, according to the fifth aspect of the present invention, it is possible to start the first circulation process and the operation of the temperature control unit based on the storage amount measured by the storage amount detection sensor.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

<1. Configuration of substrate processing apparatus>
FIG. 1 is a diagram illustrating an example of a configuration of a substrate processing apparatus 1 according to an embodiment of the present invention. The substrate processing apparatus 1 is a so-called “batch type” apparatus that performs substrate processing on a plurality of substrates at once. As shown in FIG. 1, the substrate processing apparatus 1 mainly supplies the processing tank 10 again with the processing liquid discharged from the processing tank 10, the outer tank 20, and the processing tank 10 and the outer tank 20. The pipes 51a, 51b, 52, 61, 62 used and the valves 42, 47, 56a, which are provided in the corresponding pipes and set the flow paths of the processing liquids flowing through the pipes 51a, 51b, 52, 61, 62, 56b, 57, 66.

  The processing tank 10 is a storage tank that stores the processing liquid. The processing tank 10 can perform substrate processing on the plurality of substrates W at a time by immersing the plurality of substrates W in the processing solution 15 stored inside thereof. Further, two treatment liquid nozzles (second supply parts) 17 are disposed in the vicinity of the bottom of the treatment tank 10, and the treatment liquid once discharged from each of the treatment tank 10 and the outer tank 20 is treated liquid nozzle 17. To the treatment tank 10 again.

  In the processing tank 10, a level sensor (reserved amount detection sensor) 13 that detects the height of the liquid level of the processing liquid 15 stored in the processing tank 10 is disposed. Here, since the inner shape of the treatment tank 10 is known, the storage amount is obtained from the height of the liquid surface of the treatment liquid. That is, the storage amount of the processing liquid stored in the processing tank 10 and the height of the liquid level of the processing liquid correspond one to one. Therefore, in the present embodiment, a predetermined process is executed based on the liquid level height of the processing liquid that is the detection result of the level sensor 13 or the storage amount obtained from the detection result of the level sensor 13.

  For example, as shown in FIG. 6 to be described later, when the height Z of the liquid level of the processing liquid stored in the processing tank 10 is Z1, the processing liquid discharged from the processing tank 10 is again used as the processing tank 10. In addition, when the liquid surface height Z is Z2, the temperature adjustment process by the temperature adjustment unit 63 may be executed.

  Supply nozzles (first supply units) 40 and 45 are provided above the processing tank 10. As shown in FIG. 1, the supply nozzle 40 is connected in communication with a sulfuric acid supply source 41 via a valve 42, a flow meter 43, and a pipe 44. The supply nozzle 45 is connected to a pure water supply source 46 through a valve 47, a flow meter 48, and a pipe 49. Therefore, the supply nozzles 40 and 45 supply sulfuric acid and pure water from the upper side of the processing tank 10 toward the processing tank 10 by controlling the open / closed state of the valves 42 and 47.

  As shown in FIG. 1, the flow meters 43 and 48 are respectively disposed on the pipes 44 and 49. These flow meters 43 and 48 measure the flow rate per unit time of sulfuric acid supplied from the sulfuric acid supply source 41 and pure water supplied from the pure water supply source 46. Therefore, the supply amounts of sulfuric acid and pure water supplied to the treatment tank 10 can be obtained based on the detection values of the flow meters 43 and 48.

  The lifting mechanism 30 is a mechanism for immersing the substrate W in the processing liquid stored in the processing tank 10, and mainly includes a lifter 31 and a holding rod 32 as shown in FIG. 1. The lifter 31 is provided so as to be movable up and down in the Z-axis direction by a drive mechanism (not shown). The lifter 31 is attached with three holding rods 32 extending along the Y-axis direction. Here, each of the three holding rods 32 is provided with a plurality of holding grooves, and the substrate W is held in a standing posture by the outer edge portion of the board W being fitted into the corresponding holding groove.

