JP2008300773A - Manufacturing method of light emitting element mounting wiring board and light emitting element mounting wiring board - Google Patents

Manufacturing method of light emitting element mounting wiring board and light emitting element mounting wiring board Download PDF

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JP2008300773A
JP2008300773A JP2007148044A JP2007148044A JP2008300773A JP 2008300773 A JP2008300773 A JP 2008300773A JP 2007148044 A JP2007148044 A JP 2007148044A JP 2007148044 A JP2007148044 A JP 2007148044A JP 2008300773 A JP2008300773 A JP 2008300773A
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emitting element
light emitting
adhesive sheet
wiring board
hole
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Toshio Owaki
敏男 大脇
Mikio Masabayashi
幹雄 正林
Tomokatsu Isomura
倫克 磯村
Mitsuru Koyama
充 小山
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Daisho Denshi Co Ltd
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Daisho Denshi Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a light emitting element mounting wiring board and a light emitting element mounting wiring board capable of enhancing heat radiation efficiency and of keeping light emission efficiency high over a long period of time. <P>SOLUTION: The manufacturing method of a light emitting element mounting wiring board 1 on which a light emitting element is mounted includes a bonding process of bonding a substrate part 2 on which the light emitting element is provided and an aluminum reflecting plate 3 undergoing mirror surface processing via a bonding sheet 5. The reflecting plate 3 can enhance heat radiation efficiency and light emission efficiency. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、発光素子搭載用配線板の製造方法及び発光素子搭載用配線板に関する。   The present invention relates to a method for manufacturing a light emitting element mounting wiring board and a light emitting element mounting wiring board.

従来より、LEDなどの発光素子が搭載される種々の発光素子搭載用配線板が利用されている(例えば、特許文献1参照。)。
ここで、LEDなどの発光素子は、駆動時に熱を発するため、その熱を放熱する必要がある。そこで、熱伝導率の高い銅パターンを利用することにより、効率よく放熱することができる。
しかし、銅は反射率が低いことから、LEDなどの発光素子の発光効率を向上させることが困難である。そこで、銅の表面に、反射率の高いニッケルや銀を設けることにより、LEDなどの発光効率を向上させることができる。
特開2006−73842号公報
Conventionally, various light-emitting element mounting wiring boards on which light-emitting elements such as LEDs are mounted have been used (see, for example, Patent Document 1).
Here, since light emitting elements such as LEDs emit heat when driven, it is necessary to radiate the heat. Therefore, heat can be efficiently radiated by using a copper pattern having high thermal conductivity.
However, since copper has low reflectance, it is difficult to improve the light emission efficiency of light emitting elements such as LEDs. Therefore, by providing nickel or silver with high reflectivity on the copper surface, the light emission efficiency of the LED or the like can be improved.
JP 2006-73842 A

しかしながら、上記のようなニッケルや銀は、酸化によって表面が変色し易く、時間の経過によって発光効率が低下してしまうという問題がある。   However, the above-described nickel and silver have a problem that the surface is easily discolored by oxidation, and the light emission efficiency decreases with the passage of time.

本発明は、このような事情に鑑みてなされたものであって、放熱効率を向上させることができるとともに、長期にわたって発光効率を高く維持することができる発光素子搭載用配線板の製造方法及び発光素子搭載用配線板を提供することを目的とする。   The present invention has been made in view of such circumstances, and it is possible to improve the heat dissipation efficiency and to maintain the light emission efficiency high over a long period of time and the light emitting element mounting wiring board manufacturing method and light emission An object is to provide an element mounting wiring board.

上記課題を解決するために、本発明は以下の手段を提供する。
本発明は、発光素子が搭載される発光素子搭載用配線板の製造方法であって、前記発光素子が設けられる基板部と、鏡面加工されたアルミニウムからなる反射板とを、接着シートを介して接着する接着工程を含むことを特徴とする。
In order to solve the above problems, the present invention provides the following means.
The present invention is a method of manufacturing a light emitting element mounting wiring board on which a light emitting element is mounted, wherein a substrate portion on which the light emitting element is provided and a reflecting plate made of mirror-finished aluminum are interposed via an adhesive sheet. It includes a bonding step of bonding.

この発明によれば、発光素子から発せられた熱が、反射板を介して放熱され、発光素子から放射された光が反射板により反射される。   According to the present invention, the heat generated from the light emitting element is dissipated through the reflecting plate, and the light emitted from the light emitting element is reflected by the reflecting plate.

また、本発明は、前記接着工程は、前記基板部の裏面に前記接着シートを仮圧着する仮圧着工程と、前記仮圧着工程において仮圧着された接着シートの裏面に、前記反射板を本圧着する本圧着工程と、前記本圧着工程において本圧着された接着シートを加熱して硬化させる硬化加熱工程とを含むことを特徴とする。   Further, according to the present invention, in the bonding step, the reflective sheet is temporarily bonded to the back surface of the adhesive sheet temporarily bonded in the temporary pressing step, and the temporary pressing step of temporarily bonding the adhesive sheet to the back surface of the substrate portion. And a curing heating step of heating and curing the adhesive sheet that has been finally press-bonded in the main press-bonding step.

この発明によれば、基板部と反射板とを良好に接着することができる。   According to this invention, a board | substrate part and a reflecting plate can be adhere | attached favorably.

