JP2008119943A - Impact-absorbing layer, optical filter equipped with the same, display equipped with the same, and plasma display panel - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical filter suitable for a PDP (plasma display panel) which is transparent, is excellent in impact resistance, has a high pencil hardness, and is excellent in anti-reflecting properties and electromagnetic shielding property. <P>SOLUTION: In a laminated body in which an impact-absorbing layer 15 with a thickness of 0.01-1.0 mm is provided on a polyethylene terephthalate having a thickness of 100 μm, a relation between the thickness (a) (mm) of the impact-absorbing layer and the time t (ms) from generation of the impact stress to a first peak in an impact acceleration-time curve obtained by an impact resistance test under a condition of an impact force of 0.5 J using a spring impact hammer based on JIS 060068-2-75, satisfies the formula (I): 10≤5.87<SP>a</SP>/t≤40. The optical filter using the impact-absorbing layer is obtained. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention is applicable to various displays such as a plasma display panel (PDP), a cathode ray tube (CRT) display, a liquid crystal display, an organic EL (electroluminescent) display, and a field emission display (FED) including a surface electric field display (SED). The present invention relates to an optical filter having various functions such as antireflection, antistatic, and electromagnetic wave shielding, an impact absorbing layer advantageously used for the optical filter, and a display including the optical filter, particularly a PDP.

  In the case of flat panel displays such as liquid crystal displays, plasma displays (PDP), EL displays, and CRT displays, it has been known that the light from the outside is reflected on the surface and the internal visual information is difficult to see. Various measures have been taken, such as installation of an optical filter including an antireflection film.

  In recent years, large-screen displays have become mainstream in displays, and PDPs have become common as next-generation large-screen display devices. However, in this PDP, high-frequency pulse discharge is performed on the light emitting unit for display. Therefore, there is a risk of unnecessary electromagnetic radiation and infrared radiation that may cause malfunction of an infrared remote controller. Have proposed various antireflection films for PDP (electromagnetic wave shielding light transmitting window material) having conductivity. As the conductive layer of this electromagnetic wave shielding light transmitting window material, for example, (1) a transparent film provided with a transparent conductive thin film containing metallic silver, and (2) a conductive mesh made of a metal wire or conductive fiber in a net shape are provided. Transparent film, (3) a layer of copper foil or the like on the transparent film is etched into a net-like shape, an opening is provided, and (4) a conductive ink is printed on the transparent film in a mesh shape, etc. Are known.

  Furthermore, in large displays such as conventional PDPs, various films such as antireflection films and near-infrared cut films are bonded together, so that they can play a role in preventing scattering even if the panel glass breaks. However, it is not sufficient, and it has become necessary to meet requirements in safety standards such as having a mitigation function against impact from the viewing surface side.

A PDP filter having an adhesive layer for reducing the impact is described in, for example, Japanese Patent Application Laid-Open No. 2004-311664. That is, it has an electromagnetic wave or / and near-infrared shielding layer on one side of the first transparent support, and has a transparent resin layer with impact force relaxation characteristics on the other side, and further on this transparent resin layer. A direct-attached filter for plasma display is disclosed, in which a second transparent support and a transparent adhesive layer are laminated in this order. As a transparent resin layer having impact force relaxation characteristics, a dynamic storage elastic modulus of 1,000 to 10,000 Hz at 25 ° C. is 9 × 10 ⁴ to 4 × 10 ⁶ Pa, and a dynamic loss elastic modulus is 1 ×. 10 ^{5 to} 6 × 10 ⁶ Pa is desirable. Patent Document 2 (Japanese Patent Laid-Open No. 2005-23133) also proposes an adhesive layer having a similar elastic modulus and excellent impact relaxation characteristics.

JP 2004-311664 A JP-A-2005-23133

  According to the study by the present inventors, a PDP filter having an antireflection film and an electromagnetic wave shielding layer is prepared using the transparent resin layer or the adhesive layer, and a PDP glass plate is attached, and an impact resistance test is performed. As a result, it has become clear that sufficient performance may not be obtained. For example, an impact test using a spring impact hammer stipulated in JIS 060068-2-75 for examining whether it can withstand an externally applied impact on household electrical appliances, electrical accessories (accessories), and the like. It was revealed that there was a case where it did not have sufficient impact resistance. That is, the transparent resin layer or the adhesive layer described in the above patent document shows relatively good impact resistance when the film thickness is increased, but the film thickness is reduced. In some cases, it may not be good. Further, it has been clarified that even if the impact resistance is good, the adhesive layer itself or the surface of the optical filter using the adhesive layer has a low pencil hardness, which may cause problems in practice.

  Accordingly, an object of the present invention is to provide an impact absorbing layer having excellent impact resistance and high pencil hardness, which can be advantageously used for an optical filter for display.

  Another object of the present invention is to provide an optical filter that is transparent and has an excellent impact resistance and high pencil hardness.

  Furthermore, an object of the present invention is to provide an optical filter suitable for a display that is transparent, has excellent impact resistance and high pencil hardness, and has excellent antireflection properties and electromagnetic shielding properties.

  Furthermore, the present invention provides an optical filter suitable for a plasma display panel (PDP) that is transparent, has excellent impact resistance and high pencil hardness, and has excellent antireflection properties and electromagnetic shielding properties. For the purpose.

  Another object of the present invention is to provide a display in which the optical filter having the above excellent characteristics is bonded to the surface of an image display glass plate.

  Furthermore, an object of the present invention is to provide a PDP in which the optical filter having the above excellent characteristics is bonded to the surface of an image display glass plate.

Therefore, the present invention
A spring impact conforming to JIS 060068-2-75, which is a shock absorbing layer having a thickness of 0.01 to 1.0 mm, and the laminate in which the shock absorbing layer is provided on 100 μm thick polyethylene terephthalate. Thickness a (mm) of the shock absorbing layer and time from occurrence of impact stress to the first peak in the impact acceleration-time curve obtained by impact resistance test under the condition of impact force 0.5J using a hammer: t (Ms) is represented by the following formula (I):
10 ≦ 5.87 ^a / t ≦ 40 (I)
The shock absorbing layer is characterized by satisfying the above.

  The present inventor has developed a shock acceleration-time curve obtained by a household electrical appliance and an electrical accessory (impact test using a spring impact hammer for examining whether it can withstand an impact applied from the outside to an accessory or the like). In the shock absorbing layer having a certain thickness, the impact resistance is insufficient when the time from the generation of the impact stress obtained from the impact acceleration-time curve to the first peak is short, but the pencil hardness is insufficient. On the other hand, when the time from the occurrence of impact stress to the first peak is slow, the impact resistance is good but the pencil hardness is low. When the relationship between the thickness of the layer and the time from the generation of impact stress obtained from the impact acceleration-time curve to the first peak satisfies the above formula (I), the impact resistance, pencil hardness There was found to be a both good.

Preferred embodiments of the impact absorbing layer of the present invention are as follows.
(1) The relationship between the thickness a (mm) of the shock absorbing layer and the time from occurrence of impact stress to the first peak: T (ms) is expressed by the following formula (II):
15 ≦ 5.87 ^a / t ≦ 25 (II)
Meet. Particularly excellent impact resistance and pencil hardness.
(2) The shock absorbing layer is made of an acrylic resin.
It is preferable that the monomer constituting the acrylic resin contains at least an alkyl (meth) acrylate (provided that the alkyl group has 4 to 10 carbon atoms) and acrylic acid. Moreover, it is preferable that the monomer which comprises an acrylic resin contains at least 2-ethylhexyl acrylate and acrylic acid.
(3) It is preferable that trimethylolpropane tri (meth) acrylate is further contained as a monomer constituting the acrylic resin. Moreover, it is preferable that the monomer which comprises an acrylic resin further contains alkoxy polyalkylene glycol (meth) acrylate.
(4) The shock absorbing layer cures a partial polymer / monomer mixture obtained by partially polymerizing a monomer mixture containing alkyl acrylate (wherein the alkyl group has 4 to 10 carbon atoms) and acrylic acid. It is the made acrylic resin layer.
(5) The thickness of the shock absorbing layer is 0.1 to 0.6 mm, particularly 0.2 to 0.5 mm.
(6) A shock absorbing layer used for an optical filter for display.

Furthermore, the present invention provides:
An optical filter comprising a transparent substrate, an antireflection film and a conductive layer, further comprising the above-mentioned shock absorbing layer;
An optical filter comprising an antireflection film on one surface side of a transparent substrate and a conductive layer on the other surface side,
An optical filter (1), wherein the shock absorbing layer is provided on any surface of the conductive layer;
Two transparent substrates, a transparent substrate provided with an antireflection film on one surface side, and another transparent substrate provided with a conductive layer on one surface side, are surfaces on which the antireflection film is not formed. And an optical filter bonded with the conductive layer,
A transparent adhesive layer is provided between the surface on which the antireflection film is not formed and the conductive layer, and the shock absorbing layer is provided on the surface side of the conductive layer where the transparent adhesive layer is not provided. An optical filter (2); and a transparent substrate provided with an antireflection film on one surface side, and another transparent substrate provided with a conductive layer on one surface side. The transparent substrate is an optical filter formed by bonding the surface on which the antireflection film is not formed and the conductive layer,
An optical filter (3), wherein the shock absorbing layer is provided between the transparent substrate surface on which the antireflection film is not formed and the conductive layer;
There is also.

Preferred embodiments of the optical filter (generally an optical film) of the present invention are as follows.
(1) The antireflection film has a near-infrared shielding function. Generally, a substance that absorbs near-infrared rays such as a dye is introduced into at least one layer constituting the antireflection film.
(2) When a near-infrared shielding layer is separately provided, a near-infrared shielding layer is provided on any surface of the shock absorbing layer.
(3) When the optical filter of the present invention is used for PDP, it is necessary that the conductive layer has an electromagnetic wave shielding function.
(4) The conductive layer is a mesh-like metal layer or a metal-containing layer. It is advantageous for PDP.
(5) A transparent adhesive layer is provided on the outer surface of the outermost conductive layer or near-infrared shielding layer. The transparent adhesive layer is used to attach to the glass plate on the display surface of the display.
(6) A transparent adhesive layer is embedded in the gap between the mesh-like metal layer or metal-containing layer. By suitably adjusting the shock absorbing layer, this transparent adhesive layer can be substituted.
(7) The transparent substrate is a plastic film, particularly a polyethylene terephthalate film (PET film). Continuous production is facilitated by using a long film.
(8) A release sheet is provided on the transparent adhesive layer. Handling becomes easy.
(9) A protective layer (eg, a protective polymer film) is provided on the antireflection film. Handling becomes easy.
(10) The light transmittance is 50% or more (preferably 70% or more). The image on the display is easy to see.
(11) The mesh-like metal layer or metal-containing layer of (4) is formed by etching or by a printing method, or is a metal fiber layer. It is easy to obtain low resistance.
(12) The conductive layer is a coating layer. The conductive layer can be easily formed.
The coating conductive layer is preferably a coating layer in which conductive particles of an inorganic compound are dispersed in a polymer. A conductive polymer coating layer may also be used.
(13) The conductive layer is a transparent film of a metal oxide layer such as ITO.
(14) The conductive layer is an alternately laminated film of dielectric layers and metal layers. In particular, a laminate of 5 layers or more of dielectric layer / metal layer / dielectric layer / metal layer / dielectric layer is preferable. Excellent transparency and low resistance.
(15) The antireflection film includes at least one coating layer. Easy to manufacture.
(16) The antireflection film is a hard coat layer formed by coating, and when the refractive index of the hard coat layer is lower than that of the transparent substrate, a film comprising a high refractive index layer having a higher refractive index than the hard coat layer, or a hard coat Preferably, the film includes a layer, a high refractive index layer, and a low refractive index layer; when the refractive index of the hard coat layer is higher than that of the transparent substrate, the film includes a refractive index layer having a lower refractive index than the hard coat layer, or A film including a coat layer, a low refractive index layer and a high refractive index layer is preferred.