  Therefore, the plurality of substrates W held by the three holding rods 32 are moved up and down by the lifter 31, so that the position between the position where the plurality of substrates W are immersed in the processing liquid 15 and the delivery position to the transfer robot (not shown). Can be moved up and down.

  As shown in FIG. 1, an outer tank 20 is disposed outside the processing tank 10 so as to surround the upper part of the processing tank 10. Thereby, the processing liquid overflowing after being supplied to the processing tank 10 is recovered by the outer tank 20.

  Inside the outer tank 20, a level sensor (recovered amount detection sensor) 23 that detects the height of the liquid level of the processing liquid 25 collected in the outer tank 20 is disposed. Here, since the inner shape of the outer tub 20 is known, the recovery amount of the processing liquid and the height of the liquid level of the processing liquid correspond one-to-one. Therefore, in the present embodiment, a predetermined process is executed based on the liquid level of the processing liquid, which is the detection result of the level sensor 23, or the recovery amount obtained from the detection result of the level sensor 23.

  For example, as shown in FIG. 7 described later, when the height Z of the processing liquid recovered in the outer tank 20 is Z3, the processing liquid discharged from the outer tank 20 is supplied to the processing tank 10. In addition, when the liquid surface height Z is Z2, the circulating process to be performed may be performed by closing the valve 42 and stopping the supply of sulfuric acid to the processing tank 10, respectively.

  Here, when the processing liquid used for the substrate processing in the substrate processing apparatus 1 of the present embodiment is discarded as the drainage, the used processing liquid is provided outside the substrate processing apparatus 1. It is discharged to a drainage drain 59 used as a common facility in the semiconductor factory.

  That is, as shown in FIG. 1, the inner region of the outer tub 20 communicates with a branch drain pipe (second discharge pipe) 51a, and the branch drain pipe 51a can be opened and closed (second valve) 56a. Is provided. The inner region of the processing tank 10 communicates with the branch discharge pipe 51 (first discharge pipe) b, and the branch discharge pipe 51b is provided with a valve (first valve) 56b that can be opened and closed. Further, the branch discharge pipes 51 a and 51 b communicate with the common discharge pipe 52 at the communication position 82. Further, of the ends of the common discharge pipe 52, the end opposite to the communication position 82 is connected to the drainage drain 59 through the pump 53 and the valve (fourth valve) 57. That is, in the common discharge pipe 52, the valve 57 is provided at a position downstream of the communication position 81 to which the supply pipe 61 is connected (on the drainage drain 59 side).

  Accordingly, the pump 53 is driven, the valves 56a and 57 are opened, and the valve 56b and a valve 66 described later are closed, so that the processing liquid 25 collected in the outer tub 20 is separated from the branch discharge pipe 51a. And it is discharged to the drainage drain 59 via the common discharge pipe 52. On the other hand, the pump 53 is driven, the valves 56b and 57 are opened, and the valves 56a and 66 are closed, so that the processing liquid 15 stored in the processing tank 10 is discharged into the branch discharge pipe 51b and the common discharge. It is discharged to the drainage drain 59 via the pipe 52.

  Further, the substrate processing apparatus 1 of the present embodiment employs a configuration in which each of the processing liquid 15 stored in the processing tank 10 and the processing liquid 25 collected in the outer tank 20 is re-supplied to the processing tank 10. ing.

  Specifically, as shown in FIG. 1, one end of each of the two branch supply pipes 62 communicates with the corresponding processing liquid nozzle (second supply unit) 17. On the other hand, each of the other ends of the branch supply pipe 62 communicates with one end of the supply pipe 61. The supply pipe 61 is provided with an openable / closable valve (third valve) 66, and the other end of the supply pipe 61 communicates with the common discharge pipe 52 via the filter 64, the temperature control unit 63, and the valve 66. To do. Here, the supply pipe 61 is closer to the drainage drain 59 than the position 82, and communicates with the common discharge pipe 52 at a communication position 81 between the pump 53 and the valve 57.