また、本発明は、前記本圧着工程の前に、前記仮圧着工程において前記接着シートが仮圧着された状態で、前記基板部と前記接着シートにわたって貫通孔を形成する貫通孔形成工程を含むことを特徴とする。   Moreover, this invention includes the through-hole formation process which forms a through-hole over the said board | substrate part and the said adhesive sheet in the state by which the said adhesive sheet was temporarily crimped | bonded in the said temporary crimping process before the said main crimping | compression-bonding process. It is characterized by.

この発明によれば、迅速かつ容易に発光素子搭載用配線板を製造することができる。   According to the present invention, a light emitting element mounting wiring board can be manufactured quickly and easily.

また、本発明は、前記本圧着工程において、加圧によって前記接着シートが前記貫通孔の径方向内方に突出する寸法が、前記貫通孔の半径寸法の1/4以内であることを特徴とする。   Further, the present invention is characterized in that, in the main press-bonding step, a dimension in which the adhesive sheet protrudes inward in the radial direction of the through hole by pressurization is within 1/4 of a radial dimension of the through hole. To do.

この発明によれば、貫通孔を塞ぐことなく、基板部と反射板とを良好に接着することができる。   According to this invention, it is possible to satisfactorily bond the substrate portion and the reflecting plate without blocking the through hole.

また、本発明は、前記基板部が、複数層からなっており、前記貫通孔形成工程において、前記基板部に階段状の貫通孔を形成することを特徴とする。   Further, the present invention is characterized in that the substrate part is composed of a plurality of layers, and a stepped through hole is formed in the substrate part in the through hole forming step.

この発明によれば、発光素子及び接続線などを貫通孔内に収めることができる。   According to this invention, a light emitting element, a connection line, etc. can be stored in a through-hole.

また、本発明は、前記仮圧着工程において、70℃から140℃の温度に加熱した状態で前記接着シートと前記基板部とを加圧し、前記本圧着工程において、120℃から180℃の温度に加熱した状態で前記接着シートと前記反射板とを加圧し、前記硬化加熱工程において、130℃から160℃の温度で前記接着シートを硬化加熱することを特徴とする。   Further, the present invention is to pressurize the adhesive sheet and the substrate portion in a state of being heated to a temperature of 70 ° C. to 140 ° C. in the temporary pressure bonding step, and to be a temperature of 120 ° C. to 180 ° C. in the final pressure bonding step. The adhesive sheet and the reflecting plate are pressurized in a heated state, and the adhesive sheet is cured and heated at a temperature of 130 ° C. to 160 ° C. in the curing and heating step.

この発明によれば、基板部と反射板とを良好かつ確実に接着することができる。   According to this invention, a board | substrate part and a reflecting plate can be adhere | attached favorably and reliably.

また、本発明は、発光素子が搭載される基板部と、鏡面加工されたアルミニウムからなる反射板と、前記基板部と前記反射板との間に設けられ、前記基板部と前記反射板とを接着する接着シートとを備え、前記基板部及び前記接着シートにそれぞれ貫通孔が形成されており、前記反射板がそれぞれの前記貫通孔を介して前記基板部の表面側から露出していることを特徴とする。   In addition, the present invention provides a substrate portion on which a light emitting element is mounted, a reflector made of mirror-finished aluminum, and the substrate portion and the reflector, provided between the substrate portion and the reflector. A through-hole is formed in each of the substrate part and the adhesive sheet, and the reflection plate is exposed from the surface side of the substrate part through the through-hole. Features.

この発明によれば、発光素子から発せられた熱が、反射板を介して放熱され、発光素子から放射された光が反射板により反射される。   According to the present invention, the heat generated from the light emitting element is dissipated through the reflecting plate, and the light emitted from the light emitting element is reflected by the reflecting plate.

本発明によれば、鏡面加工されたアルミニウムからなる反射板が接着シートを介して設けられていることから、放熱効率を向上させることができるとともに、長期にわたって発光効率を高く維持することができる。   According to the present invention, since the mirror-finished reflector made of aluminum is provided via the adhesive sheet, the heat dissipation efficiency can be improved and the light emission efficiency can be kept high over a long period of time.

(実施形態1)
以下、本発明の第1の実施形態における発光素子搭載用配線板について、図面を参照して説明する。
図1は、本発明の第1の実施形態としての発光素子搭載用配線板を示したものである。
発光素子搭載用配線板1は、矩形板状の基板部2を備えている。
基板部2は、ガラス布入りエポキシ樹脂絶縁基板からなるものである。なお、基板部2としては、エポキシ樹脂中に酸化チタンなどの白色無機粉体を充填したガラス布入りエポキシ樹脂絶縁基板を使用することが好ましい。基板部2の厚さは0.1mmである。
基板部2には、貫通孔9が形成されており、この貫通孔9内に、例えばLEDなどの発光素子が設けられるようになっている。
(Embodiment 1)
Hereinafter, a light emitting element mounting wiring board according to a first embodiment of the present invention will be described with reference to the drawings.
FIG. 1 shows a wiring board for mounting a light emitting element as a first embodiment of the present invention.
The light emitting element mounting wiring board 1 includes a rectangular plate-like substrate portion 2.
The board | substrate part 2 consists of an epoxy resin insulation board | substrate with a glass cloth. In addition, as the board | substrate part 2, it is preferable to use the epoxy resin insulation board | substrate with a glass cloth filled with white inorganic powders, such as a titanium oxide, in an epoxy resin. The thickness of the substrate part 2 is 0.1 mm.
A through hole 9 is formed in the substrate portion 2, and a light emitting element such as an LED is provided in the through hole 9.

