JP2008541481A5 - - Google Patents
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- Publication number
- JP2008541481A5 JP2008541481A5 JP2008512331A JP2008512331A JP2008541481A5 JP 2008541481 A5 JP2008541481 A5 JP 2008541481A5 JP 2008512331 A JP2008512331 A JP 2008512331A JP 2008512331 A JP2008512331 A JP 2008512331A JP 2008541481 A5 JP2008541481 A5 JP 2008541481A5
- Authority
- JP
- Japan
- Prior art keywords
- forming
- light absorbing
- layer
- metal nanoparticles
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 claims 9
- 239000002082 metal nanoparticle Substances 0.000 claims 5
- 238000000034 method Methods 0.000 claims 4
- 239000011358 absorbing material Substances 0.000 claims 3
- 239000004020 conductor Substances 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 3
- 230000003667 anti-reflective effect Effects 0.000 claims 1
- 239000002105 nanoparticle Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/130,772 US7648741B2 (en) | 2005-05-17 | 2005-05-17 | Forming a patterned metal layer using laser induced thermal transfer method |
| PCT/US2006/017288 WO2006124320A1 (en) | 2005-05-17 | 2006-05-02 | A patterned metal layer using thermal transfer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008541481A JP2008541481A (ja) | 2008-11-20 |
| JP2008541481A5 true JP2008541481A5 (enExample) | 2009-02-12 |
Family
ID=36938060
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008512331A Withdrawn JP2008541481A (ja) | 2005-05-17 | 2006-05-02 | 熱転写を使用して形成するパターン化金属層 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7648741B2 (enExample) |
| EP (1) | EP1884146A1 (enExample) |
| JP (1) | JP2008541481A (enExample) |
| KR (1) | KR20080007465A (enExample) |
| CN (1) | CN100576970C (enExample) |
| WO (1) | WO2006124320A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007035742A (ja) * | 2005-07-25 | 2007-02-08 | Seiko Epson Corp | 薄膜トランジスタの形成方法 |
| US8084101B2 (en) | 2006-08-01 | 2011-12-27 | The Board of Regents of the Nevada Systems of Higher Education on behalf of the University of Nevada, Las Vegas | Fabrication of patterned and ordered nanoparticles |
| EP2108239A1 (de) * | 2007-01-05 | 2009-10-14 | Basf Se | Verfahren zur herstellung von elektrisch leitfähigen oberflächen |
| US7666567B2 (en) * | 2007-10-23 | 2010-02-23 | E. I. Du Pont De Nemours And Company | Negative imaging method for providing a patterned metal layer having high conductivity |
| TW201001624A (en) * | 2008-01-24 | 2010-01-01 | Soligie Inc | Silicon thin film transistors, systems, and methods of making same |
| CN101519184B (zh) * | 2008-02-29 | 2012-05-23 | 财团法人工业技术研究院 | 利用光热效应制作应用基板的方法 |
| WO2009154156A1 (ja) * | 2008-06-16 | 2009-12-23 | 東レ株式会社 | パターニング方法およびこれを用いたデバイスの製造方法ならびにデバイス |
| FR2946639B1 (fr) * | 2009-06-12 | 2011-07-15 | Saint Gobain | Procede de depot de couche mince et produit obtenu. |
| US20110027499A1 (en) * | 2009-07-30 | 2011-02-03 | International Business Machines Corporation | Radiation-assisted nanoparticle printing |
| DE102009050199A1 (de) * | 2009-10-21 | 2011-04-28 | Giesecke & Devrient Gmbh | Herstellung von Leiterstrukturen auf Kunststoff-Folien mittels Nanotinten |
| DE102010015659A1 (de) | 2010-04-20 | 2011-10-20 | Giesecke & Devrient Gmbh | Transferverfahren zur Herstellung von Leiterstrukturen mittels Nanotinten |
| FR2980279B1 (fr) * | 2011-09-20 | 2013-10-11 | Soitec Silicon On Insulator | Procede de fabrication d'une structure composite a separer par exfoliation |
| KR20140140188A (ko) * | 2013-05-28 | 2014-12-09 | 삼성디스플레이 주식회사 | 도너기판 및 이의 제조방법 및 이를 이용한 전사패턴 형성방법 |
| CN106576429A (zh) * | 2014-05-27 | 2017-04-19 | 耶路撒冷希伯来大学伊森姆研究发展有限公司 | 制造金属图案和物体的方法 |
