JP2007328284A - Method of manufacturing optical filter for display, optical filter for display, display furnished with the same and plasma display panel - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical filter with an electrode in which a ground electrode part is easily formed. <P>SOLUTION: The method of manufacturing an optical filter for display having an electrically conductive layer functioning as an electrode part projected in the peripheral part includes a process in which an uncured layer of a rectangular substrate having a predetermined dimension and detachable surface over which an uncured hard coat layer or a near-infrared absorption layer is formed is press-contacted on the electrically conductive layer formed over the surface of a rectangular transparent film, which has a dimension larger than that of the uncured layer, of a laminated body, so that a strip-shaped area of the electrically conductive layer is left around the uncured layer, and a hardened layer is transferred onto the electrically conductive layer by removing the rectangular substrate after curing the uncured layer. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention is applicable to various displays such as a plasma display panel (PDP), a cathode ray tube (CRT) display, a liquid crystal display, an organic EL (electroluminescent) display, and a field emission display (FED) including a surface electric field display (SED). The present invention relates to an optical filter having various functions such as antireflection, near-infrared shielding, electromagnetic wave shielding, and the like, and a display provided with this optical filter, particularly a PDP.

  In the case of flat panel displays such as liquid crystal displays, plasma displays (PDP), EL displays, and CRT displays, it has been known that the light from the outside is reflected on the surface and the internal visual information is difficult to see. Various measures have been taken, such as the installation of an optical film including an antireflection film.

  In recent years, large-screen displays have become mainstream in displays, and PDPs have become common as next-generation large-screen display devices. However, in this PDP, high-frequency pulse discharge is performed on the light emitting part for image display, which may cause unnecessary electromagnetic wave radiation and infrared radiation which may cause malfunction of the infrared remote controller, etc. For this purpose, various PDP filters (electromagnetic wave shielding light transmitting window materials) having conductivity have been proposed for PDP. As the conductive layer of the electromagnetic wave shielding light transmitting window material, for example, (1) a transparent conductive thin film containing metallic silver, (2) a conductive mesh in which a metal wire or conductive fiber is made into a net, (3) on a transparent film Known are those in which a layer of copper foil or the like is etched into a net and an opening is provided, and (4) a conductive ink is printed in a mesh on a transparent film.

  Furthermore, in a large display such as a conventional PDP, various films such as an antireflection film and a near infrared cut film are bonded together. For example, Patent Document 1 (Japanese Patent Application Laid-Open No. 11-74683) discloses an electromagnetic wave shielding light transmitting window material in which a conductive mesh is interposed between two transparent substrates and bonded and integrated with a transparent adhesive resin. Are listed.

  In the electromagnetic wave shielding light transmitting window material, it is necessary to ground (ground) a conductive layer (electromagnetic wave shielding material), for example, a conductive mesh, in order to improve the electromagnetic wave shielding property by the conductive layer. There is. For this purpose, an electromagnetic wave shielding material protrudes from between two transparent substrates and is grounded by wrapping around the back side of the light transmitting window material laminate, or is in contact with the electromagnetic wave shielding material between two transparent substrates. Thus, it is necessary to sandwich the conductive adhesive tape. However, in such a method, there is a problem that the above work in the stacking process is complicated.

  Patent Document 2 (Japanese Patent Laid-Open No. 2001-142406) discloses a laminate in which a single transparent substrate, an electromagnetic wave shielding material, an outermost antireflection film, and a near infrared cut film are laminated and integrated. The conductive adhesive tape is attached across the edge and front and back edges of the transparent substrate, and the conductive adhesive tape and the edge (end) of the electromagnetic shielding material are attached by the conductive adhesive. An electromagnetic wave shielding light-transmitting laminated film is described.

Japanese Patent Laid-Open No. 11-74683 JP 2001-142406 A

  As shown in Patent Document 1, a conventional display optical filter such as a PDP generally has a complicated manufacturing process because a plurality of functional films are manufactured and then bonded together, which is disadvantageous in terms of cost.

  For this reason, in order to improve productivity and reduce costs by reducing the number of parts, a PDP filter of a type that does not include glass in a filter member as shown in Patent Document 2 (straight tension type PDP filter) has been proposed. Yes. However, such a directly stretched PDP filter is a complicated manufacturing process in the same manner as a conventional filter in that a functional film other than glass is manufactured in advance and then bonded. In addition, since each functional film uses a transparent film for the substrate, it is necessary to bond them together, so that the manufactured PDP film includes a plurality of transparent films, which is disadvantageous in terms of cost. is there.

