JP2009080416A - Method of developing conductive material and developing device of conductive material - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of developing conductive material and a developing device of conductive material, capable of suppressing flaw of a silver salt-containing layer and developing unevenness. <P>SOLUTION: Three liquid turn bars 30 are disposed in a developing tank 16, and a developer 16A is blown out through slits axially formed on the circumferential surfaces of the liquid turn bars 30, whereby a photosensitive web 12 is floated from the liquid turn bars 30, and changed in direction in no contact. The photosensitive web 12 is carried in the developer 16A within the developing tank 16 at a carrying rate of 4m/min or more. A plurality of spray devices 50 provided with a nozzle 50A for spraying the developer 16A to both surfaces of the photosensitive web 12 is disposed on the upstream side and downstream side of the three liquid turn bars 20. The vicinity of the surfaces of the photosensitive web 12 is agitated by spraying the developer thereto through the nozzle 50a, and the developer is prevented from being stayed in the vicinity of the surfaces of the photosensitive web 12. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a development method and a conductive material for a conductive material, in which a conductive pattern is formed by exposing and developing a conductive material precursor containing at least one silver salt-containing layer on a support. This relates to a development processing apparatus.

  In recent years, an electromagnetic wave shielding film of a plasma display panel (PDP) has been known as a light-transmitting conductive film that has been subjected to exposure processing of a silver salt photosensitive material and development processing and then subjected to surface resistance reduction processing.

  Patent Document 1 discloses a method of obtaining a conductive film by exposing a silver salt photosensitive material to a pattern such as a fine line, developing, and plating. In this method, it is described that the development processing is performed in the order of a development step, a fixing step, and a washing / stabilization processing step. Further, it is described that the obtained developed material is processed by activation treatment, electroless copper plating, and continuous electrolytic plating to finally obtain a transparent conductive film having desired conductivity.

  Patent Document 2 discloses a technique in which an emulsion layer is substantially disposed on the uppermost layer of a light-sensitive material and an antioxidant is contained in the emulsion layer. Among them, it is described that it is advantageous not to provide a protective layer on the emulsion layer in order to perform physical development and plating processing promptly. Further, it has been suggested that the adverse effect of not providing a protective layer is that it is easily affected by external pressure and fog is likely to occur, and this photosensitive material reduces the influence of external pressure.

  In Patent Document 3 and Patent Document 4, in the step of exposing and developing a silver salt sensitive material to obtain a conductive pattern, only the back surface is brought into contact with the roller without contacting the emulsion surface of the silver salt sensitive material. A developing processing apparatus to be conveyed is disclosed.

  Patent Document 5 discloses an automatic developing machine that processes a photographic photosensitive material such as an X-ray film by being nipped by a conveying roller.

Patent Document 6 discloses a configuration in which a photographic photosensitive material is conveyed by a plurality of nipping rollers in an automatic developing machine for photographic photosensitive material.
JP 2006-352073 A JP 2006-228469 A JP 2007-207646 A JP 2006-190535 A JP-A-5-61176 JP 2007-127984 A

  However, the above technique has the following problems.

  In order to develop the photosensitive material by the development method described in Patent Document 1 (Japanese Patent Laid-Open No. 2006-352073), Patent Document 5 (Japanese Patent Laid-Open No. 5-61176) and Patent Document 6 (Japanese Patent Laid-Open No. 2007-2007). In the case of using a so-called roller transport device as described in Japanese Patent No. 127984), fine dust or cutting scraps on both sides of the photosensitive material may adhere to the submerged transport roller and cause scratches. is there. In particular, the photosensitive material without a protective layer described in Patent Document 2 (Japanese Patent Application Laid-Open No. 2006-228469) is extremely easily damaged, and it is difficult to convey the emulsion surface while contacting the submerged conveyance roller. .

  In Patent Document 4 (Japanese Patent Laid-Open No. 2006-190535) and Patent Document 3 (Japanese Patent Laid-Open No. 2007-207646), only the back surface is brought into contact with the roller without contacting the emulsion surface of the silver salt sensitive material. In the conveying method disclosed in this document, the processing object on the film is used in two or more continuous processing tanks (for example, development, fixing, washing with water) which are often used in general silver halide light-sensitive materials. It is not suitable for non-contact treatment by dipping.

  Further, in the methods disclosed in Patent Document 4 (Japanese Patent Laid-Open No. 2006-190535) and Patent Document 3 (Japanese Patent Laid-Open No. 2007-207646), when the conveyance speed is increased (for example, 4 m / min or more), the nipping roller Since there is no means for appropriately destroying the so-called liquid boundary film of the silver salt sensitive material and causing the development reaction to proceed uniformly, uneven flow due to the accompanying liquid to the silver salt sensitive material occurs. Further, according to experiments by the present inventors, it has been found that a means for breaking the liquid boundary film is necessary even in non-contact conveyance.

  The present invention has been made in view of such circumstances, and a method for developing a conductive material that can suppress the occurrence of scratches in the silver salt-containing layer of the photosensitive material and can suppress the occurrence of development unevenness. And an apparatus for developing a conductive material.

  In order to solve the above-mentioned problems, the invention according to claim 1 forms a conductive pattern by exposing and developing a conductive material precursor having at least one silver salt-containing layer on a support. A method for developing a conductive material, wherein the conductive material precursor is prevented from contacting the silver salt-containing layer at a conveyance speed of 4 m / min to 50 m / min in the developing solution. The developer is transported and disturbed in the vicinity of the silver salt-containing layer at at least one location in the developer.

  According to the invention described in claim 1, the conductive material precursor is transported in the developing solution at a transport speed of 4 m / min to 50 m / min so that the transport guide member does not contact the silver salt-containing layer. Thus, it is possible to suppress the generation of scratches in the silver salt-containing layer. Furthermore, by disturbing the developing solution in the vicinity of the silver salt-containing layer at at least one location in the developing solution, the liquid boundary film of the silver salt-containing layer is destroyed and developed near the surface of the silver salt-containing layer. It is suppressed that a liquid retains. Thereby, the occurrence of uneven development can be suppressed.