また、基板部2の一方の主面(上面)2aのうち、貫通孔9の近傍には、銅からなる接続端子7が設けられている。
接続端子7には、発光素子や外部機器などが接続されるようになっている。
接続端子7の表面には、はんだ接続やワイヤボンディング接続などの接続信頼性の確保のために金の薄層が設けられている。なお、この金の薄層は、銀などであってもよい。
これら金や銀の薄層の形成には、蒸着法やめっき法が使用できるが、量産性や経済性の点から、電解めっきや無電解めっきの使用が望ましい。
また、接続端子7の上面の所定の箇所には、ソルダーレジスト6が設けられている。
Further, a connection terminal 7 made of copper is provided in the vicinity of the through hole 9 in one main surface (upper surface) 2 a of the substrate portion 2.
A light emitting element or an external device is connected to the connection terminal 7.
A thin gold layer is provided on the surface of the connection terminal 7 in order to ensure connection reliability such as solder connection or wire bonding connection. The thin gold layer may be silver or the like.
For the formation of the gold or silver thin layer, a vapor deposition method or a plating method can be used. From the viewpoint of mass productivity and economical efficiency, it is desirable to use electrolytic plating or electroless plating.
A solder resist 6 is provided at a predetermined location on the upper surface of the connection terminal 7.

さらに、基板部2の他方の主面(裏面)2bには、接着シート5を介して矩形板状のアルミニウム基板(反射板)3が設けられている。
アルミニウム基板3の一方の主面3aには、鏡面加工がなされており、その表面は、波長400ナノメートルで測定したときの反射率が95%になっている。なお、鏡面加工としては、例えば研磨やアルマイト処理などがあり、アルミニウム基板3の表面にアルマイトを設けてもよい。
また、アルミニウム基板3の厚さは、製造工程や発光素子の搭載時に変形が生じない程度であればよく、0.1mm以上であることが望ましい。なお、アルミニウム基板3の厚さが大きいほど、放熱性には有利になるものの、加工性やコストの点では不利になる。そのため、アルミニウム基板3の厚さは2mm以下が望ましい。
このような構成のもと、貫通孔9,11に搭載された発光素子が熱を発すると、その熱はアルミニウム基板3を介して放熱される。
Further, a rectangular plate-like aluminum substrate (reflecting plate) 3 is provided on the other main surface (back surface) 2 b of the substrate portion 2 via an adhesive sheet 5.
One main surface 3a of the aluminum substrate 3 is mirror-finished, and the surface has a reflectivity of 95% when measured at a wavelength of 400 nanometers. The mirror surface processing includes, for example, polishing or anodizing, and anodizing may be provided on the surface of the aluminum substrate 3.
Moreover, the thickness of the aluminum substrate 3 should just be a grade which does not produce a deformation | transformation at the time of a manufacturing process or mounting of a light emitting element, and it is desirable that it is 0.1 mm or more. In addition, although the thickness of the aluminum substrate 3 is more advantageous for heat dissipation, it is disadvantageous in terms of workability and cost. Therefore, the thickness of the aluminum substrate 3 is desirably 2 mm or less.
Under such a configuration, when the light emitting element mounted in the through holes 9 and 11 generates heat, the heat is radiated through the aluminum substrate 3.

また、接着シート5には、貫通孔11が形成されている。そして、貫通孔9と貫通孔11とが一致して配置されている。これにより、アルミニウム基板3の表面の鏡面部10が、貫通孔9,11を介して、一方の主面2a側に露出している。これにより、発光素子が貫通孔9,11に搭載されて、光を放射したときに、その光の一部は、鏡面部10で反射して外方に放射されるようになっている。
接着シート5としては、後述する本圧着工程において、貫通孔11への径方向内方への突出寸法が、貫通孔11の半径寸法の1/4以内となる低流動性接着シートが使用される。すなわち、貫通孔11への径方向内方への突出寸法が、接着シート5の厚さの3倍以下である低流動性接着シートが使用される。
In addition, a through hole 11 is formed in the adhesive sheet 5. And the through-hole 9 and the through-hole 11 are arrange | positioned and corresponded. Thereby, the mirror surface portion 10 on the surface of the aluminum substrate 3 is exposed to the one main surface 2 a side through the through holes 9 and 11. Thereby, when the light emitting element is mounted in the through holes 9 and 11 and radiates light, a part of the light is reflected by the mirror surface portion 10 and radiated outward.
As the adhesive sheet 5, a low-fluidity adhesive sheet is used in which a projecting dimension inward in the radial direction to the through hole 11 is within ¼ of the radial dimension of the through hole 11 in a main press-bonding process described later. . That is, a low-fluidity adhesive sheet is used in which the protruding dimension inward in the radial direction to the through hole 11 is three times or less the thickness of the adhesive sheet 5.

このような接着シートとしては、高分子量エポキシ樹脂シート、熱硬化性を付与したポリアミドイミド樹脂、ポリイミド樹脂、アクリル系樹脂シートなどを使用することができる。すなわち、樹脂の流動性が樹脂の分子量やシート製造時の加熱条件等のパラメータによって制御されたものを使用する。
接着シート5の厚さは5μm〜100μmの範囲から選択される。厚くなると貫通孔11への突出寸法が大きくなる。一方、薄くなると作業性や樹脂の埋め込み性及び平滑性が劣る。これらの点から、より好ましい厚さの範囲は10μm〜50μmである。
As such an adhesive sheet, a high molecular weight epoxy resin sheet, a thermosetting thermosetting polyamideimide resin, a polyimide resin, an acrylic resin sheet, or the like can be used. That is, a resin whose fluidity is controlled by parameters such as the molecular weight of the resin and heating conditions during sheet production is used.
The thickness of the adhesive sheet 5 is selected from the range of 5 μm to 100 μm. As the thickness increases, the protruding dimension to the through hole 11 increases. On the other hand, when it becomes thin, workability, resin embedding property and smoothness are inferior. From these points, a more preferable thickness range is 10 μm to 50 μm.