  The optical filter of the present invention is preferably a plasma display panel filter.

  A preferred embodiment of the shock absorbing layer can also be applied to the optical filter.

  Furthermore, the present invention also provides a display in which the optical filter is bonded to the surface of an image display glass plate.

  Furthermore, the present invention is also a plasma display panel characterized in that an optical filter is bonded to the surface of an image display glass plate.

  The impact absorbing layer of the present invention has excellent impact resistance and high pencil hardness. Therefore, the optical filter of the present invention having this layer can be said to be an optical filter having improved impact resistance and hardness, and functions such as antireflection, antistatic and electromagnetic wave shielding of the display.

  Such an optical filter not only has excellent impact properties, but also has a high pencil hardness, so that when an impact is applied to the optical filter, each functional layer provided in the optical filter is damaged. There is almost no. That is, the optical filter provided with the shock absorbing layer of the present invention absorbs the shock moderately and suddenly deforms when the shock is applied because the shock absorbing layer has an appropriate resistance to the shock. Does not occur and the deformation is not too great. For this reason, a big impact is not brought about to each functional layer adjacent to or near the shock absorbing layer. Further, since the pencil hardness on the surface is high, scratches and the like hardly occur in each layer.

  Therefore, the shock absorbing layer of the present invention and the optical filter provided with the same are excellent in impact resistance and durability.

  Furthermore, especially when a mesh-like metal layer is used as the conductive layer, the film surface provided with the metal layer is a rough surface. However, since the shock absorbing layer of the present invention has appropriate flexibility, it can also function as the transparent resin layer (optical filter (3)).

  In addition, two transparent substrates, a transparent substrate with an antireflection film provided on one surface and a conductive substrate provided on one surface and another transparent substrate, are bonded via a shock absorbing layer. When the optical filter having the above structure is used, it is possible to obtain a particularly excellent impact resistance. Furthermore, since it can be obtained by manufacturing a transparent film having an antireflection film and a transparent film having a conductive layer, respectively, and bonding them through a shock absorbing layer, it is easy to manufacture continuously and production. It can also be referred to as an antireflection film having excellent properties.

  The shock absorbing layer of the present invention has excellent impact resistance and high pencil hardness, and can be advantageously used for an optical filter for display.

The shock absorbing layer of the present invention has a thickness of 0.01 to 1.0 mm and is an impact resistance test using a spring impact hammer according to JIS 060068-2-75 under the condition of an impact force of 0.5 J. In the obtained impact acceleration-time curve, the relationship between the thickness a (mm) of the impact absorbing layer and the time from occurrence of impact stress to the first peak: t (ms) is expressed by the following formula (I):
10 ≦ 5.87 ^a / t ≦ 40 (I)
It is a layer that satisfies

  In the present invention, the impact test is performed using an apparatus as shown in FIG. That is, a steel plate having a thickness of 5 mm (having a hole in the center) placed on a concrete floor and an aluminum alloy plate having a thickness of 10 cm × 10 cm × 0.3 cm thereon, a polyethylene terephthalate (PET) having a thickness of 100 μm. A laminate (sample) of the film and the shock absorbing layer of the present invention formed thereon is attached so that the shock absorbing layer and the aluminum alloy plate are in contact with each other. An acceleration sensor (P5SC; manufactured by San-S Co., Ltd.) is installed at the center of the lower surface of the aluminum alloy plate, and the data converted from acceleration to voltage is converted into an oscilloscope (NR-350; manufactured by Keyence Co., Ltd.). The time displacement (impact acceleration-time curve) is obtained by reading it into a personal computer (PC). The impact applied to the sample on the aluminum alloy plate with an impact force of 0.5 J (Nm) is set to 0.5 J with a spring ring impact hammer (MODEL F22.50 (conforming to JIS 060068-2-75); manufactured by PTL). It is performed by using.

From the impact acceleration-time curve obtained by the impact test described above, the time from the occurrence of impact stress to the first peak: t (ms) is obtained, and the thickness a (mm) of the impact absorbing layer at that time, The value of 5.87 ^a / t in formula (I) is determined.

  The above formula (I) was found as follows.

  That is, the present inventor used a spring impact hammer as a test method for evaluating the shock absorbing layer to examine whether it can withstand external impacts such as household appliances and electrical accessories (accessories). In the impact test, attention was paid to the impact acceleration-time curve obtained by the test. And, when the time from the impact stress generation to the first peak obtained from the impact acceleration-time curve falls within a specific range, it is possible to obtain an impact absorbing layer excellent in both impact resistance and pencil hardness. I found it.

For this reason, the present inventor has found that when the thickness of the shock absorbing layer increases, the time to the first peak also increases, and the time to the first peak of the shock absorbing layer of various materials and thicknesses (t ) Data, it can be assumed that for each material, there is the following relationship (A) between thickness and time to first peak (t):
ln (time to first peak (t)) ≈constant 1 + constant 2 × thickness (a) (A)
The constant is obtained by least squares the above data.

That is, from the examination of the least square approximation logarithmically with the above data,
[Exp (constant 2)] ^thickness / (time to first peak) ≈exp (constant 1) = constant 3
exp (constant 2) ≈5.87 is obtained.

Therefore, the constant 3≈5.87 ^thickness / (time to the first peak), that is, 5.87 ^a / t is obtained, and satisfying this within a specific range has both impact resistance and pencil hardness. It can be said that it is an excellent shock absorbing layer.

  The relationship between each thickness (a) and the time (t) to the first peak and the specific range of the present invention are shown in FIG. The layer surrounded by the solid line and satisfying the thickness (a) range is the shock absorbing layer defined in the present invention.

The relationship between the thickness a (mm) of the shock absorbing layer and the time from occurrence of impact stress to the first peak: t (ms) is expressed by the following formula (II):
15 ≦ 5.87 ^a / t ≦ 25 (II)
It is particularly preferable to satisfy Particularly excellent impact resistance and pencil hardness.

When the value of 5.87 ^a / t is larger than the upper limit, the impact resistance is generally insufficient, but the pencil hardness is good, and when the value is smaller than the lower limit, the impact resistance is good. The pencil hardness is insufficient.

  The shock absorbing layer is preferably made of an acrylic resin. Details will be described later. The thickness of the shock absorbing layer is preferably from 0.1 to 0.6 mm, particularly preferably from 0.2 to 0.5 mm.

  Next, the optical filter of the present invention having the shock absorbing layer of the present invention will be described. FIG. 2 shows a schematic sectional view of an example showing the basic configuration of the optical filter of the present invention. In FIG. 2, an antireflection film 12 is provided on one surface of a transparent substrate 11, a conductive layer 14 is provided on the other surface via a transparent adhesive layer 13, and a shock absorbing layer is further provided on the surface of the conductive layer 14. 15 is provided. The transparent adhesive layer 13 may be omitted. The shock absorbing layer 15 may be provided between the transparent substrate 11 and the transparent adhesive layer 13 or between the transparent adhesive layer 13 and the conductive layer 14. When this optical filter is affixed to the display glass surface of the display body, the impact absorbing layer 15 is generally opposed to the glass surface and bonded with a transparent adhesive.

  In general, when the refractive index of the hard coat layer is lower than that of the transparent substrate, the antireflection film 12 is a film including a high refractive index layer having a higher refractive index than the hard coat layer, or a hard coat layer, a high refractive index layer, and a low refractive index. A film including a layer is preferable; when the refractive index of the hard coat layer is higher than that of the transparent substrate, a film including a refractive index layer having a lower refractive index than the hard coat layer, or a hard coat layer, a low refractive index layer, and a high refractive index. A film including a rate layer is preferable. The antireflection film 12 is effective even if it is only a hard coat layer having a refractive index higher or lower than that of the substrate, or only a low refractive index layer or a high refractive index layer. It is preferable from the viewpoint of productivity and economy that all of the layers constituting such an antireflection film 12 are formed by coating. When the optical filter is for PDP, the antireflection film preferably has a near infrared shielding function.

  The conductive layer 13 is, for example, a mesh-like metal layer, a metal-containing layer, a coating layer, a metal oxide layer (dielectric layer), or an alternately laminated film of metal oxide layers and metal layers. The mesh-like metal layer or metal-containing layer is generally formed by etching or printing, or is a metal fiber layer. This makes it easy to obtain a low resistance value. The mesh gap of the mesh-like metal layer or metal-containing layer is preferably filled with a transparent resin (in the present invention, a transparent adhesive layer or a shock absorbing layer). This improves transparency. The conductive layer is preferably a coating layer, for example, a coating layer in which conductive particles of an inorganic compound are dispersed in a polymer, or a coating layer of a conductive polymer. This improves productivity and economy.

  The shock absorbing layer 15 of the present invention is as described above. It has an appropriate layer thickness, and has an excellent shock absorption capacity and high pencil hardness. Since the impact absorbing layer of the present invention is not only excellent in impact properties but also has high pencil hardness, when an impact is applied to the optical filter having this layer, each functional layer provided in the optical filter There is little damage. That is, the optical filter provided with the shock absorbing layer of the present invention absorbs the shock moderately and suddenly deforms when the shock is applied because the shock absorbing layer has an appropriate resistance to the shock. Does not occur and the deformation is not too great. For this reason, a big impact is not brought about to each functional layer adjacent to or near the shock absorbing layer. Further, since the pencil hardness on the surface is high, scratches and the like hardly occur in each layer. The shock absorbing layer is preferably a layer made of an acrylic resin as described above, and its layer thickness is in the range of 0.01 to 1.0 mm and in the range of 0.1 to 0.6 mm. preferable. Thereby, it is easy to obtain excellent impact resistance.

In the ordinary antireflection film, the optical filter of the present invention has a surface resistance value of 10 ⁸ Ω / □ or less, preferably in the range of 10 ² to 10 ⁸ Ω / □, particularly in the range of 10 ² to 10 ⁵ Ω / □. In particular, in an electromagnetic wave shielding film using a metal mesh, it is generally 10Ω / □ or less, preferably 0.01 to 5Ω / □, particularly 0.005 to 5Ω / □. In each range, the effect of preventing charging or shielding electromagnetic waves is easily obtained.

  The optical filter of the present invention is a film excellent in antireflection, antistatic, and electromagnetic wave shielding if desired, and excellent in impact resistance and pencil hardness. As shown in FIG. 2, the optical filter of the present invention is provided with this shock absorbing layer, so that the glass plate which is the display screen of the display is hardly damaged even by a large shock.

  Furthermore, especially when a mesh-like metal layer is used as the conductive layer, the film surface provided with the metal layer is a rough surface. However, since the shock absorbing layer of the present invention has appropriate flexibility, it can also function as the transparent resin layer.