  Accordingly, the pump 53 is driven, the valves 56b and 66 are opened, and the valves 56a and 57 are closed, whereby the processing liquid 15 stored in the processing tank 10 is supplied again to the processing tank 10. . Further, the pump 53 is driven, the valves 56 a and 66 are opened, and the valves 56 b and 57 are closed, whereby the processing liquid 25 collected in the outer tank 20 is supplied to the processing tank 10.

  As described above, in the substrate processing apparatus 1 of the present embodiment, two processing liquid circulation processes, that is, (1) a process of supplying the processing liquid discharged from the processing tank 10 to the processing tank 10 again, and (2) A process of supplying the processing liquid discharged from the outer tank 20 to the processing tank 10 can be performed.

  As shown in FIG. 1, the filter 64 is provided in the supply pipe 61 and removes particles and the like contained in the processing liquid flowing through the supply pipe 61. As a result, even when the processing liquid is circulated while processing the substrate in the processing tank 10, the processing liquid not containing particles is supplied from the processing liquid nozzle 17 into the processing tank 10.

  As shown in FIG. 1, the temperature adjustment unit 63 is provided between the filter 64 and the valve 66 in the supply pipe 61 and heats the processing liquid flowing through the supply pipe 61. Thereby, the temperature control part 63 can heat-control the process liquid which distribute | circulates the supply pipe | tube 61, and can temperature-control it.

  As shown in FIG. 1, the control unit 90 includes a memory 91 that stores programs, variables, and the like, and a CPU 92 that executes control according to the programs stored in the memory 91. Therefore, the CPU 92 executes opening / closing control of the valves 42, 47, 56a, 56b, 57, 66, drive control of the pump 53, the temperature control unit 63, and the like at a predetermined timing in accordance with a program stored in the memory 91. .

<2. Liquid exchange procedure>
FIG. 2 is a timing chart for explaining the liquid replacement process of the processing liquid in the present embodiment. 3 to 7 are diagrams for explaining the flow path of the processing liquid in the liquid exchange process. Here, the procedure of the liquid exchange process of the present embodiment will be described with reference to FIGS.

  For convenience of explanation, it is assumed that the substrate W is moved up and down in the positive direction of the Z-axis by the lifting mechanism 30 and is transferred to a transport robot (not shown) at a time before time t1 in FIG. . Also, in FIGS. 3 to 7, pipes represented by bold lines indicate the flow path of the treatment liquid at each stage of the liquid exchange process.

  Further, in the following, a process for exchanging pure water (H2O) stored in the treatment tank 10 at a time prior to time t1 will be described, but the liquid exchange process is not limited to this. The treatment liquid before and after the exchange may be other than pure water and sulfuric acid, respectively.

  At time t1, the operation of the pump 53 is started, the valves 56b and 57 are opened, and the valves 56a and 66 are closed. Thereby, the pure water 15 (first treatment liquid) stored in the treatment tank 10 is discharged to the drainage drain 59 via the branch discharge pipe 51b and the common discharge pipe 52 by driving the pump 53 (FIG. 3). (See bold line).

  The pure water remaining in the treatment tank 10, the branch discharge pipe 51b, and the common discharge pipe 52 is discharged from the communication position 81 to the drainage drain 59 side at least by the time t2 when the time T1 elapses from the time t1. . The time T1 is a value determined according to the amount of pure water stored in the processing tank 10, the inner diameter and length of the branch discharge pipe 51b, the discharge capacity of the pump 53, and the like, and is obtained in advance by experiments. .

  Next, at time t2, the operation of the pump 53 is stopped while the open state of the valve 57 is maintained, the valves 56a and 56b are closed, and the valve 66 is opened. Thereby, the two branch supply pipes 62 and the pure water remaining in the supply pipe 61 are discharged to the drainage drain 59 at least by the time t3 when the time T2 elapses from the time t2 by the dead weight of the pure water ( (See thick line in FIG. 4). The time T2 is a value determined according to the inner diameter and length of the branch supply pipe 62 and the supply pipe 61, and is obtained in advance by experiments.

