JP2009019248A - Aluminum foil material for electrode of electrolytic capacitor - Google Patents
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本発明は、電解コンデンサ電極用アルミニウム箔材、特にFeやSiの含有量が多い低廉なアルミニウム箔材であって、交流エッチング処理により均一かつ多数のピットが形成されて、高い静電容量が得られる電解コンデンサ電極用アルミニウム箔材に関する。 The present invention is an aluminum foil material for electrolytic capacitor electrodes, particularly an inexpensive aluminum foil material with a large content of Fe and Si, and a uniform and many pits are formed by an AC etching process, thereby obtaining a high capacitance. The present invention relates to an aluminum foil material for electrolytic capacitor electrodes.
電子部品の小型化に伴い、当該部品に使用されている電解コンデンサ用アルミニウム箔についても、エッチング処理後の表面積の拡大による静電容量の向上が要望されている。電解コンデンサ用アルミニウム箔のエッチングは、通常、塩素イオンを含む溶液中で、電気化学的または化学的な処理を施すことにより行われ、エッチピットと呼ばれる多数の孔を形成して、エッチング面の表面積を拡大させる。 Along with the miniaturization of electronic components, there is a demand for an improvement in capacitance of the aluminum foil for electrolytic capacitors used in the components by increasing the surface area after the etching process. Etching of aluminum foil for electrolytic capacitors is usually performed by applying an electrochemical or chemical treatment in a solution containing chlorine ions, forming a large number of holes called etch pits, and the surface area of the etched surface. To enlarge.
エッチング処理されたエッチド箔は、例えばホウ酸やアジピン酸アンモニウム水溶液中で化成、すなわち陽極酸化することにより、誘電体の酸化皮膜がコンデンサの使用電圧に応じて形成される。コンデンサの静電容量は、C=εS/d(C:静電容量、ε:化成皮膜の誘電率、S:表面積、d:化成皮膜の厚さ)で与えられる。 The etched etched foil is formed, for example, by anodic oxidation in an aqueous solution of boric acid or ammonium adipate, whereby a dielectric oxide film is formed according to the operating voltage of the capacitor. The capacitance of the capacitor is given by C = εS / d (C: capacitance, ε: dielectric constant of conversion coating, S: surface area, d: thickness of conversion coating).
従来、交流エッチング処理される電解コンデンサ用アルミニウム箔の静電容量を高めるために、Fe系金属間化合物の種類やサイズ、あるいは存在比率を特定する試みが行われており、例えば、アルミニウム箔中のAl−Fe系金属間化合物のうち、Al6Fe/Al3Feの比率を0.5以下に規制する手法(特許文献1参照)や、アルミニウム箔中の金属間化合物の長径を0.1μm未満のもの、0.1〜1.0μmのもの、1.0μmを超えるものに分類し、箔全体のFe含有量に対するそれぞれの大きさの金属間化合物のFe含有量の比率を規定する手法が提案されている(特許文献2参照)。 Conventionally, attempts have been made to identify the type and size of Fe-based intermetallic compounds or the abundance ratio in order to increase the capacitance of aluminum foil for electrolytic capacitors that are subjected to AC etching treatment. Among Al—Fe-based intermetallic compounds, a method of regulating the ratio of Al 6 Fe / Al 3 Fe to 0.5 or less (see Patent Document 1), and the major axis of the intermetallic compound in the aluminum foil is less than 0.1 μm Proposed to define the ratio of the Fe content of intermetallic compounds of each size to the Fe content of the entire foil. (See Patent Document 2).