  On the other hand, when the conveyance speed of the conductive material precursor is less than 4 m / min, it is difficult to stably convey the conductive material precursor without contacting the conveyance guide member. Further, if the conveying speed of the conductive material precursor is higher than 50 m / min, the liquid film of the silver salt-containing layer cannot be almost uniformly broken, and it is difficult to effectively suppress the development unevenness. It becomes.

  According to a second aspect of the present invention, in the method for developing a conductive material according to the first aspect, the conductive material precursor having a silver salt-containing layer substantially not provided with a protective layer on the surface is exposed and developed. It is characterized by processing.

  When the conductive material precursor having a silver salt-containing layer that does not substantially have a protective layer on the surface is exposed and developed, the silver salt-containing layer is a soft film in the developing solution. In the invention according to claim 2, even if the conductive material precursor having a silver salt-containing layer that is substantially not provided with a protective layer is exposed and developed, the silver salt-containing layer is easily scratched. Scratches can be prevented from occurring. Here, “substantially has no protective layer on the surface” means that the thickness of the protective layer on the surface is 0.5 μm or less or has no protective layer on the surface.

  According to a third aspect of the present invention, there is provided a development processing apparatus for a conductive material that forms a conductive pattern by exposing and developing a conductive material precursor having at least one silver salt-containing layer on a support. A development processing tank filled with a development processing solution, a transport means for transporting the conductive material precursor at a transport speed of 4 m / min to 50 m / min, and provided in the development processing tank, A conveyance guide member that conveys the conductive material precursor so as not to contact the silver salt-containing layer, and the development processing tank provided in the development processing tank, and disturbs the development processing solution in the vicinity of the silver salt-containing layer in at least one place And a disturbing means.

  According to the third aspect of the present invention, the conductive material precursor is transported in the developing solution at a transport speed of 4 m / min to 50 m / min by the transport means, and the transport guide is provided in the development processing tank. The conductive material precursor is conveyed by the member so as not to contact the silver salt-containing layer. Thereby, it can suppress that a crack generate | occur | produces in a silver salt content layer. Furthermore, the developing solution in the vicinity of the silver salt-containing layer is disturbed by at least one location in the developing solution by the disturbing means provided in the developing tank, so that the liquid boundary film of the silver salt-containing layer is destroyed. In addition, the developer is prevented from staying near the surface of the silver salt-containing layer. Thereby, the occurrence of uneven development can be suppressed.

  On the other hand, when the conveyance speed of the conductive material precursor is less than 4 m / min, it is difficult to stably convey the conductive material precursor without contacting the conveyance guide member. Further, if the conveying speed of the conductive material precursor is higher than 50 m / min, the liquid film of the silver salt-containing layer cannot be almost uniformly broken, and it is difficult to effectively suppress the development unevenness. It becomes.

  According to a fourth aspect of the present invention, there is provided the conductive material development processing apparatus according to the third aspect, wherein the disturbing means is a spraying device including a nozzle for spraying a development processing solution onto the silver salt-containing layer. It is a feature.

  According to the fourth aspect of the present invention, the developing solution in the vicinity of the silver salt-containing layer is disturbed by spraying the developing solution from the nozzle of the spraying device onto the silver salt-containing layer. This destroys the liquid boundary film of the silver salt-containing layer and suppresses the developer from staying near the surface of the silver salt-containing layer.

  According to a fifth aspect of the present invention, there is provided the conductive material development processing apparatus according to the third aspect, wherein the disturbing unit faces the silver salt-containing layer at a predetermined interval when the conductive material precursor is transported. The blade is elastically deformable.

  According to the fifth aspect of the present invention, the conductive material precursor is provided with the predetermined predetermined spacing and is provided with the elastically deformable blade when the conductive material precursor is conveyed. The blade is elastically deformed by the developing solution when it is conveyed at a speed of 5 mm, and a predetermined interval is formed between the silver salt-containing layer and the blade. The developing solution in the vicinity of the silver salt-containing layer is disturbed by this blade. For this reason, the liquid boundary film of the silver salt-containing layer is destroyed and the stay of the developer near the surface of the silver salt-containing layer is suppressed.

  According to a sixth aspect of the present invention, in the development processing apparatus for a conductive material according to the third aspect, the disturbing means is a plate-like body fixedly supported at a predetermined interval from the silver salt-containing layer. It is characterized by that.

  According to the invention described in claim 6, a plate-like body fixed and supported at a predetermined interval from the silver salt-containing layer is provided, and the plate-like body allows the developing solution in the vicinity of the silver salt-containing layer to be provided. Be disturbed. For this reason, the liquid boundary film of the silver salt-containing layer is destroyed and the stay of the developer near the surface of the silver salt-containing layer is suppressed.

  A seventh aspect of the present invention is the conductive material development processing apparatus according to the third aspect, wherein the disturbing means is a roller disposed at a predetermined interval from the silver salt-containing layer. It is said.

  According to the seventh aspect of the present invention, the roller disposed at a predetermined interval from the silver salt-containing layer is provided, and the developing solution near the silver salt-containing layer is disturbed by the roller. This destroys the liquid boundary film of the silver salt-containing layer and suppresses the developer from staying near the surface of the silver salt-containing layer.

  An eighth aspect of the present invention is the conductive material development processing apparatus according to any one of the third to seventh aspects, further comprising a silver salt-containing layer substantially not provided with a protective layer on the surface. The conductive material precursor is exposed and developed.

