JP2008215943A - Illumination device and pattern correction device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an illumination device capable of suppressing the occurrence of a shadow part caused by the shape of a holding stand such as a glass surface plate or the like for holding a substrate, and a pattern correction device. <P>SOLUTION: The illumination device is equipped with a glass surface plate as the holding stand and an illumination member 10. The glass surface plate holds a glass substrate and comprises glass as a light pervious member. The illumination member 10 is arranged on the side of the back 25 opposite to the loading surface of the glass substrate in the glass surface plate and irradiates the glass substrate with illumination light through the back 25 of the glass surface plate. The illumination member 10 contains emission elements 22a and 22b as a plurality of light sources mutually different in incident angles θ1 and θ2 being the angles formed with respect to the back 25 of the glass surface plate by the optical axes 23a and 23b of the emitted illumination light. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an illumination device and a pattern correction device, and more particularly to an illumination device used in a manufacturing process of a liquid crystal display device (LCD) and a pattern correction device using the illumination device.

Conventionally, a pattern correction apparatus has been used for inspecting and correcting defects generated in a manufacturing process of a color filter which is a main component of an LCD. In the pattern correction apparatus, when observing or correcting a defective portion of the color filter, the color filter is observed from the front surface side of the color filter while irradiating illumination light from the back surface side of the color filter as the substrate to be processed. There is a need. In this case, arrange the color filter on the glass surface plate and irradiate the illumination light from below the glass surface plate, or irradiate the illumination light from the surface side of the color filter, and arrange the reflective film under the color filter A method for observing a color filter using illumination light reflected by the reflective film as transmitted illumination light is known (for example, see Patent Document 1).
JP 2006-38825 A

  A method of observing a defect portion while irradiating illumination light from below a glass surface plate as described above in a conventional pattern correction apparatus will be described with reference to FIG. FIG. 6 is a schematic diagram for explaining a method of observing a defect portion in a conventional pattern correction apparatus.

  Referring to FIG. 6, in the conventional pattern correction apparatus, a substrate 108 which is a glass substrate to be corrected (color filter) is arranged on a glass surface plate 109 (also referred to as a chuck stage). An illumination member 110 for transmitted illumination is disposed below the glass surface plate 109. A lens 130 is disposed between the illumination member 110 and the glass surface plate 109. An objective lens 111 of an observation optical system is arranged on the glass surface plate 109 so as to face the illumination member 110 and the lens 130 via the glass surface plate 109. In the conventional pattern correction apparatus, the illumination light emitted from the illumination member 110 enters the substrate 108 from the back side as indicated by the arrow 123 via the lens 130 and the glass surface plate 109. The illumination light is incident on the substrate 108 as parallel light by the lens 130. Then, the defective portion 112 of the portion of the substrate 108 irradiated with the illumination light by the objective lens 111 is observed.

  However, the above-described conventional pattern correction apparatus has the following problems. That is, the glass surface plate 109 has large and small holes such as suction holes for vacuum suction and fixing of the substrate 108 or lifter pin placement holes for lifting the substrate 108 when the substrate 108 is carried into and out of the pattern correction device. , Various cutout portions 131 as shown in FIG. 7 exist. FIG. 7 is a schematic diagram for explaining a conventional problem. Then, when the transmitted illumination light hits the notch 131 or the hole of the glass surface plate 109 as shown in FIG. 7, the transmitted illumination light is refracted at the edge (for example, the side wall 132 of the notch 131 in FIG. 7). . Further, when the surface of the edge portion is rough, diffuse reflection of transmitted illumination light may occur at the edge portion. When the transmitted illumination light is refracted or diffusely reflected in this way, a shadow portion 134 is generated in the observation image 133 due to a light amount difference from the surroundings as shown in the schematic diagram at the top of FIG. When such a shadow portion 134 occurs, there is a problem that the defect portion 112 (see FIG. 6) cannot be sufficiently observed. Further, when the shadow part 134 and the defective part 112 overlap with each other, it is necessary to perform the observation and correction work by shifting the substrate 108 and re-fixing it, resulting in a problem that work efficiency is lowered.

  The present invention has been made to solve the above-described problems, and an object of the present invention is to suppress generation of shadows due to the shape of a holding table such as a glass surface plate for holding a substrate. It is an object to provide an illumination device and a pattern correction device.