次に、このように構成された本実施形態における発光素子搭載用配線板1の製造方法について説明する。
まず、図2に示すように、ガラス布入りエポキシ樹脂銅張積層板(三菱瓦斯化学株式会社製、商品名:CCL−HL820WDI)である基板部2を用意する。基板部2の厚さは0.1mmである。なお、符号21は、基板部2の表裏面に設けられた銅層を示している。
この基板部2について、図3に示すように、エッチング法によって、銅層21から接続端子7を形成する(端子形成工程)。
そして、図4に示すように、接続端子7の所定の箇所にソルダーレジスト6を形成する。さらに、接続端子7の表面に、ニッケル層を形成し、このニッケル層の表面に銀層を形成する。なお、ニッケル層に代えて、ニッケル合金層でもよく、銀層に代えて金層でもよい。
Next, the manufacturing method of the light emitting element mounting wiring board 1 in the present embodiment configured as described above will be described.
First, as shown in FIG. 2, the board | substrate part 2 which is the epoxy resin copper clad laminated board (Mitsubishi Gas Chemical Co., Ltd. make, brand name: CCL-HL820WDI) containing a glass cloth is prepared. The thickness of the substrate part 2 is 0.1 mm. Reference numeral 21 denotes a copper layer provided on the front and back surfaces of the substrate unit 2.
As shown in FIG. 3, the connection terminal 7 is formed from the copper layer 21 on the substrate portion 2 by an etching method (terminal formation step).
Then, as shown in FIG. 4, a solder resist 6 is formed at a predetermined location of the connection terminal 7. Further, a nickel layer is formed on the surface of the connection terminal 7, and a silver layer is formed on the surface of the nickel layer. Note that a nickel alloy layer may be used instead of the nickel layer, and a gold layer may be used instead of the silver layer.

さらに、図5に示すように、他方の主面2bの全面に、厚さ25μmの接着シート5(日立化成工業株式会社、商品名:KS7003)を仮圧着する(仮圧着工程)。
仮圧着工程において、雰囲気の温度95℃、圧着圧力0.5Mpaで50秒間の圧着を行う。
次いで、図6に示すように、ドリルによって、基板部2と接着シート5とにわたって貫通孔9,11を形成する(貫通孔形成工程)。貫通孔9,11の直径は3.0mmである。
Furthermore, as shown in FIG. 5, the adhesive sheet 5 (Hitachi Chemical Industry Co., Ltd., trade name: KS7003) having a thickness of 25 μm is temporarily pressure-bonded to the entire surface of the other main surface 2b (temporary pressure-bonding step).
In the temporary pressure bonding step, pressure bonding is performed for 50 seconds at an ambient temperature of 95 ° C. and a pressure pressure of 0.5 Mpa.
Next, as shown in FIG. 6, through holes 9 and 11 are formed across the substrate portion 2 and the adhesive sheet 5 by a drill (through hole forming step). The diameter of the through holes 9 and 11 is 3.0 mm.

そして、一方の主面が鏡面に研磨され、反射率が95%のアルミニウム基板3を、鏡面側と接着シート5とが接するように重ね合わせて本圧着する(本圧着工程)。
本圧着工程において、雰囲気の温度150℃、圧着圧力0.5Mpaで80秒の圧着を行う。
その後、雰囲気の温度150℃で、圧力を加えずに2時間の硬化加熱を行う(硬化加熱工程)。
これにより、接着シート5とアルミニウム基板3とが接着され、図1に示す発光素子搭載用配線板1が得られる。
Then, one main surface is polished to a mirror surface, and the aluminum substrate 3 having a reflectivity of 95% is overlaid so that the mirror surface side and the adhesive sheet 5 are in contact with each other and subjected to main pressure bonding (main pressure bonding step).
In the main pressure bonding step, pressure bonding is performed for 80 seconds at an atmospheric temperature of 150 ° C. and a pressure pressure of 0.5 Mpa.
Thereafter, curing is performed for 2 hours at a temperature of 150 ° C. without applying pressure (curing heating step).
Thereby, the adhesive sheet 5 and the aluminum substrate 3 are bonded together, and the light emitting element mounting wiring board 1 shown in FIG. 1 is obtained.

ここで、アルミニウム基板3は、端子形成工程において使用するめっき液やエッチング液に接触すると、容易に腐食し平滑な鏡面が失われ反射率が低下してしまう。
そのため、端子形成工程後に、アルミニウム基板3を設ける必要がある。
そこで、端子形成工程後に、通常の積層プレスによってアルミニウム基板3を設けることが考えられる。
積層プレスは、通常、雰囲気の温度が180〜200℃、圧着圧力3〜4Mpaで2〜3時間の圧着を行う。
しかし、ソルダーレジスト6は、150℃で溶融してしまうため、通常の積層プレスではソルダーレジスト6にダメージを与えてしまう。また、通常の積層プレスでは、回路の断線やショートを引き起こしてしまう。
Here, when the aluminum substrate 3 comes into contact with a plating solution or an etching solution used in the terminal forming step, the aluminum substrate 3 is easily corroded and a smooth mirror surface is lost, resulting in a decrease in reflectance.
Therefore, it is necessary to provide the aluminum substrate 3 after the terminal forming step.
Therefore, it is conceivable to provide the aluminum substrate 3 by a normal lamination press after the terminal forming step.
The lamination press usually performs pressure bonding for 2 to 3 hours at an atmospheric temperature of 180 to 200 ° C. and a pressure pressure of 3 to 4 MPa.
However, since the solder resist 6 melts at 150 ° C., the solder resist 6 is damaged in a normal lamination press. In addition, a normal laminating press causes circuit disconnection or short circuit.