  In order to solve these problems, it is conceivable to employ a structure in which only one resin film is used as a substrate and a plurality of functional layers are formed on the surface thereof. The simplest manufacturing method is a method in which functional layers such as an antireflection layer and a near infrared absorption layer are formed by coating on an electromagnetic wave shielding film in which a conductive mesh is formed on a resin film.

  However, when each functional layer is formed by coating as described above, the conductive mesh portion is not exposed, and there is a problem that a ground portion for electromagnetic shielding cannot be secured. Although an intermittent coating method is also conceivable, there are problems such as a relatively expensive device and poor position accuracy during coating. Further, there is a method of forming a functional layer on the conductive mesh surface of the electromagnetic wave shielding film by a printing method. However, in this case, there is a restriction that it is necessary to use a relatively high viscosity paint.

  Therefore, the present invention provides a method for producing an optical filter for a display, which can be manufactured accurately and easily, has a good electromagnetic shielding property, and has an earth electrode that can be easily attached to the display and is easily grounded. The purpose is to do.

  In addition, the present invention provides an optical filter for a display which can be manufactured with high accuracy and easily, is light and thin, has a good electromagnetic shielding property, and has an earth electrode which can be easily attached to the display and is easily grounded. An object is to provide a manufacturing method.

  Furthermore, the present invention provides an optical filter for a display, which can be manufactured with high accuracy and has a good electromagnetic wave shielding property, and has a ground electrode that can be easily attached to the display and is easily grounded. Objective.

  The present invention also provides an optical filter for a display which can be manufactured with high accuracy and easily, is light and thin, has a good electromagnetic shielding property, and has an earth electrode which can be easily mounted and grounded on a display. The purpose is to provide.

  Furthermore, the present invention provides an optical filter suitable for a PDP that can be accurately and easily manufactured, has a good electromagnetic shielding property, and has a ground electrode that can be easily attached to a display and is easily grounded. The purpose is to do.

  Another object of the present invention is to provide a display in which the optical filter having the above excellent characteristics is bonded to the surface of an image display glass plate.

  Furthermore, an object of the present invention is to provide a PDP in which the optical filter having the excellent characteristics is bonded to the surface of an image display glass plate.

Therefore, the present invention
The uncured layer of a rectangular substrate having a predetermined size having an uncured hard coat layer or a near-infrared absorbing layer formed on the entire surface of the peelable surface has a size larger than that of the uncured layer. On the conductive layer of the laminate in which the conductive layer is formed on the entire surface of the rectangular transparent film, the uncured layer is pressed so as to leave a band-like region of the conductive layer around the uncured layer. A method for producing an optical filter for a display having a conductive layer protruding to the periphery as an electrode portion, comprising a step of transferring the cured layer onto the conductive layer by removing the rectangular substrate after curing;
It is in.

  According to the transfer method of the present invention described above, if a peelable rectangular substrate having a hard coat layer or the like is produced without producing a printing plate, for example, it is cut into a desired dimension and vacuum It can be easily transferred by pressure bonding (laminating) below, and the pattern obtained is also highly reproducible. In addition, when the conductive layer is a mesh-like conductive layer, the thickness of the hard coat layer or the like can be increased to fill the gaps between the meshes, and the smoothness of the layer surface after transfer can be easily obtained. There are advantages.

The suitable aspect of the manufacturing method of the optical filter for displays of this invention is as follows.
(1) An uncured hard coat layer is formed on the entire peelable surface. In this case, an uncured near-infrared absorbing layer is not provided.
(2) Between the peelable surface and the uncured hard coat layer, an uncured low refractive index layer having the same shape and the same dimensions as the uncured hard coat layer is present.
(3) An uncured high refractive index layer having the same shape and dimensions as the uncured hard coat layer is present between the uncured hard coat layer and the uncured low refractive index layer.
(4) An uncured near-infrared absorbing layer is formed on the entire peelable surface. In this case, an uncured hard coat layer or the like is generally provided between the peelable surface and the near infrared absorption layer.
(5) When an uncured hard coat layer is provided on the entire surface of the peelable surface, generally a near-infrared absorbing layer is formed on the back surface of a rectangular transparent film having a conductive layer.
(6) After removing the rectangular substrate, a near-infrared absorbing layer is formed on the back surface of the rectangular transparent film having the hard coat layer and the conductive layer.
(7) The near-infrared absorbing layer contains a neon light absorbing dye. Or you may have the absorption layer of neon light emission as another layer of a near-infrared absorption layer.
(8) The rectangular substrate whose surface is peelable is a rectangular substrate having a release agent layer.
(9) The conductive layer is a mesh-like conductive layer.
(10) The ratio of the thickness of the hard coat layer to the thickness of the mesh-like conductive layer is in the range of 2: 1 to 1: 5. In particular, the thickness of the hard coat layer is preferably 3 to 10 μm.
(11) An uncured hard coat layer, an uncured hard coat layer and an uncured low refractive index layer, or an uncured hard coat layer, an uncured low refractive index layer, and an uncured high refractive index layer, An ultraviolet curable resin or a thermosetting resin is included. UV curable resins are preferred. Curing is fast and productivity is improved.
(12) The hard coat layer contains an ultraviolet absorber.
(13) The transparent film is a plastic film.
(14) The pressure bonding is performed under vacuum.
(15) When an ultraviolet curable resin is used, curing is performed by ultraviolet irradiation. When a thermosetting resin is used, curing is performed by heating.

