JP2008311258A5 - - Google Patents

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Publication number
JP2008311258A5
JP2008311258A5 JP2007154764A JP2007154764A JP2008311258A5 JP 2008311258 A5 JP2008311258 A5 JP 2008311258A5 JP 2007154764 A JP2007154764 A JP 2007154764A JP 2007154764 A JP2007154764 A JP 2007154764A JP 2008311258 A5 JP2008311258 A5 JP 2008311258A5
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JP
Japan
Prior art keywords
chemical reactant
masking material
process chamber
diluent gas
mtorr
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007154764A
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English (en)
Japanese (ja)
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JP2008311258A (ja
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Publication date
Application filed filed Critical
Priority to JP2007154764A priority Critical patent/JP2008311258A/ja
Priority claimed from JP2007154764A external-priority patent/JP2008311258A/ja
Publication of JP2008311258A publication Critical patent/JP2008311258A/ja
Publication of JP2008311258A5 publication Critical patent/JP2008311258A5/ja
Pending legal-status Critical Current

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JP2007154764A 2007-06-12 2007-06-12 低誘電率の誘電材料の損傷を低減したマスキング材料の除去方法 Pending JP2008311258A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007154764A JP2008311258A (ja) 2007-06-12 2007-06-12 低誘電率の誘電材料の損傷を低減したマスキング材料の除去方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007154764A JP2008311258A (ja) 2007-06-12 2007-06-12 低誘電率の誘電材料の損傷を低減したマスキング材料の除去方法

Publications (2)

Publication Number Publication Date
JP2008311258A JP2008311258A (ja) 2008-12-25
JP2008311258A5 true JP2008311258A5 (https=) 2010-07-22

Family

ID=40238645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007154764A Pending JP2008311258A (ja) 2007-06-12 2007-06-12 低誘電率の誘電材料の損傷を低減したマスキング材料の除去方法

Country Status (1)

Country Link
JP (1) JP2008311258A (https=)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7294580B2 (en) * 2003-04-09 2007-11-13 Lam Research Corporation Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition
JP4558296B2 (ja) * 2003-09-25 2010-10-06 東京エレクトロン株式会社 プラズマアッシング方法
US7288488B2 (en) * 2005-05-10 2007-10-30 Lam Research Corporation Method for resist strip in presence of regular low k and/or porous low k dielectric materials

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