  The lighting device according to the present invention includes a holding table and a lighting member. The holding table holds the substrate and is made of a translucent member. The illumination member is disposed on the back side opposite to the mounting surface on which the substrate is mounted on the holding table. The illumination member irradiates the substrate with illumination light through the back surface of the holding table. The illumination member includes a plurality of light sources having different incident angles, which are angles formed by the optical axis of the emitted illumination light with respect to the back surface of the holding table.

  In this way, illumination light can be incident from a plurality of light sources at various incident angles on the back surface of the substrate held on the holding table from the lighting device. For this reason, it can suppress that the shadow part resulting from the uneven | corrugated shape of a holding stand is conspicuous in an observation image like the case where parallel light enters from the back surface of a board | substrate as illumination light. Here, the optical axis refers to a straight line extending in the direction in which the intensity of illumination light emitted from the light source is the strongest when viewed from the center of the light source.

  In the illuminating device, the illumination member has the same incident angle, and is arranged so as to surround the plurality of first light sources arranged on the circumference, the first light source and the first light source. A plurality of second light sources having different angles may be included. Moreover, in the said illuminating device, the 1st light source may be arrange | positioned in the inner peripheral side of a 2nd light source in the surface facing the holding stand of an illuminating member. The optical axis of the illumination light emitted from the second light source may be inclined toward the inner peripheral side of the second light source. From a different point of view, the second light source is arranged such that the optical axis of the illumination light emitted from the second light source is inclined in a direction approaching the optical axis of the illumination light emitted from the first light source. It may be determined. In this case, illumination having an incident angle different from the incident angle of the illumination light from the first light source (emitted from the second light source) in the region of the back surface of the substrate irradiated with the illumination light emitted from the first light source. Light can be easily irradiated. For this reason, it is possible to reliably irradiate illumination light from the second light source having a different incident angle onto a circular region irradiated with illumination light from the first light source.

  A pattern correction apparatus according to the present invention includes the illumination device. In this way, since it is possible to suppress the occurrence of shadows due to the unevenness of the holding table in the observation image obtained by irradiating the substrate with illumination light, the substrate can be observed accurately and efficiently. .

  As described above, according to the present invention, it is possible to suppress the occurrence of shadows due to the unevenness of the holding table in the observation image obtained by irradiating the substrate held on the holding table with illumination light from the back surface side. .

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following drawings, the same or corresponding parts are denoted by the same reference numerals, and description thereof will not be repeated.

  FIG. 1 is a perspective view showing the overall configuration of a pattern correction apparatus according to an embodiment of the present invention. A pattern correction apparatus according to the present invention will be described with reference to FIG.

  In FIG. 1, in this fine pattern correction device, a laser device 1, an observation optical system 2, and an ink application mechanism 4 are fixed to a Z-axis table 5. The Z-axis table 5 is provided so as to be movable in the Z-axis direction (vertical direction). The Z-axis table 5 is provided on the X-axis table 6 so as to be movable in the X-axis direction (lateral direction). The X-axis table 6 is provided on the Y-axis table 7 so as to be movable in the Y-axis direction (lateral direction).

  Below the X-axis table 6, a glass surface plate 9 on which a glass substrate 8 to be corrected is mounted is provided. The glass surface plate 9 has lifter pin holes 9a and vacuum suction grooves 9b. The lifter pin hole 9a is a structure for passing a lifter pin constituting a lift-up mechanism for lifting up when the glass substrate 8 is carried in and out. The vacuum suction groove 9 b is for fixing the glass substrate 8 to the upper surface of the glass surface plate 9. At several locations inside the vacuum suction groove 9b, vacuum suction holes are formed for drawing a vacuum (exhausting atmospheric gas such as air from a region surrounded by the vacuum suction groove 9b and the back surface of the glass substrate 8). ing.