| US20180132357A1 (en) * | 2015-04-13 | 2018-05-10 | Jan Franck | Device and method for producing printed circuit boards for electrical and/or electronic circuits |
| FR3035540B1 (fr) * | 2015-04-27 | 2017-04-28 | Centre Nat Rech Scient | Procede d'impression au moyen de deux lasers |
| US9776442B2 (en) | 2015-12-30 | 2017-10-03 | Palo Alto Research Center Incorporated | Single pass imaging using rapidly addressable laser lamination |
| EP3663090A1 (en) * | 2018-12-04 | 2020-06-10 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | High resolution laser induced forward transfer |
| CN117465081A (zh) * | 2023-10-12 | 2024-01-30 | 广东工业大学 | 一种高吸光率复合膜片及其在激光诱导转移中的应用 |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4541830A (en) | 1982-11-11 | 1985-09-17 | Matsushita Electric Industrial Co., Ltd. | Dye transfer sheets for heat-sensitive recording |
| US4698651A (en) | 1985-12-24 | 1987-10-06 | Eastman Kodak Company | Magenta dye-donor element used in thermal dye transfer |
| US4695287A (en) | 1985-12-24 | 1987-09-22 | Eastman Kodak Company | Cyan dye-donor element used in thermal dye transfer |
| US4701439A (en) | 1985-12-24 | 1987-10-20 | Eastman Kodak Company | Yellow dye-donor element used in thermal dye transfer |
| US4757046A (en) | 1986-10-06 | 1988-07-12 | Eastman Kodak Company | Merocyanine dye-donor element used in thermal dye transfer |
| US4743582A (en) | 1986-10-06 | 1988-05-10 | Eastman Kodak Company | N-alkyl-or n-aryl-aminopyrazolone merocyanine dye-donor element used in thermal dye transfer |
| US4769360A (en) | 1987-09-14 | 1988-09-06 | Eastman Kodak Company | Cyan dye-donor element for thermal dye transfer |
| US4753922A (en) | 1987-11-20 | 1988-06-28 | Eastman Kodak Company | Neutral-black dye-donor element for thermal dye transfer |
| US4973572A (en) | 1987-12-21 | 1990-11-27 | Eastman Kodak Company | Infrared absorbing cyanine dyes for dye-donor element used in laser-induced thermal dye transfer |
| US4900130A (en) | 1988-10-07 | 1990-02-13 | Eastman Kodak Company | Method of scanning |
| US5171650A (en) | 1990-10-04 | 1992-12-15 | Graphics Technology International, Inc. | Ablation-transfer imaging/recording |
| US5256506A (en) | 1990-10-04 | 1993-10-26 | Graphics Technology International Inc. | Ablation-transfer imaging/recording |
| US4948776A (en) | 1989-06-16 | 1990-08-14 | Eastman Kodak Company | Infrared absorbing chalcogenopyrylo-arylidene dyes for dye-donor element used in laser-induced thermal dye transfer |
| US4948777A (en) | 1989-06-16 | 1990-08-14 | Eastman Kodak Company | Infrared absorbing bis(chalcogenopyrylo)polymethine dyes for dye-donor element used in laser-induced thermal dye transfer |
| US4950639A (en) | 1989-06-16 | 1990-08-21 | Eastman Kodak Company | Infrared absorbing bis(aminoaryl)polymethine dyes for dye-donor element used in laser-induced thermal dye transfer |
| US4942141A (en) | 1989-06-16 | 1990-07-17 | Eastman Kodak Company | Infrared absorbing squarylium dyes for dye-donor element used in laser-induced thermal dye transfer |
| US4950640A (en) | 1989-06-16 | 1990-08-21 | Eastman Kodak Company | Infrared absorbing merocyanine dyes for dye-donor element used in laser-induced thermal dye transfer |
| US5036040A (en) | 1989-06-20 | 1991-07-30 | Eastman Kodak Company | Infrared absorbing nickel-dithiolene dye complexes for dye-donor element used in laser-induced thermal dye transfer |
| US4912083A (en) | 1989-06-20 | 1990-03-27 | Eastman Kodak Company | Infrared absorbing ferrous complexes for dye-donor element used in laser-induced thermal dye transfer |
| US4948778A (en) | 1989-06-20 | 1990-08-14 | Eastman Kodak Company | Infrared absorbing oxyindolizine dyes for dye-donor element used in laser-induced thermal dye transfer |
