JP2008140885A5 - - Google Patents

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JP2008140885A5
JP2008140885A5 JP2006324125A JP2006324125A JP2008140885A5 JP 2008140885 A5 JP2008140885 A5 JP 2008140885A5 JP 2006324125 A JP2006324125 A JP 2006324125A JP 2006324125 A JP2006324125 A JP 2006324125A JP 2008140885 A5 JP2008140885 A5 JP 2008140885A5
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substrate
solar cell
cleaning
photoelectric conversion
temperature
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透光性基板と、前記基板の主面上に形成され、セル分割ラインによって複数の短冊状の発電セルに分割された太陽電池膜と、を有する太陽電池パネルを製造する太陽電池パネル製造システムであって、
前記基板の主面上に透明導電層を製膜する透明導電層製膜装置と、
前記透明導電層を、前記発電セルに対応させてレーザーエッチングする透明導電層用レーザーエッチング装置と、
前記透明導電層のレーザーエッチングされた基板上に光電変換層を製膜する光電変換層製膜装置と、
前記光電変換層を、前記発電セルに対応させてレーザーエッチングする光電変換層用レーザーエッチング装置と、
前記光電変換層のレーザーエッチングされた基板上に裏面電極膜を製膜する裏面電極膜製膜装置と、
前記裏面電極膜を、前記発電セルに対応させてレーザーエッチングする裏面電極用レーザーエッチング装置と、
洗浄水を吹き付けて基板を洗浄する複数の基板洗浄器を有する基板洗浄部と、
を具備し、
前記基板洗浄部は、
前記透明導電層製膜装置と前記透明導電層用レーザーエッチング装置との間に配置された第1基板洗浄器と、
前記裏面電極膜製膜装置と前記裏面電極用レーザーエッチング装置との間に配置された第2基板洗浄器と、
を有し、
前記光電変換層用レーザーエッチング装置に投入される直前の基板平均温度と、前記第1基板洗浄器の洗浄水温度と、前記第2基板洗浄器の洗浄水温度の温度差を±10℃以下になるようにした太陽電池パネル製造システム。
A solar cell panel manufacturing system for manufacturing a solar cell panel having a translucent substrate and a solar cell film formed on a main surface of the substrate and divided into a plurality of strip-shaped power generation cells by a cell dividing line There,
A transparent conductive layer forming apparatus for forming a transparent conductive layer on the main surface of the substrate;
A laser etching apparatus for a transparent conductive layer that performs laser etching of the transparent conductive layer in correspondence with the power generation cell;
A photoelectric conversion layer forming apparatus for forming a photoelectric conversion layer on the laser-etched substrate of the transparent conductive layer;
A laser etching device for a photoelectric conversion layer that performs laser etching of the photoelectric conversion layer in correspondence with the power generation cell;
A back electrode film forming apparatus for forming a back electrode film on the laser-etched substrate of the photoelectric conversion layer;
A laser etching device for a back electrode that performs laser etching of the back electrode film in correspondence with the power generation cell;
A substrate cleaning section having a plurality of substrate cleaners for cleaning the substrate by spraying cleaning water;
Comprising
The substrate cleaning unit
A first substrate cleaner disposed between the transparent conductive layer forming apparatus and the transparent conductive layer laser etching apparatus;
A second substrate cleaning device disposed between the back electrode film forming apparatus and the back electrode laser etching apparatus;
Have
The temperature difference between the substrate average temperature immediately before being introduced into the photoelectric conversion layer laser etching apparatus, the cleaning water temperature of the first substrate cleaning device, and the cleaning water temperature of the second substrate cleaning device is ± 10 ° C. or less. A solar cell panel manufacturing system.