  The laser device 1 irradiates a laser beam to an unnecessary portion of the ink applied to the defective portion of the color filter on the glass substrate 8 or a connection portion of the short defect electrode on the glass substrate 8, and uses the thermal energy for the ink. And electrode material is removed by sublimation or scattering. The observation optical system 2 captures an image of a defective part and displays the captured image on a television monitor (not shown). A light source (not shown) for irradiating illumination light from the back side of the glass substrate 8 is disposed at a position facing the objective lens 11 of the observation optical system 2 via the top surfaces of the glass substrate 8 and the glass surface plate 9. Yes. The light source will be described later. The ink application mechanism 4 applies ink to a defective portion of the color filter on the glass substrate 8 or applies a conductive paste to an electrode lacking portion called an open defect on the glass substrate 8. The applied ink or paste is photocured or thermally cured by ultraviolet illumination (not shown) or halogen lamp illumination (not shown).

  Since the laser device 1, the observation optical system 2, and the ink application mechanism 4 are attached to the Z-axis table 5, they can be positioned on the glass substrate 8 at an arbitrary height. Furthermore, since the Z-axis table 5 is placed on the X-axis table 6 and the Y-axis table 7, it can be moved to any position in the X-axis direction and the Y-axis direction with respect to the glass substrate 8. In addition, a control computer (not shown) for controlling each mechanism and a host computer (not shown) for controlling the entire apparatus are provided.

  As the observation optical system 2 moves, the illumination member 10 described above can move so as to maintain a state of facing the objective lens 11 of the observation optical system 2 (in synchronization with the movement of the observation optical system 2). ing. A moving mechanism of the illumination member 10 will be described with reference to FIG. FIG. 2 is a schematic diagram illustrating a moving mechanism of the illumination member.

  Referring to FIG. 2, the moving mechanism of illumination member 10 includes linear guides 60 to 62 provided under glass surface plate 9 in FIG. 1, a pedestal installed movably on linear guide 60, and the pedestal And the lighting member 10 installed in the. The linear guides 61 and 62 are arranged so as to extend in parallel to each other. A linear guide 60 extends in a direction perpendicular to the extending direction of the two linear guides 61 and 62 and is movably connected to the linear guides 61 and 62. The linear guide 60 is movable in the Y axis direction. A pedestal is installed on the linear guide 60 so as to be movable in the X-axis direction. An illumination member 10 is installed on the pedestal. The linear guide 60 moves in the Y-axis direction, and the pedestal moves on the linear guide 60 in the X-axis direction, whereby the illumination member 10 can be moved to an arbitrary position on the XY plane. The position of the observation optical system 2 below the objective lens is controlled by controlling the movement of the pedestal in the X-axis direction and the movement of the linear guide 60 in the Y-axis direction by a control unit (control computer or host computer) (not shown). The illumination member 10 can be disposed on the surface.

  Next, the configuration of the illumination member 10 will be described. FIG. 3 is a schematic side view showing the illumination member arranged to face the objective lens. 4 is a schematic plan view seen from the side where the light emitting elements of the illumination member shown in FIG. 3 are arranged. FIG. 5 is a schematic cross-sectional view taken along line VV in FIG. With reference to FIGS. 3-5, the illumination member of the pattern correction apparatus by this invention is demonstrated.

  3-5, the illumination member 10 is arrange | positioned so that the objective lens 11, the glass surface plate 9, and the glass substrate 8 may be opposed as mentioned above. That is, the illuminating member 10 is disposed on the lower side of the glass surface plate 9 on which the glass substrate 8 is mounted (on the back surface side opposite to the mounting surface on the glass surface plate 9 on which the glass substrate 8 is mounted). The glass substrate 8 is illuminated from the back side by the illumination light emitted from the illumination member 10, and the defective portion 12 of the glass substrate 8 can be observed by an observation optical system including the objective lens 11.

  The illumination member 10 includes a base member 20 in which a recess 21 is formed, and a plurality of light emitting elements 22a and 22b arranged inside the recess 21 of the base member 20. The light emitting elements 22a and 22b may be LEDs (for example, white LEDs), and are arranged concentrically around the center of the recess 21 inside the recess 21. From a different point of view, the light emitting elements 22a and 22b are arranged so as to be symmetric with respect to the center line 24 of FIG. And the extension direction of the optical axis 23a of the light emitting element 22a located in the center part of the recessed part 21 and the extension direction of the optical axis 23b of the light emitting element 22b arrange | positioned outside the light emitting element 22a differ. Specifically, as shown in FIG. 5, an incident angle θ <b> 1 that is an angle formed by the optical axis 23 a of the light emitting element 22 a with respect to the back surface 25 of the glass surface plate 9 is substantially about 90 °. On the other hand, an incident angle θ2 that is an angle formed by the optical axis 23b of the light emitting element 22b with respect to the back surface 25 of the glass surface plate 9 is smaller than 90 ° (a sharp angle). That is, as shown in FIG. 5, the optical axis 23b of the light emitting element 22b is inclined to the light emitting element 22a side (the center side of the illumination member 10 or the center line 24 side).