本実施形態においては、仮圧着工程と本圧着工程とに分けて圧着を行うものである。
図7は、接着シート5の材料である熱硬化性樹脂の温度と粘度との関係を示す表である。
室温状態から加熱していくと、接着シート5を構成する樹脂成分が流動し易くなり粘度が低下する。その一方で、ある一定の温度になると、加熱に伴い樹脂の架橋反応(構成分子間の橋かけ反応)によって樹脂が硬化する。すなわち、温度上昇によって、まず、樹脂の流動性が向上し、その後、加熱による架橋反応によって樹脂の流動性が低下(硬化)する。その結果、温度−粘度曲線は、図7に示すように、下に凸の曲線となる。
In the present embodiment, the pressure bonding is performed separately in the temporary pressure bonding process and the main pressure bonding process.
FIG. 7 is a table showing the relationship between the temperature and the viscosity of the thermosetting resin that is the material of the adhesive sheet 5.
If it heats from a room temperature state, the resin component which comprises the adhesive sheet 5 will flow easily, and a viscosity will fall. On the other hand, when the temperature reaches a certain temperature, the resin is cured by a crosslinking reaction (crosslinking reaction between constituent molecules) of the resin with heating. That is, as the temperature rises, the fluidity of the resin is first improved, and then the fluidity of the resin is lowered (cured) by a crosslinking reaction by heating. As a result, the temperature-viscosity curve becomes a downwardly convex curve as shown in FIG.

本発明では、仮圧着工程において、接着シート5の一方の面5aを基板部2の他方の主面2bに仮圧着する。仮圧着工程時の温度、圧力、時間の選定は、仮圧着後に行う貫通孔形成工程の穴加工(ドリル)時に、一方の主面5aと他方の主面2bとの接着面に剥れが生じない程度を基準に行う。これは、一方の主面5aと他方の主面2bとの隙間にドリル加工くずなどが入らないようにするためである。
この仮圧着工程において、加熱過剰になると、樹脂の架橋反応が進んでしまい、本圧着工程において接着シート5の流動性が低下し、接着が不十分になってしまう。そのため、架橋反応が進まない程度に仮圧着する。そのための温度が70℃から140℃、圧着圧力が0.1〜1Mpa、時間が10〜90秒となる。
In the present invention, one surface 5 a of the adhesive sheet 5 is temporarily bonded to the other main surface 2 b of the substrate portion 2 in the temporary pressure bonding step. Selection of temperature, pressure, and time during the pre-bonding process is such that peeling occurs on the bonding surface between the one main surface 5a and the other main surface 2b during drilling in the through-hole forming step performed after the temporary bonding. It is based on the degree that there is no. This is to prevent drilling debris and the like from entering the gap between one main surface 5a and the other main surface 2b.
In this temporary press-bonding step, if the heating is excessive, the resin cross-linking reaction proceeds, and in the main press-bonding step, the fluidity of the adhesive sheet 5 is lowered and the adhesion becomes insufficient. Therefore, temporary pressure bonding is performed to such an extent that the crosslinking reaction does not proceed. For this purpose, the temperature is 70 ° C. to 140 ° C., the pressure is 0.1-1 Mpa, and the time is 10-90 seconds.

次いで、貫通孔形成工程の後、本圧着を行う。本圧着工程においては、接着シート5の他方の主面5bと、アルミニウム基板3の一方の主面3aとを接着する。本圧着工程において、流動過剰になると、接着シート5が貫通孔11から流出し貫通孔11が塞がれてしまう。さらに、加熱過剰になると、樹脂の架橋反応が進んでしまい、樹脂の硬化が進んでしまう。そのため、流動過剰、加熱過剰にならない程度に本圧着する。そのための本圧着工程における温度が120℃から180℃、圧着圧力が0.1〜1Mpa、時間が20〜600秒となる。さらに、硬化加熱工程における温度が130℃から160℃、時間が30分以上150分以下となる。   Next, after the through-hole forming step, main pressure bonding is performed. In the main press bonding step, the other main surface 5b of the adhesive sheet 5 and one main surface 3a of the aluminum substrate 3 are bonded. If the flow is excessive in the main pressure bonding step, the adhesive sheet 5 flows out of the through hole 11 and the through hole 11 is blocked. Furthermore, when the heating is excessive, the crosslinking reaction of the resin proceeds and the curing of the resin proceeds. Therefore, the main pressure bonding is performed to such an extent that the fluid does not excessively flow and does not excessively heat. Therefore, the temperature in the main press bonding step is 120 ° C. to 180 ° C., the press bonding pressure is 0.1 to 1 Mpa, and the time is 20 to 600 seconds. Further, the temperature in the curing and heating step is from 130 ° C. to 160 ° C., and the time is from 30 minutes to 150 minutes.

