JP2009070722A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2009070722A5 JP2009070722A5 JP2007239149A JP2007239149A JP2009070722A5 JP 2009070722 A5 JP2009070722 A5 JP 2009070722A5 JP 2007239149 A JP2007239149 A JP 2007239149A JP 2007239149 A JP2007239149 A JP 2007239149A JP 2009070722 A5 JP2009070722 A5 JP 2009070722A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- insulating film
- mol
- general formula
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000203 mixture Substances 0.000 claims description 17
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 150000001875 compounds Chemical class 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- -1 2-phenylpropyl group Chemical group 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 7
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 6
- 239000000178 monomer Substances 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- 229920000620 organic polymer Polymers 0.000 claims description 5
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 claims description 4
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 4
- MPXKIFWZOQVOLN-UHFFFAOYSA-N 1-(1-adamantyl)adamantane Chemical compound C1C(C2)CC(C3)CC2CC13C(C1)(C2)CC3CC2CC1C3 MPXKIFWZOQVOLN-UHFFFAOYSA-N 0.000 claims description 2
- YOKBFUOPNPIXQC-UHFFFAOYSA-N anti-tetramantane Chemical compound C1C(CC2C3C45)CC6C2CC52CC5CC7C2C6C13CC7C4C5 YOKBFUOPNPIXQC-UHFFFAOYSA-N 0.000 claims description 2
- AMFOXYRZVYMNIR-UHFFFAOYSA-N ctk0i0750 Chemical compound C12CC(C3)CC(C45)C1CC1C4CC4CC1C2C53C4 AMFOXYRZVYMNIR-UHFFFAOYSA-N 0.000 claims description 2
- ZICQBHNGXDOVJF-UHFFFAOYSA-N diamantane Chemical compound C1C2C3CC(C4)CC2C2C4C3CC1C2 ZICQBHNGXDOVJF-UHFFFAOYSA-N 0.000 claims description 2
- OOHPORRAEMMMCX-UHFFFAOYSA-N dodecahedrane Chemical group C12C(C3C45)C6C4C4C7C6C2C2C7C6C4C5C4C3C1C2C46 OOHPORRAEMMMCX-UHFFFAOYSA-N 0.000 claims description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 229920001296 polysiloxane Polymers 0.000 claims 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 125000002252 acyl group Chemical group 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000000304 alkynyl group Chemical group 0.000 claims 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 230000000379 polymerizing effect Effects 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007239149A JP2009070722A (ja) | 2007-09-14 | 2007-09-14 | 絶縁膜形成用組成物および電子デバイス |
| US12/209,480 US7820748B2 (en) | 2007-09-14 | 2008-09-12 | Insulating film forming composition and electronic device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007239149A JP2009070722A (ja) | 2007-09-14 | 2007-09-14 | 絶縁膜形成用組成物および電子デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009070722A JP2009070722A (ja) | 2009-04-02 |
| JP2009070722A5 true JP2009070722A5 (enExample) | 2010-04-08 |
Family
ID=40455279
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007239149A Abandoned JP2009070722A (ja) | 2007-09-14 | 2007-09-14 | 絶縁膜形成用組成物および電子デバイス |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7820748B2 (enExample) |
| JP (1) | JP2009070722A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6046038B2 (ja) * | 2011-07-11 | 2016-12-14 | 株式会社トクヤマ | フォトクロミック硬化性組成物 |
| JP2014141626A (ja) * | 2012-12-28 | 2014-08-07 | Konica Minolta Inc | 塗布液、反射膜、反射シート、太陽電池モジュール、led照明装置および実装用基板 |
| CN109792003B (zh) * | 2016-12-22 | 2020-10-16 | 广州华睿光电材料有限公司 | 基于狄尔斯-阿尔德反应的可交联聚合物及其在有机电子器件中的应用 |
| KR102445179B1 (ko) | 2017-10-26 | 2022-09-21 | 시예드 타이무르 아흐마드 | 소수성, 올레포빅 및 올레필릭 코팅용 비-뉴턴 유체를 포함하는 조성물, 및 그의 사용 방법 |
| US11015082B2 (en) * | 2017-12-19 | 2021-05-25 | Honeywell International Inc. | Crack-resistant polysiloxane dielectric planarizing compositions, methods and films |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0810567B2 (ja) * | 1987-01-28 | 1996-01-31 | 古河電気工業株式会社 | 自己潤滑性を有する絶縁電線 |
| JP3151836B2 (ja) * | 1991-01-30 | 2001-04-03 | 住友電気工業株式会社 | 自己融着性絶縁電線及びそれを用いたコイル |
| US5965679A (en) * | 1996-09-10 | 1999-10-12 | The Dow Chemical Company | Polyphenylene oligomers and polymers |
| US6252030B1 (en) * | 1999-03-17 | 2001-06-26 | Dow Corning Asia, Ltd. | Hydrogenated octasilsesquioxane-vinyl group-containing copolymer and method for manufacture |