  Subsequently, at time t3, the operation of the pump 53 is started while the opening of the valve 57 and the closed state of the valve 56b are maintained, the valve 66 is closed, and the valve 56a is opened. Thus, the pure water 25 collected in the outer tub 20 is discharged to the drainage drain 59 through the branch discharge pipe 51a and the common discharge pipe 52 by driving the pump 53 (see the thick line in FIG. 5).

  The pure water remaining in the outer tub 20 and the branch discharge pipe 51a is discharged from the communication position 81 to the drainage drain 59 side at least by the time T3 from time t3. The time T3 is a value determined according to the amount of pure water collected in the outer tub 20, the inner diameter and length of the branch discharge pipe 51a, the discharge capacity of the pump 53, and the like, and is obtained in advance by experiments. .

  Moreover, the process which supplies a sulfuric acid to the process tank 10 is performed with the process from which the pure water is discharged | emitted from the outer tank 20 at the time t3. That is, at time t <b> 3, the valve 42 is opened, and sulfuric acid from the sulfuric acid supply source 41 is supplied from the supply nozzle 40 to the treatment tank 10 through the pipe 44. Thereby, the storage of the sulfuric acid in the processing tank 10 is started.

  In this way, at time t3, the process of discharging pure water from the outer tank 20 and the process of storing sulfuric acid in the processing tank 10 are performed in parallel.

  Subsequently, based on the detection value of the level sensor 13, at time t <b> 4 when it is determined that the level Z of the sulfuric acid stored in the processing tank 10 has reached Z <b> 1 (see FIG. 6: solid level). While the operation state of 53 is maintained, the valves 56a and 57 are closed and the valves 56b and 66 are opened.

  Thereby, the sulfuric acid discharged from the processing tank 10 is driven from the processing liquid nozzle 17 through the branch discharge pipe 51b, the common discharge pipe 52, the supply pipe 61, and the two branch supply pipes 62 by driving the pump 53. It is resupplied to the inside of the processing tank 10 (see the thick line in FIG. 6). That is, at time t4, a first circulation process (hereinafter also referred to as “inner-inner circulation process”) in which sulfuric acid is circulated from the treatment tank 10 toward the treatment tank 10 again is started.

  In addition, the valve 42 is opened even after the internal-internal circulation process is started, and sulfuric acid is continuously supplied to the processing tank 10. Also, the sulfuric acid liquid level Z1 which is a trigger for starting the internal-internal circulation process is obtained in advance by experiments or the like.

  Subsequently, based on the detected value of the level sensor 13 at time T6 from time t4, the height Z of the sulfuric acid liquid level stored in the processing tank 10 is Z2 (see FIG. 6: broken line level). At the time t5 when it is determined that the temperature adjustment unit 63 has been reached, the temperature adjustment unit 63 is activated while maintaining the internal-internal circulation process. Thereby, the temperature control process by the temperature control part 63 is started, and the sulfuric acid which distribute | circulates the supply pipe | tube 61 is temperature-controlled.

  Note that the valve 42 is opened even after the temperature adjustment process is started, and sulfuric acid is continuously supplied to the treatment tank 10. Then, the sulfuric acid overflowing from the treatment tank 10 is collected by the outer tank 20.

  Subsequently, based on the detection value of the level sensor 23, at time t5 when it is determined that the level Z of the sulfuric acid recovered in the outer tub 20 has reached Z3 (see FIG. 7: solid level). While the operating state of the temperature control unit 53 and the temperature control unit 63 and the open / closed state of the valves 66 and 57 are maintained, the valve 56b is closed and the valve 56a is opened.

  As a result, the sulfuric acid discharged from the outer tub 20 is processed by the processing liquid nozzle 17 through the branch discharge pipe 51a, the common discharge pipe 52, the supply pipe 61, and the two branch supply pipes 62 by the driving energy of the pump 53. It is supplied into the tank 10 (see the thick line in FIG. 7). That is, at time t6, the internal-internal circulation process is stopped and a second circulation process (hereinafter also referred to as “external-internal circulation process”) for circulating sulfuric acid from the outer tank 20 toward the treatment tank 10 is started. Is done.