以上より、本実施形態における発光素子搭載用配線板1によれば、発光素子から発する熱を、アルミニウム基板3を介して伝えるによって、効率よく放熱することができる。さらに、発光素子から放射される光を鏡面部10によって反射させることにより、長期にわたって発光効率を高く維持することができる。
また、仮圧着工程、本圧着工程及び硬化加熱工程によって、基板部2とアルミニウム基板3とを接着シート5を介して接着することから、端子形成後の基板部2にアルミニウム基板3を適正に接着することができる。
また、仮圧着工程の後、貫通孔形成工程によって貫通孔9,11を形成することから、迅速かつ容易に貫通孔を形成することができる。
また、接着シート5として、本圧着工程において、貫通孔11への径方向内方への突出寸法が、貫通孔11の半径寸法の1/4以内となる低流動性接着シートが使用されることから、貫通孔11を塞ぐことなく、基板部2とアルミニウム基板3とを良好に接着することができる。
As described above, according to the light emitting element mounting wiring board 1 of the present embodiment, the heat generated from the light emitting element can be efficiently radiated by being transmitted through the aluminum substrate 3. Further, by reflecting the light emitted from the light emitting element by the mirror surface portion 10, the luminous efficiency can be kept high over a long period of time.
Moreover, since the board | substrate part 2 and the aluminum substrate 3 are adhere | attached through the adhesive sheet 5 by the temporary crimping | compression-bonding process, this crimping | compression-bonding process, and the hardening heating process, the aluminum substrate 3 is adhere | attached appropriately to the board | substrate part 2 after terminal formation. can do.
In addition, since the through holes 9 and 11 are formed by the through hole forming process after the temporary pressure bonding process, the through holes can be formed quickly and easily.
In addition, as the adhesive sheet 5, a low-fluidity adhesive sheet in which the projecting dimension inward in the radial direction to the through hole 11 is within ¼ of the radial dimension of the through hole 11 is used in the main crimping step. Thus, the substrate portion 2 and the aluminum substrate 3 can be favorably bonded without blocking the through hole 11.

(実施形態2)
次に、本発明の第2の実施形態について説明する。
図8は、本発明の第2の実施形態を示したものである。
図8において、図1から図7に記載の構成要素と同一部分については同一符号を付し、その説明を省略する。
この実施形態と上記第1の実施形態とは基本的構成は同一であり、ここでは主として異なる点について説明する。
(Embodiment 2)
Next, a second embodiment of the present invention will be described.
FIG. 8 shows a second embodiment of the present invention.
In FIG. 8, the same components as those shown in FIGS. 1 to 7 are denoted by the same reference numerals, and the description thereof is omitted.
This embodiment and the first embodiment have the same basic configuration, and different points will be mainly described here.

本実施形態においては、矩形板状の第1の基板部25と、同形状の第2の基板部23とが積層されて構成されている。第1の基板部25と第2の基板部23とは、不図示の接着シートにより接合されている。第2の基板部23には、大径の貫通孔26が形成されている。また、第1の基板部23には、小径の貫通孔27が形成されている。これら貫通孔26,27は、同心線上に配置されている。すなわち、貫通孔26,27は、側面視して、階段状に形成されている。
このような構成のもと、貫通孔26,27,11に発光素子が設けられ、ワイヤボンディングにより発光素子と接続端子7とが接続されるようになっている。このとき、貫通孔26,27が階段状になっていることから、発光素子を含めてワイヤボンディング用のワイヤをも貫通孔26,27内に収めることができる。
また、仮圧着工程、本圧着工程及び硬化加熱工程により、第1の基板部25と第2の基板部23との間の不図示の接着シートにダメージを与えることなく、第1の基板部25と第2の基板部23との接着力を強固に維持することができる。
In the present embodiment, the first substrate portion 25 having a rectangular plate shape and the second substrate portion 23 having the same shape are laminated. The first substrate unit 25 and the second substrate unit 23 are joined by an adhesive sheet (not shown). A large-diameter through hole 26 is formed in the second substrate portion 23. Further, a small-diameter through hole 27 is formed in the first substrate portion 23. These through holes 26 and 27 are arranged on concentric lines. That is, the through holes 26 and 27 are formed in a step shape when viewed from the side.
Under such a configuration, light emitting elements are provided in the through holes 26, 27, and 11, and the light emitting elements and the connection terminals 7 are connected by wire bonding. At this time, since the through holes 26 and 27 are stepped, wires for wire bonding including the light emitting elements can be accommodated in the through holes 26 and 27.
In addition, the first substrate portion 25 is not damaged by the temporary pressure bonding step, the main pressure bonding step, and the curing heating step without damaging an adhesive sheet (not shown) between the first substrate portion 25 and the second substrate portion 23. And the second substrate portion 23 can be firmly maintained.

なお、上記実施形態においては、アルミニウム基板3の鏡面の反射率を95%としたが、これに限ることはなく、適宜変更可能である。特に、80%以上100%以下であることが望ましい。
また、接着シート5について、貫通孔11への径方向内方への突出寸法が、接着シート5の厚さの3倍以下であるとしたが、これに限ることはなく、適宜変更可能である。特に、0〜5倍の範囲であることが望ましい。
さらに、貫通孔9,11の直径を3mmとしたが、これに限ることはなく、適宜変更可能である。特に、1〜5mmの範囲であることが望ましい。
また、基板部2の厚さが0.1mmであるとしたが、これに限ることはなく、厚さ寸法は適宜変更可能である。
なお、本発明の技術範囲は上記の実施形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲において、種々の変更を加えることが可能である。
In the above embodiment, the reflectance of the mirror surface of the aluminum substrate 3 is 95%. However, the present invention is not limited to this and can be changed as appropriate. In particular, it is desirable that it is 80% or more and 100% or less.
Moreover, about the adhesive sheet 5, although the protrusion dimension to radial direction inner side to the through-hole 11 was 3 times or less of the thickness of the adhesive sheet 5, it is not restricted to this, It can change suitably. . In particular, the range of 0 to 5 times is desirable.
Furthermore, although the diameter of the through holes 9 and 11 is 3 mm, it is not limited to this and can be changed as appropriate. In particular, the range of 1 to 5 mm is desirable.
Moreover, although the thickness of the board | substrate part 2 was 0.1 mm, it is not restricted to this, A thickness dimension can be changed suitably.
The technical scope of the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention.