  When the conductive material precursor having a silver salt-containing layer that does not substantially have a protective layer on the surface is exposed and developed, the silver salt-containing layer is a soft film in the developing solution. In the invention according to claim 8, even if the conductive material precursor having a silver salt-containing layer that does not substantially have a protective layer on the surface is exposed and developed, the silver salt-containing layer is easily scratched. Scratches can be prevented from occurring. Here, “substantially has no protective layer on the surface” means that the thickness of the protective layer on the surface is 0.5 μm or less or has no protective layer on the surface.

  According to a ninth aspect of the present invention, in the conductive material development processing apparatus according to any one of the third to eighth aspects, the transport guide member develops the conductive material precursor into a development processing solution. It is characterized by being a submerged turn bar that changes direction inside.

  According to the invention described in claim 9, since the transport guide member is a submerged turn bar that changes the direction of the conductive material precursor in the developing solution, the conductive material precursor is efficiently removed in the developing solution. It can be transported and developed.

  As described above, according to the present invention, when the conductive material precursor is developed, it is possible to suppress the occurrence of scratches in the silver salt-containing layer and to suppress the occurrence of development unevenness.

  Embodiments of the present invention will be described with reference to the drawings. In addition, the same code | symbol is provided to the member which has the substantially same function throughout all the drawings, and the overlapping description may be abbreviate | omitted.

  FIG. 1 shows a conductive material processing apparatus to which a conductive material processing method according to the present invention is applied. This processing apparatus is disposed after exposing a conductive material precursor having a silver halide emulsion layer as a silver salt-containing layer on a support film, and developing, fixing, washing, etc. of the exposed conductive material precursor It is a device that performs.

  As shown in FIG. 1, in the processing apparatus 10, a photosensitive web 12 having a silver halide emulsion layer on a belt-like support film is conveyed in a fixed direction while being guided by a plurality of support rollers 14. The photosensitive web 12 has been subjected to a desired fine line pattern exposure by an exposure apparatus (not shown).

  The processing apparatus 10 includes, in order from the upstream side to the downstream side in the conveyance direction of the photosensitive web 12, a development processing tank 16 in which the developer 16A is stored, a development stop processing tank 18 in which the stop liquid 18A is stored, The fixing tank 20 in which the fixing liquid 20A is stored, the first water washing tank 22 in which pure water (cleaning liquid) 22A is stored, the second water washing tank 24 in which pure water (cleaning liquid) 24A is stored, and the photosensitive web 12. And a drying device 26 for drying. In the drying device 26, the photosensitive web 12 is wound around three support rollers 14 arranged in a staggered manner, and the photosensitive web 12 is positioned upstream and downstream in the transport direction from the three support rollers 14. A hot air generator 28 for blowing hot air on the surface is disposed.

  In the processing apparatus 10, the photosensitive web 12 is conveyed to the development processing tank 16 through a support roller 14 disposed on the development processing tank 16. In the development processing tank 16, three submerged turn bars 30 are arranged in a staggered manner. The submerged turn bar 30 has a surface facing the photosensitive web 12 formed in an arc shape and a surface not facing the photosensitive web 12 formed in a flat shape. That is, the two submerged turn bars 30 arranged on the lower side have an arcuate surface facing the lower side, and one submerged turn bar 30 arranged on the upper side between the two submerged turn bars 30. The turn bar 30 has an arc-shaped surface facing upward. The photosensitive web 12 is supported in a state where it is stretched over two submerged turn bars 30 arranged on the lower side and one submerged turn bar 30 arranged on the upper side between them. By the three submerged turn bars 30, the photosensitive web 12 can be efficiently conveyed in the development processing tank 16 to perform development processing.

  The submerged turn bar 30 is formed with a plurality of slits (not shown) in the axial direction on the peripheral surface, and a predetermined amount of developer 16A is ejected from the plurality of slits, so that the photosensitive web 12 is submerged in the submerged turn bar. It floats from 30 and becomes non-contact. As a result, the photosensitive web 12 is supported by the three submerged turn bars 30 so that the silver halide emulsion layer is not in contact, and the direction is changed. Since the silver halide emulsion layer of the photosensitive web 12 is a soft film in the wet state, it is desirable that the amount of the developer 16A sprayed from the slit is too strong to be adjusted to a predetermined spray amount so as not to break the soft film.

  In the development processing tank 16, a plurality of spraying devices serving as disturbing means for spraying the developer 16A on both surfaces of the photosensitive web 12 to the upstream and downstream portions of the three submerged turn bars 30 in the transport direction. 50 is provided. The spraying device 50 is made of a cylindrical member and is disposed so as to face the photosensitive web 12 at a predetermined interval. A plurality of nozzles 50 </ b> A that spray the developer 16 </ b> A onto the photosensitive web 12 are formed at positions facing the photosensitive web 12 on the peripheral surface of the spraying device 50. By spraying the developer 16A on both surfaces of the photosensitive web 12 from the plurality of nozzles 50A, the developer 16A near the both surfaces of the photosensitive web 12 is disturbed, and the developer 16A is prevented from staying near both surfaces of the photosensitive web 12. The Particularly, by disturbing the vicinity of the silver halide emulsion layer on the surface of the photosensitive web 12, the liquid boundary film of the silver halide emulsion layer is destroyed, and the development reaction is accelerated. Thereby, generation | occurrence | production of a developing solution development nonuniformity can be suppressed.

  In the present embodiment, the spraying device 50 has three locations upstream of the first submerged turn bar 30 in the conveying direction of the photosensitive web 12, two locations between the first and second submerged turnbars 30, and the second one. Two locations are provided between the third submerged turn bar 30 and three locations downstream of the third submerged turn bar 30. Further, the spraying device 50 includes four nozzles 50A along the axial direction on the peripheral surface. The amount of developer 16A sprayed by the spraying device 50 is set to 5 to 10 l / min × 4, and the nozzle 50A has a slit width of 0.5 mm and a length of 180 mm. The interval between the nozzle 50A and the photosensitive web 12 is set to 3 to 5 mm.

