JP2009069829A5 - - Google Patents
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- Publication number
- JP2009069829A5 JP2009069829A5 JP2008234609A JP2008234609A JP2009069829A5 JP 2009069829 A5 JP2009069829 A5 JP 2009069829A5 JP 2008234609 A JP2008234609 A JP 2008234609A JP 2008234609 A JP2008234609 A JP 2008234609A JP 2009069829 A5 JP2009069829 A5 JP 2009069829A5
- Authority
- JP
- Japan
- Prior art keywords
- photoresist pattern
- mol
- photoresist
- methyl group
- examples
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- VLLPVDKADBYKLM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 VLLPVDKADBYKLM-UHFFFAOYSA-M 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20070092796A KR101492403B1 (ko) | 2007-09-12 | 2007-09-12 | 용해촉진제 및 이를 포함하는 포토레지스트 조성물 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009069829A JP2009069829A (ja) | 2009-04-02 |
| JP2009069829A5 true JP2009069829A5 (enExample) | 2011-10-06 |
Family
ID=40432222
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008234609A Pending JP2009069829A (ja) | 2007-09-12 | 2008-09-12 | 溶解促進剤及びこれを含むフォトレジスト組成物 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20090068585A1 (enExample) |
| JP (1) | JP2009069829A (enExample) |
| KR (1) | KR101492403B1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20120107653A (ko) | 2011-03-22 | 2012-10-04 | 삼성디스플레이 주식회사 | 감광성 수지 조성물 및 이를 이용한 패턴의 형성 방법 |
| US20140127625A1 (en) * | 2011-04-25 | 2014-05-08 | Orthogonal, Inc. | Orthogonal solvents and compatible photoresists for the photolithographic patterning of organic electronic devices |
| JPWO2019151429A1 (ja) * | 2018-01-31 | 2021-01-14 | Ｓｐｉｂｅｒ株式会社 | タンパク質繊維の製造方法 |
| CN113004291B (zh) * | 2019-12-20 | 2022-03-01 | 中国科学院化学研究所 | 基于金属卟啉的分子玻璃化学放大光刻胶及其制备方法和应用 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5683856A (en) * | 1994-10-18 | 1997-11-04 | Fuji Photo Film Co., Ltd. | Positive-working photosensitive composition |
| JP3340864B2 (ja) * | 1994-10-26 | 2002-11-05 | 富士写真フイルム株式会社 | ポジ型化学増幅レジスト組成物 |
| JP3075174B2 (ja) * | 1996-04-10 | 2000-08-07 | 信越化学工業株式会社 | ジフェニルモノテルペン炭化水素誘導体、溶解制御剤及び化学増幅ポジ型レジスト材料 |
| JP3676918B2 (ja) * | 1997-10-09 | 2005-07-27 | 富士通株式会社 | レジスト材料及びレジストパターンの形成方法 |
| JP2004012511A (ja) * | 2002-06-03 | 2004-01-15 | Matsushita Electric Ind Co Ltd | パターン形成方法 |
| JP4250937B2 (ja) * | 2002-09-25 | 2009-04-08 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物、パターンの製造法及び電子部品 |
| JP4705323B2 (ja) * | 2003-02-17 | 2011-06-22 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 |
| JP4230837B2 (ja) * | 2003-06-26 | 2009-02-25 | 東京応化工業株式会社 | 化学増幅型ポジ型ホトレジスト組成物 |
| JP2006290799A (ja) * | 2005-04-11 | 2006-10-26 | Idemitsu Kosan Co Ltd | レジスト添加剤及びそれを含有するレジスト組成物 |
| JP4736864B2 (ja) * | 2006-03-03 | 2011-07-27 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性ポリアミドイミド樹脂組成物、パターンの製造方法及び電子部品 |
-
2007
- 2007-09-12 KR KR20070092796A patent/KR101492403B1/ko active Active
-
2008
- 2008-09-11 US US12/208,880 patent/US20090068585A1/en not_active Abandoned
- 2008-09-12 JP JP2008234609A patent/JP2009069829A/ja active Pending
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