JP2008547166A5 - - Google Patents
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- JP2008547166A5 JP2008547166A5 JP2008517388A JP2008517388A JP2008547166A5 JP 2008547166 A5 JP2008547166 A5 JP 2008547166A5 JP 2008517388 A JP2008517388 A JP 2008517388A JP 2008517388 A JP2008517388 A JP 2008517388A JP 2008547166 A5 JP2008547166 A5 JP 2008547166A5
- Authority
- JP
- Japan
- Prior art keywords
- product
- plasma
- electrode
- atmosphere
- atmospheric pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 41
- 239000012298 atmosphere Substances 0.000 claims description 36
- 238000000576 coating method Methods 0.000 claims description 33
- 239000000463 material Substances 0.000 claims description 32
- 230000004888 barrier function Effects 0.000 claims description 31
- 239000011248 coating agent Substances 0.000 claims description 29
- 238000009832 plasma treatment Methods 0.000 claims description 22
- 239000000126 substance Substances 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 239000002994 raw material Substances 0.000 claims description 3
- 239000000376 reactant Substances 0.000 claims 1
- 239000000047 product Substances 0.000 description 62
- 239000007789 gas Substances 0.000 description 28
- 239000003570 air Substances 0.000 description 10
- 229920006255 plastic film Polymers 0.000 description 6
- 239000002985 plastic film Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- -1 hexamethylenedisiloxane Chemical class 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 239000002987 primer (paints) Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005029360A DE102005029360B4 (de) | 2005-06-24 | 2005-06-24 | Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen |
| PCT/EP2006/005838 WO2007000255A2 (de) | 2005-06-24 | 2006-06-19 | Verfahren zur kontinuierlichen atmosphärendruck plasmabehandlung und/oder -beschichtung von werkstücken |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008547166A JP2008547166A (ja) | 2008-12-25 |
| JP2008547166A5 true JP2008547166A5 (enExample) | 2009-08-06 |
Family
ID=36997862
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008517388A Pending JP2008547166A (ja) | 2005-06-24 | 2006-06-19 | 製品、特にプレート材または棒材を大気圧で連続的にプラズマ処理およびプラズマコーティングの少なくともいずれかをする方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US20100112235A1 (enExample) |
| EP (2) | EP1902156B1 (enExample) |
| JP (1) | JP2008547166A (enExample) |
| CN (1) | CN101198718B (enExample) |
| AT (2) | ATE432379T1 (enExample) |
| DE (2) | DE102005029360B4 (enExample) |
| DK (1) | DK1902156T3 (enExample) |
| PL (1) | PL1894449T3 (enExample) |
| WO (2) | WO2007000255A2 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2793367B1 (fr) | 1999-05-03 | 2004-09-10 | Jean Luc Stehle | Dispositif d'authentification et de securisation pour un reseau informatique |
| DE102005029360B4 (de) * | 2005-06-24 | 2011-11-10 | Softal Corona & Plasma Gmbh | Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen |
| DE102007018716A1 (de) | 2007-04-20 | 2008-10-23 | Schaeffler Kg | Verfahren zum Aufbringen einer verschleißfesten Beschichtung |
| DE102007025151A1 (de) * | 2007-05-29 | 2008-09-04 | Innovent E.V. | Verfahren zum Beschichten eines Substrats |
| DE102007025152B4 (de) * | 2007-05-29 | 2012-02-09 | Innovent E.V. | Verfahren zum Beschichten eines Substrats |
| WO2011006018A2 (en) | 2009-07-08 | 2011-01-13 | Plasmasi, Inc. | Apparatus and method for plasma processing |
| JP5648349B2 (ja) * | 2009-09-17 | 2015-01-07 | 東京エレクトロン株式会社 | 成膜装置 |
| DE102010024086A1 (de) * | 2010-06-17 | 2011-12-22 | WPNLB UG (haftungsbeschränkt) & Co. KG | Vorrichtung zur kontinuierlichen Plasmabehandlung und/oder Plasmabeschichtung eines Materialstücks |