  An air knife 34 is disposed at the outlet of the development processing tank 16 on the downstream side in the conveyance direction of the photosensitive web 12 so as to face the photosensitive web 12. The air knife 34 blows air onto the photosensitive web 12, and the developer 16 </ b> A is scraped off by the air blown from the air knife 34 at the outlet of the developing bath 16 in the photosensitive web 12 conveyed in the developing bath 16. Then, the toner is introduced into the next development stop processing tank 18 through a conveyance guide member 36 disposed above the development processing tank 16 and the development stop processing tank 18. The conveyance guide member 36 has a surface facing the photosensitive web 12 formed in an arc shape, and a plurality of slits (not shown) are provided on the arc surface along the axial direction. The conveyance guide member 36 can change the direction of the photosensitive web 12 in a substantially non-contact manner with the conveyance guide member 36 by ejecting a predetermined amount of air from the slit.

  A submerged turn bar 38 is disposed in the development stop processing tank 18 on the lower side, and the submerged turn bar 38 supports and changes the direction of the photosensitive web 12 so that the silver halide emulsion layer is not in contact. . The submerged turn bar 38 is formed with a plurality of slits (not shown) in the axial direction on the peripheral surface, and a predetermined amount of stop liquid 18A is ejected from the plurality of slits, whereby the photosensitive web 12 is submerged in the submerged turn bar. It floats from 38 and becomes non-contact. The photosensitive web 12 transported in the development stop processing tank 18 is scraped off by the air knife 34 disposed opposite to both surfaces of the photosensitive web 12 at the exit of the development stop processing tank 18 to stop development. The toner is introduced into the next fixing tank 20 through a conveyance guide member 36 disposed above the processing tank 18 and the fixing tank 20.

  Thereafter, similar to the development processing tank 16 described above, the photosensitive web 12 is redirected by the three submerged turn bars 40 disposed in the fixing tank 20 so that the silver halide emulsion layer is not in contact with the fixing tank 20. At the outlet 20, the fixing solution 20 </ b> A is scraped off by an air knife 34 disposed opposite to both surfaces of the photosensitive web 12, and passes through a conveyance guide member 36 disposed above the fixing tank 20 and the first washing tank 22. It introduce | transduces into the following 1st washing tank 22. FIG. The submerged turn bar 40 is configured such that a predetermined amount of the fixing solution 20A is ejected from a plurality of slits formed in the axial direction on the peripheral surface, whereby the photosensitive web 12 floats from the submerged turn bar 40 and is not contacted. Become.

  Thereafter, the direction of the photosensitive web 12 is changed by the submerged turn bar 42 in the first washing tank 22 so that the silver halide emulsion layer is not in contact with the photosensitive web 12, and faces the both sides of the photosensitive web 12 at the outlet of the first washing tank 22. The cleaning liquid is scraped off by the air knife 34 arranged in this manner, and is introduced into the second water washing tank 24 through the conveyance guide member 36 arranged above the first water washing tank 22 and the second water washing tank 24. Further, the direction of the photosensitive web 12 is changed by the submerged turn bar 44 in the second washing tank 24 while the silver halide emulsion layer is not in contact. The submerged turn bars 42 and 44 are configured such that a predetermined amount of pure water 22A and 24A is ejected from a plurality of slits formed in the axial direction on the peripheral surface, whereby the photosensitive web 12 is ejected from the submerged turn bars 42 and 44. Levitation and non-contact.

  Two pairs of air knives 34 are arranged at the outlet of the second rinsing tank 24 so as to face both surfaces of the photosensitive web 12, and the photosensitive web 12 coming out of the second rinsing tank 24 is blown out from the air knife 34. The cleaning liquid is scraped off by the air to be transported to the drying device 26 through the transport guide member 36 disposed at the upper part of the second water washing tank 24.

  In the drying device 26, both surfaces of the photosensitive web 12 are dried by the warm air generated from the warm air generating device 28, and the photosensitive web 12 is conveyed through the support roller 14 disposed on the upper portion of the drying device 26. Further, the processing device 10 is provided with a delivery roller (not shown) for sending the photosensitive web 12 upstream of the development processing tank 16, and a take-up roller for winding the photosensitive web 12 downstream of the hot air generator 28. The photosensitive web 12 is transported at a constant transport speed by the rotation of the feed roller (not illustrated) and the take-up roller (not illustrated). Although not shown, the processing apparatus 10 has a torque adjusting mechanism so that the photosensitive web 12 can be conveyed with a constant tension. The conveyance speed of the photosensitive web 12 is preferably 4 m / min to 50 m / min, more preferably 8 m / min to 30 m / min, and even more preferably 10 m / min to 20 m / min.

  Further, if the conveyance speed of the photosensitive web 12 is less than 4 m / min, it is difficult to stably convey the photosensitive web 12 without contacting the submerged turn bar 30 in the development processing tank 16. Further, if the conveying speed of the photosensitive web 12 is higher than 50 m / min, the liquid boundary film of the silver halide emulsion layer cannot be almost uniformly broken, and it is difficult to effectively suppress the development unevenness. Become.

  In such a processing apparatus 10, the photosensitive web 12 is developed into the development processing tank 16, the development stop processing tank 18, and the fixing tank by a plurality of support rollers 14, 32, 34 and submerged turn bars 30, 38, 40, 42, 44, etc. 20, development, development stop, fixing, and washing are performed by being conveyed through the first washing tank 22 and the second washing tank 24. As a result, a photosensitive web 12 on which a fine-line mesh developed silver image (conductive film) is formed is obtained.

  In the processing apparatus 10, a development stop processing tank 18 in which a stop liquid 18 </ b> A is stored is disposed between the development processing tank 16 and the fixing tank 20. The stop liquid 18A is preferably pH 1 or more and pH 5 or less, more preferably pH 2 or more and pH 3 or less. If the pH of the stop solution is out of the range of pH 1 or more and pH 5 or less, it becomes impossible to effectively suppress the silver in the developer from locally depositing on the silver wire edge portion of the conductive material. For example, acetic acid, succinic acid, maleic acid, citric acid or the like is used as the stop liquid 18A. In this embodiment, 5% acetic acid is used.