しかしながら、上記のように、金属間化合物、Al6Fe、Al3Feの存在比率や大きさ、あるいは箔全体のFe含有量に対する金属間化合物のFe含有量の比率を規定しただけでは高い静電容量を得るには必ずしも十分ではなく、交流による電解エッチング時、箔表面や内部での溶解により静電容量が低下する場合があるという問題がある。
本発明は、交流エッチング処理される電解コンデンサ用アルミニウム箔の静電容量を高めるための上記従来の問題を解消するためになされたものであり、その目的は、交流による電解エッチング時、表面や内部における過剰溶解を生じることなく、エッチピットの形成がアルミニウム内部まで均一かつ深く進行して、高い静電容量が得られる電解コンデンサ用アルミニウム箔を提供することにある。 The present invention has been made to solve the above-mentioned conventional problems for increasing the capacitance of aluminum foil for electrolytic capacitors that are subjected to AC etching treatment, and the purpose thereof is the surface and the interior during electrolytic etching by AC. It is an object of the present invention to provide an aluminum foil for electrolytic capacitors in which the formation of etch pits proceeds uniformly and deeply into the aluminum without causing excessive dissolution in the aluminum, and a high capacitance can be obtained.
上記の目的を達成するための請求項1による電解コンデンサ用アルミニウム箔は、Fe:30〜450ppm、Si:30〜300ppmを含有し、Al純度99.90%以上の組成を有し、交流エッチング処理される電解コンデンサ電極用アルミニウム箔材であって、該箔材中に存在する金属間化合物のうち、熱フェノール法により得られる溶解残渣のX線回折パターンにおけるα-AlFeSiの強度I(α-AlFeSi)とAl3Feの強度I(Al3Fe)の比率、I(α-AlFeSi)/I(Al3Fe)が0.15〜0.60であることを特徴とする。 In order to achieve the above object, an aluminum foil for electrolytic capacitor according to claim 1 contains Fe: 30 to 450 ppm, Si: 30 to 300 ppm, has an Al purity of 99.90% or more, and has an AC etching treatment. The aluminum foil material for electrolytic capacitor electrodes, and among the intermetallic compounds present in the foil material, α-AlFeSi strength I (α-AlFeSi) in the X-ray diffraction pattern of the dissolved residue obtained by the hot phenol method ) And Al 3 Fe strength I (Al 3 Fe), I (α-AlFeSi) / I (Al 3 Fe) is 0.15 to 0.60.
請求項2による電解コンデンサ電極用アルミニウム箔材は、請求項1において、金属間化合物として存在するFe量が、前記箔材のFe含有量の50%以上であることを特徴とする。 The aluminum foil material for electrolytic capacitor electrodes according to claim 2 is characterized in that, in claim 1, the amount of Fe existing as an intermetallic compound is 50% or more of the Fe content of the foil material.
本発明によれば、交流による電解エッチング時、表面や内部における過剰溶解を生じることなく、エッチピットの形成がアルミニウム内部まで均一かつ深く進行して、高い静電容量が得られる電解コンデンサ用アルミニウム箔が提供される。 According to the present invention, during electrolytic etching by alternating current, the formation of etch pits proceeds uniformly and deeply inside the aluminum without causing excessive dissolution on the surface and inside, and an aluminum foil for electrolytic capacitors that can obtain a high capacitance. Is provided.
本発明による電解コンデンサ電極用アルミニウム箔材は、Fe:30〜450ppm、Si:30〜300ppmを含有し、Al純度99.90%以上の組成を有し、交流エッチング処理されるアルミニウム箔材であって、該箔材中に存在する金属間化合物のうち、熱フェノール法により得られる溶解残渣のX線回折パターンにおけるα-AlFeSiの強度I(α-AlFeSi)とAl3Feの強度I(Al3Fe)の比率、I(α-AlFeSi)/I(Al3Fe)が0.15〜0.60であることを特徴とする。 The aluminum foil material for electrolytic capacitor electrodes according to the present invention is an aluminum foil material containing Fe: 30 to 450 ppm, Si: 30 to 300 ppm, having an Al purity of 99.90% or more and subjected to AC etching. Of the intermetallic compounds present in the foil material, α-AlFeSi strength I (α-AlFeSi) and Al 3 Fe strength I (Al 3 in the X-ray diffraction pattern of the dissolved residue obtained by the hot phenol method. The ratio of Fe), I (α-AlFeSi) / I (Al 3 Fe), is 0.15 to 0.60.
