JP2008519433A - アポクロマート等倍投影光学系 - Google Patents

アポクロマート等倍投影光学系 Download PDF

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Publication number
JP2008519433A
JP2008519433A JP2007539114A JP2007539114A JP2008519433A JP 2008519433 A JP2008519433 A JP 2008519433A JP 2007539114 A JP2007539114 A JP 2007539114A JP 2007539114 A JP2007539114 A JP 2007539114A JP 2008519433 A JP2008519433 A JP 2008519433A
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JP
Japan
Prior art keywords
optical system
projection optical
mirror
projection
glass
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Pending
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JP2007539114A
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English (en)
Japanese (ja)
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JP2008519433A5 (enExample
Inventor
アイ メルカード ロメオ
Original Assignee
ウルトラテック インク
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Application filed by ウルトラテック インク filed Critical ウルトラテック インク
Publication of JP2008519433A publication Critical patent/JP2008519433A/ja
Publication of JP2008519433A5 publication Critical patent/JP2008519433A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2007539114A 2004-11-01 2005-10-27 アポクロマート等倍投影光学系 Pending JP2008519433A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/980,110 US7148953B2 (en) 2004-11-01 2004-11-01 Apochromatic unit-magnification projection optical system
PCT/US2005/038777 WO2006050029A2 (en) 2004-11-01 2005-10-27 Apochromatic unit-magnification projection optical system

Publications (2)

Publication Number Publication Date
JP2008519433A true JP2008519433A (ja) 2008-06-05
JP2008519433A5 JP2008519433A5 (enExample) 2010-05-20

Family

ID=36261404

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007539114A Pending JP2008519433A (ja) 2004-11-01 2005-10-27 アポクロマート等倍投影光学系

Country Status (5)

Country Link
US (1) US7148953B2 (enExample)
JP (1) JP2008519433A (enExample)
KR (1) KR101130594B1 (enExample)
TW (1) TWI420149B (enExample)
WO (1) WO2006050029A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014123719A (ja) * 2012-12-21 2014-07-03 Ultratech Inc 熱変形を低減するｗｙｎｎ−ｄｙｓｏｎ結像システム

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
EP1912098B1 (en) * 2006-10-12 2012-04-25 Carl Zeiss SMT GmbH Unit magnification projection objective
DE102008015775A1 (de) 2007-04-16 2008-12-18 Carl Zeiss Smt Ag Chromatisch korrigiertes Lithographieobjektiv
US7710564B1 (en) * 2007-09-03 2010-05-04 Kla-Tencor Corporation Polarized broadband wafer inspection
US8493670B2 (en) 2010-09-10 2013-07-23 Coherent, Inc. Large-field unit-magnification catadioptric projection system
US8659823B2 (en) 2011-04-22 2014-02-25 Coherent, Inc. Unit-magnification catadioptric and catoptric projection optical systems
US8830590B2 (en) * 2012-05-30 2014-09-09 Ultratech, Inc. Unit magnification large-format catadioptric lens for microlithography
US8845163B2 (en) * 2012-08-17 2014-09-30 Ultratech, Inc. LED-based photolithographic illuminator with high collection efficiency
US9488811B2 (en) 2013-08-20 2016-11-08 Ultratech, Inc. Wynne-Dyson optical system with variable magnification
US9436103B2 (en) 2014-05-19 2016-09-06 Ultratech, Inc. Wynne-Dyson projection lens with reduced susceptibility to UV damage
JP2016218299A (ja) * 2015-05-22 2016-12-22 財団法人國家實驗研究院 単一非球面共通光学素子露光機レンズセット
CN107064016B (zh) * 2017-04-14 2019-11-12 中国科学院长春光学精密机械与物理研究所 一种光栅色散成像光谱仪