  Furthermore, the present invention also resides in an optical filter for display having a conductive layer projecting around as an electrode portion obtained by the above-described manufacturing method.

Preferred embodiments of the optical filter for display of the present invention are as follows.
(1) When the hard coat layer is provided on the surface of the transparent film opposite to the near infrared absorption layer, the transparent adhesive layer is provided on the surface of the near infrared absorption layer opposite to the transparent film.
(2) A release sheet is provided on the transparent adhesive layer.
(3) A plasma display panel filter.

Furthermore, the present invention provides:
A display characterized in that the optical filter for display is bonded to the surface of the image display glass plate; and a plasma characterized in that the optical filter for display is bonded to the surface of the image display glass plate It is also on the display panel.

  By the method for manufacturing an optical filter for display of the present invention, an optical filter having an electrode portion (ground electrode) made of a conductive layer protruding to the periphery can be manufactured very easily and with high accuracy. That is, according to the method of the present invention, it is formed by laminating and transferring a hard coat layer or the like on the conductive layer formed on the entire surface of the rectangular plastic film so as to leave a conductive layer around it. An optical filter having an electrode portion (ground electrode) made of a conductive layer protruding to the periphery can be produced efficiently.

  The display optical filter of the present invention is an optical filter with a specific structure having a conductive layer protruding to the periphery, which is advantageously obtained by using the above-described manufacturing method, and makes the grounding installation very easy. There are advantages to being able to.

  In particular, in the present invention, since the optical filter is generally obtained by using a single transparent film, the thickness of the optical filter is extremely small, and the mass is accordingly reduced. Even after mounting, it is extremely advantageous in handling.

  Therefore, the optical filter for display of the present invention includes a field emission display (FED) including a plasma display panel (PDP), a cathode ray tube (CRT) display, a liquid crystal display, an organic EL (electroluminescence) display, and a surface electric field display (SED). It can be said that the optical filter has various functions such as anti-reflection, near-infrared shielding, and electromagnetic wave shielding for various displays such as).

  The manufacturing method of the optical filter for displays with an electrode part (earth electrode) of the present invention and the optical filter for displays with an electrode part of the present invention will be described in detail below.

  FIG. 1 is a view for explaining an example of a method for producing an optical filter for a display with an electrode portion according to the present invention.

  An uncured low refractive index layer 17 and an uncured hard coat layer 16 are formed flush with each other on the entire surface of the release agent layer 11A of the rectangular substrate 11 having the release agent layer 11A on the surface. On the other hand, a conductive layer 13 is formed on the entire surface of the rectangular transparent film 12 having a size larger than those of these uncured layers, and a near-infrared absorbing layer 14 is formed on the back surface. The rectangular substrate 11 and the rectangular transparent film 12 are arranged so that the uncured hard coat layer 16 and the conductive layer 13 leave a band-like region (width L) of the conductive layer 13 around the uncured hard coat layer. Then, press-fitting under vacuum and close contact (1). Thereby, as shown in (2), these laminated bodies are formed. Next, the uncured low-refractive index layer 17 and the uncured hard coat layer 16 are cured by ultraviolet irradiation (UV irradiation) or the like, and these cured layers are left on the conductive layer 13 to form the rectangular layer having the release agent layer 11. The shape substrate 10 is removed. As a result, the cured low refractive index layer 17 and the cured hard coat layer 16 are transferred onto the conductive layer 13, and the optical filter 10 for a display with an electrode portion of the present invention is obtained. Therefore, an optical filter for display having a conductive layer (electrode part) protruding around the width L can be easily obtained.