  Note that the valve 42 is opened even after the outside-inside circulation treatment is started, and the treatment tank 10 is continuously supplied with sulfuric acid. Further, the liquid level Z3 of sulfuric acid serving as a trigger for starting the outer-inner circulation process is obtained in advance by experiments or the like.

  Subsequently, based on the detection value of the level sensor 23, at the time t7 when it is determined that the level Z of the sulfuric acid recovered in the outer tub 20 has reached Z4 (see FIG. 7: broken line level). -The valve 42 is closed while the internal circulation process is maintained. Thereby, the supply of sulfuric acid from the supply nozzle 40 to the treatment tank 10 is stopped. Then, the temperature adjustment unit 63 continues to operate while the outer-inner circulation process is being performed, and the liquid exchange process is completed at time t8 when the temperature of sulfuric acid is raised to a temperature at which the substrate can be processed.

  When the substrate process is performed after the liquid exchange process, the outer-internal circulation process is continuously executed after time t8 and the temperature of the sulfuric acid is controlled by the temperature control unit 63. Maintained at a temperature of Moreover, when the processing liquid stored in the processing tank 10 is other than sulfuric acid, it is maintained at a predetermined temperature at which the substrate processing with the processing liquid can be appropriately performed.

<3. Comparison of liquid treatment exchange procedure of this embodiment and conventional liquid exchange treatment procedure>
FIG. 8 is a timing chart for explaining a conventional liquid exchange process. Here, this embodiment, a liquid exchange process, and a conventional liquid exchange process are compared.

  In the following, a procedure when a conventional liquid exchange process is executed by the substrate processing apparatus 1 of the present embodiment will be described. In addition, as in the liquid exchange process of the present embodiment, the pure water is stored in the treatment tank 10 at a time point before time t1 in FIG. 8, and a process when the pure water is replaced with sulfuric acid will be described. To do. Further, in FIG. 8, the same reference numerals are assigned to the same time and time as those in FIG.

  In the conventional liquid exchange process, first, the pure water 15 stored in the processing tank 10 is discharged to the drainage drain 59 from time t1 to time t2 when the time T1 elapses, as in the present embodiment. Next, the pure water 25 collected in the outer tub 20 is discharged to the drainage drain 59 from time t2 to time t3 'when time T3 elapses. Subsequently, the pure water remaining in the two branch supply pipes 62 and the supply pipe 61 is discharged to the drainage drain 59 from time t3 'to time t4 when the time T2 elapses.

  Subsequently, at time t4 when the process of discharging pure water from the processing tank 10, the outer tank 20, the two branch supply pipes 62, and the supply pipe 61 is completed, a process of supplying sulfuric acid to the processing tank 10 is executed. . Subsequently, at the time when time T7 ′ has elapsed from time t4, based on the detection value of the level sensor 23, the height Z of the sulfuric acid liquid level recovered in the outer tank 20 is Z3 (see FIG. 7: solid line). At time t5 ′ when it is determined that the liquid level is reached, the outer-inner circulation process is started. Subsequently, at the time when time T6 ′ has elapsed from time t5 ′, based on the detection value of the level sensor 23, the height Z of the sulfuric acid recovered in the outer tank 20 is Z4 (see FIG. 7: broken line). The supply of sulfuric acid from the supply nozzle 40 to the treatment tank 10 is stopped at time t6 ′ when it is determined that the liquid level is reached. Then, the temperature adjustment unit 63 continues to operate while the outer-inner circulation process is being performed, and the liquid exchange process is completed at time t8 'when the temperature of sulfuric acid is raised to a temperature at which the substrate can be processed.