本発明に係る発光素子搭載用配線板の第1の実施形態を示す側断面図である。It is a sectional side view which shows 1st Embodiment of the wiring board for light emitting element mounting which concerns on this invention. 図1の発光素子搭載用配線板の製造方法を示す図であって、基板部の表裏面に銅層を設けた様子を示す側断面図である。It is a figure which shows the manufacturing method of the wiring board for light emitting element mounting of FIG. 1, Comprising: It is a sectional side view which shows a mode that the copper layer was provided in the front and back of a board | substrate part. 図2の銅層から接続端子を形成した様子を示す側断面図である。It is a sectional side view which shows a mode that the connection terminal was formed from the copper layer of FIG. 図3の接続端子にソルダーレジストを設けた様子を示す側断面図である。It is a sectional side view which shows a mode that the soldering resist was provided in the connecting terminal of FIG. 図4の基板部に接着シートを設けた様子を示す側断面図である。It is a sectional side view which shows a mode that the adhesive sheet was provided in the board | substrate part of FIG. 図5の基板部及び接着シートに貫通孔を形成した様子を示す側断面図である。It is a sectional side view which shows a mode that the through-hole was formed in the board | substrate part and adhesive sheet of FIG. 接着シートの材料である熱硬化性樹脂の温度と粘度との関係を示す表である。It is a table | surface which shows the relationship between the temperature of a thermosetting resin which is a material of an adhesive sheet, and a viscosity. 本発明に係る発光素子搭載用配線板の第2の実施形態を示す側断面図である。It is a sectional side view which shows 2nd Embodiment of the wiring board for light emitting element mounting which concerns on this invention.

符号の説明Explanation of symbols

1 発光素子搭載用配線板
2 基板部
3 アルミニウム基板(反射板)
5 接着シート
9,11,26,27 貫通孔
DESCRIPTION OF SYMBOLS 1 Wiring board for light emitting element mounting 2 Board | substrate part 3 Aluminum substrate (reflection board)
5 Adhesive sheet 9, 11, 26, 27 Through hole

Claims (7)

発光素子が搭載される発光素子搭載用配線板の製造方法であって、
前記発光素子が設けられる基板部と、鏡面加工されたアルミニウムからなる反射板とを、接着シートを介して接着する接着工程を含むことを特徴とする発光素子搭載用配線板の製造方法。
A method of manufacturing a light emitting element mounting wiring board on which a light emitting element is mounted,
The manufacturing method of the wiring board for light emitting element mounting characterized by including the adhesion process which adhere | attaches the board | substrate part in which the said light emitting element is provided, and the reflecting plate which consists of mirror-finished aluminum through an adhesive sheet.
前記接着工程は、
前記基板部の裏面に前記接着シートを仮圧着する仮圧着工程と、
前記仮圧着工程において仮圧着された接着シートの裏面に、前記反射板を本圧着する本圧着工程と、
前記本圧着工程において本圧着された接着シートを加熱して硬化させる硬化加熱工程とを含むことを特徴とする請求項1に記載の発光素子搭載用配線板の製造方法。
The bonding step includes
A temporary pressure bonding step of temporarily pressing the adhesive sheet to the back surface of the substrate portion;
A main press-bonding step of finally press-bonding the reflection plate to the back surface of the adhesive sheet temporarily press-bonded in the temporary press-bonding step;
The method for manufacturing a wiring board for mounting a light-emitting element according to claim 1, further comprising a curing heating step of heating and curing the adhesive sheet that has been subjected to the final pressure bonding in the main pressure bonding step.
前記本圧着工程の前に、前記仮圧着工程において前記接着シートが仮圧着された状態で、前記基板部と前記接着シートにわたって貫通孔を形成する貫通孔形成工程を含むことを特徴とする請求項2に記載の発光素子搭載用配線板の製造方法。   The through-hole formation process of forming a through-hole between the said board | substrate part and the said adhesive sheet in the state by which the said adhesive sheet was temporarily crimped | bonded in the said temporary crimping process before the said crimping | compression-bonding process, The manufacturing method of the wiring board for light emitting element mounting of 2 characterized by the above-mentioned. 前記本圧着工程において、加圧によって前記接着シートが前記貫通孔の径方向内方に突出する寸法が、前記貫通孔の半径寸法の1/4以内であることを特徴とする請求項3に記載の発光素子搭載用配線板の製造方法。   4. The dimension according to claim 3, wherein, in the main press-bonding step, a dimension in which the adhesive sheet protrudes inward in a radial direction of the through hole by pressurization is within ¼ of a radial dimension of the through hole. Manufacturing method of the light emitting element mounting wiring board. 前記基板部が、複数層からなっており、
前記貫通孔形成工程において、前記基板部に階段状の貫通孔を形成することを特徴とする請求項3又は請求項4に記載の発光素子搭載用配線板の製造方法。
The substrate part is composed of a plurality of layers,
5. The method for manufacturing a wiring board for mounting a light emitting element according to claim 3, wherein, in the through hole forming step, a stepped through hole is formed in the substrate portion.
前記仮圧着工程において、70℃から140℃の温度に加熱した状態で前記接着シートと前記基板部とを加圧し、
前記本圧着工程において、120℃から180℃の温度に加熱した状態で前記接着シートと前記反射板とを加圧し、
前記硬化加熱工程において、130℃から160℃の温度で前記接着シートを硬化加熱することを特徴とする請求項2から請求項5のいずれか一項に記載の発光素子搭載用配線板の製造方法。
In the temporary press-bonding step, the adhesive sheet and the substrate portion are pressed in a state heated to a temperature of 70 ° C. to 140 ° C.,
In the main press-bonding step, the adhesive sheet and the reflection plate are pressed in a state heated to a temperature of 120 ° C. to 180 ° C.,
The method for manufacturing a wiring board for mounting a light-emitting element according to any one of claims 2 to 5, wherein in the curing and heating step, the adhesive sheet is cured and heated at a temperature of 130 ° C to 160 ° C. .
発光素子が搭載される基板部と、
鏡面加工されたアルミニウムからなる反射板と、
前記基板部と前記反射板との間に設けられ、前記基板部と前記反射板とを接着する接着シートとを備え、
前記基板部及び前記接着シートにそれぞれ貫通孔が形成されており、前記反射板がそれぞれの前記貫通孔を介して前記基板部の表面側から露出していることを特徴とする発光素子搭載用配線板。
A substrate portion on which the light emitting element is mounted;
A reflector made of mirror-finished aluminum;
An adhesive sheet that is provided between the substrate portion and the reflector, and bonds the substrate portion and the reflector;
A through hole is formed in each of the substrate part and the adhesive sheet, and the reflector is exposed from the surface side of the substrate part through the through hole. Board.
JP2007148044A 2007-06-04 2007-06-04 Manufacturing method of light emitting element mounting wiring board and light emitting element mounting wiring board Pending JP2008300773A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010150810A1 (en) * 2009-06-26 2010-12-29 富士フイルム株式会社 Light reflecting substrate and process for manufacture thereof
JP2012079780A (en) * 2010-09-30 2012-04-19 Hitachi Chem Co Ltd Substrate for mounting led and manufacturing method therefor
JP2012079779A (en) * 2010-09-30 2012-04-19 Hitachi Chem Co Ltd Substrate for mounting led and manufacturing method therefor
WO2012073875A1 (en) * 2010-11-30 2012-06-07 富士フイルム株式会社 Insulating substrate and method for manufacturing same