請求項1に記載された太陽電池パネル製造システムであって、
前記光電変換層を製膜後に、前記光電変換層用レーザーエッチング装置に投入されるまでの間に前記基板を冷却する冷却部と、
前記第1基板洗浄器の洗浄水温度を測定する第1基板洗浄器用温度センサと、
前記第2基板洗浄器の洗浄水温度を測定する第2基板洗浄器用温度センサと、
を具備し、
前記冷却部の後において、前記光電変換層用レーザーエッチング装置に投入される直前の前記基板平均温度と、前記第1基板洗浄器用温度センサによって測定された洗浄水温度と、前記第2基板洗浄器用温度センサによって測定された洗浄水温度の温度差を±10℃以下になるように、前記冷却部の前記基板温度を管理する太陽電池パネル製造システム。
A solar cell panel manufacturing system according to claim 1,
A cooling part for cooling the substrate after the photoelectric conversion layer is formed and before being introduced into the laser etching apparatus for photoelectric conversion layer;
A temperature sensor for a first substrate cleaning device that measures a cleaning water temperature of the first substrate cleaning device;
A temperature sensor for a second substrate cleaning device for measuring a cleaning water temperature of the second substrate cleaning device;
Comprising
Wherein even after the cooling section, the a substrate average temperature immediately before being put into the laser etching device for the photoelectric conversion layer, and the cleaning water temperature of which is measured by the first substrate cleaning dexterity temperature sensor, the second substrate cleaning dexterity so that the temperature difference between the wash water temperature measured by the temperature sensor below ± 10 ° C., solar panel manufacturing system for managing the substrate temperature of the cooling section.
請求項2に記載された太陽電池パネル製造システムであって、
更に、
制御装置
を具備し、
前記制御装置は、前記第1基板洗浄器用温度センサ及び前記第2基板洗浄器用温度センサの測定結果に基いて、前記第1基板洗浄器及び前記第2基板洗浄器の洗浄水温度が、前記光電変換層用レーザーエッチング装置に投入される直前の基板平均温度と±10℃以内になるように、前記冷却部の動作を制御する太陽電池パネル製造システム。
A solar cell panel manufacturing system according to claim 2,
Furthermore,
A control device,
Based on the measurement results of the temperature sensor for the first substrate cleaner and the temperature sensor for the second substrate cleaner, the control device determines whether the cleaning water temperature of the first substrate cleaner and the second substrate cleaner is the photoelectric sensor. The solar cell panel manufacturing system which controls operation | movement of the said cooling part so that it may become less than +/- 10 degreeC with the board | substrate average temperature immediately before thrown into the laser etching apparatus for conversion layers.
請求項1に記載された太陽電池パネル製造システムであって、
更に、
前記光電変換層用レーザーエッチング装置に投入される直前の基板温度を測定する光電変換層エッチング用温度センサと、
制御装置と、
を具備し、
前記基板洗浄部は、
前記第1基板洗浄器の洗浄水温度を管理する第1温度コントローラと、
前記第2基板洗浄器の洗浄水温度を管理する第2温度コントローラと、
を有し、
前記制御装置は、前記光電変換層エッチング用温度センサの測定結果に基いて、前記第1基板洗浄器及び前記第2基板洗浄器の洗浄水温度が、前記光電変換層エッチング用温度センサの測定結果の平均温度と±10℃以内になるように、前記第1温度コントローラと前記第2温度コントローラの動作を制御する太陽電池パネル製造システム。
A solar cell panel manufacturing system according to claim 1,
Furthermore,
A photoelectric conversion layer etching temperature sensor for measuring the substrate temperature immediately before being introduced into the photoelectric conversion layer laser etching device;
A control device;
Comprising
The substrate cleaning unit
A first temperature controller for managing a cleaning water temperature of the first substrate cleaner;
A second temperature controller for managing a cleaning water temperature of the second substrate cleaner;
Have
Based on the measurement result of the temperature sensor for photoelectric conversion layer etching , the control device is configured so that the cleaning water temperature of the first substrate cleaning device and the second substrate cleaning device is the measurement result of the temperature sensor for photoelectric conversion layer etching. The solar cell panel manufacturing system which controls operation | movement of the said 1st temperature controller and the said 2nd temperature controller so that it may become less than +/- 10 degreeC with the average temperature of.