  Here, when the supply amount of sulfuric acid supplied from the sulfuric acid supply source 41 is the same in the present embodiment and the conventional liquid exchange process and the supply amount of sulfuric acid per unit time is the same, the sulfuric acid (treatment liquid) input time T4 and sulfuric acid (treatment liquid) temperature adjustment time T5 are the same time in each liquid exchange treatment. Therefore, in this embodiment and the conventional liquid exchange process, the drain time T1 for discharging the processing liquid from the processing tank 10, the drain time T2 for discharging the processing liquid from the pipes 61 and 62, and the processing liquid from the outer tank 20 are discharged. Assuming that the drain times T3 are the same, the time ΔT obtained by subtracting the liquid exchange processing time T0 of the present embodiment from the conventional liquid exchange processing time T0 ′ can be obtained by Equation 1.

ΔT = T0'-T0
= {T1 + T2 + T3 + (T7 '+ T6') + T5}
− {T1 + T2 + (T3 + T6) + T5}
= T3 + (T7'-T3) + (T6'-T6) Equation 1
Here, since the inner-inner circulation process and the temperature adjustment process of the present embodiment are started before the processing liquid overflows from the processing tank 10 to the outer tank 20, T7 ′> T3, T6 ′> T6. It becomes. That is, in the liquid exchange process according to the present embodiment, the timing for starting the circulation process of the treatment liquid and the timing for starting the temperature adjustment process can be made earlier compared to the conventional liquid exchange process. Further, as described above, the sulfuric acid (treatment liquid) charging time T4 and the sulfuric acid (treatment liquid) temperature adjustment time T5 are the same time in each liquid exchange treatment. Therefore, since ΔT> 0, the liquid exchange process of the present embodiment can shorten the processing time as compared with the conventional one.

<4. Advantages of Substrate Processing Apparatus According to Embodiment of the Present Invention>
As described above, the substrate processing apparatus 1 according to the present embodiment discharges the processing liquid (for example, pure water) collected in the outer tank 20 when replacing the processing liquid stored in the processing tank 10. And the process which supplies a new process liquid (for example, sulfuric acid) to the process tank 10 can be performed in parallel. In addition, the circulation process (inner-inner circulation process) is executed before the new treatment liquid overflows from the treatment tank 10 to the outer tank 20, and the temperature adjustment process by the temperature adjustment unit 63 can be executed.

  That is, in the liquid exchange process according to the present embodiment, the timing for starting the circulation process of the treatment liquid and the timing for starting the temperature adjustment process can be made earlier compared to the conventional liquid exchange process. Therefore, it is possible to shorten the liquid exchange processing time for supplying new processing liquid to the processing tank 10 and adjusting the temperature to a predetermined temperature.

<5. Modification>
While the embodiments of the present invention have been described above, the present invention is not limited to the above examples.

  (1) In the present embodiment, the branch discharge pipes 51a and 51b and the common discharge pipe 52 have been described as being connected in communication at the same communication position 82, but the present invention is not limited to this, and branch discharge The pipes 51a and 51b may communicate with the common discharge pipe 52 at different positions.

  (2) In the present embodiment, the level sensor 13 is a sensor that can detect a plurality of storage amounts by a single sensor, but is not limited to this. For example, two sensors that are in the “ON” state when the liquid level of the processing liquid reaches a predetermined height or more are arranged inside the processing tank 10. Then, the internal-internal circulation process is started at time t4 (see FIG. 2) when the detection value of one sensor transitions from the “OFF” state to the “ON” state, and then the detection value of the other sensor is “OFF The temperature of the processing liquid to be circulated may be controlled by starting the operation of the temperature control unit 63 at time t5 when the state is changed from the “ON” state to the “ON” state.

  Similarly, instead of the level sensor 23, two sensors that are in the “ON” state when the liquid level of the processing liquid reaches a predetermined height or more are arranged inside the outer tank 20, and based on these. Thus, the start timing of the outer-internal circulation process and the closing timing of the valve 42 may be determined.