  In addition, two transparent substrates, a transparent substrate with an antireflection film provided on one surface and a conductive substrate provided on one surface and another transparent substrate, are bonded via a shock absorbing layer. When the optical filter having the above structure is used, it is possible to obtain a particularly excellent impact resistance. Furthermore, since it can be obtained by manufacturing a transparent film having an antireflection film and a transparent film having a conductive layer, respectively, and bonding them through a shock absorbing layer, it is easy to manufacture continuously and production. It can also be referred to as an antireflection film having excellent properties.

  FIG. 3 shows a schematic cross-sectional view of an example of a preferred embodiment in the optical filter of the present invention. In order for the conductive layer in FIG. 2 to be an optical filter suitable for PDP, it is preferably a mesh-like metal layer or metal-containing layer. FIG. 3 shows a preferred embodiment as an optical filter for PDP. In FIG. 3, an antireflection film 22 is provided on one surface of a transparent substrate 21A, and a conductive layer 24 is provided on one surface of another transparent substrate 21B. These two transparent substrates are formed of this antireflection film. The substrate surface on which the substrate is not formed and the conductive layer are opposed to each other and pressed through the transparent adhesive layer 23, and the shock absorbing layer 25 is provided on the other surface of the transparent substrate 21B. Here, the conductive layer 24 has a mesh shape, and the gap is filled with the transparent adhesive layer 23. When this optical filter is affixed to the display glass surface of the display main body, the impact absorbing layer 25 is generally opposed to the glass surface and bonded with a transparent adhesive. When the tackiness of the shock absorbing layer 25 is sufficient, the use of a transparent adhesive can be omitted.

  When the optical filter is for PDP, the antireflection film preferably has a near infrared shielding function.

  In FIG. 2 or FIG. 3, when a near-infrared shielding layer or film is separately provided, it is preferable to take the embodiment shown in FIG. 4 or FIG. In FIG. 4, an antireflection film 32 is provided on one surface of a transparent substrate 31A, and a conductive layer 34 is provided on one surface of another transparent substrate 31B. These two transparent substrates are provided with this antireflection film. The substrate surface on which the substrate is not formed and the conductive layer 34 are opposed to each other and pressed through the transparent adhesive layer 33, and the shock absorbing layer 35 and the near-infrared shielding film 36 are provided on the other surface of the transparent substrate 31B. Yes. Here, the conductive layer 34 has a mesh shape, and the gap is filled with the transparent adhesive layer 33. Although the near-infrared shielding film 36 is bonded by the shock absorbing layer 35, an adhesive layer (transparent adhesive layer) may be provided separately. When this optical filter is affixed to the display glass surface of the display main body, generally, the near-infrared shielding film 36 is opposed to the glass surface and bonded with a transparent adhesive.

  In FIG. 5, an antireflection film 42 is provided on one surface of a transparent substrate 41A, and a conductive layer 44 is provided on one surface of another transparent substrate 41B. These two transparent substrates are provided with this antireflection film. The conductive layer 44 is opposed to the surface where the surface is not formed, and is pressure-bonded via the transparent adhesive layer 43A. Further, the other surface of the transparent substrate 41B is covered with the near-infrared shielding film via the transparent adhesive layer 43B. 46 is provided on which the shock absorbing layer 45 is laminated. Here, the conductive layer 44 is mesh-shaped, and the gap is filled with the transparent adhesive layer 43A. The near-infrared shielding film 46 is adhered to the transparent substrate 41B by the transparent adhesive layer 43B, and the shock absorbing layer 45 is adhered to the near-infrared shielding film 46. When this optical filter is affixed to the display glass surface of the display body, the impact absorbing layer 45 is generally opposed to the glass surface and bonded with a transparent adhesive. The near-infrared shielding film 46 may be provided between the transparent substrate 41A and the transparent adhesive layer 43B via a transparent adhesive layer.

  Next, FIG. 6 shows a schematic sectional view of an example showing another basic configuration of the optical filter of the present invention. In FIG. 6, an antireflection film 52 is provided on one surface of a transparent substrate 51, and a conductive layer 54 is provided on the other surface via a shock absorbing layer 55. When this optical filter is affixed to the display glass surface of the display body, it is generally affixed with a transparent adhesive with the conductive layer 54 facing the glass surface.

  In order for the conductive layer in FIG. 6 to be an optical filter suitable for PDP, it is preferably a mesh-like metal layer or metal-containing layer. FIG. 7 shows a preferred embodiment as an optical filter for PDP. In FIG. 7, an antireflection film 62 is provided on one surface of a transparent substrate 61A, and a conductive layer 64 is provided on one surface of another transparent substrate 61B. These two transparent substrates are provided with this antireflection film. The surface of the substrate on which the film is not formed and the conductive layer 64 are opposed to each other and are pressure-bonded via the shock absorbing layer 65. Here, the conductive layer 64 has a mesh shape, and the gap is filled with a shock absorbing layer 65. This aspect is possible when the shock absorbing layer is sufficiently flexible and has a large film thickness. When this optical filter is attached to the display glass surface of the display main body, generally, the transparent substrate 61B is opposed to the glass surface and is bonded with a transparent adhesive. When the optical filter is for PDP, the antireflection film preferably has a near infrared shielding function.

  In FIG. 7, when a near-infrared shielding layer or film is provided separately, it is preferable to take the embodiment shown in FIG. FIG. 8 shows a preferred embodiment as an optical filter for PDP. In FIG. 8, an antireflection film 72 is provided on one surface of a transparent substrate 71A, and a conductive layer 74 is provided on one surface of another transparent substrate 71B. These two transparent substrates are connected to the antireflection film. The conductive layer 74 is opposed to the surface on which the surface is not formed, and is pressed through the shock absorbing layer 75. A near-infrared shielding film 76 is provided on the other surface of the transparent substrate 71 </ b> B via a transparent adhesive layer 73. Here, the conductive layer 74 has a mesh shape, and the gap is filled with a shock absorbing layer 75. When this optical filter is affixed to the display glass surface of the display main body, generally, the near-infrared shielding film 76 is opposed to the glass surface and is adhered with a transparent adhesive. The near-infrared shielding film 76 may be provided between the transparent substrate 71 </ b> A and the shock absorbing layer 75 via a transparent adhesive layer.

  From the viewpoint of productivity, it is advantageous that the antireflection film, the conductive layer and the like of the present invention are formed by coating. In particular, in both cases, an antireflection film can be produced with high productivity by forming by continuously performing coating and curing using an ultraviolet curable resin. However, as the conductive layer, a mesh-like metal layer or the like is often used particularly for PDF depending on the required performance. The coating film and coating layer can generally be formed on a rectangular transparent substrate (generally a film or sheet) or a continuous film. In the case of a rectangular transparent substrate, each layer is formed in a batch system, and when formed on a continuous film, each layer is formed in a continuous system, generally a roll-to-roll system. In the present invention, the latter is particularly preferable.

  The material used for the optical filter suitable for the display of this invention is demonstrated below.

  The material of the transparent substrate is not particularly limited as long as it is transparent (meaning “transparent to visible light”), but a plastic film is generally used. For example, polyester {eg, polyethylene terephthalate (PET), polybutylene terephthalate}, polymethyl methacrylate (PMMA), acrylic resin, polycarbonate (PC), polystyrene, triacetate resin, polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, Examples thereof include ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion crosslinked ethylene-methacrylic acid copolymer, polyurethane, cellophane and the like. Among these, polyethylene terephthalate (PET), polycarbonate (PC), polymethyl methacrylate (PMMA), etc. are highly resistant to loads during processing (heat, solvent, bending, etc.) and particularly highly transparent. preferable. In particular, PET is preferable because it has excellent processability.

  The thickness of the transparent substrate varies depending on the use of the optical filter and the like, but is generally preferably about 1 μm to 5 mm.

In the conductive layer of the present invention, the surface resistance value of the obtained optical filter is generally 10 ⁸ Ω / □ or less, preferably in the range of 10 ² to 10 ⁸ Ω / □, particularly in the range of 10 ² to 10 ⁵ Ω / □, Alternatively, it is generally set to be 10Ω / □ or less, preferably 0.01 to 5Ω / □, particularly 0.005 to 5Ω / □. The conductive layer is preferably a coating layer, but a mesh (lattice) conductive layer is also preferable. Alternatively, a layer (a transparent conductive thin film of metal oxide (ITO or the like)) obtained by a vapor deposition method may be used. Further, it may be an alternate laminate of a metal oxide dielectric film such as ITO and a metal layer such as Ag (eg, ITO / silver / ITO / silver / ITO laminate).

  As the mesh-like conductive layer, metal fibers and metal-coated organic fiber metals made into a mesh, copper foil on a transparent film etched into a mesh and provided with openings, conductive on the transparent film And the like, in which a conductive ink is printed in a mesh shape. It is preferable to etch a layer of copper foil or the like on the transparent film into a net shape and provide an opening, or to print a conductive ink on the transparent film in a mesh shape.

  In the case of a mesh-like conductive layer, the mesh preferably has a wire diameter of 1 μm to 1 mm and an aperture ratio of 50 to 95% made of metal fiber and / or metal-coated organic fiber, mesh-like metal foil, or the like. A more preferable wire diameter is 10 to 500 μm, and an aperture ratio is 60 to 95%. The opening ratio of the conductive mesh refers to the area ratio occupied by the opening portion in the projected area of the conductive mesh.

  As the metal of the metal fiber and the metal-coated organic fiber constituting the conductive mesh, copper, stainless steel, aluminum, nickel, titanium, tungsten, tin, lead, iron, silver, carbon or alloys thereof, preferably copper, stainless steel, Aluminum is used.

  As the organic material for the metal-coated organic fiber, polyester, nylon, vinylidene chloride, aramid, vinylon, cellulose and the like are used.

  When a conductive foil such as a metal foil is subjected to pattern etching, copper, stainless steel, aluminum, nickel, iron, brass, or an alloy thereof, preferably copper, stainless steel, or nickel is used as the metal of the metal foil.

  If the thickness of the metal foil is too thin, it is not preferable in terms of handleability and workability of pattern etching, and if it is too thick, it affects the thickness of the glass obtained or the time required for the etching process becomes long. The thickness is preferably about 1 to 200 μm.

  The shape of the etching pattern is not particularly limited, and examples thereof include a grid-like metal foil in which square holes are formed, and a punching metal-like metal foil in which circular, hexagonal, triangular or elliptical holes are formed. It is done. Further, the holes are not limited to those regularly arranged, and may be a random pattern. It is preferable that the area ratio of the opening part in the projection surface of this metal foil is 20 to 95%.

  Alternatively, the mesh-like conductive layer may be formed by pattern printing of conductive ink on a transparent substrate. Using the following conductive ink, it can be printed on the surface of the transparent substrate by screen printing, ink jet printing, electrostatic printing or the like.

  In general, carbon black particles having a particle size of 100 μm or less, or particles of a conductive material such as particles of metals or alloys such as copper, aluminum, nickel, etc. are bound to a binder of PMMA, polyvinyl acetate, epoxy resin or the like at a concentration of 50 to 90% by weight. Dispersed in resin. This ink is diluted or dispersed at a suitable concentration in a solvent such as toluene, xylene, methylene chloride, water, etc., applied to the surface of the transparent substrate by printing, and then dried at room temperature to 120 ° C. as necessary. Apply. Particles obtained by covering the same conductive material particles as described above with a binder resin are directly applied by electrostatic printing and fixed by heat or the like.