請求項1に記載された太陽電池パネル製造システムであって、
前記基板洗浄部は、更に、
前記光電変換層製膜装置と前記光電変換層用レーザーエッチング装置との間に配置された第3基板洗浄器を有し、
前記第3基板洗浄器の洗浄水温度と、前記第1基板洗浄器の洗浄水温度と、前記第2基板洗浄器の洗浄水温度の温度差を±5℃以下になるようにした太陽電池パネル製造システム。
A solar cell panel manufacturing system according to claim 1,
The substrate cleaning unit further includes:
A third substrate cleaning device disposed between the photoelectric conversion layer deposition apparatus and the photoelectric conversion layer laser etching apparatus;
The solar cell panel in which the temperature difference between the cleaning water temperature of the third substrate cleaner, the cleaning water temperature of the first substrate cleaner, and the cleaning water temperature of the second substrate cleaner is ± 5 ° C. or less. Manufacturing system.
請求項5に記載された太陽電池パネル製造システムであって、
前記光電変換層用レーザーエッチング装置に投入される直前の基板温度を測定する光電変換層エッチング用温度センサと、
制御装置と、
を具備し、
前記基板洗浄部は、
前記第1基板洗浄器の洗浄水温度を管理する第1温度コントローラと、
前記第2基板洗浄器の洗浄水温度を管理する第2温度コントローラと、
前記第3基板洗浄器の洗浄水温度を管理する第温度コントローラと、
を有し、
前記制御装置は、前記光電変換層エッチング用温度センサの測定結果に基づいて、前記第1基板洗浄器と前記第2基板洗浄器及び前記第3基板洗浄器の洗浄水温度が、前記温度センサの測定結果の平均温度と±10℃以内になるように、前記第1温度コントローラと前記第2温度コントローラと前記第3温度コントローラの動作を制御する太陽電池パネル製造システム。
The solar cell panel manufacturing system according to claim 5,
A photoelectric conversion layer etching temperature sensor for measuring the substrate temperature immediately before being introduced into the photoelectric conversion layer laser etching device;
A control device;
Comprising
The substrate cleaning unit
A first temperature controller for managing a cleaning water temperature of the first substrate cleaner;
A second temperature controller for managing a cleaning water temperature of the second substrate cleaner;
A third temperature controller for managing a cleaning water temperature of the third substrate cleaner;
Have
Based on the measurement result of the temperature sensor for photoelectric conversion layer etching , the control device is configured so that cleaning water temperatures of the first substrate cleaner, the second substrate cleaner, and the third substrate cleaner are the measured average temperature to be within ± 10 ℃ results, solar panel manufacturing system for controlling the operation of the first temperature controller and the second temperature controller and the third temperature controller.
請求項1乃至6のいずれかに記載された太陽電池パネル製造システムであって、
前記太陽電池パネルは前記太陽電池膜が前記透光性基板の主面上に形成され、前記主面上の基板端付近の周辺における少なくとも一部は、ラミネート処理工程の前までにおいて前記太陽電池膜の除去された除去領域となっており、
前記複数の基板洗浄器の各々は、搬送ローラーを有しており、
前記搬送ローラーは、基板を、前記セル分割ラインの形成される方向と略平行となる方向を搬送方向として搬送し、
前記搬送ローラーは、前記基板を搬送するに際して前記基板を挟むように、前記基板の主面側と前記主面の反対面側の双方に配置され、主面側では前記除去領域または前記除去予定の領域で接触し、前記太陽電池膜の設けられた領域では接触しない太陽電池パネル製造システム。
A solar cell panel manufacturing system according to any one of claims 1 to 6,
In the solar cell panel, the solar cell film is formed on the main surface of the translucent substrate, and at least part of the periphery of the substrate near the substrate end on the main surface is the solar cell film before the laminating process. It is a removed area of
Each of the plurality of substrate cleaners has a transport roller,
The transport roller transports the substrate as a transport direction in a direction substantially parallel to the direction in which the cell division line is formed,
The transport rollers are arranged on both the main surface side of the substrate and the opposite surface side of the main surface so as to sandwich the substrate when transporting the substrate, and on the main surface side the removal region or the removal scheduled A solar cell panel manufacturing system that contacts in a region and does not contact in a region where the solar cell film is provided.
