JP2009183949A5 - - Google Patents
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- Publication number
- JP2009183949A5 JP2009183949A5 JP2009114870A JP2009114870A JP2009183949A5 JP 2009183949 A5 JP2009183949 A5 JP 2009183949A5 JP 2009114870 A JP2009114870 A JP 2009114870A JP 2009114870 A JP2009114870 A JP 2009114870A JP 2009183949 A5 JP2009183949 A5 JP 2009183949A5
- Authority
- JP
- Japan
- Prior art keywords
- ultraviolet light
- ultraviolet
- processed
- gas supply
- open
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims 6
- 238000004140 cleaning Methods 0.000 claims 5
- 239000011261 inert gas Substances 0.000 claims 4
- 238000009792 diffusion process Methods 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 230000007723 transport mechanism Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009114870A JP4883133B2 (ja) | 2009-05-11 | 2009-05-11 | 紫外光洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009114870A JP4883133B2 (ja) | 2009-05-11 | 2009-05-11 | 紫外光洗浄装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003435401A Division JP4337547B2 (ja) | 2003-12-26 | 2003-12-26 | 紫外光洗浄装置および紫外光洗浄装置用紫外線ランプ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009183949A JP2009183949A (ja) | 2009-08-20 |
| JP2009183949A5 true JP2009183949A5 (enrdf_load_stackoverflow) | 2011-04-14 |
| JP4883133B2 JP4883133B2 (ja) | 2012-02-22 |
Family
ID=41067764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009114870A Expired - Lifetime JP4883133B2 (ja) | 2009-05-11 | 2009-05-11 | 紫外光洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4883133B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012003980A (ja) * | 2010-06-17 | 2012-01-05 | Sumitomo Electric Ind Ltd | 酸化物超電導薄膜線材の製造方法および製造装置 |
| CN103962346B (zh) * | 2014-05-21 | 2016-08-24 | 深圳市华星光电技术有限公司 | 可调整紫外光照射能量的紫外光清洗基板的方法 |
| JP7281083B2 (ja) * | 2019-05-14 | 2023-05-25 | ウシオ電機株式会社 | エキシマ光照射装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000260396A (ja) * | 1999-03-05 | 2000-09-22 | Quark Systems Co Ltd | エキシマランプ、エキシマ照射装置および有機化合物の分解方法 |
| JP4218192B2 (ja) * | 1999-08-05 | 2009-02-04 | 株式会社日立ハイテクノロジーズ | 基板処理装置及び処理方法 |
| JP2001300451A (ja) * | 2000-04-25 | 2001-10-30 | Hoya Schott Kk | 紫外光照射装置 |
| TWI251506B (en) * | 2000-11-01 | 2006-03-21 | Shinetsu Eng Co Ltd | Excimer UV photo reactor |
-
2009
- 2009-05-11 JP JP2009114870A patent/JP4883133B2/ja not_active Expired - Lifetime