  The thickness of the printed film formed in this way is not preferable because the electromagnetic wave shielding property is insufficient if it is too thin, and if it is too thick, it affects the thickness of the glass obtained, so it is about 0.5 to 100 μm. It is preferable to do this.

  According to such pattern printing, the degree of freedom of the pattern is large, and a conductive layer having an arbitrary wire diameter, interval, and opening shape can be formed. Therefore, a glass plate having desired electromagnetic wave shielding properties and light transmittance properties (Or a plastic film) can be easily formed.

  There is no particular limitation on the pattern printing shape of the conductive layer. For example, a grid-like printed film having a rectangular opening or a punching metal shape having a circular, hexagonal, triangular or elliptical opening. Examples include printed films. Further, the openings are not limited to those regularly arranged, and may be a random pattern. It is preferable that the area ratio of the opening part in the projection surface of this printed film is 20 to 95%.

  Examples of the conductive layer by coating include a coating layer in which conductive particles of an inorganic compound are dispersed in a polymer.

  Examples of the inorganic compound constituting the conductive particles include metals, alloys such as aluminum, nickel, indium, chromium, gold, vanadium, tin, cadmium, silver, platinum, copper, titanium, cobalt, lead; or ITO, oxidation Indium, tin oxide, zinc oxide, indium oxide-tin oxide (ITO, so-called indium-doped tin oxide), tin oxide-antimony oxide (ATO, so-called antimony-doped tin oxide), zinc oxide-aluminum oxide (ZAO; so-called aluminum-doped oxide) And conductive oxides such as zinc). In particular, ITO is preferable. The average particle size is preferably 10 to 10,000 nm, particularly preferably 10 to 50 nm.

  Examples of the polymer include acrylic resin, polyester resin, epoxy resin, urethane resin, phenol resin, maleic acid resin, melamine resin, urea resin, polyimide resin, and silicon-containing resin. Furthermore, it is preferable that it is a thermosetting resin among these resins.

  Alternatively, the polymer is particularly preferably an ultraviolet curable resin used for a hard coat layer described later.

  The conductive layer is formed by coating by dispersing the conductive fine particles in a polymer (using a solvent if necessary) by mixing or the like to prepare a coating solution, and coating the coating solution on a transparent substrate. And then drying and curing as appropriate. In the case of using a thermoplastic resin, it is obtained by drying after coating, and in the case of a thermosetting type, it is obtained by drying and thermosetting. When an ultraviolet curable resin is used, it can be obtained by drying after application and irradiating with ultraviolet rays after coating.

  The thickness of the conductive layer formed by coating is preferably 0.01 to 5 μm, particularly preferably 0.05 to 3 μm. When the thickness is less than 0.01 μm, the electromagnetic wave shielding property or antistatic property may not be sufficient. On the other hand, when the thickness exceeds 5 μm, the transparency of the resulting film may be lowered.

  The conductive layer of the present invention is also preferably a conductive polymer layer formed by coating. For example, hydrocarbon polymers such as polyacetylene, polyphenylene, polyphenylene vinylene, polyacene, polyphenylacetylene, polynaphthalene; heteroatom-containing polymers such as polypyrrole, polyaniline, polythiophene, polyethylene vinylene, polyazulene, polyisothianaphthene . Polypyrrole and polythiophene are preferred. The thickness of the light conductive layer of the conductive polymer is preferably 0.01 to 5 μm, particularly preferably 0.05 to 3 μm. When the thickness is less than 0.01 μm, the electromagnetic shielding property or antistatic property may not be sufficient, while when it exceeds 5 μm, the transparency of the resulting film may be lowered.

  When the conductive layer is formed by a vapor deposition method (metal oxide layer), the formation method is not particularly limited, but a vapor phase such as sputtering, ion plating, electron beam vapor deposition, vacuum vapor deposition, chemical vapor deposition, etc. Examples of the method include a film forming method, printing, and coating, but a gas phase film forming method (sputtering, ion plating, electron beam vapor deposition, vacuum vapor deposition, chemical vapor deposition) is preferable. A conductive layer can be formed using the inorganic compound. When the conductive layer is formed by a vapor deposition method, the layer thickness is preferably 30 to 50000 nm, particularly about 50 nm.

  Blacking treatment may be performed on the surface of the conductive layer, particularly the mesh-shaped metal conductive layer.

  The blackening treatment can be a known blackening treatment corresponding to the metal of the conductive layer, and a known blackening treatment liquid corresponding to this can be used. Examples of the blackening treatment generally include oxidation treatment, sulfurization treatment, chromium plating treatment, and alloy plating treatment such as tin-nickel. When the plating metal in the electroplating tank is copper, oxidation treatment, sulfurization treatment, chrome plating treatment, and alloy plating treatment such as tin-nickel can be mentioned, especially the simplicity of waste liquid treatment and environmental safety. From this point, oxidation treatment is preferable.

  When the oxidation treatment is performed as the blackening treatment, it is generally possible to use a mixed aqueous solution of hypochlorite and sodium hydroxide, a mixed aqueous solution of peroxodisulfuric acid and sodium hydroxide, or the like as the blackening treatment liquid. It is possible to use a mixed aqueous solution of hypochlorite and sodium hydroxide, particularly from the viewpoint of economy.

  When performing the sulfurization treatment as the blackening treatment, an aqueous solution such as potassium sulfide, barium sulfide and ammonium sulfide can be generally used as the blackening treatment liquid, preferably potassium sulfide and ammonium sulfide. In particular, ammonium sulfide is preferably used because it can be used at a low temperature.

  As the blackening treatment, when performing a chrome plating treatment, as the blackening treatment liquid, it is generally possible to use an aqueous solution of chromic acid and acetic acid, an aqueous solution of chromic acid and hydrofluoric acid, and the like. In particular, it is preferable to use an aqueous solution of chromic acid and acetic acid from the viewpoint of economy.

  The thickness of the blackened layer obtained as described above is generally 0.5 to 5 μm, particularly preferably 1 to 2 μm. In the present invention, the thickness of the blackening layer is included in the thickness of the metal conductive layer of the present invention.

  A metal plating layer may be further provided on the conductive layer in order to improve conductivity. The metal plating layer can be formed by a known electrolytic plating method or electroless plating method. As the metal used for plating, generally, copper, copper alloy, nickel, aluminum, silver, gold, zinc or tin can be used, preferably copper, copper alloy, silver or nickel, In particular, it is preferable to use copper or a copper alloy from the viewpoint of economy and conductivity. Moreover, you may perform the said blackening process on a metal plating layer.

  Further, the conductive layer may be an alternately laminated film of a dielectric layer (metal oxide) and a metal layer. In particular, a laminate of 5 layers or more of dielectric layer / metal layer / dielectric layer / metal layer / dielectric layer is preferable. For example, an alternate laminate of a dielectric layer of a metal oxide such as ITO and a metal layer of Ag or the like (eg, a laminate of ITO / silver / ITO / silver / ITO) can be used.

  The transparent conductive film can be formed by physical vapor deposition or chemical vapor deposition. Examples of the physical vapor deposition method include a vacuum vapor deposition method, a sputtering method, an ion plating method, and a laser ablation method, but it is generally preferable to form a film by the sputtering method. Examples of the chemical vapor deposition method include an atmospheric pressure CVD method, a low pressure CVD method, and a plasma CVD method.

  The antireflection film of the present invention is generally a composite film of a hard coat layer having a refractive index higher than that of a transparent substrate and a low refractive layer provided thereon, or preferably a higher refractive index layer on the low refractive index layer. Is a composite membrane provided. The antireflection film is effective even if only the hard coat layer having a higher refractive index than that of the substrate or only the low refractive index layer. However, when the refractive index of the transparent substrate is low, a composite film of a hard coat layer having a refractive index lower than that of the transparent substrate and a high refractive layer provided thereon, or a low refractive index layer is further provided on the high refractive index layer. A composite film obtained may be used. In the case of imparting a near-infrared shielding function to the antireflection film of the present invention, a material to be described later (eg, a dye) that absorbs near-infrared rays may be mixed and / or kneaded into the hard coat layer or the like. Or you may introduce | transduce into the transparent substrate for forming an antireflection film.

  As a hard-coat layer, the layer which consists of an acrylic resin layer, an epoxy resin layer, a urethane resin layer, a silicon resin layer etc. can be mentioned, The layer thickness is 1-50 micrometers normally, Preferably it is 1-10 micrometers. Either a thermosetting resin or an ultraviolet curable resin may be used, but an ultraviolet curable resin is preferable.

  Examples of the thermosetting resin include phenol resin, resorcinol resin, urea resin, melamine resin, epoxy resin, acrylic resin, urethane resin, furan resin, and silicon resin.

  Examples of the ultraviolet curable resin (monomer, oligomer) include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, and 2-ethylhexyl polyethoxy (meth) acrylate. , Benzyl (meth) acrylate, isobornyl (meth) acrylate, phenyloxyethyl (meth) acrylate, tricyclodecane mono (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, acryloylmorpholine , N-vinylcaprolactam, 2-hydroxy-3-phenyloxypropyl (meth) acrylate, o-phenylphenyloxyethyl (meth) acrylate, neopentylglyce Di (meth) acrylate, neopentyl glycol dipropoxy di (meth) acrylate, neopentyl glycol di (meth) acrylate hydroxypivalate, tricyclodecane dimethylol di (meth) acrylate, 1,6-hexanediol di (meth) Acrylate, nonanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, tris [(meth) acryloxyethyl] isocyanurate, ditrimethylolpropane (Meth) acrylate monomers such as tetra (meth) acrylate; polyol compounds (for example, ethylene glycol, propylene glycol, neopentyl glycol, , 6-hexanediol, 3-methyl-1,5-pentanediol, 1,9-nonanediol, 2-ethyl-2-butyl-1,3-propanediol, trimethylolpropane, diethylene glycol, dipropylene glycol, polypropylene Polyols such as glycol, 1,4-dimethylolcyclohexane, bisphenol A polyethoxydiol, polytetramethylene glycol, the polyols and succinic acid, maleic acid, itaconic acid, adipic acid, hydrogenated dimer acid, phthalic acid, isophthalic acid Polyester polyols which are reaction products of polybasic acids such as acid and terephthalic acid or acid anhydrides thereof, polycaprolactone polyols which are reaction products of the polyols and ε-caprolactone, the polyols and the above, Polybasic acid or this Reaction products of these acid anhydrides with ε-caprolactone, polycarbonate polyols, polymer polyols, etc.) and organic polyisocyanates (for example, tolylene diisocyanate, isophorone diisocyanate, xylylene diisocyanate, diphenylmethane-4,4′-diisocyanate, diisocyanate) Cyclopentanyl diisocyanate, hexamethylene diisocyanate, 2,4,4′-trimethylhexamethylene diisocyanate, 2,2′-4-trimethylhexamethylene diisocyanate, etc.) and a hydroxyl group-containing (meth) acrylate (for example, 2-hydroxyethyl (meta ) Acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenyloxypropyl (meth) acrylic Rate, cyclohexane-1,4-dimethylol mono (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, glycerin di (meth) acrylate, etc.) (Meth) such as bisphenol type epoxy (meth) acrylate, which is a reaction product of bisphenol type epoxy resin such as polyurethane (meth) acrylate, bisphenol A type epoxy resin, bisphenol F type epoxy resin and (meth) acrylic acid, which are reactants Examples include acrylate oligomers. These compounds can be used alone or in combination. These ultraviolet curable resins may be used as a thermosetting resin together with a thermal polymerization initiator.

