JP2008191050A - 蛍光x線分析法及び装置 - Google Patents
蛍光x線分析法及び装置 Download PDFInfo
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Abstract
【解決手段】本願発明においては、斜入射蛍光X線分析法において、入射X線の入射角度を変えた一連の深さ分布を持つ測定対象元素からの蛍光X線強度を測定し、その強度変化から、測定対象元素の物質表面からの深さ方向の元素分布情報を、非破壊的に測定するものである。
【選択図】図1
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Claims (6)
- 試料にX線を入射し試料中の元素から放出される蛍光X線を分析する蛍光X線分析法において、入射X線の入射角度を変えて蛍光X線強度を測定し、該強度の変化から測定対象元素の物質表面からの深さ方向元素分布を測定することを特徴とする蛍光X線分析法。
- 試料にX線を入射し試料中の元素から放出される蛍光X線を分析する蛍光X線分析法において、異なる2つの入射角度において蛍光X線強度を測定することにより、試料中の元素の深さ分布に関する情報及び元素の存在量に関する情報を得ることを特徴とする蛍光X線分析法。
- 請求項2に記載の蛍光X線分析法において、上記異なる2つの入射角度は、臨界角の1.5倍より小さい領域及び臨界角の1.5倍より大きい領域であることを特徴とする蛍光X線分析法。
- 試料にX線を入射し試料中の元素から放出される蛍光X線を分析する蛍光X線分析法において、入射角度が臨界角の1.5倍より小さい領域における測定対象元素の蛍光X線強度を測定することにより試料中の元素の深さ分布に関する情報を得ることを特徴とする蛍光X線分析法。
- 試料にX線を入射し試料中の元素から放出される蛍光X線を分析する蛍光X線分析法において、入射角度が臨界角の1.5倍より大きい領域における測定対象元素の蛍光X線強度を測定することにより試料中の元素の存在量に関する情報を得ることを特徴とする蛍光X線分析法。
- 試料にX線を入射し試料中の元素から放出される蛍光X線を分析する蛍光X線分析装置において、入射X線の入射角度を変化させる装置を有し、入射角度を変えた一連の蛍光X線強度を測定し、その強度変化から測定対象元素の物質表面からの深さ方向元素分布を測定することを特徴とする蛍光X線分析装置。
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JP2007027099A JP5110562B2 (ja) | 2007-02-06 | 2007-02-06 | 蛍光x線分析法 |
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JP2007027099A JP5110562B2 (ja) | 2007-02-06 | 2007-02-06 | 蛍光x線分析法 |
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JP2008191050A true JP2008191050A (ja) | 2008-08-21 |
JP5110562B2 JP5110562B2 (ja) | 2012-12-26 |
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JP2007027099A Expired - Fee Related JP5110562B2 (ja) | 2007-02-06 | 2007-02-06 | 蛍光x線分析法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012008513A1 (ja) * | 2010-07-15 | 2012-01-19 | 株式会社堀場製作所 | 蛍光x線検出方法及び蛍光x線検出装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0627056A (ja) * | 1992-07-09 | 1994-02-04 | Ricoh Co Ltd | 物質組成及び構造分析方法 |
JPH06249803A (ja) * | 1993-02-26 | 1994-09-09 | Sharp Corp | X線装置と該装置を用いた評価解析方法 |
JPH08327566A (ja) * | 1995-05-31 | 1996-12-13 | Fujitsu Ltd | 全反射蛍光x線分析の定量法および定量装置 |
JP2000097889A (ja) * | 1998-09-24 | 2000-04-07 | Jeol Ltd | 試料分析方法および試料分析装置 |
JP2006313132A (ja) * | 2005-05-09 | 2006-11-16 | Fujitsu Ltd | 試料分析方法およびx線分析装置 |
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- 2007-02-06 JP JP2007027099A patent/JP5110562B2/ja not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0627056A (ja) * | 1992-07-09 | 1994-02-04 | Ricoh Co Ltd | 物質組成及び構造分析方法 |
JPH06249803A (ja) * | 1993-02-26 | 1994-09-09 | Sharp Corp | X線装置と該装置を用いた評価解析方法 |
JPH08327566A (ja) * | 1995-05-31 | 1996-12-13 | Fujitsu Ltd | 全反射蛍光x線分析の定量法および定量装置 |
JP2000097889A (ja) * | 1998-09-24 | 2000-04-07 | Jeol Ltd | 試料分析方法および試料分析装置 |
JP2006313132A (ja) * | 2005-05-09 | 2006-11-16 | Fujitsu Ltd | 試料分析方法およびx線分析装置 |
Non-Patent Citations (1)
Title |
---|
JPN6011019907; 辻幸一: '蛍光X線測定による非破壊的な深さ方向元素分析' 放射線と産業 , 20061201, P.14-19 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012008513A1 (ja) * | 2010-07-15 | 2012-01-19 | 株式会社堀場製作所 | 蛍光x線検出方法及び蛍光x線検出装置 |
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