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5413329A (en) * 1977-06-30 1979-01-31 Ibm Unittmagnification achromatic optical system
JPH11202208A (ja) * 1997-10-27 1999-07-30 Wescam Inc 反射屈折光学系ズームレンズ組立体
WO2004061487A2 (en) * 2003-01-02 2004-07-22 Ultratech Stepper, Inc. Variable numerical aperture large-field unit-magnification projection system
WO2004062262A2 (en) * 2002-12-27 2004-07-22 Ultratech Stepper, Inc. Large-field unit-magnification projection system

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103989A (en) 1977-02-07 1978-08-01 Seymour Rosin Unit-power concentric optical systems
US4171870A (en) 1977-05-06 1979-10-23 Bell Telephone Laboratories, Incorporated Compact image projection apparatus
US4391494A (en) 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4425037A (en) 1981-05-15 1984-01-10 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4469414A (en) 1982-06-01 1984-09-04 The Perkin-Elmer Corporation Restrictive off-axis field optical system
US4768869A (en) 1984-11-29 1988-09-06 Lockheed Missiles & Space Company, Inc. Catadioptric imaging system
US4934801A (en) 1984-11-29 1990-06-19 Lockheed Missiles & Space Company, Inc. Optical imaging system
US4681407A (en) 1985-12-02 1987-07-21 Lockheed Missiles & Space Company, Inc. Two-glass photographic objective color-corrected at four wavelengths
US4704011A (en) 1985-12-13 1987-11-03 Lockheed Missiles & Space Company, Inc. Three-glass photographic objective color-corrected at four wavelengths
US4929071A (en) 1985-12-20 1990-05-29 Lockheed Missiles & Space Company, Inc. Long-focus color-corrected petzval-type optical objective
US5000548A (en) 1988-04-25 1991-03-19 Lockheed Missiles & Space Company, Inc. Microscope objective
US5040882A (en) 1988-11-07 1991-08-20 General Signal Corporation Unit magnification optical system with improved reflective reticle
US4964705A (en) 1988-11-07 1990-10-23 General Signal Corporation Unit magnification optical system
US5031977A (en) 1989-12-27 1991-07-16 General Signal Corporation Deep ultraviolet (UV) lens for use in a photolighography system
US5161062A (en) 1991-07-11 1992-11-03 General Signal Corporation Optical projection system including a refractive lens assembly having a gap between constituent lenses
US5559629A (en) 1994-08-19 1996-09-24 Tamarack Scientific Co., Inc. Unit magnification projection system and method
JPH08211294A (ja) 1995-02-02 1996-08-20 Nikon Corp 投影露光装置
US6963403B2 (en) * 2002-01-15 2005-11-08 Council Of Scientific And Industrial Research Method for determining the reflectance profile of materials
US6809888B1 (en) * 2003-04-16 2004-10-26 Ultratech, Inc. Apparatus and methods for thermal reduction of optical distortion
US6863403B2 (en) * 2003-05-27 2005-03-08 Ultratech, Inc. Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5413329A (en) * 1977-06-30 1979-01-31 Ibm Unittmagnification achromatic optical system
JPH11202208A (ja) * 1997-10-27 1999-07-30 Wescam Inc 反射屈折光学系ズームレンズ組立体
WO2004062262A2 (en) * 2002-12-27 2004-07-22 Ultratech Stepper, Inc. Large-field unit-magnification projection system
WO2004061487A2 (en) * 2003-01-02 2004-07-22 Ultratech Stepper, Inc. Variable numerical aperture large-field unit-magnification projection system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014123719A (ja) * 2012-12-21 2014-07-03 Ultratech Inc 熱変形を低減するｗｙｎｎ−ｄｙｓｏｎ結像システム

Also Published As

Publication number Publication date
WO2006050029A3 (en) 2006-08-10
US20060092395A1 (en) 2006-05-04
US7148953B2 (en) 2006-12-12
KR101130594B1 (ko) 2012-04-02
WO2006050029A2 (en) 2006-05-11
TWI420149B (zh) 2013-12-21
TW200615577A (en) 2006-05-16
KR20070069186A (ko) 2007-07-02

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