  For the hard coat layer, among the above-mentioned ultraviolet curable resins (monomers and oligomers), hard materials such as pentaerythritol tri (meth) acrylate, pentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate are used. It is preferable to mainly use polyfunctional monomers.

  Any compound suitable for the properties of the ultraviolet curable resin can be used as the photopolymerization initiator for the ultraviolet curable resin. For example, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1, 2, Acetophenones such as 2-diethoxyacetophenone, benzoins such as benzyldimethyl ketal, benzophenones such as benzophenone, 4-phenylbenzophenone and hydroxybenzophenone, thioxanthones such as isopropylthioxanthone and 2-4-diethylthioxanthone, and other special products For example, methylphenylglyoxylate can be used. Particularly preferably, 2,2-diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1, benzophenone and the like. These photopolymerization initiators may be optionally selected from one or more known photopolymerization accelerators such as benzoic acid type or tertiary amine type such as 4-dimethylaminobenzoic acid. It can be used by mixing at a ratio. Moreover, it can be used by 1 type, or 2 or more types of mixture of only a photoinitiator. Particularly preferred is 1-hydroxycyclohexyl phenyl ketone (Irgacure 184, manufactured by Ciba Specialty Chemicals).

  The quantity of a photoinitiator is 0.1-10 mass% with respect to a resin composition, Preferably it is 0.1-5 mass%.

  The hard coat layer may have a refractive index higher or lower than that of the transparent substrate, but is preferably high. By using the ultraviolet curable resin, it is generally easy to obtain a refractive index lower than that of the substrate. It is preferable to increase the refractive index by adding conductive metal oxide fine particles. The film thickness is as described above.

The high refractive index layer is made of, for example, ITO, ATO, Sb ₂ O ₃ , SbO ₂ , In ₂ O ₃ , SnO ₂ , ZnO, Al-doped ZnO, TiO ₂ or the like in a polymer (preferably UV curable resin). It is preferable to use a layer in which conductive metal oxide fine particles (inorganic compound) are dispersed. The metal oxide fine particles preferably have an average particle size of 10 to 10,000 nm, preferably 10 to 50 nm. In particular, ITO (especially having an average particle diameter of 10 to 50 nm) is preferable. Those having a refractive index of 1.64 or more are suitable. The film thickness is generally in the range of 10 to 500 nm, preferably 20 to 200 nm.

  When the high refractive index layer is a conductive layer, the minimum reflectance of the surface reflectance of the antireflection film is set within 1.5% by setting the refractive index of the high refractive index layer 2 to 1.64 or more. The minimum reflectance of the surface reflectance of the antireflection film can be made to be within 1.0% by setting it to 1.69 or more, preferably 1.69 to 1.82.

  The hard coat layer preferably has a visible light transmittance of 85% or more. Both the visible light transmittance of the high refractive index layer and the low refractive index layer are preferably 85% or more.

  The low refractive index layer is a layer (cured) in which fine particles such as silica and fluororesin, preferably 10 to 40% by weight (preferably 10 to 30% by mass) of hollow silica are dispersed in a polymer (preferably UV curable resin). Layer). The refractive index of this low refractive index layer is preferably 1.45 to 1.51. When the refractive index is more than 1.51, the antireflection property of the antireflection film is deteriorated. The film thickness is generally in the range of 10 to 500 nm, preferably 20 to 200 nm.

  As the hollow silica, those having an average particle diameter of 10 to 100 nm, preferably 10 to 50 nm, and a specific gravity of 0.5 to 1.0, preferably 0.8 to 0.9 are preferable.

  When the antireflection film is composed of the above three layers, for example, the thickness of the hard coat layer is 2 to 20 μm, the thickness of the high refractive index layer is 75 to 90 nm, and the thickness of the low refractive index layer is 85 to 110 nm. Preferably there is.

  In order to form each layer of the antireflection film, as described above, the polymer (preferably ultraviolet curable resin) is blended with the fine particles as necessary, and the obtained coating solution is applied, and then dried. If necessary, it is heat-cured, or after coating, if necessary, it is dried and irradiated with ultraviolet rays. In this case, each layer may be applied and cured one by one, or all the layers may be applied and then cured together.

  As a specific method of coating, a method of coating a coating solution in which an ultraviolet curable resin containing an acrylic monomer or the like is made into a solution with a solvent such as toluene is coated with a gravure coater, and then dried, and then cured by ultraviolet rays. Can be mentioned. This wet coating method has the advantage that the film can be uniformly formed at high speed at low cost. After this coating, for example, by irradiating and curing with ultraviolet rays, the effect of improving the adhesion and increasing the hardness of the film can be obtained. The conductive layer can be formed similarly.

  In the case of ultraviolet curing, many light sources that emit light in the ultraviolet to visible range can be used as the light source, such as ultra-high pressure, high pressure, low pressure mercury lamp, chemical lamp, xenon lamp, halogen lamp, mercury lamp, carbon arc lamp, incandescent lamp. And laser light. The irradiation time cannot be determined unconditionally depending on the type of lamp and the intensity of the light source, but is about several seconds to several minutes. Moreover, in order to accelerate curing, the laminate may be preheated to 40 to 120 ° C. and irradiated with ultraviolet rays.

  The antireflection layer of the present invention is preferably formed by coating as described above, but may be formed by a vapor phase film forming method. Usually, the high refractive index layer and the low refractive index layer can be formed by physical vapor deposition or chemical vapor deposition. Examples of the physical vapor deposition method include a vacuum vapor deposition method, a sputtering method, an ion plating method, and a laser ablation method, but it is generally preferable to form a film by the sputtering method. Examples of the chemical vapor deposition method include an atmospheric pressure CVD method, a low pressure CVD method, and a plasma CVD method.

  Examples of the combination of the high refractive index layer and the low refractive index layer include the following.

(A) 1 layer each in the order of high refractive index layer / low refractive index layer, laminated in a total of 2 layers, (b) 2 layers of high refractive index layer / low refractive index layer alternately, 4 layers in total (C) One layer each in the order of medium refractive index layer / high refractive index layer / low refractive index layer, laminated in a total of three layers, (d) high refractive index layer / low refractive index layer In this order, each layer is alternately stacked in 3 layers for a total of 6 layers. As the high refractive index layer, ITO (tin indium oxide) or ZnO, a thin film of ZnO, TiO ₂ , SnO ₂ , ZrO or the like doped with Al can be employed. As the low refractive index layer, a thin film having a refractive index of 1.6 or less, such as SiO ₂ , MgF ₂ , Al ₂ O _3, or the like can be used.

  The transparent conductive film can be formed by physical vapor deposition or chemical vapor deposition. Examples of the physical vapor deposition method include a vacuum vapor deposition method, a sputtering method, an ion plating method, and a laser ablation method, but it is generally preferable to form a film by the sputtering method. Examples of the chemical vapor deposition method include an atmospheric pressure CVD method, a low pressure CVD method, and a plasma CVD method.

  The impact-absorbing layer of the present invention is usually used to prevent damage to the glass of the display or the anti-reflection film itself when an impact is applied to the display equipped with the anti-reflection film of the present invention from the anti-reflection film side. Is provided.

  The shock absorbing layer of the present invention is a layer having a thickness of 0.01 to 1 mm and satisfying the formula (I) (preferably the formula (II)).

  Examples of the resin constituting the shock absorbing layer include ethylene-vinyl acetate copolymer, ethylene-methyl acrylate copolymer, acrylic resin (eg, ethylene- (meth) acrylic acid copolymer, ethylene- (meta ) Ethyl acrylate copolymer, ethylene- (meth) acrylic acid methyl copolymer, metal ion cross-linked ethylene- (meth) acrylic acid copolymer), partially saponified ethylene-vinyl acetate copolymer, carboxylated ethylene-acetic acid Examples include ethylene copolymers such as vinyl copolymers, ethylene- (meth) acryl-maleic anhydride copolymers, and ethylene-vinyl acetate- (meth) acrylate copolymers (in addition, “(meth) “Acrylic” means “acrylic or methacrylic”.) In addition, polyvinyl butyral (PVB) resin, epoxy resin, phenol resin, silicone resin, polyester resin, urethane resin, and the like can be used. However, the ethylene-vinyl acetate copolymer ( EVA), an acrylic resin.

  The acrylic resin is preferably a polymerized layer or a cured layer of an ultraviolet ray or a thermosetting (meth) acrylate composition.

  The (meth) acrylate composition is generally a monomer material mainly composed of (meth) acrylic acid alkyl ester having an alkyl group having 4 to 14 carbon atoms (50% by mass or more), or a part of this monomer material. 0.1 to 1.0 mass of polyfunctional (meth) acrylate having a partial polymer / monomer mixture obtained by polymerization, and further 100 mass parts of the partial polymer / monomer mixture and two or more (meth) acryloyl groups. Those containing parts are preferred. In the present invention, the (meth) acrylic acid alkyl ester refers to an acrylic acid alkyl ester and / or a methacrylic acid alkyl ester.

  Examples of the (meth) acrylic acid alkyl ester having an alkyl group having 4 to 14 carbon atoms, which is the main component of the (meth) acrylate composition, include butyl (meth) acrylate, isoamyl (meth) acrylate, and n-hexyl. Examples include (meth) acrylate, 2-ethylhexyl (meth) acrylate, isooctyl (meth) acrylate, isononyl (meth) acrylate, decyl (meth) acrylate, dodecyl (meth) acrylate, tetradecyl (meth) acrylate, and the like. A seed or a mixture of two or more is used. The alkyl group may be either a straight chain or a branched chain, but is preferably not a t-alkyl group.

  In the production of the (meth) acrylate composition (preferably production of a partial polymer / monomer mixture), a monovinyl monomer copolymerizable with the monomer is used for the purpose of improving the physical properties such as optical properties and heat resistance, as necessary. It is preferable to use together. Examples of the monovinyl monomer include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, and 6-hydroxyhexyl (meth) acrylate. Hydroxyl group-containing monomers; (meth) acrylic acid alkoxyalkyl monomers such as (meth) acrylic acid methoxyethyl and (meth) acrylic acid ethoxyethyl; mono (meth) acrylic acid polyethylene glycol, mono (meth) acrylic acid polypropylene glycol Polyalkylene glycol (meth) acrylates such as alkoxypolyethylene glycol (meth) acrylate and alkoxypolyalkylene glycol (meth) acrylates such as alkoxypolypropylene glycol (meth) acrylate It can be mentioned methacrylic acid and acrylic acid; over and. In particular, acrylic acid and methacrylic acid (acrylic acid is preferred); hydroxyl group-containing monomers such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate And alkoxypolyalkylene glycol (meth) acrylates are preferred. Alkoxypolyalkylene glycol (meth) acrylate is a group in which an alkoxyl group has 1 to 5 carbon atoms (particularly methoxy, ethoxy), alkyleneoxy is ethyleneoxy or propyleneoxy, and poly (alkyleneoxy) is repeated. The number is preferably 2 to 15 (especially 2 to 12; especially 2 to 5).