  Here, development processing techniques used for silver salt photographic films, printing plate-making films, photomask emulsion masks, and the like can be applied to the development, fixing, and washing processes. A developing solution, a fixing solution, and a cleaning solution can be appropriately applied according to these. For example, the developer is not particularly limited, but PQ developer, MQ developer, MAA developer and the like can also be used. For example, CN-16, CR-56, CP45X, FD-3 manufactured by FUJIFILM Corporation. Developers such as C-41, E-6, RA-4, D-19, and D-72 manufactured by KODAK, Papitol, or a developer included in the kit, and a lith developer such as D-85 Can be used. The fixing process is performed for the purpose of removing and stabilizing the silver salt in the unexposed part.

  In this embodiment, a protective layer is not provided on the surface of the silver halide emulsion layer of the photosensitive web 12. Further, the tension when the photosensitive web 12 is conveyed is preferably 3 N / m or more and 150 N / m or less. If the tension is less than 3 N / m, the support rollers 14, 34, etc. will not rotate, and the film may be damaged. On the other hand, if it exceeds 150 N / m, wrinkles may occur on the photosensitive web 12, and the film may come into contact with the surface of the turnbar in the liquid and damage the developed silver image.

  Next, the operation of the processing apparatus 10 to which the conductive material processing method of the present embodiment is applied will be described.

  In the processing apparatus 10, the photosensitive web 12 is developed into a development processing tank 16, a development stop processing tank 18, a fixing tank 20, a first tank by a plurality of support rollers 14, 32, 34 and submerged turn bars 30, 38, 40, 42, 44. The inside of the 1 water washing tank 22 and the 2nd water washing tank 24 is conveyed. As a result, each process of development, development stop, fixing, and washing is performed on the photosensitive web 12. Then, the photosensitive web 12 is dried by the drying device 26 to obtain the photosensitive web 12 (conductive material) on which a fine-line mesh-shaped developed silver image (conductive film) is formed. The photosensitive web 12 obtained by processing by the processing apparatus 10 can be suitably used for a light-transmitting electromagnetic wave shielding film. That is, a light-transmitting electromagnetic wave shielding film is formed by applying a predetermined amount of metal to a thin-line mesh silver pattern expressed by processing the photosensitive web 12 by the processing apparatus 10 by plating treatment of Cu, Ag or the like. The

  In this processing apparatus 10, since the photosensitive web 12 is conveyed in a non-contact manner by the three submerged turn bars 30 in the development processing tank 16, scratches are generated in the silver halide emulsion layer on the surface of the photosensitive web 12. Can be suppressed. Moreover, since the back surface of the photosensitive web 12 and the submerged turn bar 30 are not in contact with each other, it is possible to suppress the generation of scratches on the back surface of the photosensitive web 12.

  Also, a plurality of spraying devices 50 for spraying the developer 16A on both surfaces of the photosensitive web 12 are provided at the upstream and downstream portions of the three submerged turn bars 30 in the developing tank 16, respectively. The developer 16 </ b> A is sprayed on both surfaces of the photosensitive web 12 from the plurality of nozzles 50 </ b> A of the apparatus 50. Thereby, the developer 16A in the vicinity of both surfaces of the photosensitive web 12 is disturbed, and the same developer 16A is suppressed from staying in the vicinity of both surfaces of the photosensitive web 12. Particularly, when the vicinity of the silver halide emulsion layer on the surface of the photosensitive web 12 is disturbed, the liquid boundary film of the silver halide emulsion layer is destroyed, and the same development is performed in the vicinity of the silver halide emulsion layer on the surface of the photosensitive web 12. The retention of the liquid 16A is suppressed. For this reason, the development reaction of the photosensitive web 12 is promoted, and the occurrence of development unevenness can be suppressed. Therefore, even when the photosensitive web 12 is conveyed in the developer 16A at a relatively high speed of 4 m / min or more, particularly 8 m / min or more, the occurrence of development unevenness can be suppressed.

  The photosensitive web 12 is not provided with a protective layer on the surface of the silver halide emulsion layer. In the case where a protective layer is not substantially provided on the surface of the silver halide emulsion layer, the silver halide emulsion layer of the photosensitive web 12 is a soft film in a wet state, so that the silver halide emulsion layer is easily scratched. However, in the processing apparatus 10, even if the photosensitive web 12 has no protective layer on the surface or the photosensitive layer has a very thin thickness (for example, the protective layer has a thickness of 0.5 μm or less), the silver halide emulsion layer The generation of scratches can be suppressed.

  Since a general photographic photosensitive material is not subjected to plating after development processing, a sufficient protective layer that can withstand conveyance by a pair of conveyance rollers can be provided on the emulsion surface. It was not necessary to use the processing apparatus 10 of the invention. In order to apply plating after development, it is necessary that the silver wire is exposed on the surface after development. Therefore, a protective layer is not provided on the silver halide emulsion layer, and the halogen of the photosensitive web 12 as in the processing apparatus 10 of the present invention. It was necessary to perform development processing in a non-contact manner on the silver halide emulsion layer.

  Further, in the processing apparatus 10, a development stop processing tank 18 in which a stop solution 18 </ b> A is stored is disposed between the development processing tank 16 and the fixing tank 20, and the photosensitive web 12 exiting the development processing tank 16 is It is transported into the development stop processing tank 18 and development stop processing is performed.