交流エッチング処理において、ピットは箔中の金属間化合物を起点として発生する。発明者らは、交流エッチング処理において、エッチング挙動に及ぼす金属間化合物の存在状態の影響を調査した結果、α-AlFeSiとAl3Feの存在比率が静電容量に大きく影響することを見出し、この知見に基づいてさらに検討を行った結果として本発明に至ったものである。 In the AC etching process, pits are generated starting from an intermetallic compound in the foil. As a result of investigating the influence of the presence state of the intermetallic compound on the etching behavior in the AC etching process, the inventors found that the abundance ratio of α-AlFeSi and Al 3 Fe greatly affects the capacitance. As a result of further investigation based on the findings, the present invention has been achieved.
Al3Feは、ピットサイズよりも比較的微細であるため、交流エッチング処理時のピット開始点ならびにピット内部におけるカソード皮膜の欠陥部を形成するのに最も有効な作用を有する。α-AlFeSiは球状を呈し、交流エッチング処理で生じるピットのサイズよりも大きいためピットの回り込みを生じ、箔表層では表面の欠落部、内部ではエッチング層の空洞部を形成し、静電容量の低下を招く。一方、固溶したSiはマトリックスの過剰溶解を引き起こし、エッチング層のピットの合体により静電容量を低下させる。 Since Al 3 Fe is relatively finer than the pit size, it has the most effective action for forming a pit start point during the AC etching process and a defect portion of the cathode film in the pit. α-AlFeSi has a spherical shape and is larger than the size of the pit generated by the AC etching process, causing pit wraparound, forming a missing surface portion on the foil surface layer, and a cavity in the etching layer inside, reducing the capacitance Invite. On the other hand, the solid solution Si causes excessive dissolution of the matrix and lowers the electrostatic capacity due to coalescence of pits in the etching layer.
通常材よりSiを多く含む本発明の電解コンデンサ電極用アルミニウム箔材においては、エッチング時の過剰溶解を防止するために、Siの一部をα-AlFeSiとするとともに、α-AlFeSiやAl3Feの生成を適性に制御し、FeやSiの含有量が多い低廉なアルミニウム箔材であっても、交流エッチングにより均一かつ多数のピットを形成し、高い静電容量を得ることができる。 In the aluminum foil material for electrolytic capacitor electrodes of the present invention containing more Si than ordinary materials, in order to prevent excessive dissolution during etching, a part of Si is α-AlFeSi, and α-AlFeSi or Al 3 Fe Even in the case of an inexpensive aluminum foil material having a high Fe or Si content, uniform and many pits can be formed by AC etching, and a high capacitance can be obtained.
本発明によるアルミニウム箔材は、Fe:30〜450ppm、Si:30〜300ppmを含有する。Fe含有量およびSi含有量が30ppm未満では、従来から使用されている電解コンデンサ電極用アルミニウム箔材と同じく高純度となるため、コスト高となる。さらに好ましいFe含有量およびSi含有量は50ppm以上である。 The aluminum foil material according to the present invention contains Fe: 30 to 450 ppm and Si: 30 to 300 ppm. When the Fe content and the Si content are less than 30 ppm, the purity becomes high as in the case of conventionally used aluminum foil materials for electrolytic capacitor electrodes. Further preferable Fe content and Si content are 50 ppm or more.
Fe含有量およびSi含有量がそれぞれ450ppmおよび300ppmを超えると、本発明のような組織制御を行っても、高い静電容量が得られなくなる。さらに好ましいFe含有量およびSi含有量の上限はそれぞれ400ppmおよび250ppmである。Al純度は99.90%以上が好ましく、純度が99.90%未満では不純物が多く、高い静電容量が得られない。さらに好ましいAl純度は99.97%以上である。 When the Fe content and the Si content exceed 450 ppm and 300 ppm, respectively, a high capacitance cannot be obtained even if the structure control as in the present invention is performed. Furthermore, the upper limit of preferable Fe content and Si content is 400 ppm and 250 ppm, respectively. The Al purity is preferably 99.90% or more. If the purity is less than 99.90%, there are many impurities, and a high capacitance cannot be obtained. Further preferred Al purity is 99.97% or more.