  Of the monovinyl monomers, a hydroxyl group-containing monomer and an alkoxy polyalkylene glycol (meth) acrylate are preferable because they are effective in improving the heat and moisture resistance. Furthermore, acrylic acid is preferable in that it exhibits good compatibility. The monovinyl monomer preferably contains the alkoxy polyalkylene glycol (meth) acrylate and a hydroxyl group-containing (meth) acrylate.

  For the production of the partial polymer / monomer mixture, a known radical polymerization method such as solution polymerization, bulk polymerization, emulsion polymerization or the like can be appropriately selected and used using an appropriate polymerization initiator. As the radical polymerization initiator, various known azo and peroxide initiators can be used. For example, in bulk polymerization, a polymerization initiator is used in an amount of about 0.01 to 0.2 parts by mass with respect to 100 parts by mass of the monomer, and this is irradiated with a small amount of radiation such as ultraviolet rays to partially polymerize to increase the reaction system. It is obtained by making it stick. The polymerization rate of the monomer is preferably 3 to 50% by mass, more preferably 5 to 30% by mass, and particularly preferably 10 to 20% by mass.

  In addition, the acrylic resin is produced by appropriately applying a known radical polymerization method such as solution polymerization, bulk polymerization, emulsion polymerization or the like to an ultraviolet ray or thermosetting (meth) acrylate composition using an appropriate thermal (radical) polymerization initiator. It is also possible to select and use. As the radical polymerization initiator, various known azo and peroxide initiators can be used. For example, in bulk polymerization, a polymerization initiator is used in an amount of about 0.01 to 0.2 parts by mass with respect to 100 parts by mass of the monomer. The resulting acrylic resin (polymerization reaction solution) is further appropriately added with the following polyfunctional (meth) acrylate, polyisocyanate, and the like, and appropriately heat-cured (preferably 80 to 120 ° C.) to obtain the shock absorbing layer of the present invention. It is preferable. In this case, the thermosetting (meth) acrylate composition is generally composed of a polymerized acrylic resin and, if desired, a curing agent such as polyisocyanate.

  Examples of the polyfunctional (meth) acrylate having two or more (meth) acryloyl groups include hexanediol di (meth) acrylate, (poly) ethylene glycol di (meth) acrylate, and (poly) propylene glycol di (meth) acrylate. , Neopentyl glycol di (meth) acrylate, pentaerythritol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, epoxy (meth) acrylate, Polyester (meth) acrylate, urethane (meth) acrylate, etc. can be mentioned.

  As a preferable curable (meth) acrylate composition, a monomer material mainly composed of (meth) acrylic acid alkyl ester having an alkyl group having 4 to 14 carbon atoms (50% by mass or more) is partially polymerized. 100 parts by mass of the resulting partial polymer / monomer mixture and 0.1 to 1.0 part by mass of a polyfunctional (meth) acrylate having two or more (meth) acryloyl groups.

  As the partial polymer / monomer mixture constituting this curable (meth) acrylate composition, in particular, at least alkyl acrylate (however, the alkyl group has 4 to 10 carbon atoms; particularly 2-ethylhexyl acrylate) and A mixture containing acrylic acid is preferred. The acrylic acid is preferably used in an amount of 0.1 to 20% by mass, particularly 0.5 to 10% by mass, based on the alkyl acrylate.

  As a monomer constituting the curable (meth) acrylate composition, in addition to the partial polymer / monomer mixture, a polyfunctional acrylate monomer having 2 or more (meth) acryloyl groups (particularly trimethylolpropane triacrylate) is included. It is particularly preferable. The polyfunctional acrylate monomer is generally used in an amount of 0.1 to 1.0 part by mass with respect to 100 parts by mass of the partial polymer / monomer mixture.

  Furthermore, it is preferable that polyisocyanate (preferably diisocyanate) is further contained in the curable (meth) acrylate composition (usually with respect to the partial polymer / monomer mixture or acrylic resin). Examples include tolylene diisocyanate, isophorone diisocyanate, xylylene diisocyanate, diphenylmethane-4,4'-diisocyanate, dicyclopentanyl diisocyanate, hexamethylene diisocyanate, 2,4,4'-trimethylhexamethylene diisocyanate, 2,2 And '-4-trimethylhexamethylene diisocyanate. It is preferable to use it in an amount of 0.1 to 10% by mass, particularly 0.1 to 5% by mass with respect to the curable (meth) acrylate composition.

  By using such a curable (meth) acrylate composition, it is easy to design a resin that satisfies the formula (I). In addition, this makes it easy to obtain a layer that absorbs impact and easily returns to its original shape from deformation due to impact. The gel fraction of the obtained layer is preferably 70 to 100% by mass, more preferably 80 to 100% by mass, and particularly preferably 80 to 99% by mass. The weight average molecular weight is preferably 10,000 to 700,000, particularly preferably 400,000 to 700,000. The thickness of the shock absorbing layer is preferably in the range of 0.1 to 1.0 mm, more preferably in the range of 0.2 to 0.6 mm.

  The ultraviolet or thermosetting (meth) acrylate composition contains the photopolymerization initiator (ultraviolet light) or thermal polymerization initiator (heat) described as the material for the hard coat layer, and various additives as required. . For example, a known tackifier resin (for example, rosin resin, terpene resin, petroleum resin, coumarone-indene resin, styrene resin, etc.) may be added to adjust the adhesive properties of the composition. Additives other than tackifying resins include fillers such as plasticizers, glass fibers, glass beads, metal powder, or finely divided silica, pigments, colorants, antioxidants, anti-aging agents, and silane coupling agents. And ultraviolet absorbers. Moreover, it can also be set as the adhesive layer which contains microparticles | fine-particles and has light diffusibility.

  The method for forming the shock absorbing layer of the present invention is not particularly limited, and various methods can be used. For example, the curable (meth) acrylate composition is applied to one or both surfaces of a transparent substrate or the surface of a desired layer, dried, and cured as necessary (preferably by bulk polymerization) to form an impact absorbing layer. A method can be mentioned. Also, after applying the curable (meth) acrylate composition onto a transfer sheet having a peelable surface, drying and curing as necessary to form an impact absorbing layer, the impact absorbing layer is then applied to one or both sides of the substrate. The impact absorbing layer may be formed by peeling and removing the transfer sheet.

  When the impact absorbing layer of the present invention is formed by ultraviolet irradiation, for example, after the ultraviolet curable (meth) acrylate composition is applied to a transfer sheet having a peelable surface, the surface is also applied to the surface of the coating film as necessary. Can be obtained by placing a peelable transfer sheet (in a sandwich state) and curing it by ultraviolet irradiation, and then removing the transfer sheet. Alternatively, the impact absorbing layer can be formed by applying the ultraviolet curable (meth) acrylate composition directly on the surface of the optical filter on which the impact absorbing layer is to be provided and then curing the composition by ultraviolet irradiation. Further, since it is necessary to form a relatively thick shock absorbing layer, it is preferable to form the shock absorbing layer by photopolymerization reaction. What is necessary is just to heat instead of ultraviolet irradiation when making it thermoset.

  In a preferred embodiment of the UV curing method, first, a monomer material and a photopolymerization initiator are mixed, and a part of the monomer is polymerized by a small amount of light irradiation to thicken the reaction system (production of a partial polymer / monomer mixture). . A polyfunctional (meth) acrylate, a photopolymerization initiator, and the like are appropriately added to and mixed with this partial polymer / monomer mixture, and this is applied to the substrate or the like with an appropriate thickness. Then, it is polymerized and cross-linked by light irradiation to form an impact absorbing layer. The quantity of a photoinitiator is 0.1-10 mass% with respect to an ultraviolet-ray or a thermosetting (meth) acrylate composition, Preferably it is 0.1-5 mass%.

  Alternatively, the impact absorbing layer can be formed by a method other than the above application using a thermoplastic resin such as EVA, which will be described later. For example, after mixing EVA and the above-mentioned additives and kneading them with an extruder, a roll or the like. It is manufactured by forming a sheet into a predetermined shape by a film forming method such as calendar, roll, T-die extrusion, and inflation. During film formation, embossing is applied to prevent blocking and facilitate degassing during pressure bonding with a glass substrate.

  The transparent pressure-sensitive adhesive layer of the present invention is a layer for bonding between layers or films, or for bonding to a display. Any resin having such an adhesive function can be used. For example, ethylene-vinyl acetate copolymer, ethylene-methyl acrylate copolymer, acrylic resin (eg, ethylene- (meth) acrylic acid copolymer, ethylene- (meth) ethyl acrylate copolymer, ethylene- ( (Meth) methyl acrylate copolymer, metal ion cross-linked ethylene- (meth) acrylic acid copolymer), partially saponified ethylene-vinyl acetate copolymer, carboxylated ethylene-vinyl acetate copolymer, ethylene- (meth) acrylic -Ethylene-based copolymers such as maleic anhydride copolymer and ethylene-vinyl acetate- (meth) acrylate copolymer can be mentioned ("(meth) acryl" means "acryl or methacryl"). ). In addition, polyvinyl butyral (PVB) resin, epoxy resin, phenol resin, silicone resin, polyester resin, urethane resin, etc. can be used, but acrylic resin pressure-sensitive adhesives and epoxy resins are easy to obtain good adhesion. is there.

  The layer thickness is generally 10 to 50 μm, preferably 20 to 30 μm. In general, the optical filter can be equipped by heat-pressing the pressure-sensitive adhesive layer to a glass plate of a display.

  When the conductive layer is formed in a mesh shape, it is preferable to use the transparent pressure-sensitive adhesive layer in order to fill the voids in the mesh.

  EVA can also be used as a material for the transparent adhesive layer. EVA having a vinyl acetate content of 5 to 50% by weight, preferably 15 to 40% by weight is used. When the vinyl acetate content is less than 5% by weight, there is a problem in transparency, and when it exceeds 40% by weight, the mechanical properties are remarkably deteriorated and the film formation becomes difficult and the films are easily blocked.

  As the cross-linking agent, an organic peroxide is suitable for heat cross-linking and is selected in consideration of sheet processing temperature, cross-linking temperature, storage stability, and the like. Examples of peroxides that can be used include 2,5-dimethylhexane-2,5-dihydroperoxide; 2,5-dimethyl-2,5-di (t-butylperoxy) hexane-3; -Butyl peroxide; t-butylcumyl peroxide; 2,5-dimethyl-2,5-di (t-butylperoxy) hexane; dicumyl peroxide; α, α'-bis (t-butylperoxyisopropyl) ) Benzene; n-butyl-4,4-bis (t-butylperoxy) valerate; 2,2-bis (t-butylperoxy) butane; 1,1-bis (t-butylperoxy) cyclohexane; , 1-bis (t-butylperoxy) -3,3,5-trimethylcyclohexane; t-butylperoxybenzoate; benzoyl peroxide; Luperoxyacetate; 2,5-dimethyl-2,5-bis (tertiarybutylperoxy) hexyne-3; 1,1-bis (tertiarybutylperoxy) -3,3,5-trimethylcyclohexane; 1-bis (tert-butylperoxy) cyclohexane; methyl ethyl ketone peroxide; 2,5-dimethylhexyl-2,5-bisperoxybenzoate; tert-butyl hydroperoxide; p-menthane hydroperoxide; p-chlorobenzoyl Peroxides; tertiary butyl peroxyisobutyrate; hydroxyheptyl peroxide; chlorohexanone peroxide. These peroxides are used singly or in combination of two or more, and are usually used at a ratio of 5 parts by mass or less, preferably 0.5 to 5.0 parts by mass with respect to 100 parts by weight of EVA. .

