JP2009164543A - 光センサ及び表示装置 - Google Patents
光センサ及び表示装置 Download PDFInfo
- Publication number
- JP2009164543A JP2009164543A JP2008052811A JP2008052811A JP2009164543A JP 2009164543 A JP2009164543 A JP 2009164543A JP 2008052811 A JP2008052811 A JP 2008052811A JP 2008052811 A JP2008052811 A JP 2008052811A JP 2009164543 A JP2009164543 A JP 2009164543A
- Authority
- JP
- Japan
- Prior art keywords
- control electrode
- photoactive layer
- region
- electrode
- optical sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 64
- 239000000758 substrate Substances 0.000 claims abstract description 34
- 230000003287 optical effect Effects 0.000 claims description 89
- 230000003071 parasitic effect Effects 0.000 abstract description 28
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 128
- 239000012535 impurity Substances 0.000 description 15
- 230000002093 peripheral effect Effects 0.000 description 14
- 239000010409 thin film Substances 0.000 description 14
- 239000000463 material Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 230000007423 decrease Effects 0.000 description 9
- 239000011810 insulating material Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000005229 chemical vapour deposition Methods 0.000 description 8
- 235000012489 doughnuts Nutrition 0.000 description 8
- 229910052814 silicon oxide Inorganic materials 0.000 description 8
- 239000004973 liquid crystal related substance Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000000137 annealing Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Thin Film Transistor (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008052811A JP2009164543A (ja) | 2007-12-11 | 2008-03-04 | 光センサ及び表示装置 |
TW097143948A TWI425627B (zh) | 2007-12-11 | 2008-11-13 | 光感測器和顯示器 |
US12/324,520 US8426937B2 (en) | 2007-12-11 | 2008-11-26 | Light sensor and display |
KR1020080124739A KR20090061589A (ko) | 2007-12-11 | 2008-12-09 | 광센서 및 표시장치 |
CN200810184652XA CN101458430B (zh) | 2007-12-11 | 2008-12-11 | 光传感器和显示器 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007319141 | 2007-12-11 | ||
JP2008052811A JP2009164543A (ja) | 2007-12-11 | 2008-03-04 | 光センサ及び表示装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009164543A true JP2009164543A (ja) | 2009-07-23 |
JP2009164543A5 JP2009164543A5 (zh) | 2011-03-03 |
Family
ID=40769384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008052811A Pending JP2009164543A (ja) | 2007-12-11 | 2008-03-04 | 光センサ及び表示装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2009164543A (zh) |
KR (1) | KR20090061589A (zh) |
CN (1) | CN101458430B (zh) |
TW (1) | TWI425627B (zh) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07202250A (ja) * | 1993-12-31 | 1995-08-04 | Casio Comput Co Ltd | 光電変換装置 |
JPH09260630A (ja) * | 1996-03-26 | 1997-10-03 | Sony Corp | 固体撮像素子及びその製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EA003343B1 (ru) * | 1999-08-02 | 2003-04-24 | Касио Компьютер Ко., Лтд. | Фотодатчик и система фотодатчиков |
US6933532B2 (en) * | 2003-03-28 | 2005-08-23 | Eastman Kodak Company | OLED display with photosensor |
CN100369270C (zh) * | 2003-12-24 | 2008-02-13 | 三洋电机株式会社 | 光传感器及显示装置 |
JP2005208582A (ja) * | 2003-12-24 | 2005-08-04 | Sanyo Electric Co Ltd | 光センサおよびディスプレイ |
JP2005250454A (ja) * | 2004-02-06 | 2005-09-15 | Sanyo Electric Co Ltd | 光センサ付きディスプレイおよびその製造方法 |
KR101097920B1 (ko) * | 2004-12-10 | 2011-12-23 | 삼성전자주식회사 | 광 센서와, 이를 구비한 표시 패널 및 표시 장치 |
JP2006186266A (ja) * | 2004-12-28 | 2006-07-13 | Toshiba Matsushita Display Technology Co Ltd | 光電変換素子及びこれを用いた表示装置 |
TWI291237B (en) * | 2005-10-07 | 2007-12-11 | Integrated Digital Technologie | Photo detector array |
JP2007214398A (ja) * | 2006-02-10 | 2007-08-23 | Nec Corp | 半導体集積回路 |
-
2008
- 2008-03-04 JP JP2008052811A patent/JP2009164543A/ja active Pending
- 2008-11-13 TW TW097143948A patent/TWI425627B/zh not_active IP Right Cessation
- 2008-12-09 KR KR1020080124739A patent/KR20090061589A/ko not_active Application Discontinuation
- 2008-12-11 CN CN200810184652XA patent/CN101458430B/zh not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07202250A (ja) * | 1993-12-31 | 1995-08-04 | Casio Comput Co Ltd | 光電変換装置 |
JPH09260630A (ja) * | 1996-03-26 | 1997-10-03 | Sony Corp | 固体撮像素子及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW200931653A (en) | 2009-07-16 |
TWI425627B (zh) | 2014-02-01 |
KR20090061589A (ko) | 2009-06-16 |
CN101458430A (zh) | 2009-06-17 |
CN101458430B (zh) | 2013-05-22 |
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