  In this way, illumination light can be incident on the glass surface plate 9 at various incident angles. Therefore, even if the glass surface plate 9 has a concavo-convex shape portion, it is possible to suppress the shadow portion due to reflection or refraction of illumination light in the concavo-convex shape portion from being noticeable in the observed image.

  As shown in FIG. 5, the concave portion 21 has a flat central portion, and an inclined portion in which the depth of the concave portion gradually decreases toward the peripheral portion. The light emitting element 22b described above is disposed on the inclined portion. In this way, the position of the adjacent light emitting element 22b in the depth direction of the concave portion 21 in the radial direction of the concave portion 21 can be changed, so that one of the adjacent light emitting elements 22b located on the inner peripheral side is emitted. The degree to which the element 22b blocks the light of the other light emitting element 22b located on the outer peripheral side can be suppressed.

  Note that the bottom wall of the recess 21 may be flattened on the entire surface, and a base member for installing each of the light emitting elements 22a and 22b may be installed on the bottom wall. And the above-mentioned effect can also be acquired by changing the height (height from a bottom wall) of a base member suitably (for example, making the height of a base member high, so that it goes to an outer peripheral side). .

  Next, the operation of this pattern correction apparatus will be described. On the glass substrate 8 on which the color filter is formed by the observation optical system 2 by moving the X-axis table 6 and the Y-axis table 7 in the X-axis direction and the Y-axis direction, respectively, and moving the Z-axis table 5 in the Z-axis direction. Image. The captured image is displayed on a television monitor, and the operator looks at the display to determine visually whether there is a filter defect. However, it may be determined by image processing instead of visual observation.

  When the presence of a color filter defect is determined, ink is applied to the defective portion by the ink application mechanism 4 and cured. When an unnecessary portion is generated by the cured ink, the laser device 1 irradiates the unnecessary portion with a laser beam, and sublimates or scatters it with the thermal energy of the laser beam. In addition, when using the glass substrate 8 in which the electrode pattern was formed as the glass substrate 8 which is a correction object, a short defect and an open defect are mention | raise | lifted as a defect part corrected. A short defect is a short circuit between adjacent electrode patterns due to defective etching. When the presence of a short defect in the electrode is determined, the laser device 1 is irradiated with laser light from the laser device 1, and the connected portion is sublimated or scattered by the thermal energy of the laser light. Open defects are those in which part of the electrode pattern is missing due to excessive etching. When the presence of an open defect is determined, a conductive paste or the like is applied to the defective portion by the ink application mechanism 4 and cured.

  Hereinafter, although there is a part which overlaps with embodiment mentioned above, if the characteristic structure of this invention is summarized, the illuminating device according to this invention will be provided with the glass surface plate 9 and the illuminating member 10 as a holding stand. . The glass surface plate 9 holds a glass substrate 8 as a substrate and is made of glass as a translucent member. The illuminating member 10 is disposed on the back surface side opposite to the mounting surface on which the glass substrate 8 is mounted on the glass surface plate 9. The illumination member 10 irradiates the glass substrate 8 with illumination light through the back surface of the glass surface plate 9. The illumination member 10 includes light emitting elements 22a and 22b serving as light sources having different incident angles θ1 and θ2 that are angles formed by the optical axes 23a and 23b of emitted illumination light with respect to the back surface of the glass surface plate 9.

  In this way, illumination light can be incident from the plurality of light emitting elements 22a and 22b at various incident angles θ1 and θ2 on the back surface of the glass substrate 8 held on the glass surface plate 9 from the illumination member 10. it can. For this reason, it can suppress that the shadow part resulting from the uneven | corrugated shape of the glass surface plate 9 is conspicuous in an observation image like the case where parallel light is incident as illumination light from the back surface of the glass substrate 8.