  The organic peroxide is usually kneaded with EVA using an extruder, a roll mill or the like, but may be dissolved in an organic solvent, a plasticizer, a vinyl monomer or the like and added to the EVA film by an impregnation method.

  Various acryloxy group or methacryloxy group and allyl group-containing compounds can be added to improve EVA physical properties (mechanical strength, optical properties, adhesiveness, weather resistance, whitening resistance, crosslinking speed, etc.). . As the compound used for this purpose, acrylic acid or methacrylic acid derivatives, for example, esters and amides thereof are the most common. As the ester residue, in addition to alkyl groups such as methyl, ethyl, dodecyl, stearyl, lauryl, cyclohexyl groups , Tetrahydrofurfuryl group, aminoethyl group, 2-hydroxyethyl group, 3-hydroxypropyl group, 3-chloro-2-hydroxypropyl group and the like. Further, esters with polyfunctional alcohols such as ethylene glycol, triethylene glycol, polyethylene glycol, trimethylolpropane, and pentaerythritol can also be used. A typical amide is diacetone acrylamide.

  Examples thereof include polyfunctional esters such as acrylic or methacrylic acid esters such as trimethylolpropane, pentaerythritol, glycerin, triallyl cyanurate, triallyl isocyanurate, diallyl phthalate, diallyl isophthalate, diallyl maleate, etc. Examples include allyl group-containing compounds. These are used alone or in combination of two or more, and are usually used in an amount of 0.1 to 2 parts by weight, preferably 0.5 to 5 parts by weight, based on 100 parts by weight of EVA. .

  When EVA is crosslinked by light, a photosensitizer is usually used in an amount of 5 parts by mass or less, preferably 0.1 to 3.0 parts by mass based on 100 parts by mass of EVA instead of the peroxide.

  In this case, usable photosensitizers include, for example, benzoin, benzophenone, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, dibenzyl, 5-nitroacenaphthene, hexachlorocyclopentadiene, p-nitrodiphenyl. , P-nitroaniline, 2,4,6-trinitroaniline, 1,2-benzanthraquinone, 3-methyl-1,3-diaza-1,9-benzanthrone, and the like. Alternatively, two or more types can be mixed and used.

  Moreover, a silane coupling agent is used in combination as an adhesion promoter. As this silane coupling agent, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycid Xylpropyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-chloropropylmethoxysilane, vinyltrichlorosilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N- β (aminoethyl) -γ-aminopropyltrimethoxysilane and the like can be mentioned.

  The silane coupling agent is generally used in an amount of 0.001 to 10 parts by mass, preferably 0.001 to 5 parts by mass, based on 100 parts by mass of EVA, and one or more types are mixed and used.

  In addition, the EVA adhesive layer according to the present invention may further contain a small amount of an ultraviolet absorber, an infrared absorber, an anti-aging agent, a coating processing aid, a colorant, and the like. A small amount of a filler such as hydrophobic silica or calcium carbonate may be included.

  The near-infrared shielding layer or film is generally a near-infrared cut film, for example, a near-infrared cut layer containing a pigment or the like formed on the surface of the base film, or a film containing a pigment or the like. is there. Examples of the dye include a cyanine dye, a squarylium dye, an anthraquinone dye, a phthalocyanine dye, a polymethine dye, and a polyazo dye, and a cyanine dye or a squarylium dye is particularly preferable. These dyes can be used alone or in combination.

  A particularly preferred near-infrared cut film is a film in which a near-infrared cut layer containing a diimonium compound and a specific copper complex and / or a copper compound is formed on the surface of the base film. It can be formed by dispersing a diimonium compound and a copper complex and / or a copper compound, coating the surface of the transparent substrate with a coating solution that has been diluted with an appropriate solvent and adjusting the concentration, and then drying the coating film. .

  The near-infrared cut film may be provided with a layer composed of two or more near-infrared cut layers, preferably two or more near-infrared absorber layers, on the base film. It is advantageous in that extremely good near-infrared cut performance can be obtained in a wide wavelength range.

  Two or more near-infrared cut films can be configured as follows.

Combined use of a near-infrared cut film having a near-infrared cut layer formed on the base film and a near-infrared cut film having a near-infrared cut layer formed on the base film;
A near-infrared cut film having a near-infrared cut layer formed on one side of the base film and a near-infrared cut layer formed on the other side;
A near infrared cut film in which a near infrared cut layer and a near infrared cut layer are laminated on a base film;
Near-infrared cut film having a near-infrared cut layer formed on the base film;
Any combination of two or more of the above.

  In the above configuration, it is preferable that one of the near-infrared cut layers is a layer containing a diimonium compound and a copper complex and / or a copper compound, and the other is a different layer.

  Moreover, in said structure, it is preferable to make a near-infrared cut layer into a layer containing a diimonium type compound, a copper complex, and / or a copper compound, and to mix | blend a different near-infrared absorber as needed.

  In the present invention, as a near infrared cut layer other than a layer containing a diimonium compound and a copper complex and / or a copper compound, the following may be used alone or in combination of two or more. This is preferable because good near-infrared cut performance (for example, performance to sufficiently absorb near-infrared light in a wide wavelength range of near-infrared such as 850 to 1250 nm) can be obtained without impairing the brightness.

  (A) 100-5000 mm thick ITO coating layer, (b) 100-10000 mm thick ITO and silver coating layer, (c) 0.5-50 μm thick nickel complex system and imonium A coating layer in which a mixed material of the system is formed into a film using an appropriate transparent base polymer; (d) a copper compound containing divalent copper ions having a thickness of 10 to 10,000 μm is formed into a film using an appropriate transparent base polymer; (E) an organic dye-based coating layer having a thickness of 0.5 to 50 μm.

  The protective layer is preferably formed in the same manner as the hard coat layer.

  As a material for the release sheet, a transparent polymer having a glass transition temperature of 50 ° C. or higher is preferable. Examples of such a material include polyester resins such as polyethylene terephthalate, polycyclohexylene terephthalate, and polyethylene naphthalate, nylon 46, and modified nylon. In addition to polyamide resins such as 6T, nylon MXD6 and polyphthalamide, ketone resins such as polyphenylene sulfide and polythioether sulfone, and sulfone resins such as polysulfone and polyether sulfone, polyether nitrile, polyarylate, poly Resins based on polymers such as ether imide, polyamide imide, polycarbonate, polymethyl methacrylate, triacetyl cellulose, polystyrene and polyvinyl chloride can be used. . Of these, polycarbonate, polymethyl methacrylate, polyvinyl chloride, polystyrene, and polyethylene terephthalate can be suitably used. The thickness is preferably 10 to 200 μm, particularly preferably 30 to 100 μm.

  The optical filter of the present invention includes, for example, a transparent film on which an antireflection film is formed and a transparent film on which a conductive layer is formed, with the surface having no layer or film facing each other, or the surface having no film. A conductive layer (mesh-like metal layer) is placed facing each other, and a sheet of shock absorbing layer is placed on one side, stacked, degassed under reduced pressure and warm, pre-pressed, and then heated or irradiated Thus, the shock absorbing layer can be easily manufactured by heating (hardening if necessary) and integrating. Alternatively, the three sheets can be continuously manufactured by continuously conveying and superimposing and thermocompression bonding. Or it can manufacture by using a transparent adhesive layer suitably instead of an impact absorption layer. In that case, the shock absorbing layer is provided at another position simultaneously or separately.

  The optical filter of the present invention thus obtained is used by being bonded to the surface of an image display glass plate of a display such as PDP.

  Since the PDP display device of the present invention can directly bond the optical filter of the present invention to the surface of the glass plate by using a plastic film as a transparent substrate, the PDP itself can be reduced in weight, thickness, This can contribute to cost reduction. Compared with the case where a front plate made of a transparent molded body is installed on the front side of the PDP, an air layer having a low refractive index can be eliminated between the PDP and the PDP filter, so that visible light reflection due to interface reflection can be achieved. Problems such as an increase in rate and double reflection can be solved, and the visibility of the PDP can be further improved. In the present invention, since a specific shock absorbing layer is provided, the PDP has a function of protecting the PDP against a large external shock because it has relaxation properties against a high impact force.

  Therefore, the optical filter of the present invention has an excellent antireflection effect and antistatic property, hardly emits dangerous electromagnetic waves, and has a large protection function against impacts. It can be said.

  EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not limited to a following example.

[Example 1]
(1) Preparation of impact-absorbing layer-forming composition (ultraviolet curable (meth) acrylate composition) 97.5 parts by mass of 2-ethylhexyl acrylate and 2.5 parts by mass of acrylic acid have a polymerization rate of 30% (mass). A partial polymer / monomer mixture was prepared by polymerizing to the above.

  To 100 parts by mass of this partial polymer / monomer mixture, 0.2 parts by mass of a photopolymerization initiator (2,2-diethoxyacetophenone) and 0.1 parts by mass of a polyfunctional monomer (trimethylolpropane triacrylate) are added, The composition for shock absorption layer formation (UV curable (meth) acrylate composition coating solution) was prepared by sufficiently stirring.

(2) Formation of Shock Absorbing Layer The obtained shock absorbing layer forming composition (coating solution) was applied onto a release polyethylene terephthalate film (thickness 100 μm), and another release polyethylene terephthalate film (thickness) was formed thereon. 100 μm) was placed, and ultraviolet rays were irradiated from above the release film with an ultraviolet lamp until the total integrated light amount reached 3000 mJ / cm ² . As a result, the shock absorbing layer forming composition was photopolymerized to obtain a shock absorbing layer having a thickness of 0.2 mm.

[Example 2]
In Example 1, the shock absorbing layer was obtained in the same manner as in (2) Formation of the shock absorbing layer except that a shock absorbing layer having a thickness of 0.4 mm was formed.

[Example 3]
In Example 1, the composition for forming an impact absorbing layer was the same as in Example 1 except that 10 parts by mass of ethoxydiethylene glycol acrylate was further added to 100 parts by mass of the partial polymer / monomer mixture in the preparation of the composition for forming the impact absorbing layer. Was prepared.

  Other procedures were carried out in the same manner as in Example 1 to obtain an impact absorbing layer.

[Comparative Example 1]
In Example 1, a shock absorbing layer was obtained in the same manner as in (2) Formation of shock absorbing layer, except that a shock absorbing layer having a thickness of 0.005 mm (5 μm) was formed.

[Comparative Example 2]
In Example 3, a shock absorbing layer forming composition was prepared in the same manner as in (1) except that the amount of ethoxydiethylene glycol acrylate added in the preparation of the shock absorbing layer forming composition was changed to 30 parts by mass.

[Comparative Example 3]
In Example 3, an impact absorbing layer was obtained in the same manner as in (2) Formation of the impact absorbing layer except that an impact absorbing layer having a thickness of 1.2 mm was formed.

[Examples 4 to 6]
A hard made of an ultraviolet curable resin (resin composition having an acryloyl group) in which silica fine particle-dispersed ultraviolet curable resin (trade name: Z7501; manufactured by JSR Corporation) is dispersed on one surface of a 125 μm thick PET film. A coating liquid for forming a coat layer (silica content: 51% by mass (solid content)) was applied with a gravure coater, dried, and then cured by irradiation with ultraviolet rays to form a hard coat layer having a thickness of 6 μm.

