JP2008248239A5 - - Google Patents
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- Publication number
- JP2008248239A5 JP2008248239A5 JP2008055918A JP2008055918A JP2008248239A5 JP 2008248239 A5 JP2008248239 A5 JP 2008248239A5 JP 2008055918 A JP2008055918 A JP 2008055918A JP 2008055918 A JP2008055918 A JP 2008055918A JP 2008248239 A5 JP2008248239 A5 JP 2008248239A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin composition
- siloxane resin
- radical polymerizable
- polymerizable organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- -1 silane compound Chemical class 0.000 claims 16
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 10
- 239000011342 resin composition Substances 0.000 claims 10
- 125000000962 organic group Chemical group 0.000 claims 8
- 229920001296 polysiloxane Polymers 0.000 claims 7
- 229910000077 silane Inorganic materials 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 4
- 239000007870 radical polymerization initiator Substances 0.000 claims 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 2
- 125000003277 amino group Chemical group 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 229910052731 fluorine Inorganic materials 0.000 claims 2
- 239000011737 fluorine Substances 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims 1
- 239000005711 Benzoic acid Substances 0.000 claims 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 235000010233 benzoic acid Nutrition 0.000 claims 1
- 150000008366 benzophenones Chemical class 0.000 claims 1
- 238000007334 copolymerization reaction Methods 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 239000011817 metal compound particle Substances 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008055918A JP2008248239A (ja) | 2007-03-08 | 2008-03-06 | シロキサン樹脂組成物、それを用いた硬化膜および光学デバイス |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007058163 | 2007-03-08 | ||
| JP2008055918A JP2008248239A (ja) | 2007-03-08 | 2008-03-06 | シロキサン樹脂組成物、それを用いた硬化膜および光学デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008248239A JP2008248239A (ja) | 2008-10-16 |
| JP2008248239A5 true JP2008248239A5 (enExample) | 2010-09-16 |
Family
ID=39973554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008055918A Pending JP2008248239A (ja) | 2007-03-08 | 2008-03-06 | シロキサン樹脂組成物、それを用いた硬化膜および光学デバイス |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008248239A (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8901268B2 (en) * | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
| EP2312394B1 (en) * | 2008-08-01 | 2012-12-05 | Asahi Glass Company, Limited | Negative working photosensitive composition, partition walls for an optical element using the negative working photosensitive composition, and optical element comprising the partition walls |
| KR101739951B1 (ko) * | 2009-12-04 | 2017-05-25 | 다우 코닝 코포레이션 | 실세스퀴옥산 수지의 안정화 방법 |
| JP2012082393A (ja) * | 2010-09-17 | 2012-04-26 | Jsr Corp | ポリシロキサン組成物、並びにその硬化膜及びその形成方法 |
| US9228035B2 (en) | 2010-10-20 | 2016-01-05 | Tokuyama Corporation | Photo-curable nanoimprint composition, method for formatting pattern using the composition, and nanoimprint replica mold comprising cured product of the composition |
| WO2013047131A1 (en) * | 2011-09-30 | 2013-04-04 | Fujifilm Corporation | Curable resin composition, optical member set, method of producing the same, and solid state imaging device using the same |
| KR101969192B1 (ko) * | 2012-01-31 | 2019-04-15 | 에이지씨 가부시키가이샤 | 지문 부착 방지제 및 그 제조 방법, 하드 코트용 조성물, 하드 코트층을 갖는 기재 그리고 터치 패널 |
| JP2016040353A (ja) * | 2014-08-12 | 2016-03-24 | 日本曹達株式会社 | 有機無機複合体及びその形成用組成物 |
| JP2016056256A (ja) * | 2014-09-08 | 2016-04-21 | セイコーインスツル株式会社 | コーティング剤、コーティング膜、およびコーティング剤の製造方法 |
| JP6864268B2 (ja) | 2015-06-11 | 2021-04-28 | 日産化学株式会社 | 感放射線性組成物 |
| CN108026253B (zh) * | 2015-09-28 | 2020-06-12 | 东丽株式会社 | 高分子化合物及制造方法、树脂组合物、膜、固体摄像器件及制造方法、及光学设备 |
| KR102465013B1 (ko) * | 2016-11-28 | 2022-11-09 | 메르크 파텐트 게엠베하 | 보호막을 구비하는 박막 트랜지스터 기판 및 이의 제조방법 |
| WO2019102655A1 (ja) * | 2017-11-21 | 2019-05-31 | 東レ株式会社 | シロキサン樹脂組成物、硬化膜および表示装置 |
| WO2020196750A1 (ja) * | 2019-03-28 | 2020-10-01 | 株式会社カネカ | 有機無機複合樹脂及びその製造方法 |
| TWI861658B (zh) * | 2022-12-30 | 2024-11-11 | 達興材料股份有限公司 | 清潔組合物、清洗方法和半導體製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0681774B2 (ja) * | 1988-10-18 | 1994-10-19 | 信越化学工業株式会社 | 紫外線硬化性組成物 |
| JP2005036051A (ja) * | 2003-07-17 | 2005-02-10 | Shin Etsu Chem Co Ltd | 放射線硬化性シリコーンゴム組成物および電気・電子装置 |
| JPWO2005085922A1 (ja) * | 2004-03-09 | 2008-01-24 | Jsr株式会社 | 光導波路チップの製造方法 |
| JP4671338B2 (ja) * | 2005-06-27 | 2011-04-13 | 日本化薬株式会社 | フッ素含有ポリシロキサン、それを用いる感光性樹脂組成物及びその硬化物 |
-
2008
- 2008-03-06 JP JP2008055918A patent/JP2008248239A/ja active Pending
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