Si、Fe以外の元素としては、Cuを0.005%以下、Mn、Mg、Crをそれぞれ0.001%以下、Zn、Ti、Ga、Vをそれぞれ0.005%以下、その他不可避不純物をそれぞれ0.001%以下の範囲で含有しても、本発明の効果に影響することはない。 As elements other than Si and Fe, Cu is 0.005% or less, Mn, Mg and Cr are 0.001% or less, Zn, Ti, Ga and V are 0.005% or less, respectively, and other inevitable impurities. Even if it contains in 0.001% or less of range, the effect of this invention is not affected.
本発明において、熱フェノール法(熱フェノール溶解法)により得られる溶解残渣のX線回折パターンにおけるα−AlFeSi の強度はd=0.2038nm、θ=44.5deg、Al3Feの強度はd=0.2095nm、θ=43.14degに相当するピーク強度から求める。 In the present invention, the strength of α-AlFeSi in the X-ray diffraction pattern of the dissolved residue obtained by the hot phenol method (hot phenol dissolution method) is d = 0.2038 nm, θ = 44.5 deg, and the strength of Al 3 Fe is d = It is determined from the peak intensity corresponding to 0.2095 nm and θ = 43.14 deg.
α-AlFeSiの強度I(α-AlFeSi)とAl3Feの強度I(Al3Fe)の比率、I(α-AlFeSi)/I(Al3Fe)は0.15〜0.60であり、I(α-AlFeSi)/I(Al3Fe)が0.60を超えると、前記のように、交流エッチング処理時、エッチング層に表面の欠落と内部の空洞が生じ、過剰溶解に起因して静電容量の低下が生じる。I(α-AlFeSi)/I(Al3Fe)が0.15未満では、固溶したSiがマトリックスの過剰溶解を引き起こし、エッチング層のピットの合体により、静電容量が低下する。 The ratio of the intensity of the α-AlFeSi I (α-AlFeSi ) and Al 3 Fe intensity I (Al 3 Fe), I (α-AlFeSi) / I (Al 3 Fe) is 0.15 to 0.60, When I (α-AlFeSi) / I (Al 3 Fe) exceeds 0.60, as described above, during AC etching, surface deficiency and internal cavities occur in the etching layer, which is caused by excessive dissolution. A decrease in capacitance occurs. When I (α-AlFeSi) / I (Al 3 Fe) is less than 0.15, the solid solution Si causes excessive dissolution of the matrix, and the capacitance decreases due to coalescence of pits in the etching layer.
高い静電容量を得るために、金属間化合物として存在するFe量は、アルミニウム箔材のFe含有量の50%以上であることが好ましい。より好ましくは70%以上、さらに好ましくは80%以上である。金属間化合物として存在するFe量がアルミニウム箔材中のFe含有量の50%未満では、固溶したFeに起因してエッチング層の溶解が生じ易くなり、高い静電容量が得難くなる。 In order to obtain a high capacitance, the amount of Fe present as an intermetallic compound is preferably 50% or more of the Fe content of the aluminum foil material. More preferably, it is 70% or more, More preferably, it is 80% or more. If the amount of Fe present as an intermetallic compound is less than 50% of the Fe content in the aluminum foil material, the etching layer is likely to be dissolved due to the solid solution of Fe, and it is difficult to obtain a high capacitance.
以下、本発明のアルミニウム箔材の製造方法について説明する。なお、この製造方法は一実施形態を示すものであり、この製造方法に限定されない。
半連続鋳造により例えば厚さ500mm鋳塊を造塊する。この場合、α−AlFeSiが鋳塊中に適度に晶出するように、鋳塊凝固時の冷却速度を3〜20℃/秒、より好ましくは3〜10℃/秒とする徐冷を行う。冷却速度が速すぎるとα−AlFeSi晶出物が過度に微細化して、エッチング時に欠落し静電容量低下の原因になる。再固溶し易くなるという問題もある。
Hereinafter, the manufacturing method of the aluminum foil material of this invention is demonstrated. In addition, this manufacturing method shows one Embodiment, It is not limited to this manufacturing method.