請求項7に記載された太陽電池パネル製造システムであって、
前記各基板洗浄器は、すくなくとも、
高圧水によって洗浄を行う高圧シャワー部と、
純水によって洗浄を行う直水リンス部と、
水きりを行うエアーナイフ部と、
を有し、
前記高圧シャワー部は、高圧シャワー用ノズルを有し、
前記高圧シャワー用ノズルは、高圧水が、搬送上流側に傾いた角度で基板に吹き付けられるように設けられており、
前記高圧シャワー用ノズルは、高圧水の噴射方向と、搬送方向に垂直な面とが成す角度が、10°以上30°以下となるように設けられている太陽電池パネル製造システム。
A solar cell panel manufacturing system according to claim 7,
Each of the substrate cleaners is at least
A high-pressure shower section for cleaning with high-pressure water;
A direct water rinse section for cleaning with pure water;
An air knife for draining water,
Have
The high-pressure shower unit has a high-pressure shower nozzle,
The high-pressure shower nozzle is provided such that high-pressure water is sprayed onto the substrate at an angle inclined toward the upstream side of conveyance,
The high-pressure shower nozzle is a solar cell panel manufacturing system provided such that an angle formed by a high-pressure water jetting direction and a surface perpendicular to the transport direction is 10 ° or more and 30 ° or less.
請求項8に記載された太陽電池パネル製造システムであって、
前記制御装置は、前記高圧シャワー用ノズルを基板搬送方向と略直交する方向へ揺動させる太陽電池パネル製造システム。
A solar cell panel manufacturing system according to claim 8,
The control device is a solar cell panel manufacturing system in which the high-pressure shower nozzle is swung in a direction substantially perpendicular to the substrate transport direction.
請求項7乃至9のいずれかに記載された太陽電池パネル製造システムであって、
前記各基板洗浄器は、更に、
前記高圧シャワー部の前に、ロールブラシによって洗浄を行うロールブラシ部と、前記ロールブラシ部の上流側に設けられ、前記基板を洗浄水のミスト雰囲気に曝すための助走部と、
を有し、
前記助走部は、前記基板の搬送方向長さの1/2以上で2枚分以下のスペースを有している太陽電池パネル製造システム。
A solar cell panel manufacturing system according to any one of claims 7 to 9,
Each of the substrate cleaners further includes
Before the high-pressure shower unit, a roll brush unit that performs cleaning with a roll brush, an upstream unit that is provided on the upstream side of the roll brush unit, and exposes the substrate to a mist atmosphere of cleaning water,
Have
The said run-up part is a solar cell panel manufacturing system which has the space for 2 sheets or less by 1/2 or more of the conveyance direction length of the said board | substrate.
請求項1乃至10のいずれかに記載された太陽電池パネルの製造システムであって、
更に、
自然乾燥区間
を具備し、
前記自然乾燥区間は、前記各基板洗浄器から搬出された前記基板が、次の下流側の処理装置に搬入されるまでの間に、前記基板を自然乾燥させるための区間である太陽電池パネル製造システム。
A solar cell panel manufacturing system according to any one of claims 1 to 10,
Furthermore,
It has a natural drying section,
The natural drying section is a section for naturally drying the substrate until the substrate unloaded from each substrate cleaner is loaded into the next downstream processing apparatus. system.