  In the case where the development stop processing tank 18 is not provided between the development processing tank 16 and the fixing tank 20, local runaway of development (1 of dissolution physics phenomenon) in the squeeze part at the initial stage of fixing after development or at the inlet of the fixing tank after development. Depending on the seed, bleeding of the edge of the silver wire, jaggedness, dendritic silver deposition (black spots), and uneven stripes are likely to occur. Blemish and jagged defects on these silver wire edges can be seen with the transmitted light after development, but when the transparent conductive film precursor (developed product before plating) is plated, the above silver wire Edge defects are amplified by plating and can be seen through. In order to obtain an electromagnetic wave shielding film for a PDP (plasma display panel), unevenness that is visible through transmission becomes a failure. In particular, in a photosensitive web without a protective layer, local runaway of development develops remarkably, and as the transport speed increases, the developer that can be squeezed and increases, the unevenness tends to become severe.

  In the processing apparatus 10 of the present embodiment, the photosensitive web 12 exiting the development processing tank 16 is conveyed into the development stop processing tank 18 and subjected to the development stop processing, thereby causing local runaway of development, that is, in the developer. It is possible to suppress the phenomenon that the silver halide dissolved in a minute amount comes into contact with the fixing solution, and the silver in the developer is locally deposited on the silver wire of the photosensitive web 12. For this reason, it is possible to suppress the occurrence of defects such as bleeding and jaggedness of the silver wire edge portion of the photosensitive web 12, and a smooth silver wire edge portion can be obtained.

  Next, another embodiment of the processing apparatus of the present invention will be described.

  FIG. 2 shows a development processing tank 60 used in the processing apparatus according to the second embodiment of the present invention. In addition, the same code | symbol is provided to the member same as 1st Embodiment, and the overlapping description is abbreviate | omitted. As shown in FIG. 2, in the developing tank 60, two lower liquid turn bars 62 and two upper support rollers 64 are arranged in a staggered pattern. Guide rollers 65 for guiding the photosensitive web 12 on the back side of the photosensitive web 12 are disposed at positions upstream and downstream in the conveying direction of the photosensitive web 12 at positions close to the submerged turn bar 62. A plurality of spraying devices 50 that spray the developer 16 </ b> A onto the surface of the photosensitive web 12 are disposed on the upstream side and the downstream side of the two submerged turn bars 62 in the conveying direction of the photosensitive web 12. Further, a plurality of guide rollers 66 for guiding the photosensitive web 12 on the back side of the photosensitive web 12 are disposed at positions facing the plurality of spraying devices 50 with the photosensitive web 12 interposed therebetween.

  As shown in FIG. 3, the spraying device 50 is provided with four nozzles 50 </ b> A along the axial direction on the circumferential surface of the cylindrical member, and the developer 16 </ b> A sprays the surface of the photosensitive web 12 from the nozzles 50 </ b> A. It is done. The developer 16A sprayed from the nozzle 50A onto the surface of the photosensitive web 12 flows in the vertical direction on the surface of the photosensitive web 12 as shown by the arrows in FIG. As shown in FIG. 2, the developing tank 60 is provided with a tube 68 into which the developing solution 16 </ b> A in the developing tank 60 is introduced, and the tube 68 is connected to the submerged turn bar 62 through a pump 70. Has been. The submerged turn bar 62 is made of a cylindrical member, and includes a plurality of slits along the axial direction on the circumferential surface. The developer 16A introduced into the submerged turn bar 62 through the tube 68 by the pump 70 is jetted into the developing tank 60 from a plurality of slits as indicated by arrows in FIG. As a result, the photosensitive web 12 floats with respect to the submerged turn bar 62, and the direction is changed while the silver halide emulsion layer of the photosensitive web 12 is supported in a non-contact manner. Further, a support roller 14 is disposed at the top of the development processing tank 60 at the outlet of the development processing tank 60, and a pressing roller 72 is disposed at a position facing the support roller 14 with the photosensitive web 12 interposed therebetween. Yes.

  In such a development processing tank 16, since the surface of the photosensitive web 12 is conveyed in a non-contact manner by the two submerged turn bars 30, the generation of scratches on the silver halide emulsion layer on the surface of the photosensitive web 12 is suppressed. can do. In addition, a plurality of spraying devices 50 for spraying the developer 16 </ b> A onto the surface of the photosensitive web 12 are provided on the upstream side and the downstream side of the two submerged turn bars 30 in the development processing tank 16. Is guided to the surface of the photosensitive web 12 from the plurality of nozzles 50A of the spraying device 50 in a state where the developer 16A is guided by the guide roller 66. As a result, the vicinity of the silver halide emulsion layer on the surface of the photosensitive web 12 is disturbed, the liquid boundary film of the silver halide emulsion layer is destroyed, and the same developer 16A stays in the vicinity of the surface of the photosensitive web 12. It is suppressed. For this reason, the development reaction is promoted, and the occurrence of development unevenness can be suppressed. Therefore, even when the photosensitive web 12 is conveyed in the developer 16A at a relatively high speed of 4 m / min or more, particularly 8 m / min or more, the occurrence of development unevenness can be suppressed.

  FIG. 4 shows a blade as disturbance means used in the processing apparatus according to the third embodiment of the present invention. In addition, the same code | symbol is provided to the member same as 1st Embodiment and 2nd Embodiment, and the overlapping description is abbreviate | omitted. As shown in FIG. 4, a blade 80 supported by a support 82 is disposed at a position facing the surface of the photosensitive web 12. The blade 80 is formed of a thin plate member that can be elastically deformed. As shown in FIG. 4A, when the photosensitive web 12 is stationary, the tip 80A of the blade 80 is in contact with the surface of the photosensitive web 12. As shown in FIG. 4B, when the photosensitive web 12 is conveyed in the direction of the arrow, the blade 80 is elastically deformed by the flow of the developer, and the tip 80A is separated from the surface of the photosensitive web 12. As a result, the tip 80A of the blade 80 is in a state of facing the surface of the photosensitive web 12 at a predetermined interval.