| US8765232B2 (en) * | 2011-01-10 | 2014-07-01 | Plasmasi, Inc. | Apparatus and method for dielectric deposition |
| JP5670229B2 (ja) * | 2011-03-10 | 2015-02-18 | 積水化学工業株式会社 | 表面処理方法及び装置 |
| JP5626899B2 (ja) * | 2011-05-17 | 2014-11-19 | 株式会社日立製作所 | 大気圧プラズマ処理装置 |
| US9299956B2 (en) | 2012-06-13 | 2016-03-29 | Aixtron, Inc. | Method for deposition of high-performance coatings and encapsulated electronic devices |
| US20130337657A1 (en) * | 2012-06-19 | 2013-12-19 | Plasmasi, Inc. | Apparatus and method for forming thin protective and optical layers on substrates |
| US10526708B2 (en) | 2012-06-19 | 2020-01-07 | Aixtron Se | Methods for forming thin protective and optical layers on substrates |
| PL2936539T3 (pl) * | 2012-12-21 | 2017-08-31 | Asahi Glass Company, Limited | Sposób zapłonu i urządzenie do parowania elektrod DBD |
| KR102094056B1 (ko) * | 2013-02-04 | 2020-03-26 | 가부시키가이샤 크리에이티브 테크놀러지 | 플라즈마 발생 장치 |
| DE102013106315B4 (de) | 2013-06-18 | 2016-09-15 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen eines physikalischen Plasmas |
| JP2015005780A (ja) * | 2014-09-25 | 2015-01-08 | 株式会社日立製作所 | プラズマ処理装置 |
| DE102016105976A1 (de) * | 2016-04-01 | 2017-10-05 | Dieffenbacher GmbH Maschinen- und Anlagenbau | Vorrichtung zum Transport von Material |
| DE102016109044B3 (de) * | 2016-05-17 | 2017-07-06 | Leonhard Kurz Stiftung & Co. Kg | Vorrichtung zur Oberflächenbehandlung eines Substrats |
| DE102016118569A1 (de) * | 2016-09-30 | 2018-04-05 | Cinogy Gmbh | Elektrodenanordnung zur Ausbildung einer dielektrisch behinderten Plasmaentladung |
| DE102017118652A1 (de) * | 2017-08-16 | 2019-02-21 | Hochschule Für Angewandte Wissenschaft Und Kunst Hildesheim/Holzminden/Göttingen | Plasmageneratormodul und dessen Verwendung |
| EP3585136A1 (en) * | 2018-06-20 | 2019-12-25 | Masarykova Univerzita | A method and device for generating low-temperature electrical water-based plasma at near-atmospheric pressures and its use |
| EP3814423B1 (en) | 2018-06-29 | 2023-10-18 | Dow Global Technologies LLC | Foam bead and sintered foam structure |
| DE102019101997A1 (de) | 2019-01-28 | 2020-07-30 | Koenig & Bauer Ag | Verfahren und Druckmaschine jeweils zum Bedrucken eines metallischen Bedruckstoffes |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61155430A (ja) * | 1984-12-28 | 1986-07-15 | Isuzu Motors Ltd | プラズマ処理方法 |
| JP2616760B2 (ja) * | 1985-04-08 | 1997-06-04 | 株式会社 半導体エネルギー研究所 | プラズマ気相反応装置 |
| DE3521318A1 (de) * | 1985-06-14 | 1986-12-18 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum behandeln, insbesondere zum beschichten, von substraten mittels einer plasmaentladung |
| CN1036286A (zh) * | 1988-02-24 | 1989-10-11 | 珀金·埃莱姆公司 | 超导陶瓷的次大气压等离子体喷涂 |
| JP2803017B2 (ja) * | 1993-06-07 | 1998-09-24 | 工業技術院長 | 抗血栓性医用材料及び医療用具並びにこれらの製造方法、製造装置及びプラズマ処理装置 |
| JP3844151B2 (ja) * | 1997-05-14 | 2006-11-08 | 凸版印刷株式会社 | 表面処理装置 |
| FR2770425B1 (fr) * | 1997-11-05 | 1999-12-17 | Air Liquide | Procede et dispositif pour le traitement de surface d'un substrat par decharge electrique entre deux electrodes dans un melange gazeux |
| JP2000208296A (ja) * | 1999-01-13 | 2000-07-28 | Sekisui Chem Co Ltd | 表面処理品の製造方法 |
| JP4688116B2 (ja) * | 1999-04-15 | 2011-05-25 | コニカミノルタホールディングス株式会社 | 偏光板用保護フィルム |
| ATE214521T1 (de) * | 1999-04-21 | 2002-03-15 | Softal Elektronik Gmbh | Barrierenelektrode zur oberflächenbehandlung von elektrisch leitenden oder nichtleitenden materialien sowie anordnung derartiger barrierenelektroden |
| US6150430A (en) * | 1999-07-06 | 2000-11-21 | Transitions Optical, Inc. | Process for adhering a photochromic coating to a polymeric substrate |
| EP1073091A3 (en) * | 1999-07-27 | 2004-10-06 | Matsushita Electric Works, Ltd. | Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus |
| AU2001232188A1 (en) * | 2000-02-11 | 2001-08-20 | Dow Corning Ireland Limited | An atmospheric pressure plasma system |
| EP1125972A1 (fr) * | 2000-02-11 | 2001-08-22 | L'air Liquide Société Anonyme pour l'étude et l'exploitation des procédés Georges Claude | Procédé de traitement de surface de subtrats polymères |
| JP2002018276A (ja) * | 2000-07-10 | 2002-01-22 | Pearl Kogyo Kk | 大気圧プラズマ処理装置 |
| EP2233605B1 (en) * | 2000-12-12 | 2012-09-26 | Konica Corporation | Optical film comprising an anti-reflection layer |
| US6849306B2 (en) * | 2001-08-23 | 2005-02-01 | Konica Corporation | Plasma treatment method at atmospheric pressure |
| WO2003019624A2 (en) * | 2001-08-27 | 2003-03-06 | University Of New Hampshire | Dielectric barrier discharge process for depositing silicon nitride film on substrates |
| JP4433680B2 (ja) * | 2002-06-10 | 2010-03-17 | コニカミノルタホールディングス株式会社 | 薄膜形成方法 |
| JP4140289B2 (ja) * | 2002-06-10 | 2008-08-27 | コニカミノルタホールディングス株式会社 | 大気圧プラズマ放電処理装置、大気圧プラズマ放電処理方法及び光学素子 |
| DE10228506B4 (de) * | 2002-06-24 | 2015-10-08 | Fachhochschule Hildesheim/Holzminden/Göttingen - Körperschaft des öffentlichen Rechts - | Verfahren und Vorrichtung zum Modifizieren von Oberflächen durch dielektrisch behinderte Entladung unter Atmosphärendruck |
| US7288204B2 (en) * | 2002-07-19 | 2007-10-30 | Fuji Photo Film B.V. | Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG) |
| CN1754409B (zh) * | 2002-08-30 | 2010-07-28 | 积水化学工业株式会社 | 等离子处理装置 |
| DE10300439B4 (de) | 2003-01-09 | 2017-06-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Behandeln von Oberflächen |
| EP1643002A4 (en) * | 2003-06-06 | 2009-11-11 | Konica Minolta Holdings Inc | METHOD FOR FORMING THIN LAYERS AND ARTICLE COMPRISING A THIN LAYER |
| JP3955835B2 (ja) * | 2003-07-01 | 2007-08-08 | 株式会社イー・スクエア | プラズマ表面処理装置とその処理方法 |
| US7365956B2 (en) * | 2004-06-14 | 2008-04-29 | Douglas Burke | Plasma driven, N-type semiconductor, thermoelectric power superoxide ion generator with critical bias conditions |
| JP2006005315A (ja) * | 2004-06-21 | 2006-01-05 | Seiko Epson Corp | プラズマ処理装置およびプラズマ処理方法 |
| BG66022B1 (bg) * | 2005-06-14 | 2010-10-29 | ДИНЕВ Петър | Метод за плазмено-химична повърхнинна модификация |
| DE102005029360B4 (de) * | 2005-06-24 | 2011-11-10 | Softal Corona & Plasma Gmbh | Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen |
| US20070154650A1 (en) * | 2005-12-30 | 2007-07-05 | Atomic Energy Council - Institute Of Nuclear Energy Research | Method and apparatus for glow discharge plasma treatment of flexible material at atmospheric pressure |
-
2005
- 2005-06-24 DE DE102005029360A patent/DE102005029360B4/de not_active Expired - Fee Related
-
2006
- 2006-06-19 WO PCT/EP2006/005838 patent/WO2007000255A2/de not_active Ceased
- 2006-06-19 CN CN2006800214983A patent/CN101198718B/zh not_active Expired - Fee Related
- 2006-06-19 US US11/993,362 patent/US20100112235A1/en not_active Abandoned
- 2006-06-19 EP EP06762073A patent/EP1902156B1/de not_active Not-in-force
- 2006-06-19 US US11/993,095 patent/US7989034B2/en not_active Expired - Fee Related
- 2006-06-19 PL PL06754430T patent/PL1894449T3/pl unknown
- 2006-06-19 DE DE502006003822T patent/DE502006003822D1/de active Active
- 2006-06-19 AT AT06762073T patent/ATE432379T1/de not_active IP Right Cessation
- 2006-06-19 AT AT06754430T patent/ATE533339T1/de active
- 2006-06-19 WO PCT/EP2006/005839 patent/WO2007016999A2/de not_active Ceased
- 2006-06-19 EP EP06754430A patent/EP1894449B1/de active Active
- 2006-06-19 JP JP2008517388A patent/JP2008547166A/ja active Pending
- 2006-06-19 DK DK06762073T patent/DK1902156T3/da active
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