JP2009056586A5 - - Google Patents

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Publication number
JP2009056586A5
JP2009056586A5 JP2008209144A JP2008209144A JP2009056586A5 JP 2009056586 A5 JP2009056586 A5 JP 2009056586A5 JP 2008209144 A JP2008209144 A JP 2008209144A JP 2008209144 A JP2008209144 A JP 2008209144A JP 2009056586 A5 JP2009056586 A5 JP 2009056586A5
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JP
Japan
Prior art keywords
polishing
filaments
polishing pad
abrasive
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008209144A
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English (en)
Japanese (ja)
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JP5452897B2 (ja
JP2009056586A (ja
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Publication date
Priority claimed from US11/893,495 external-priority patent/US7517277B2/en
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Publication of JP2009056586A publication Critical patent/JP2009056586A/ja
Publication of JP2009056586A5 publication Critical patent/JP2009056586A5/ja
Application granted granted Critical
Publication of JP5452897B2 publication Critical patent/JP5452897B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008209144A 2007-08-16 2008-08-15 化学機械研磨のための層状フィラメント格子 Active JP5452897B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/893,495 2007-08-16
US11/893,495 US7517277B2 (en) 2007-08-16 2007-08-16 Layered-filament lattice for chemical mechanical polishing

Publications (3)

Publication Number Publication Date
JP2009056586A JP2009056586A (ja) 2009-03-19
JP2009056586A5 true JP2009056586A5 (enExample) 2013-07-18
JP5452897B2 JP5452897B2 (ja) 2014-03-26

Family

ID=40032782

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008209144A Active JP5452897B2 (ja) 2007-08-16 2008-08-15 化学機械研磨のための層状フィラメント格子

Country Status (7)

Country Link
US (1) US7517277B2 (enExample)
EP (1) EP2025459B1 (enExample)
JP (1) JP5452897B2 (enExample)
KR (1) KR101539462B1 (enExample)
CN (1) CN101367202B (enExample)
SG (1) SG150465A1 (enExample)
TW (1) TWI446424B (enExample)

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US7530887B2 (en) * 2007-08-16 2009-05-12 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with controlled wetting
US8057287B2 (en) * 2009-08-10 2011-11-15 Hg Tools Co., Ltd. Abrasive mesh for a powered grinding wheel
JP2011115935A (ja) * 2009-10-30 2011-06-16 Toray Ind Inc 研磨パッドおよび研磨パッドの製造方法
US9950408B2 (en) * 2009-11-02 2018-04-24 Diamabrush Llc Abrasive pad
JP2011143533A (ja) * 2009-12-16 2011-07-28 Toray Ind Inc 研磨パッドおよび半導体ウエハの研磨方法
CN102229105A (zh) * 2011-06-28 2011-11-02 清华大学 化学机械抛光方法
US8894799B2 (en) * 2011-09-22 2014-11-25 Dow Global Technologies Llc Method of forming layered-open-network polishing pads
US8801949B2 (en) * 2011-09-22 2014-08-12 Dow Global Technologies Llc Method of forming open-network polishing pads
US9108291B2 (en) 2011-09-22 2015-08-18 Dow Global Technologies Llc Method of forming structured-open-network polishing pads
TWI516373B (zh) * 2014-01-17 2016-01-11 三芳化學工業股份有限公司 硏磨墊、硏磨裝置及製造硏磨墊之方法
US9873180B2 (en) 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US10821573B2 (en) 2014-10-17 2020-11-03 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US10875145B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US9776361B2 (en) 2014-10-17 2017-10-03 Applied Materials, Inc. Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
US10399201B2 (en) 2014-10-17 2019-09-03 Applied Materials, Inc. Advanced polishing pads having compositional gradients by use of an additive manufacturing process
SG10202002601QA (en) 2014-10-17 2020-05-28 Applied Materials Inc Cmp pad construction with composite material properties using additive manufacturing processes
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
CN113103145B (zh) 2015-10-30 2023-04-11 应用材料公司 形成具有期望ζ电位的抛光制品的设备与方法
US10593574B2 (en) 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
MX2018009428A (es) * 2016-02-22 2018-11-09 Almt Corp Herramienta abrasiva.
TWI713526B (zh) * 2016-05-20 2020-12-21 智勝科技股份有限公司 基底層、具有基底層的研磨墊及研磨方法
US10849660B2 (en) 2017-02-21 2020-12-01 Diamabrush Llc Sanding screen device
CN106881636B (zh) * 2017-04-10 2018-10-23 上海理工大学 一种载液板及其制造方法以及磁性复合流体抛光头装置
US20180304539A1 (en) 2017-04-21 2018-10-25 Applied Materials, Inc. Energy delivery system with array of energy sources for an additive manufacturing apparatus
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
US11072050B2 (en) 2017-08-04 2021-07-27 Applied Materials, Inc. Polishing pad with window and manufacturing methods thereof
WO2019032286A1 (en) 2017-08-07 2019-02-14 Applied Materials, Inc. ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME
WO2020050932A1 (en) 2018-09-04 2020-03-12 Applied Materials, Inc. Formulations for advanced polishing pads
US11524385B2 (en) 2019-06-07 2022-12-13 Rohm And Haas Electronic Materials Cmp Holdings, Inc. CMP polishing pad with lobed protruding structures
CN110587387A (zh) * 2019-06-24 2019-12-20 南昌大学 一种超声电化学机械抛光蓝宝石衬底材料的装置
US20210053056A1 (en) * 2019-08-23 2021-02-25 Lawrence Livermore National Security, Llc Systems and methods for reaction and transport engineering via cellular fluidics
CN112677062B (zh) * 2019-10-18 2022-12-09 江苏韦尔博新材料科技有限公司 一种打磨钢材磨盘的专用磨粒地貌、其金刚石磨盘与制备方法
US11813712B2 (en) 2019-12-20 2023-11-14 Applied Materials, Inc. Polishing pads having selectively arranged porosity
US20210299816A1 (en) * 2020-03-25 2021-09-30 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Cmp polishing pad with protruding structures having engineered open void space
US11833638B2 (en) 2020-03-25 2023-12-05 Rohm and Haas Electronic Materials Holding, Inc. CMP polishing pad with polishing elements on supports
US11806829B2 (en) 2020-06-19 2023-11-07 Applied Materials, Inc. Advanced polishing pads and related polishing pad manufacturing methods
CN112935994B (zh) * 2021-01-29 2023-08-01 中国建筑材料科学研究总院有限公司 异型表面抛光装置及抛光方法
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ

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US2984052A (en) * 1959-08-12 1961-05-16 Norton Co Coated abrasives
US3861892A (en) * 1973-02-08 1975-01-21 Norton Co Coated abrasive material and manner of manufacture
US4282011A (en) * 1980-05-30 1981-08-04 Dan River Incorporated Woven fabrics containing glass fibers and abrasive belts made from same
JPS5854060A (ja) * 1981-09-28 1983-03-30 大和紡績株式会社 高配向不織布の製造方法
US5131924A (en) * 1990-02-02 1992-07-21 Wiand Ronald C Abrasive sheet and method
MY114512A (en) 1992-08-19 2002-11-30 Rodel Inc Polymeric substrate with polymeric microelements
US5871392A (en) * 1996-06-13 1999-02-16 Micron Technology, Inc. Under-pad for chemical-mechanical planarization of semiconductor wafers
CA2192880C (en) * 1996-12-13 2005-02-22 Brian H. Parrott Sanding devices and the like for removing materials
JP2000288916A (ja) * 1999-04-05 2000-10-17 Ngk Insulators Ltd 研磨処理用治具
US6962524B2 (en) * 2000-02-17 2005-11-08 Applied Materials, Inc. Conductive polishing article for electrochemical mechanical polishing
US6979248B2 (en) * 2002-05-07 2005-12-27 Applied Materials, Inc. Conductive polishing article for electrochemical mechanical polishing
US20040020789A1 (en) * 2000-02-17 2004-02-05 Applied Materials, Inc. Conductive polishing article for electrochemical mechanical polishing
US6383066B1 (en) * 2000-06-23 2002-05-07 International Business Machines Corporation Multilayered polishing pad, method for fabricating, and use thereof
US6964604B2 (en) * 2000-06-23 2005-11-15 International Business Machines Corporation Fiber embedded polishing pad
JP2002361564A (ja) * 2001-06-06 2002-12-18 Nihon Micro Coating Co Ltd 研磨シート及びその製造方法
US20030013397A1 (en) * 2001-06-27 2003-01-16 Rhoades Robert L. Polishing pad of polymer coating
US20040226620A1 (en) 2002-09-26 2004-11-18 Daniel Therriault Microcapillary networks
US7311862B2 (en) 2002-10-28 2007-12-25 Cabot Microelectronics Corporation Method for manufacturing microporous CMP materials having controlled pore size
US20040259479A1 (en) 2003-06-23 2004-12-23 Cabot Microelectronics Corporation Polishing pad for electrochemical-mechanical polishing
US7604529B2 (en) 2006-02-16 2009-10-20 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Three-dimensional network for chemical mechanical polishing
US7503833B2 (en) 2006-02-16 2009-03-17 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Three-dimensional network for chemical mechanical polishing

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