基板と、前記基板の主面上に形成され、セル分割ラインによって複数の短冊状の発電セルに分割された太陽電池膜と、を有する太陽電池パネルを製造する太陽電池パネル製造方法であって、
前記基板の主面上に透明導電層を製膜する透明導電層製膜ステップと、
前記透明導電層を、前記発電セルに対応させてレーザーエッチングする透明導電層エッチングステップと、
前記透明導電層上に光電変換層を製膜する光電変換層製膜ステップと、
前記光電変換層を、前記発電セルに対応させてレーザーエッチングする光電変換層エッチングステップと、
前記光電変換層上に裏面電極膜を製膜する裏面電極膜製膜ステップと、
前記裏面電極膜を、前記発電セルに対応させてレーザーエッチングする裏面電極膜エッチングステップと、
各ステップ間で洗浄水を吹き付けて基板を洗浄する複数回の洗浄ステップと、
を具備し、
前記複数回の洗浄ステップは、
前記透明導電層エッチングステップの直前に実施され、前記光電変換層エッチングステップの直前の基板平均温度に対して±10℃以内の洗浄水温度で前記基板を洗浄する第1洗浄ステップと、
前記裏面電極膜エッチングステップの直前に実施され、前記光電変換層エッチングステップの直前の基板平均温度に対して±10℃以内の洗浄水温度で前記基板を洗浄する第2洗浄ステップと、
を有する太陽電池パネル製造方法。
A solar cell panel manufacturing method for manufacturing a solar cell panel having a substrate and a solar cell film formed on a main surface of the substrate and divided into a plurality of strip-shaped power generation cells by a cell dividing line,
A transparent conductive layer forming step of forming a transparent conductive layer on the main surface of the substrate;
A transparent conductive layer etching step of laser etching the transparent conductive layer in correspondence with the power generation cell;
A photoelectric conversion layer forming step of forming a photoelectric conversion layer on the transparent conductive layer;
A photoelectric conversion layer etching step of performing laser etching on the photoelectric conversion layer in correspondence with the power generation cell;
A back electrode film forming step of forming a back electrode film on the photoelectric conversion layer;
A back electrode film etching step in which the back electrode film is laser-etched corresponding to the power generation cell;
A plurality of cleaning steps for cleaning the substrate by spraying cleaning water between each step;
Comprising
The multiple washing steps include:
A first cleaning step that is performed immediately before the transparent conductive layer etching step and that cleans the substrate at a cleaning water temperature within ± 10 ° C. with respect to the average substrate temperature immediately before the photoelectric conversion layer etching step;
A second cleaning step that is performed immediately before the back electrode film etching step and that cleans the substrate at a cleaning water temperature within ± 10 ° C. with respect to the average substrate temperature immediately before the photoelectric conversion layer etching step;
A method for manufacturing a solar cell panel.
請求項12に記載された太陽電池パネル製造方法であって、
前記太陽電池パネルは前記太陽電池膜が前記透光性基板の主面上に形成され、前記主面上の基板端付近の周辺における少なくとも一部は、ラミネート処理工程の前までにおいて前記太陽電池膜の除去された除去領域となっており、
前記複数回の洗浄ステップの各々において、基板を、前記セル分割ラインの形成される方向と略平行となる方向を搬送方向として、搬送ローラーにより搬送しながら洗浄し、
前記搬送ローラーは、前記基板を挟むように、前記基板の主面側と前記主面の反対面側の双方に配置されており、
前記各洗浄ステップにおいて基板を搬送するに際し、前記搬送ローラーが、前記除去領域又は前記主面の反対面で接触し、前記太陽電池膜の設けられた領域では接触しないように搬送する太陽電池パネル製造方法。
A solar panel manufacturing method of claim 1 2,
In the solar cell panel, the solar cell film is formed on the main surface of the translucent substrate, and at least part of the periphery of the substrate near the substrate end on the main surface is the solar cell film before the laminating process. It is a removed area of
In each of the plurality of cleaning steps, the substrate is cleaned while being transported by a transport roller, with the transport direction being a direction substantially parallel to the direction in which the cell division line is formed,
The transport rollers are arranged on both the main surface side of the substrate and the opposite surface side of the main surface so as to sandwich the substrate,
When transporting the substrate in each of the cleaning steps, the transport roller is in contact with the removal region or the surface opposite to the main surface and transports so as not to contact in the region where the solar cell film is provided. Method.
