JP2009160681A5 - - Google Patents
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- Publication number
- JP2009160681A5 JP2009160681A5 JP2007341519A JP2007341519A JP2009160681A5 JP 2009160681 A5 JP2009160681 A5 JP 2009160681A5 JP 2007341519 A JP2007341519 A JP 2007341519A JP 2007341519 A JP2007341519 A JP 2007341519A JP 2009160681 A5 JP2009160681 A5 JP 2009160681A5
- Authority
- JP
- Japan
- Prior art keywords
- mask blank
- manufacturing
- substrate
- acid
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 22
- 238000004519 manufacturing process Methods 0.000 claims 15
- 238000005498 polishing Methods 0.000 claims 10
- 239000007788 liquid Substances 0.000 claims 8
- 239000011521 glass Substances 0.000 claims 7
- 238000000034 method Methods 0.000 claims 7
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims 3
- 239000006096 absorbing agent Substances 0.000 claims 3
- 238000004140 cleaning Methods 0.000 claims 3
- 150000007524 organic acids Chemical class 0.000 claims 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 2
- 239000006061 abrasive grain Substances 0.000 claims 2
- 239000012528 membrane Substances 0.000 claims 2
- 150000007522 mineralic acids Chemical class 0.000 claims 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims 1
- 229910010413 TiO 2 Inorganic materials 0.000 claims 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 239000008119 colloidal silica Substances 0.000 claims 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims 1
- 239000011976 maleic acid Substances 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 238000007517 polishing process Methods 0.000 claims 1
- 239000011975 tartaric acid Substances 0.000 claims 1
- 235000002906 tartaric acid Nutrition 0.000 claims 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007341519A JP5455143B2 (ja) | 2007-12-29 | 2007-12-29 | マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、及び反射型マスクブランクの製造方法、並びに反射型マスクの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007341519A JP5455143B2 (ja) | 2007-12-29 | 2007-12-29 | マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、及び反射型マスクブランクの製造方法、並びに反射型マスクの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009160681A JP2009160681A (ja) | 2009-07-23 |
| JP2009160681A5 true JP2009160681A5 (enExample) | 2011-01-27 |
| JP5455143B2 JP5455143B2 (ja) | 2014-03-26 |
Family
ID=40963874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007341519A Active JP5455143B2 (ja) | 2007-12-29 | 2007-12-29 | マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、及び反射型マスクブランクの製造方法、並びに反射型マスクの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5455143B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI594069B (zh) * | 2011-09-21 | 2017-08-01 | Hoya Corp | Method of manufacturing a transfer mask |
| JP5942773B2 (ja) * | 2012-10-19 | 2016-06-29 | 旭硝子株式会社 | ガラス基板の研磨方法 |
| JP2013214095A (ja) * | 2013-07-03 | 2013-10-17 | Hoya Corp | マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、及び反射型マスクブランクの製造方法、並びに反射型マスクの製造方法 |
| JP2015147713A (ja) * | 2014-02-07 | 2015-08-20 | 旭硝子株式会社 | フォトマスク用ガラス基板の洗浄方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4414292B2 (ja) * | 2004-06-29 | 2010-02-10 | 花王株式会社 | 研磨速度向上方法 |
| JP5090633B2 (ja) * | 2004-06-22 | 2012-12-05 | 旭硝子株式会社 | ガラス基板の研磨方法 |
| US20070037892A1 (en) * | 2004-09-08 | 2007-02-15 | Irina Belov | Aqueous slurry containing metallate-modified silica particles |
| JP2007054944A (ja) * | 2005-07-25 | 2007-03-08 | Hoya Corp | マスクブランク用基板の製造方法、マスクブランクの製造方法及びマスクの製造方法 |
| JP2007299942A (ja) * | 2006-04-28 | 2007-11-15 | Fujifilm Corp | 金属研磨用組成物及びそれを用いた化学的機械的研磨方法 |
| JP2007301721A (ja) * | 2007-08-29 | 2007-11-22 | Kao Corp | 研磨液組成物 |
-
2007
- 2007-12-29 JP JP2007341519A patent/JP5455143B2/ja active Active
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