JP3955835B2 - プラズマ表面処理装置とその処理方法 - Google Patents
プラズマ表面処理装置とその処理方法 Download PDFInfo
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- JP3955835B2 JP3955835B2 JP2003270067A JP2003270067A JP3955835B2 JP 3955835 B2 JP3955835 B2 JP 3955835B2 JP 2003270067 A JP2003270067 A JP 2003270067A JP 2003270067 A JP2003270067 A JP 2003270067A JP 3955835 B2 JP3955835 B2 JP 3955835B2
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- electrodes
- electrode
- substrate
- planar
- surface treatment
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- Physical Or Chemical Processes And Apparatus (AREA)
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Description
このようにすると、反応ガスの消費量を削減してコストを低減できることについて、実験データで説明する。
2 コンベア
W 被処理物である基板
3 プラズマ表面処理装置の開口
4 プラナー(P)方式とダウンストリーム(D)方式に共用される電極
5 プラナー(P)方式の電極
6,7 ダウンストリーム(D)方式の電極
8 固体誘電体
a,b,c 電極のプラズマ発生に関る部分の幅
L 電極の対向間隔
9,10 電極部カバー
11,12 キャビティ
13,14 反応ガスの供給管
15,16,17,18 排気管
RF 高周波電源
SW 切換えスイッチ回路
P1,P2,D 切換接点
Claims (2)
- 大気圧近傍の圧力の下に、プラズマ化した反応ガスによって被処理基板の表面処理を行う装置であって、
被処理基板を挟むように対向配置された一対のプラナー方式の電極(4,5)と、被処理基板への反応ガスの供給路を形成するように、前記プラナー方式の電極(4,5)の一方の電極(4)の両側面に対向配置された一対の補助電極(6,7)と、これらの電極(4,5,6,7)に高周波電圧を切り換えて供給する切換えスイッチ回路とを備え、
前記切換えスイッチ回路は、高周波電圧を前記プラナー方式の電極(4,5)間に加えると同時に、前記対向配置された補助電極(6,7)の電位を前記プラナー方式の一方の電極(4)と同電位に保つ切換接点と、高周波電圧を前記プラナー方式の電極(4,5)間に加えると同時に、前記補助電極(6,7)を電気的に中立に保つ切換接点と、高周波電圧を前記プラナー方式の一方の電極(4)と前記補助電極(6,7)に加え、前記プラナー方式の他方の電極(5)は電気的に中立とする切換接点とを備えていることを特徴とするプラズマ表面処理装置。 - 被処理基板を挟むように対向配置された一対のプラナー方式の電極(4,5) と、被処理基板への反応ガスの供給路を形成するように、前記プラナー方式の電極(4,5)の一方の電極(4)の両側面に対向配置された一対の補助電極(6,7)を備え、前記一方の電極(4)とこれに対向配置された補助電極(6,7)をダウンストリーム方式の電極としてなるプラズマ表面処理装置において、
前記対向配置された補助電極(6,7)を電気的に中立にし、一対のプラナー方式の電極(4,5)に高周波電圧を印加することにより、対向配置された補助電極(6,7)に前記印加される高周波電圧の分圧を誘導させ、この分圧によってダウンストリーム方式の電極を動作させて、反応ガスを予めプラズマ化してプラナー方式の電極に供給することを特徴とするプラズマ表面処理方法。
Priority Applications (1)
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JP2003270067A JP3955835B2 (ja) | 2003-07-01 | 2003-07-01 | プラズマ表面処理装置とその処理方法 |
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JP2003270067A JP3955835B2 (ja) | 2003-07-01 | 2003-07-01 | プラズマ表面処理装置とその処理方法 |
Related Child Applications (1)
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JP2007024280A Division JP2007128910A (ja) | 2007-02-02 | 2007-02-02 | プラズマ表面処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005026167A JP2005026167A (ja) | 2005-01-27 |
JP3955835B2 true JP3955835B2 (ja) | 2007-08-08 |
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Family Applications (1)
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JP2003270067A Expired - Fee Related JP3955835B2 (ja) | 2003-07-01 | 2003-07-01 | プラズマ表面処理装置とその処理方法 |
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JP (1) | JP3955835B2 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4202292B2 (ja) * | 2004-03-22 | 2008-12-24 | シャープ株式会社 | プラズマ処理装置 |
JP2006019067A (ja) * | 2004-06-30 | 2006-01-19 | Sharp Corp | プラズマ処理装置およびプラズマ処理方法 |
DE102005029360B4 (de) * | 2005-06-24 | 2011-11-10 | Softal Corona & Plasma Gmbh | Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen |
JP4582140B2 (ja) * | 2007-11-22 | 2010-11-17 | セイコーエプソン株式会社 | 基板の表面処理方法 |
JP5911178B2 (ja) * | 2013-05-07 | 2016-04-27 | 株式会社イー・スクエア | プラズマ表面処理装置 |
EP3761341A1 (en) * | 2019-07-03 | 2021-01-06 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO | Spatially controlled plasma delivery apparatus |
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2003
- 2003-07-01 JP JP2003270067A patent/JP3955835B2/ja not_active Expired - Fee Related
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