基板と、前記基板の主面上に形成され、セル分割ラインによって複数の短冊状の発電セルに分割された太陽電池膜と、前記基板の主面上の少なくとも一部に設けられ、前記太陽電池膜の除去された除去領域とを有する太陽電池パネルを製造する太陽電池パネル製造システム中で、被処理基板を洗浄し、
前記基板を、前記セル分割ラインの形成される方向と略平行となる方向を搬送方向として、搬送ローラーにより搬送しながら洗浄し、前記搬送ローラーは、前記基板を搬送するに際して前記基板を挟むように、前記基板の主面側と前記主面の反対面側の双方に配置され、主面側では前記除去領域または前記除去予定の領域で接触し、前記太陽電池膜の設けられた領域では接触しない基板洗浄器であって、
高圧水によって洗浄を行う高圧シャワー部と、
純水によって洗浄を行う直水リンス部と、
水きりを行うエアーナイフ部と、
を具備し、
前記高圧シャワー部は、高圧シャワー用ノズルを有し、
前記高圧シャワー用ノズルは、高圧水が、搬送上流側に傾いた角度で基板に吹き付けられるように設けられており、
前記高圧シャワー用ノズルは、高圧水の噴射方向と、搬送方向に垂直な面とが成す角度が、10°以上30°以下となるように設けられている基板洗浄器。
A solar cell film formed on a main surface of the substrate, divided into a plurality of strip-shaped power generation cells by a cell dividing line, and provided on at least a part of the main surface of the substrate; In a solar cell panel manufacturing system for manufacturing a solar cell panel having a removal region from which a film has been removed, the substrate to be processed is cleaned ,
The substrate is cleaned while being transported by a transport roller with a direction substantially parallel to the direction in which the cell division lines are formed as transport direction, and the transport roller sandwiches the substrate when transporting the substrate. , Disposed on both the main surface side of the substrate and the opposite surface side of the main surface, contacting on the main surface side in the removal region or the region to be removed, and not contacting on the region where the solar cell film is provided A substrate cleaner,
A high-pressure shower section for cleaning with high-pressure water;
A direct water rinse section for cleaning with pure water;
An air knife for draining water,
Comprising
The high-pressure shower unit has a high-pressure shower nozzle,
The high-pressure shower nozzle is provided such that high-pressure water is sprayed onto the substrate at an angle inclined toward the upstream side of conveyance.
The high-pressure shower nozzle is a substrate cleaning device provided so that an angle formed between a jet direction of high-pressure water and a surface perpendicular to the transport direction is 10 ° or more and 30 ° or less.
請求項14に記載された基板洗浄器であって、
前記高圧シャワー用ノズルは、基板搬送方向と略直交する方向に揺動する基板洗浄器。
The substrate cleaner according to claim 14 , comprising:
The high pressure shower nozzle is a substrate cleaning device that swings in a direction substantially orthogonal to the substrate transport direction .
請求項14又は15に記載された基板洗浄器であって、
更に、
前記高圧シャワー部の前に、ロールブラシによって洗浄を行うロールブラシ部と、
前記ロールブラシ部の上流側に設けられ、前記基板を洗浄水のミスト雰囲気に曝すための助走部と、
を具備し、
前記助走部は、前記基板の搬送方向長さの1/2以上で2枚分以下のスペースを有している基板洗浄器。
The substrate cleaner according to claim 14 or 15 ,
Furthermore,
Before the high-pressure shower part, a roll brush part for cleaning with a roll brush,
Provided on the upstream side of the roll brush part, and a running part for exposing the substrate to a mist atmosphere of cleaning water;
Comprising
The runner is a substrate cleaner having a space of 1/2 or more of the length in the conveyance direction of the substrate and 2 or less.
請求項14乃至16のいずれかに記載された基板洗浄器であって、
更に、
次の下流側の処理装置に搬入されるまでの間に、前記基板を自然乾燥させるための区間である自然乾燥区間を具備する基板洗浄器。
The substrate cleaner according to any one of claims 14 to 16 , comprising:
Furthermore,
A substrate cleaner having a natural drying section which is a section for naturally drying the substrate before it is carried into the next downstream processing apparatus.
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