| US4952552A (en) | 1989-06-20 | 1990-08-28 | Eastman Kodak Company | Infrared absorbing quinoid dyes for dye-donor element used in laser-induced thermal dye transfer |
| US5244770A (en) | 1991-10-23 | 1993-09-14 | Eastman Kodak Company | Donor element for laser color transfer |
| US5292559A (en) | 1992-01-10 | 1994-03-08 | Amp Incorporated | Laser transfer process |
| US5691098A (en) | 1996-04-03 | 1997-11-25 | Minnesota Mining And Manufacturing Company | Laser-Induced mass transfer imaging materials utilizing diazo compounds |
| US5725989A (en) * | 1996-04-15 | 1998-03-10 | Chang; Jeffrey C. | Laser addressable thermal transfer imaging element with an interlayer |
| US5800960A (en) | 1996-10-24 | 1998-09-01 | Eastman Kodak Company | Uniform background for color transfer |
| US6143451A (en) * | 1996-11-26 | 2000-11-07 | E. I. Du Pont De Nemours And Company | Imaged laserable assemblages and associated processes with high speed and durable image-transfer characteristics for laser-induced thermal transfer |
| US6031561A (en) * | 1997-04-22 | 2000-02-29 | Eastman Kodak Company | Printer system having a plurality of light sources of different wavelengths |
| US6097416A (en) | 1997-11-10 | 2000-08-01 | Eastman Kodak Company | Method for reducing donor utilization for radiation-induced colorant transfer |
| US6252621B1 (en) | 1998-08-03 | 2001-06-26 | Eastman Kodak Company | Printing lenticular images |
| US6169565B1 (en) * | 1999-03-31 | 2001-01-02 | Eastman Kodak Company | Laser printer utilizing a spatial light modulator |
| US6165671A (en) * | 1999-12-30 | 2000-12-26 | Eastman Kodak Company | Laser donor element |
| JP5008216B2 (ja) * | 2000-10-13 | 2012-08-22 | 株式会社アルバック | インクジェット用インクの製法 |
| WO2002048432A2 (en) * | 2000-12-15 | 2002-06-20 | The Arizona Board Of Regents | Method for patterning metal using nanoparticle containing precursors |
| JP4066621B2 (ja) | 2001-07-19 | 2008-03-26 | 富士通株式会社 | 全文検索システム及び全文検索プログラム |
| US6703111B2 (en) | 2001-10-25 | 2004-03-09 | Eastman Kodak Company | Laser thermal imaging process, dye, and element |
| US6770549B2 (en) | 2002-05-08 | 2004-08-03 | Lucent Technologies Inc. | Forming patterned thin film metal layers |
| US6939660B2 (en) * | 2002-08-02 | 2005-09-06 | Eastman Kodak Company | Laser thermal transfer donor including a separate dopant layer |
| US6890627B2 (en) | 2002-08-02 | 2005-05-10 | Eastman Kodak Company | Laser thermal transfer from a donor element containing a hole-transporting layer |
| TWI265762B (en) * | 2003-01-14 | 2006-11-01 | Sharp Kk | Wiring material, wiring substrate and manufacturing method thereof, display panel, fine particle thin film material, substrate including thin film layer and manufacturing method thereof |
| US6790594B1 (en) * | 2003-03-20 | 2004-09-14 | Eastman Kodak Company | High absorption donor substrate coatable with organic layer(s) transferrable in response to incident laser light |
| US20060003262A1 (en) | 2004-06-30 | 2006-01-05 | Eastman Kodak Company | Forming electrical conductors on a substrate |
-
2005
- 2005-05-17 US US11/130,772 patent/US7648741B2/en not_active Expired - Fee Related
-
2006
- 2006-05-02 CN CN200680016938A patent/CN100576970C/zh not_active Expired - Fee Related
- 2006-05-02 EP EP06759105A patent/EP1884146A1/en not_active Withdrawn
- 2006-05-02 JP JP2008512331A patent/JP2008541481A/ja not_active Withdrawn
- 2006-05-02 WO PCT/US2006/017288 patent/WO2006124320A1/en not_active Ceased
- 2006-05-02 KR KR1020077026589A patent/KR20080007465A/ko not_active Withdrawn
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