It is a figure which shows an example of a structure of the substrate processing apparatus in embodiment of this invention. It is a timing chart for demonstrating the liquid exchange process of the process liquid in embodiment of this invention. It is a figure for demonstrating the flow path of the process liquid in the liquid exchange process of embodiment of this invention. It is a figure for demonstrating the flow path of the process liquid in the liquid exchange process of embodiment of this invention. It is a figure for demonstrating the flow path of the process liquid in the liquid exchange process of embodiment of this invention. It is a figure for demonstrating the flow path of the process liquid in the liquid exchange process of embodiment of this invention. It is a figure for demonstrating the flow path of the process liquid in the liquid exchange process of embodiment of this invention. It is a timing chart for demonstrating the conventional liquid exchange process.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 10 Processing tank 13, 23 Level sensor 17 Processing liquid nozzle 20 Outer tank 40, 45 Supply nozzle 41 Sulfuric acid supply source 42, 47, 56a, 56b, 57, 66 Valve 43, 48 Flowmeter 44, 49 Piping 46 Pure water supply source 51a, 51b Branch discharge pipe 52 Common discharge pipe 53 Pump 59 Drain drain 61 Supply pipe 62 Branch supply pipe 63 Temperature control section 90 Control section W substrate

Claims (5)

A substrate processing apparatus for processing a substrate,
A treatment tank for storing the treatment liquid;
A first supply unit for supplying a treatment liquid to the treatment tank;
An outer tank that is provided outside the processing tank and collects the processing liquid overflowing from the processing tank;
A first discharge pipe for discharging the processing liquid stored in the processing tank;
A first valve provided in the first discharge pipe;
A second discharge pipe for discharging the processing liquid stored in the outer tank;
A second valve provided in the second discharge pipe;
A common discharge pipe that is connected to each of the first discharge pipe and the second discharge pipe and discharges the processing liquid discharged through the first discharge pipe and the second discharge pipe;
A second supply section for supplying the treatment liquid discharged through the first discharge pipe and the second discharge pipe to the treatment tank;
A supply pipe connected to the common discharge pipe and the second supply unit;
A third valve provided in the supply pipe;
A temperature adjusting unit provided in the supply pipe for adjusting the temperature of the processing liquid flowing through the supply pipe;
A fourth valve provided in a position downstream of the position where the supply pipe is connected in the common discharge pipe;
A controller that controls the supply of the processing liquid from the first supply unit and the opening and closing operations of the first valve, the second valve, the third valve, and the fourth valve;
With
The control unit opens the first valve, the third valve, and the fourth valve, and passes the first processing liquid stored in the processing tank through the first discharge pipe and the common discharge pipe. And discharging the first processing liquid remaining in the supply pipe through the supply pipe and the common discharge pipe,
While supplying the second processing liquid from the first supply unit to the processing tank, the second valve is opened and the first processing liquid stored in the outer tank is supplied to the second discharge pipe and the common discharge pipe. Through the
While supplying the second processing liquid from the first supply unit to the processing tank, the first valve and the third valve are opened and the second processing liquid stored in the processing tank is supplied to the first discharge pipe. , Causing the first circulation process to be circulated from the second supply unit to the treatment tank via the common discharge pipe and the supply pipe,
Based on the amount of the second processing liquid recovered in the outer tank, the first valve is stopped and the second valve is supplied from the first supply unit to the processing tank, while the second valve is supplied. The second processing liquid recovered in the outer tank by opening the third valve is transferred from the second supply section to the processing tank via the second discharge pipe, the common discharge pipe, and the supply pipe. A substrate processing apparatus for performing a second circulation process for circulation. The substrate processing apparatus according to claim 1,
The control unit starts each of the first circulation processing and the operation of the temperature control unit based on a storage amount of the second processing liquid stored in the processing tank. . The substrate processing apparatus according to claim 1,
The substrate processing apparatus, wherein the control unit starts an operation of the temperature control unit after the first circulation processing is started. The substrate processing apparatus according to claim 1, wherein:
A recovery amount detection sensor for detecting a recovery amount of the second treatment liquid in the outer tank;
A substrate processing apparatus further comprising: The substrate processing apparatus according to claim 2, wherein:
A storage amount detection sensor for detecting a storage amount of the second processing liquid in the processing tank;
A substrate processing apparatus further comprising:

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