| US6451437B1 (en) * | 1999-10-13 | 2002-09-17 | Chugoku Marine Paints, Ltd. | Curable composition, coating composition, paint, antifouling paint, cured product thereof and method of rendering base material antifouling |
| US6465368B2 (en) * | 2000-05-16 | 2002-10-15 | Jsr Corporation | Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film |
| EP1355963B1 (en) * | 2000-12-19 | 2006-04-12 | Bausch & Lomb Incorporated | Polymeric biomaterials containing silsesquioxane monomers |
| US6632748B2 (en) * | 2001-03-27 | 2003-10-14 | Samsung Electronics Co., Ltd. | Composition for preparing substances having nano-pores |
| US6936537B2 (en) * | 2001-06-19 | 2005-08-30 | The Boc Group, Inc. | Methods for forming low-k dielectric films |
| JP2003176352A (ja) | 2001-12-11 | 2003-06-24 | Sumitomo Bakelite Co Ltd | 絶縁膜用材料、絶縁膜用コーティングワニス及びこれらを用いた絶縁膜並びに半導体装置 |
| US7012746B2 (en) * | 2002-05-20 | 2006-03-14 | Eastman Kodak Company | Polyvinyl butyral films prepared by coating methods |
| KR100532915B1 (ko) * | 2002-10-29 | 2005-12-02 | 삼성전자주식회사 | 단당류계 또는 올리고당류계 포로젠을 포함하는 다공성층간 절연막을 형성하기 위한 조성물 |
| TW200413417A (en) * | 2002-10-31 | 2004-08-01 | Arch Spec Chem Inc | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof |
| KR100533538B1 (ko) * | 2002-12-03 | 2005-12-05 | 삼성전자주식회사 | 새로운 기공형성물질을 포함하는 다공성 층간 절연막을형성하기 위한 조성물 |
| US20040120915A1 (en) * | 2002-12-19 | 2004-06-24 | Kaiyuan Yang | Multifunctional compositions for surface applications |
| JP4479160B2 (ja) * | 2003-03-11 | 2010-06-09 | チッソ株式会社 | シルセスキオキサン誘導体を用いて得られる重合体 |
| TWI278473B (en) * | 2003-03-12 | 2007-04-11 | Chisso Corp | Polymer with the silsesquioxane skeleton in its main chain, method of forming the same, and coating film and membrane of preventing metal ion elution |
| US7135433B2 (en) * | 2003-09-17 | 2006-11-14 | Eastman Kodak Company | Thermal print assembly |
| JP4878779B2 (ja) | 2004-06-10 | 2012-02-15 | 富士フイルム株式会社 | 膜形成用組成物、絶縁膜及び電子デバイス |
| JP4516857B2 (ja) | 2005-02-28 | 2010-08-04 | 富士フイルム株式会社 | カゴ構造を有する重合体、それを含む膜形成用組成物、絶縁膜および電子デバイス |
| TW200714636A (en) * | 2005-09-05 | 2007-04-16 | Fuji Photo Film Co Ltd | Composition, film and producing method therefor |
| JP2007119706A (ja) | 2005-09-28 | 2007-05-17 | Fujifilm Corp | 重合体および膜形成用組成物 |
| US20070135603A1 (en) * | 2005-12-09 | 2007-06-14 | Fujifilm Corporation | Film, film forming composition and electronic device having the film |
| US20070135585A1 (en) * | 2005-12-09 | 2007-06-14 | Fujifilm Corporation | Film forming composition, insulating film using the composition, and electronic device having the insulating film |
| JP2007211104A (ja) * | 2006-02-08 | 2007-08-23 | Fujifilm Corp | 重合体の製造方法、重合体、膜形成用組成物、絶縁膜及び電子デバイス |
| US7612155B2 (en) * | 2006-04-26 | 2009-11-03 | Fujifilm Corporation | Film forming composition, insulating film formed by use of the composition, and electronic device |
| JP5018065B2 (ja) * | 2006-12-15 | 2012-09-05 | Jnc株式会社 | ポリシロキサン化合物とその製造方法 |
-
2007
- 2007-09-14 JP JP2007239149A patent/JP2009070722A/ja not_active Abandoned
-
2008
- 2008-09-12 US US12/209,480 patent/US7820748B2/en not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2009070722A5 (enExample) | ||
| JP2014237844A5 (enExample) | ||
| JP2010519375A5 (enExample) | ||
| JP2014516210A5 (enExample) | ||
| JP2013546173A5 (enExample) | ||
| JP2014111765A5 (enExample) | ||
| JP2011514399A5 (enExample) | ||
| JP2009541548A5 (enExample) | ||
| JP2013057058A5 (ja) | ブロック共重合体の塗膜 | |
| MX2014005959A (es) | Metodo para la elaboracion de un separador polimerico con electrolito, y el separador polimerico con electrolito resultante. | |
| JP2014043565A5 (enExample) | ||
| JP2011509241A5 (enExample) | ||
| JP2012233099A5 (enExample) | ||
| JP2018507289A5 (enExample) | ||
| JP2015536376A5 (enExample) | ||
| JP2011529119A5 (enExample) | ||
| JP2008280420A5 (enExample) | ||
| JP2009530485A5 (enExample) | ||
| JP2014156461A5 (enExample) | ||
| JP2015506403A5 (enExample) | ||
| JP2008538221A5 (enExample) | ||
| JP2014040598A5 (enExample) | ||
| JP2017512670A5 (enExample) | ||
| JP2012512315A5 (enExample) | ||
| JP2011524908A5 (enExample) |