For example, an ingot having a thickness of 500 mm is formed by semi-continuous casting. In this case, slow cooling is performed at a cooling rate of 3 to 20 ° C./second, more preferably 3 to 10 ° C./second during solidification of the ingot so that α-AlFeSi crystallizes appropriately in the ingot. If the cooling rate is too high, the α-AlFeSi crystallized product becomes excessively fine and is lost during etching, causing a decrease in capacitance. There is also a problem that it becomes easier to re-dissolve.
鋳塊については、α−AlFeSiが再固溶しないよう、均質化処理を行うことなく、または高温での均質化処理を行わず、開始温度450〜550℃で熱間圧延を行う。ついで例えば圧延率98%で冷間圧延を行い、厚さ100μmの箔材とする。得られた箔材については、組成、製造条件に応じて、280〜350℃の温度範囲で5〜12hの最終焼鈍を施し、強度とAl3Fe量を調整する。 The ingot is hot-rolled at a starting temperature of 450 to 550 ° C. without performing a homogenization process or without performing a homogenization process at a high temperature so that α-AlFeSi does not re-dissolve. Next, for example, cold rolling is performed at a rolling rate of 98% to obtain a foil material having a thickness of 100 μm. The resulting foil member, composition, depending on the production conditions, subjected to final annealing 5~12h in the temperature range of 280 to 350 ° C., to adjust the intensity and Al 3 Fe amount.
以下、本発明の実施例を比較例と対比して説明し、本発明の効果を実証する。なお、これらの実施例は、本発明の一実施態様を示すものであり、本発明はこれらに限定されない。 Examples of the present invention will be described below in comparison with comparative examples to demonstrate the effects of the present invention. In addition, these Examples show one embodiment of this invention, and this invention is not limited to these.
実施例、比較例
表1に示す組成を有するアルミニウムの溶湯を連続鋳造により造塊し、得られた鋳塊を、表2に示す条件で均質化処理、熱間圧延および冷間圧延、または均質化処理を行うことなく熱間圧延および冷間圧延して、厚さ90μmの箔とし、一部については、窒素ガス雰囲気中、表2に示す条件で最終焼鈍処理した。
Examples and Comparative Examples Molten aluminum melts having the compositions shown in Table 1 were ingoted by continuous casting, and the resulting ingots were homogenized, hot-rolled and cold-rolled, or homogeneously under the conditions shown in Table 2 Hot-rolling and cold-rolling were carried out without performing a heat treatment, and a foil having a thickness of 90 μm was obtained. A part of the foil was subjected to a final annealing treatment under the conditions shown in Table 2 in a nitrogen gas atmosphere.
得られたアルミニウム箔材(試験材)について、下記の方法で、アルミニウム箔材中に存在する金属間化合物のうち、熱フェノール法により得られる溶解残渣のX線回折パターンにおけるα-AlFeSiの強度I(α-AlFeSi)とAl3Feの強度I(Al3Fe)の比率、I(α-AlFeSi)/I(Al3Fe)を測定し、下記の方法で、交流電解エッチング処理を行った後、アジピン酸アンモニウム水溶液中で20Vに化成後に、LCRを用いて、120Hzの直列等価回路で静電容量を測定した。結果を表3に示す。なお、表1、表3において、本発明の条件を外れたものには下線を付した。 About the obtained aluminum foil material (test material), strength I of α-AlFeSi in the X-ray diffraction pattern of the dissolved residue obtained by the hot phenol method among the intermetallic compounds present in the aluminum foil material by the following method After measuring the ratio of strength I (Al 3 Fe) between (α-AlFeSi) and Al 3 Fe, I (α-AlFeSi) / I (Al 3 Fe), and performing AC electrolytic etching treatment by the following method Then, after chemical conversion to 20 V in an aqueous solution of ammonium adipate, the capacitance was measured with a 120 Hz series equivalent circuit using LCR. The results are shown in Table 3. In Tables 1 and 3, those outside the conditions of the present invention are underlined.