  In this embodiment, a urethane blade having a thickness of 0.5 mm and a length of 20 mm is used as the blade 80. Further, the blade 80 has a hardness (JISA hardness) of 50 to 90 degrees. In the present embodiment, when the photosensitive web 12 is conveyed, the distance between the tip 80A of the blade 80 and the photosensitive web 12 is adjusted to 0.1 to 0.5 mm.

  In such a blade 80, as shown in FIG. 4B, when the photosensitive web 12 is conveyed in the direction of the arrow, the tip 80A of the blade 80 is formed on the surface of the photosensitive web 12 by a flow of the developer. It will be in the state which opposed at intervals. The tip 80A of the blade 80 disturbs the developer near the silver halide emulsion layer on the surface of the photosensitive web 12, destroys the liquid boundary film of the silver halide emulsion layer, and closes the surface of the photosensitive web 12 to the vicinity. It is suppressed that the same developing solution stays. For this reason, the development reaction is promoted, and the occurrence of development unevenness can be suppressed. Therefore, even when the photosensitive web 12 is conveyed in the developer 16A at a relatively high speed of 4 m / min or more, particularly 8 m / min or more, the occurrence of development unevenness can be suppressed.

  Further, instead of the blade 80, a rigid plate-like baffle plate (plate-like body) may be fixedly supported so as to face the surface of the photosensitive web 12 at a predetermined interval. At this time, the distance between the baffle plate and the photosensitive web 12 is preferably set to 0.1 to 0.5 mm. Even when a baffle plate having rigidity is provided, the developer in the vicinity of the silver halide emulsion layer on the surface of the photosensitive web 12 is disturbed by the baffle plate, and the liquid boundary film of the silver halide emulsion layer is destroyed. It is suppressed that the same developing solution stays in the vicinity of the surface of 12. For this reason, the occurrence of development unevenness can be suppressed.

  FIG. 5 shows a roller as disturbance means used in the processing apparatus according to the fourth embodiment of the present invention. In addition, the same code | symbol is provided to the member same as 1st-3rd embodiment, and the overlapping description is abbreviate | omitted. As shown in FIG. 5, a roller 90 is disposed at a position facing the surface of the photosensitive web 12. The roller 90 includes a cylindrical roller portion 90A facing the surface of the photosensitive web 12 at a predetermined interval along the axial direction, and a circular flange portion 90B having a larger radius than the roller portion 90A at both ends of the roller portion 90A. It is equipped with. The flange portion 90B is disposed so as to come into contact with both end portions of the circumferential surface of the guide roller 66 on both sides in the width direction of the photosensitive web 12, and the roller portion 90A and the surface of the photosensitive web 12 are predetermined by the flange portion 90B. It will be in the state which opposed at intervals. The interval between the roller portion 90A and the photosensitive web 12 is set to 0.1 to 0.5 mm.

  In such a roller 90, since the roller portion 90A faces the surface of the photosensitive web 12 at a predetermined interval, the developing solution near the silver halide emulsion layer on the surface of the photosensitive web 12 is disturbed by the roller portion 90A. In addition, the liquid boundary film of the silver halide emulsion layer is destroyed, and the same developer is prevented from staying in the vicinity of the surface of the photosensitive web 12. For this reason, the development reaction is promoted, and the occurrence of development unevenness can be suppressed. Therefore, even if the photosensitive web 12 is transported in the developer at a relatively high speed of 4 m / min or more, particularly 8 m / min or more, development unevenness can be suppressed.

  Next, using the processing apparatus 10, an experiment was conducted to examine the development unevenness of the photosensitive web 12 and the scratch state of the silver halide emulsion layer.

  In the spraying device 50, the amount of developer sprayed from the nozzle 50A was set to 5 to 10 l / min × 4, and the size of the nozzle 50A was set to 0.5 mm in width and 180 mm in length. The interval between the nozzle 50A and the photosensitive web 12 was set to 3 to 5 mm. As the blade 80, a urethane blade having a thickness of 0.5 mm and a length of 20 mm was used, and the hardness (JISA hardness) of the blade 80 was set to 50 to 90 degrees. The distance between the baffle plate and the roller 90 was set to 0.1 to 0.5 mm between the photosensitive web 12. Under this condition, the development of the photosensitive web 12 was carried out to examine the development unevenness of the photosensitive web 12 and the occurrence of scratches in the silver halide emulsion layer. The photosensitive web 12 used was a silver halide emulsion layer having no protective layer on the surface. The results of this experiment are shown in Table 1. In Table 1, the case of very good was evaluated as ◎, the case of good was evaluated as ◯, and the case where a small amount of scratches or development unevenness was observed was evaluated as △.

表１に示されるように、吹き付け装置５０では、感光ウエブ１２の現像ムラ、キズともに極めて良好であることが確認された。また、ブレード８０では、感光ウエブ１２の現像ムラ、キズともにほぼ良好であることが確認された。さらに、邪魔板、ローラ９０では、感光ウエブ１２の現像ムラは良好であるが、キズが少量発生することがわかった。従って、本発明の撹乱手段によれば、感光ウエブ１２の現像ムラを抑制できると共に、ハロゲン化銀乳剤層のキズの発生を低減できることがわかった。

As shown in Table 1, in the spraying device 50, it was confirmed that both development unevenness and scratches on the photosensitive web 12 were extremely good. In addition, it was confirmed that in the blade 80, both development unevenness and scratches on the photosensitive web 12 were almost satisfactory. Further, it was found that the baffle plate and the roller 90 have good development unevenness on the photosensitive web 12, but a small amount of scratches occurred. Therefore, it has been found that according to the disturbing means of the present invention, the uneven development of the photosensitive web 12 can be suppressed and the generation of scratches in the silver halide emulsion layer can be reduced.

