JP2008158281A5 - - Google Patents

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Publication number
JP2008158281A5
JP2008158281A5 JP2006347323A JP2006347323A JP2008158281A5 JP 2008158281 A5 JP2008158281 A5 JP 2008158281A5 JP 2006347323 A JP2006347323 A JP 2006347323A JP 2006347323 A JP2006347323 A JP 2006347323A JP 2008158281 A5 JP2008158281 A5 JP 2008158281A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006347323A
Other versions
JP4403174B2 (ja
JP2008158281A (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2006347323A external-priority patent/JP4403174B2/ja
Priority to JP2006347323A priority Critical patent/JP4403174B2/ja
Priority to PCT/JP2007/074643 priority patent/WO2008078676A1/ja
Priority to KR1020097005873A priority patent/KR101330558B1/ko
Priority to CN2007800394213A priority patent/CN101553758B/zh
Priority to TW096149676A priority patent/TWI447782B/zh
Publication of JP2008158281A publication Critical patent/JP2008158281A/ja
Publication of JP2008158281A5 publication Critical patent/JP2008158281A5/ja
Publication of JP4403174B2 publication Critical patent/JP4403174B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006347323A 2006-12-25 2006-12-25 パターン形成方法およびそれに用いる感光性樹脂組成物 Active JP4403174B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2006347323A JP4403174B2 (ja) 2006-12-25 2006-12-25 パターン形成方法およびそれに用いる感光性樹脂組成物
PCT/JP2007/074643 WO2008078676A1 (ja) 2006-12-25 2007-12-21 パターン形成方法およびそれに用いる感光性樹脂組成物
KR1020097005873A KR101330558B1 (ko) 2006-12-25 2007-12-21 패턴 형성 방법 및 이것에 사용하는 감광성 수지 조성물
CN2007800394213A CN101553758B (zh) 2006-12-25 2007-12-21 图案的形成方法及其所使用的感光性树脂组合物
TW096149676A TWI447782B (zh) 2006-12-25 2007-12-24 圖案形成方法及用於它之感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006347323A JP4403174B2 (ja) 2006-12-25 2006-12-25 パターン形成方法およびそれに用いる感光性樹脂組成物

Publications (3)

Publication Number Publication Date
JP2008158281A JP2008158281A (ja) 2008-07-10
JP2008158281A5 true JP2008158281A5 (ja) 2009-04-02
JP4403174B2 JP4403174B2 (ja) 2010-01-20

Family

ID=39562466

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006347323A Active JP4403174B2 (ja) 2006-12-25 2006-12-25 パターン形成方法およびそれに用いる感光性樹脂組成物

Country Status (5)

Country Link
JP (1) JP4403174B2 (ja)
KR (1) KR101330558B1 (ja)
CN (1) CN101553758B (ja)
TW (1) TWI447782B (ja)
WO (1) WO2008078676A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5329999B2 (ja) 2009-01-29 2013-10-30 ＡｚエレクトロニックマテリアルズＩｐ株式会社 パターン形成方法
US8257901B2 (en) 2009-03-10 2012-09-04 Lg Chem, Ltd. Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same
KR101227280B1 (ko) * 2009-09-10 2013-01-28 도레이 카부시키가이샤 감광성 수지 조성물 및 감광성 수지막의 제조방법
JP5924760B2 (ja) * 2011-12-06 2016-05-25 東京応化工業株式会社 スピンレスコーティング用レジストの製造方法
KR101729599B1 (ko) * 2012-09-28 2017-04-24 후지필름 가부시키가이샤 감광성 수지 조성물, 이것을 사용한 패턴의 제조 방법
JPWO2014126034A1 (ja) * 2013-02-14 2017-02-02 富士フイルム株式会社 インクジェット塗布用感光性樹脂組成物、熱処理物及びその製造方法、樹脂パターン製造方法、液晶表示装置、有機ｅｌ表示装置、タッチパネル及びその製造方法、並びに、タッチパネル表示装置
TWI731961B (zh) 2016-04-19 2021-07-01 德商馬克專利公司 正向感光材料及形成正向凸紋影像之方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08110634A (ja) * 1994-10-07 1996-04-30 Fuji Photo Film Co Ltd フォトレジスト塗布液
JPH10186637A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd ロールコート用放射線感応性組成物
JP2002267833A (ja) 2001-03-14 2002-09-18 Toray Ind Inc 液晶ディスプレイ用カラーフィルタの製造方法。
KR100973799B1 (ko) * 2003-01-03 2010-08-03 삼성전자주식회사 Ｍｍｎ 헤드 코터용 포토레지스트 조성물
KR20040092550A (ko) * 2003-04-24 2004-11-04 클라리언트 인터내셔널 리미티드 레지스트 조성물 및 레지스트 제거용 유기용제
JP2005234045A (ja) * 2004-02-17 2005-09-02 Fujifilm Electronic Materials Co Ltd 着色樹脂組成物
JP2005257884A (ja) * 2004-03-10 2005-09-22 Fuji Photo Film Co Ltd ポジ型レジスト組成物及びパターン形成方法
KR101042667B1 (ko) * 2004-07-05 2011-06-20 주식회사 동진쎄미켐 포토레지스트 조성물
JP4687902B2 (ja) * 2005-06-15 2011-05-25 Ｊｓｒ株式会社 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
TWI411877B (zh) * 2005-06-15 2013-10-11 Jsr Corp A photosensitive resin composition, a display panel spacer, and a display panel
JP4661384B2 (ja) * 2005-06-16 2011-03-30 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP2007219499A (ja) * 2006-01-18 2007-08-30 Fujifilm Electronic Materials Co Ltd 光硬化性組成物並びにそれを用いたカラーフィルタ及びその製造方法

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