I(α-AlFeSi)/I(Al3Fe)の測定:熱フェノール法、すなわち、沸騰させたフェノール100mlに、試験材を1〜5gの範囲で完全に溶解させ、フェノール固化防止のため、ベンジルアルコールを50ml添加する。さらに、全体で200mlとなるようにベンジルアルコールを加え、約85℃まで冷却してから孔径0.2μmのメンブランフィルターを用いて吸引ろ過する。得られた残渣をX線回折測定すると同時に、フィルター残渣を塩酸に溶解し、Fe析出量を原子吸光法で定量する。なお、原子吸光法に代えてICP発光分光分析を行ってもよい。 Measurement of I (α-AlFeSi) / I (Al 3 Fe): Thermal phenol method, that is, the test material is completely dissolved in 100 ml of boiling phenol in the range of 1 to 5 g, and benzyl is used to prevent phenol solidification. Add 50 ml of alcohol. Furthermore, benzyl alcohol is added so that it may become 200 ml on the whole, and it cools to about 85 degreeC, Then, it suction-filters using a membrane filter with the hole diameter of 0.2 micrometer. At the same time as the X-ray diffraction measurement of the obtained residue, the filter residue is dissolved in hydrochloric acid, and the amount of Fe deposited is quantified by atomic absorption spectrometry. Note that ICP emission spectroscopic analysis may be performed instead of the atomic absorption method.
交流電解エッチング処理:塩酸1.5mol/dm3、リン酸0.09mol/dm3、硝酸0.07mol/dm3の混合溶液を用い、液温32℃、25Hz正弦波交流により、電流密度200mA/cm2で450s間電解処理を行う。 AC electrolytic etching treatment: Using a mixed solution of hydrochloric acid 1.5 mol / dm 3 , phosphoric acid 0.09 mol / dm 3 and nitric acid 0.07 mol / dm 3 , with a liquid temperature of 32 ° C. and a 25 Hz sine wave AC, a current density of 200 mA / Electrolytic treatment is performed at cm 2 for 450 s.
表3にみられるように、本発明に従う試験材1〜15は、試験材1の静電容量を100%とした場合、いずれも98%以上の優れた静電容量をそなえている。 As can be seen from Table 3, each of the test materials 1 to 15 according to the present invention has an excellent capacitance of 98% or more when the capacitance of the test material 1 is 100%.
これに対して、表3に示すように、試験材16、17は、鋳塊造塊時の冷却速度が大きいため、α−AlFeSi晶出物が過度に微細化しエッチング時に欠落することに起因して、静電容量の低下が生じた。試験材18、19は、鋳塊造塊時の冷却速度が小さいため、α-AlFeSiの晶出が適度に行われず、α-AlFeSiの強度I(α-AlFeSi)とAl3Feの強度I(Al3Fe)の比率、I(α-AlFeSi)/I(Al3Fe)が小さくなり、固溶したSiがマトリックスの過剰溶解を引き起こし、エッチング層のピットの合体に起因して静電容量が低下した。試験材20は、Fe、Siの含有量が多く、Al純度が低いため、金属間化合物量が多くなり過ぎ、I(α-AlFeSi)/I(Al3Fe)の比率のみの規制ではエッチング時の溶解減量を制御することができず、静電容量が劣っていた。 On the other hand, as shown in Table 3, the test materials 16 and 17 are caused by the fact that the α-AlFeSi crystallized material is excessively refined and missing during etching because the cooling rate during ingot ingot formation is large. As a result, the capacitance decreased. Since the test materials 18 and 19 have a low cooling rate during ingot ingot formation, α-AlFeSi does not crystallize appropriately, and α-AlFeSi strength I (α-AlFeSi) and Al 3 Fe strength I ( The ratio of Al 3 Fe), I (α-AlFeSi) / I (Al 3 Fe), decreases, and the solid solution Si causes excessive dissolution of the matrix, and the capacitance is caused by coalescence of pits in the etching layer. Declined. Since the test material 20 has a large content of Fe and Si and low Al purity, the amount of intermetallic compound is too large. When the ratio of only I (α-AlFeSi) / I (Al 3 Fe) is regulated, It was not possible to control the weight loss of the solution, and the capacitance was inferior.
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