The pressure bonding of the uncured low refractive index layer 17 and the uncured hard coat layer 16 to the conductive layer 13 is performed using, for example, a laminator. The laminating condition is usually performed at a temperature equal to or higher than the softening point of the material of the hard coat layer, and is generally 20 to 120 ° C, preferably 40 to 110 ° C, particularly preferably 60 to 100 ° C, and 1 to 10 kg / cm ² . Pressure, preferably after degassing. Such a pressing method is particularly advantageous in terms of surface smoothness and dimensional stability, unlike the printing method.

  Thus, by providing a hard coat layer or the like by transfer, these layers can be accurately provided in a predetermined region narrower than the conductive layer 13, and a transparent film (with the width L described above) having a conductive layer around the laminate. A narrow strip-like region) protrudes. This protruding portion is used as an electrode portion for grounding. The width L of the strip-shaped region at both ends is preferably 2 to 100 mm, particularly 5 to 50 mm. Further, when the conductive layer is in a mesh shape, the mesh gap can be filled by increasing the layer thickness of the hard coat layer or the like, so that there is an advantage that a smooth layer surface can be obtained.

  The rectangular substrate 10 having the release agent layer 11 on the surface, on which the uncured low refractive index layer 17 and the uncured hard coat layer 16 are provided, is prepared in the form of a long film, for example. It is preferable to use the above-mentioned method of the present invention after cutting into the above-mentioned dimensions. This improves productivity. Also, optical filters of various shapes can be easily created, and the degree of freedom is expanded. Moreover, it is also preferable that the transparent film having the conductive layer 13 and the near-infrared absorbing layer 14 is formed into a long shape as described above and cut into a desired dimension.

  In FIG. 1, a transparent adhesive layer is preferably provided on the near-infrared absorbing layer 14 (advantageous for sticking to a display). Furthermore, a release sheet may be provided thereon. Further, on the hard coat layer 16, it is preferable to provide a low refractive index layer or the like as described above in order to improve the antireflection property, but only the hard coat layer may be provided.

  In FIG. 1, the near-infrared absorbing layer 14 formed on the back surface of the rectangular transparent film 12 may be provided on the low refractive index layer 16 of the rectangular substrate 10. Alternatively, a hard coat layer 16 and a low refractive index layer 17 are provided on the back surface of the rectangular transparent film 12, and a near-infrared absorbing layer 14 is provided on the rectangular substrate 10 (preferably a transparent treatment layer, a near-infrared layer on the rectangular substrate 10). The infrared absorbing layer 14 and the transparent adhesive layer may be provided in this order).

  However, the configuration of the optical filter obtained in FIG. 1 is advantageous in that the ground layer can be easily installed because the conductive layer exists outside the display when the display is mounted.

  FIG. 2 is a plan view of the optical filter for a display with an electrode obtained in FIG. 1 as viewed from the low refractive index layer side. It is shown that the conductive layer 13 exists in a band shape around the low refractive index layer 17 on the hard coat layer 16. The conductive layer 13 protrudes from the periphery (four sides) of the hard coat layer 16 (low refractive index layer 17), and forms an electrode portion (width L portion). A conductive tape or the like may be further attached to the electrode portion.

  1 and 2, the method for manufacturing one optical filter for a display with an electrode according to the present invention has been described. However, it is also possible to create a plurality of filters at once. For example, a rectangular transparent film 12 having a conductive layer 13 formed on the front surface and a near-infrared absorbing layer 14 formed on the back surface is prepared so that two optical displays can be obtained. Two rectangular substrates 10 having a release agent layer 11 on which an uncured low refractive index layer 17 and an uncured hard coat layer 16 are formed are continuously crimped as described above at intervals. The cured layer is transferred by the curing and peeling of the rectangular substrate 10, and a cured layer is formed at two locations of the conductive layer 13. And this is cut | judged between cured layers and the two optical filters for displays which have a conductive layer around are obtained. Three or more sheets can be obtained in the same manner.

  The conductive layer 13 is, for example, a mesh-like metal layer, a metal-containing layer, a coating layer, a metal oxide layer (dielectric layer), or an alternately laminated film of metal oxide layers and metal layers. The mesh-like metal layer or metal-containing layer is generally formed by etching or printing, or is a metal fiber layer. This makes it easy to obtain low resistance. In general, the mesh gap of the mesh-like metal layer or metal-containing layer is filled with a hard coat layer 16 as shown in FIG. This improves transparency. When not filling with the hard-coat layer 16, it is preferable to fill with another layer, for example, the near-infrared absorption layer 14, or its own transparent resin layer.

  The antireflection layer 17 is generally a low refractive index layer. That is, the antireflection effect is exhibited by the composite film of the hard coat layer 16 and the low refractive index layer provided thereon. A high refractive index layer may be provided between the low refractive index layer and the hard coat layer 16. This improves the antireflection function.