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0832187A (en) * 1994-07-19 1996-02-02 Hitachi Ltd Module board and electronic device using it
JPH11296805A (en) * 1998-04-03 1999-10-29 Matsushita Electric Ind Co Ltd Magnetic head and its manufacture
JP2000223752A (en) * 1999-01-29 2000-08-11 Nichia Chem Ind Ltd Optical semiconductor device and its forming method
JP2002299386A (en) * 2001-03-29 2002-10-11 Hitachi Cable Ltd Double-sided wiring film carrier and manufacturing method therefor
JP2002353622A (en) * 2001-03-23 2002-12-06 Fujikura Ltd Multilayer wiring board and base material for multilayer interconnection, and method of manufacturing the same
JP2004072071A (en) * 2002-06-13 2004-03-04 Hitachi Chem Co Ltd Method of manufacturing multilayer wiring board, and multilayer wiring board
JP2006186297A (en) * 2004-12-03 2006-07-13 Toshiba Corp Semiconductor light emitting device and its manufacturing method
WO2006129690A1 (en) * 2005-05-31 2006-12-07 Showa Denko K.K. Substrate for led and led package
JP2007109701A (en) * 2005-10-11 2007-04-26 Hitachi Aic Inc Substrate for mounting light emitting element

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0832187A (en) * 1994-07-19 1996-02-02 Hitachi Ltd Module board and electronic device using it
JPH11296805A (en) * 1998-04-03 1999-10-29 Matsushita Electric Ind Co Ltd Magnetic head and its manufacture
JP2000223752A (en) * 1999-01-29 2000-08-11 Nichia Chem Ind Ltd Optical semiconductor device and its forming method
JP2002353622A (en) * 2001-03-23 2002-12-06 Fujikura Ltd Multilayer wiring board and base material for multilayer interconnection, and method of manufacturing the same
JP2002299386A (en) * 2001-03-29 2002-10-11 Hitachi Cable Ltd Double-sided wiring film carrier and manufacturing method therefor
JP2004072071A (en) * 2002-06-13 2004-03-04 Hitachi Chem Co Ltd Method of manufacturing multilayer wiring board, and multilayer wiring board
JP2006186297A (en) * 2004-12-03 2006-07-13 Toshiba Corp Semiconductor light emitting device and its manufacturing method
WO2006129690A1 (en) * 2005-05-31 2006-12-07 Showa Denko K.K. Substrate for led and led package
JP2007109701A (en) * 2005-10-11 2007-04-26 Hitachi Aic Inc Substrate for mounting light emitting element

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010150810A1 (en) * 2009-06-26 2010-12-29 富士フイルム株式会社 Light reflecting substrate and process for manufacture thereof
JP2012079780A (en) * 2010-09-30 2012-04-19 Hitachi Chem Co Ltd Substrate for mounting led and manufacturing method therefor
JP2012079779A (en) * 2010-09-30 2012-04-19 Hitachi Chem Co Ltd Substrate for mounting led and manufacturing method therefor
WO2012073875A1 (en) * 2010-11-30 2012-06-07 富士フイルム株式会社 Insulating substrate and method for manufacturing same

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