  In the illumination device, the illumination member 10 has the same incident angle θ1 and is disposed so as to surround the light emitting element 22a as a plurality of first light sources disposed on the circumference, and the light emitting element 22a. It includes a plurality of light emitting elements 22b as second light sources having different incident angles θ2 from the light emitting elements 22a. Moreover, in the said illuminating device, in the surface which opposes the glass surface plate 9 of the illuminating member 10, the light emitting element 22a is arrange | positioned at the inner peripheral side of the light emitting element 22b. The optical axis 23b of the illumination light emitted from the light emitting element 22b is inclined toward the inner peripheral side of the light emitting element 22b (the central part side of the base member 20 on which the light emitting element 22a is disposed). From another point of view, the arrangement of the light emitting element 22b is determined so that the optical axis 23b of the illumination light emitted from the light emitting element 22b is inclined in a direction approaching the optical axis 23a of the illumination light emitted from the light emitting element 22a. Has been. In this case, the illumination light having an incident angle θ2 that is different from the incident angle θ1 of the illumination light from the light emitting element 22a (emitted from the light emitting element 22b) in the region of the back surface of the substrate irradiated with the illumination light emitted from the light emitting element 22a. Can be easily irradiated. For this reason, the illumination light from the light emitting element 22b having a different incident angle can be reliably irradiated onto the circular region irradiated with the illumination light from the light emitting element 22a.

  Moreover, in the illumination member 10 mentioned above, the incident angle (theta) 2 mentioned above is so small that the light emitting element 22b located in the outer peripheral side from the center part of the base member 20 is small. In this way, the illumination light from the light emitting elements 22a and 22b can be intensively applied to the area having a relatively smaller area than the area of the illumination member 10 on the back surface of the glass substrate 8.

  The pattern correction apparatus according to this invention is provided with the said illuminating device, as shown in FIGS. If it does in this way, since it can suppress that the shadow part resulting from the unevenness | corrugation of the glass surface plate 9 generate | occur | produces in the observation image obtained by irradiating illumination light to the glass substrate 8, observation of the glass substrate 8 is carried out correctly and efficiently. Can be done automatically.

  The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is shown not by the above-described embodiment but by the scope of claims, and is intended to include all modifications within the meaning and scope equivalent to the scope of claims.

  The present invention is applicable to illumination devices and pattern correction devices used in LCD manufacturing processes, but also to illumination devices and pattern correction devices used in display device manufacturing processes using other glass substrates such as plasma displays. Is possible.

1 is a perspective view showing an overall configuration of a pattern correction apparatus according to an embodiment of the present invention. It is a schematic diagram which shows the moving mechanism of an illumination member. It is a side surface schematic diagram which shows the illuminating member arrange | positioned so as to oppose an objective lens. It is the plane schematic diagram seen from the side by which the light emitting element of the illumination member shown in FIG. 3 is arrange | positioned. It is a cross-sectional schematic diagram in line segment VV of FIG. It is a schematic diagram for demonstrating the method to observe a defect part in the conventional pattern correction apparatus. It is a schematic diagram for demonstrating the conventional problem.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 Laser apparatus, 2 Observation optical system, 4 Ink application mechanism, 5 Z-axis table, 6 X-axis table, 7 Y-axis table, 8,108 Glass substrate, 9,109 Glass surface plate, 9a Lifter pin hole, 9b For vacuum suction Groove, 10, 110 Illumination member, 11, 111 Objective lens, 12, 112 Defect, 20 Base member, 21 Recess, 22a, 22b Light emitting element, 23a, 23b Optical axis, 24 Center line, 25 Back surface, 60-62 Linear Guide, 123 arrow, 130 lens, 131 notch, 132 side wall, 133 observation image, 134 shadow part.

Claims (3)

A holding stand made of a translucent member for holding a substrate;
An illumination member that is disposed on the back side opposite to the mounting surface on which the substrate is mounted in the holding table, and irradiates the substrate with illumination light through the back surface of the holding table;
The illumination device includes a plurality of light sources having different incident angles, which are angles formed by an optical axis of the emitted illumination light with respect to a back surface of the holding table. The illumination member is
A plurality of first light sources having the same incident angle and arranged on a circumference;
The lighting device according to claim 1, wherein the lighting device is disposed so as to surround the first light source, and includes a plurality of second light sources having different incident angles from the first light source.   A pattern correction device comprising the illumination device according to claim 1.

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