JP2009065015A5 - - Google Patents
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- Publication number
- JP2009065015A5 JP2009065015A5 JP2007232503A JP2007232503A JP2009065015A5 JP 2009065015 A5 JP2009065015 A5 JP 2009065015A5 JP 2007232503 A JP2007232503 A JP 2007232503A JP 2007232503 A JP2007232503 A JP 2007232503A JP 2009065015 A5 JP2009065015 A5 JP 2009065015A5
- Authority
- JP
- Japan
- Prior art keywords
- container
- semiconductor films
- semiconductor
- bond substrate
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 28
- 239000000758 substrate Substances 0.000 claims 17
- 238000003776 cleavage reaction Methods 0.000 claims 4
- 239000013078 crystal Substances 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 230000007017 scission Effects 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007232503A JP5255801B2 (ja) | 2007-09-07 | 2007-09-07 | 半導体装置の作製方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007232503A JP5255801B2 (ja) | 2007-09-07 | 2007-09-07 | 半導体装置の作製方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009065015A JP2009065015A (ja) | 2009-03-26 |
JP2009065015A5 true JP2009065015A5 (enrdf_load_stackoverflow) | 2010-09-30 |
JP5255801B2 JP5255801B2 (ja) | 2013-08-07 |
Family
ID=40559327
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007232503A Expired - Fee Related JP5255801B2 (ja) | 2007-09-07 | 2007-09-07 | 半導体装置の作製方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5255801B2 (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0819449D0 (en) * | 2008-10-23 | 2008-12-03 | Cambridge Display Tech Ltd | Display drivers |
KR101651206B1 (ko) * | 2009-05-26 | 2016-08-25 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Soi 기판의 제작 방법 |
JP5981424B2 (ja) * | 2010-06-11 | 2016-08-31 | クロスバー, インコーポレイテッドCrossbar, Inc. | メモリー素子に関する柱状構造及び方法 |
WO2025043446A1 (zh) * | 2023-08-28 | 2025-03-06 | 京东方科技集团股份有限公司 | 开关结构及其制备方法、射频芯片 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000012864A (ja) * | 1998-06-22 | 2000-01-14 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
EP1039513A3 (en) * | 1999-03-26 | 2008-11-26 | Canon Kabushiki Kaisha | Method of producing a SOI wafer |
JP3771084B2 (ja) * | 1999-04-30 | 2006-04-26 | Necエレクトロニクス株式会社 | 半導体集積回路装置用トレイ |
JP4378672B2 (ja) * | 2002-09-03 | 2009-12-09 | セイコーエプソン株式会社 | 回路基板の製造方法 |
JP4163478B2 (ja) * | 2002-09-25 | 2008-10-08 | トッパン・フォームズ株式会社 | チップ反転装置 |
JP4299721B2 (ja) * | 2003-12-09 | 2009-07-22 | 株式会社ルネサステクノロジ | 半導体装置の搬送方法および半導体装置の製造方法 |
JP4838504B2 (ja) * | 2004-09-08 | 2011-12-14 | キヤノン株式会社 | 半導体装置の製造方法 |
JP4687366B2 (ja) * | 2005-10-12 | 2011-05-25 | セイコーエプソン株式会社 | 半導体チップ収容トレイ及び半導体チップの搬送方法 |
US7696574B2 (en) * | 2005-10-26 | 2010-04-13 | International Business Machines Corporation | Semiconductor substrate with multiple crystallographic orientations |
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2007
- 2007-09-07 JP JP2007232503A patent/JP5255801B2/ja not_active Expired - Fee Related