  Next, on this hard coat layer, an ultraviolet curable resin (ITO content: 35 mass% (solid content)) in which ITO fine particles (average particle size 40 nm) are dispersed is applied and cured in the same manner as described above. Thus, a high refractive index layer having a thickness of 0.1 μm was formed.

Further, an ultraviolet curable resin (silica content: 20.5% by mass (solid content)) in which porous silica (hollow silica, average particle size 40 μm, specific surface area m ³ / g) is dispersed on the high refractive index layer. Was coated and cured in the same manner as described above to form a low refractive index layer having a thickness of 0.1 μm. The said process was implemented continuously and the roll-shaped laminated body 1 was produced.

  A photoresist film is applied on the copper foil of a 188 μm thick PET film with a copper foil formed on the surface, dried, exposed to a resist layer through a mesh pattern mask, developed, and then etched. Went. Thereby, a PET film (transparent substrate having a conductive layer; laminate 2) having a conductive layer (mesh pattern metal layer: thickness 10 μm, line width 10 μm, line pitch: 300 μm, aperture ratio: 90%) was obtained.

  The laminated body 1 and the laminated body 2 were subjected to thermocompression bonding with the impact absorbing layers obtained in Examples 1 to 3 interposed therebetween to produce the optical filter of the present invention.

[Evaluation of shock absorbing layer]
(1) Measurement of the value of 5.87 ^a / t in the formula (I) The laminate of the shock absorbing layers obtained in Examples 1 to 3 and Comparative Examples 1 to 3 was removed from one release sheet, A laminate of a polyethylene terephthalate (PET) film having a thickness of 100 μm and the shock absorbing layer of the present invention formed thereon is prepared. As shown in FIG. 9, the laminate was placed on a 5 mm thick iron plate (having a hole in the center) placed on a concrete floor and an aluminum alloy plate 10 cm × 10 cm × 0.3 cm thick thereon. Then, the shock absorbing layer and the aluminum alloy plate are attached so as to contact each other. An acceleration sensor (P5SC; manufactured by San-S Co., Ltd.) is installed at the center of the lower surface of the aluminum alloy plate, and data converted from acceleration to voltage by using an oscilloscope (NR-350; manufactured by Keyence Co., Ltd.) is used. Then, the time displacement (impact acceleration-time curve) is obtained by reading it into a personal computer. The impact applied to the sample on the aluminum alloy plate with an impact force of 0.5 J (Nm) is set to 0.5 J with a spring ring impact hammer (MODEL F22.50 (conforming to JIS 060068-2-75); manufactured by PTL). It is performed by using.

From the impact acceleration-time curve obtained by the impact test, the time from the occurrence of impact stress to the first peak: T (ms) is obtained, and the thickness a (mm) of the impact absorbing layer at that time The value of 5.87 ^a / t in formula (I) is obtained.

(2) Impact resistance Sample preparation The laminate of the shock-absorbing layers obtained in Examples 1 to 3 and Comparative Examples 1 to 3 is cut into a 10 cm square by removing one release sheet. A 10 cm square laminate was stacked and pressed on a 10 cm square 2.5 mm thick glass plate so that the shock absorbing layer was in contact with the glass to obtain a three layer laminate.

  Similarly to FIG. 9, a paper file (# 150) is used so that the sample can be fixed on an iron plate having a thickness of 5 mm placed on a concrete floor and an aluminum alloy plate having a thickness of 10 cm × 10 cm × 0.3 cm thereon. The sample was placed with the glass facing down, and a spring impact hammer was applied from above the PET film with a predetermined impact force, and the glass plate was observed for damage.

  The predetermined impact force was 0.20 J, 0.35 J, 0.5 J, 0.70 J, and 1.00 J. In each example, five samples were prepared for each impact force, and the maximum impact force when no cracks were found in the glass of all the five samples was shown.

(3) Surface pencil hardness One release sheet was removed from the laminate of the shock absorbing layer obtained in Examples 1 to 3 and Comparative Examples 1 to 3, and the hard coat layer was formed as shown in Examples 4 to 6. An impact absorbing layer is provided on the back surface of the provided PET film, and the obtained laminate is cut into a 5 cm × 10 cm square. On a 5 cm × 10 cm square 2.5 mm thick glass plate, a 5 cm × 10 cm square laminate was stacked and pressed so that the shock absorbing layer was in contact with the glass to obtain a 4 layer laminate.

  About the obtained four-layer laminate, the surface hardness tester (TYPE: 14FW; manufactured by Shinto Kagaku Co., Ltd.) was used to determine the pencil hardness of the hard coat layer surface by a method based on JIS-K-5400. It was measured. The pencil hardness of the PET having the hard coat layer was 2H.

  The results are shown in Table 1.

  As can be seen from the measurement results, the impact absorbing layers of Examples 1 to 3 that satisfy the relationship of the formula (I) of the present invention have both excellent impact resistance and high surface pencil hardness.

  In addition, the PDP filters obtained in Examples 4 to 6 were not inferior to conventional ones such as transparency and electromagnetic wave shielding properties even when actually attached to the PDP. Therefore, it can be seen that even if the shock absorbing layer of the present invention is provided, the characteristics required for the optical filter for PDP are not impaired.

FIG. 1 is a graph showing the relationship between the thickness (a) of the shock absorbing layer and the time (t) to the first peak, and the specific range of the present invention. It is a schematic sectional drawing of an example of the basic composition of the optical filter of this invention. It is a schematic sectional drawing of an example of the preferable aspect in the optical filter of this invention. It is a schematic sectional drawing of an example of another aspect in the optical filter of this invention of the said FIG. It is a schematic sectional drawing of an example of another aspect in the optical filter of this invention of the said FIG. It is a schematic sectional drawing of an example of another basic composition in the optical filter of the present invention. It is a schematic sectional drawing of one example of another aspect in the optical filter of this invention of the said FIG. It is a schematic sectional drawing of one example of another aspect in the optical filter of this invention of the said FIG. It is a schematic sectional drawing for demonstrating the impact test of this invention.

Explanation of symbols

11, 21A, 21B, 31A, 31B, 41A, 41B, 51, 61A, 61B, 71A, 71B Transparent substrate 12, 22, 32, 42, 52, 62, 72 Anti-reflective coating 13, 23, 33, 43A, 43B 73 Transparent adhesive layer 14, 24, 34, 44, 54, 64, 74 Conductive layer 15, 25, 35, 45, 55, 65, 75 Shock absorbing layer

Claims (26)

A spring impact conforming to JIS 060068-2-75, which is a shock absorbing layer having a thickness of 0.01 to 1.0 mm, and the laminate in which the shock absorbing layer is provided on 100 μm thick polyethylene terephthalate. Thickness a (mm) of the shock absorbing layer and time from occurrence of impact stress to the first peak in the impact acceleration-time curve obtained by impact resistance test under the condition of impact force 0.5J using a hammer: t (Ms) is represented by the following formula (I):
10 ≦ 5.87 ^a / t ≦ 40 (I)
A shock absorbing layer characterized by satisfying The relationship between the thickness a (mm) of the shock absorbing layer and the time from the generation of impact stress to the first peak: T (ms) is expressed by the following formula (II):
15 ≦ 5.87 ^a / t ≦ 25 (II)
The shock absorbing layer according to claim 1 satisfying   The shock absorbing layer according to claim 1 or 2, wherein the shock absorbing layer is made of an acrylic resin.   The impact-absorbing layer according to claim 3, wherein the monomer constituting the acrylic resin contains at least an alkyl (meth) acrylate (provided that the alkyl group has 4 to 10 carbon atoms) and acrylic acid.   The impact-absorbing layer according to claim 3 or 4, which contains at least 2-ethylhexyl acrylate and acrylic acid as monomers constituting the acrylic resin.   The shock absorbing layer according to any one of claims 3 to 5, further comprising trimethylolpropane tri (meth) acrylate as a monomer constituting the acrylic resin.   The impact-absorbing layer according to any one of claims 3 to 6, further comprising an alkoxypolyalkylene glycol (meth) acrylate as a monomer constituting the acrylic resin.   The shock absorbing layer cures a partial polymer / monomer mixture in which a monomer mixture containing alkyl (meth) acrylate (wherein the alkyl group has 4 to 10 carbon atoms) and acrylic acid is partially polymerized. The shock absorbing layer according to any one of claims 1 to 7, wherein the shock absorbing layer is an acrylic resin layer.   The shock absorbing layer according to any one of claims 1 to 8, wherein the shock absorbing layer has a thickness of 0.1 to 0.6 mm.   The shock absorbing layer according to claim 1, which is a shock absorbing layer used for a display optical filter.   An optical filter comprising a transparent substrate, an antireflection film, and a conductive layer, further comprising the shock absorbing layer according to any one of claims 1 to 9. An optical filter comprising an antireflection film on one surface side of a transparent substrate and a conductive layer on the other surface side,
An optical filter, wherein the shock absorbing layer according to any one of claims 1 to 9 is provided on any surface of the conductive layer. Two transparent substrates, a transparent substrate provided with an antireflection film on one surface side, and another transparent substrate provided with a conductive layer on one surface side, are surfaces on which the antireflection film is not formed. And an optical filter bonded with the conductive layer,
A transparent pressure-sensitive adhesive layer is provided between the surface on which the antireflection film is not formed and the conductive layer, and the surface side of the conductive layer on which the transparent pressure-sensitive adhesive layer is not provided is any one of claims 1 to 9. An optical filter comprising the shock absorbing layer described in the item. Two transparent substrates, a transparent substrate provided with an antireflection film on one surface side and another transparent substrate provided with a conductive layer on one surface side, are not provided with the antireflection film. An optical filter formed by bonding a surface and the conductive layer,
10. An optical filter, wherein the shock absorbing layer according to claim 1 is provided between the surface of the transparent substrate on which the antireflection film is not formed and the conductive layer.   The optical filter according to any one of claims 11 to 14, wherein the antireflection film has a near-infrared shielding function.   The optical filter according to claim 11, wherein a near-infrared shielding layer is provided on any surface of the shock absorbing layer.   The optical filter according to claim 11, wherein the conductive layer has an electromagnetic wave shielding function.   The optical filter according to claim 11, wherein the conductive layer is a mesh-like metal layer or a metal-containing layer.   The optical filter according to any one of claims 11 to 18, wherein a transparent adhesive layer is provided on the outer surface of the outermost conductive layer or the near-infrared shielding layer.   The optical filter according to claim 18, wherein a transparent adhesive layer is embedded in a gap between the mesh-like metal layer or the metal-containing layer.   The optical filter according to any one of claims 11 to 20, wherein the transparent substrate is a plastic film.   The optical filter according to any one of claims 13 and 15 to 21, wherein a release sheet is provided on the transparent adhesive layer.   The optical filter according to any one of claims 11 to 22, wherein a protective layer is provided on the antireflection film.   It is a filter for plasma display panels, The optical filter of any one of Claims 1-23.   24. A display, wherein the optical filter according to claim 1 is bonded to a surface of an image display glass plate.   24. A plasma display panel, wherein the optical filter according to claim 1 is bonded to a surface of an image display glass plate.

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