  Next, the photosensitive web 12 will be described. The photosensitive web 12 is, for example, a long and wide flexible base material made of a photosensitive material provided with a silver salt-containing layer (in this embodiment, a silver halide emulsion layer) containing a silver salt on a light-transmitting support. is there. In this embodiment, a protective layer is not substantially provided on the silver salt-containing layer. However, a protective layer may be provided on the silver salt-containing layer. And a layer made of a binder such as a polymer, and is formed on the silver salt-containing layer in order to exhibit the effects of preventing scratches and improving mechanical properties. It is preferable that the thickness of a protective layer is 0.02-20 micrometers, More preferably, it is 0.1-10 micrometers, More preferably, it is 0.3-3 micrometers.

  The composition of these silver salt-containing layers and protective layers includes silver halide emulsion layers (silver salt-containing layers) and protective layers applied to silver salt photographic films, photographic paper, printing plate-making films, emulsion masks for photomasks, etc. Layers can be applied as appropriate.

  In particular, as the photosensitive web 12 (photosensitive material), a silver salt photographic film (silver salt photosensitive material) is preferable, and a black and white silver salt photographic film (black and white silver salt photosensitive material) is the best. The silver salt applied to the silver salt-containing layer is most preferably silver halide.

  On the other hand, as the light-transmitting support, a single-layer plastic film or a multilayer film in which two or more layers are combined can be applied. Examples of the raw material for the plastic film include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate; polyolefins such as polyethylene (PE), polypropylene (PP), polystyrene, and EVA; polyvinyl chloride, polyvinylidene chloride, and the like. In addition, use polyetheretherketone (PEEK), polysulfone (PSF), polyethersulfone (PES), polycarbonate (PC), polyamide, polyimide, acrylic resin, triacetylcellulose (TAC), etc. Can do.

  Among these, from the viewpoint of transparency, heat resistance, ease of handling, and cost, the plastic film as the support is a polyethylene terephthalate film or cellulose triacetate film that is usually applied to silver salt photographic films (silver salt photosensitive materials). In addition, a polyimide film is preferable. Particularly preferred is a polyethylene terephthalate film.

  Moreover, since the electromagnetic shielding material for displays requires transparency, it is desirable that the support has high transparency. In this case, the total visible light transmittance of the light transmissive support is preferably 70 to 100%, more preferably 85 to 100%, and particularly preferably 90 to 100%.

  The width of the photosensitive web 12 is, for example, 50 cm or more, and the thickness is preferably 50 to 200 μm.

  In addition, although this embodiment demonstrated the apparatus and manufacturing method which manufacture a light-transmitting electromagnetic wave shielding material, it is not restricted to this, For example, it has a fine line pattern which consists of fine electroconductive metal parts, such as other industrial goods The present invention can also be applied as a manufacturing apparatus and a manufacturing method of a light transmissive conductive material.

It is a schematic block diagram which shows the processing apparatus of the electroconductive material to which the processing method of the electroconductive material in 1st Embodiment of this invention was applied. It is a block diagram which shows the image development processing tank used for the processing apparatus of the electroconductive material in 2nd Embodiment of this invention. It is sectional drawing which shows the spraying apparatus shown by FIG. It is a block diagram which shows the braid | blade used for the processing apparatus of the electroconductive material in 3rd Embodiment of this invention. It is a block diagram which shows the roller used for the processing apparatus of the electroconductive material in 3rd Embodiment of this invention.

Explanation of symbols

10 Processing device 12 Photosensitive web (conductive material precursor)
16 Development tank 16A Developer 30 Submerged turn bar (conveyance guide member)
34 Air knife 36 Conveying guide member 50 Spraying device (disturbing means)
50A Nozzle 60 Guide roller 60 Development processing tank 62 Submerged turn bar (conveyance guide member)
80 blade (disturbing means)
80A tip 90 roller (disturbing means)
90A Roller part (disturbing means)

Claims (9)

A method of developing a conductive material, wherein a conductive pattern is formed by exposing and developing a conductive material precursor having at least one silver salt-containing layer on a support,
The conductive material precursor is transported in a developing solution at a transport speed of 4 m / min to 50 m / min so that a transport guide member does not contact the silver salt-containing layer,
A developing method for a conductive material, wherein the developing solution in the vicinity of the silver salt-containing layer is disturbed at least at one or more locations in the developing solution.   2. The method for developing a conductive material according to claim 1, wherein the conductive material precursor having a silver salt-containing layer substantially not provided with a protective layer is exposed and developed. A conductive material development processing apparatus for forming a conductive pattern by exposing and developing a conductive material precursor having at least one silver salt-containing layer on a support,
A developing tank filled with a developing solution;
Conveying means for conveying the conductive material precursor at a conveying speed of 4 m / min to 50 m / min;
A conveyance guide member provided in the development processing tank and configured to convey the conductive material precursor so as not to contact the silver salt-containing layer;
Disturbing means provided in the developing processing tank, for disturbing the developing processing solution in the vicinity of the silver salt-containing layer in at least one place,
An apparatus for developing a conductive material, comprising:   The developing device for a conductive material according to claim 3, wherein the disturbing unit is a spraying device including a nozzle for spraying a developing solution onto the silver salt-containing layer.   4. The development of a conductive material according to claim 3, wherein the disturbing means is a blade that is elastically deformable and faces the silver salt-containing layer at a predetermined interval when the conductive material precursor is conveyed. Processing equipment.   4. The development processing apparatus for a conductive material according to claim 3, wherein the disturbing means is a plate-like body fixedly supported at a predetermined interval from the silver salt-containing layer.   The developing apparatus for conductive material according to claim 3, wherein the disturbing unit is a roller disposed at a predetermined interval from the silver salt-containing layer.   The conductive material according to any one of claims 3 to 7, wherein the conductive material precursor having a silver salt-containing layer substantially not provided with a protective layer is exposed and developed. Development processing equipment for functional materials.   The conductive material according to any one of claims 3 to 8, wherein the transport guide member is a submerged turn bar that changes the direction of the conductive material precursor in a developing solution. Development processing equipment.

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