  Further, the antireflection layer 17 may not be provided, and only the transparent film and the hard coat layer 16 having a refractive index higher or lower (preferably lower) than that of the transparent film may be used. The hard coat layer 16 and the antireflection layer 17 are preferably formed by coating from the viewpoints of productivity and economy.

  The near-infrared absorbing layer 14 has a function of blocking unnecessary electromagnetic waves in the near-infrared region generated from the PDP or the display. In general, it is a layer containing a dye having an absorption maximum at a wavelength of 800 to 1200 nm. The transparent adhesive layer 15 is generally provided for easy mounting on a display. A release sheet may be provided on the transparent adhesive layer 15.

  The electrode portion is a conductive layer protruding from one opposite end face of the optical filter, and the width of the protruding band-like portion (L in FIGS. 1 and 2) is 2 to 100 mm, particularly 5 to 50 mm as described above. It is preferable that The conductive layer is preferably a mesh metal layer.

  FIG. 3 shows a schematic cross-sectional view of an example of a preferred embodiment of the display optical filter 11 of the present invention shown in FIG. FIG. 3 corresponds to a diagram in the case where a mesh conductive layer is used as the conductive layer in FIG. In the display optical filter 21 of FIG. 3, a mesh-like conductive layer 23, a hard coat layer 26, and a low refractive index layer (antireflection layer) 27 are provided in this order on one surface of the transparent film 22. A near-infrared absorbing layer 24 (and a transparent adhesive layer is preferably provided thereon) is provided on the surface. An antireflection layer 27 such as a hard coat layer 26 and a low refractive index layer is formed on the conductive layer 23 formed over the entire surface of the transparent film so as to leave a frame-shaped conductive layer around it. The conductive layer 23 protrudes from the periphery and forms an electrode part. The mesh voids of the mesh-like metal layer are filled with the hard coat layer 26, thereby improving the transparency. The ratio of the thickness of the hard coat layer to the thickness of the mesh-like conductive layer is preferably in the range of 2: 1 to 1:10. In this case, the layer thickness of the hard coat layer is particularly preferably 3 to 10 μm. An optical filter having excellent warpage (curl) and haze is obtained. Various conductive materials for grounding are connected to the electrode portion. For example, a conductive tape (No. 8323 manufactured by Teraoka Seisakusho Co., Ltd.) can be used.

  The rectangular optical filter for display uses one transparent film, but two transparent films may be used. For example, the surface of a transparent film is manufactured according to the method of the present invention in which an antireflection layer such as a mesh-like conductive layer, a hard coat layer and a low refractive index layer is provided in this order. In this case, a near-infrared absorbing layer and a transparent pressure-sensitive adhesive layer provided thereon may be bonded to each other on the surfaces where the two transparent film layers are not provided. The two transparent films are employed when it is advantageous in terms of production, but are disadvantageous in that they are bulky because the thickness is increased.

The method of pressure-bonding the hard coat layer or the like used in the method for producing an optical filter for display of the present invention on the conductive layer is performed using a laminator as described above. For example, using a vacuum laminator, generally 20 to 120 ° C., preferably 40 to 110 ° C., particularly preferably 60 to 100 ° C., degassing time 1 to 5 minutes, press pressure 1 to 10 kg / cm ² , press time 1 to It is carried out by pressure bonding in 45 minutes.

  The material used for the optical filter for display of this invention is demonstrated below.

  The material of the transparent film is not particularly limited as long as it is transparent (meaning “transparent to visible light”), but a plastic film is generally used. For example, polyester {eg, polyethylene terephthalate (PET), polybutylene terephthalate}, polymethyl methacrylate (PMMA), acrylic resin, polycarbonate (PC), polystyrene, triacetate resin, polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, Examples thereof include ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion crosslinked ethylene-methacrylic acid copolymer, polyurethane, cellophane and the like. Among these, polyethylene terephthalate (PET), polycarbonate (PC), polymethyl methacrylate (PMMA), etc. are highly resistant to loads during processing (heat, solvent, bending, etc.) and particularly highly transparent. preferable.

The thickness of the transparent film varies depending on the use of the optical filter, but is generally preferably 1 μm to 10 mm, 1 μm to 5 mm, and particularly preferably 25 to 250 μm.
A rectangular substrate similar to the transparent film can also be used. Particularly preferred is polyethylene terephthalate (PET). The thickness of the rectangular substrate is generally preferably 1 μm to 1 mm, 1 μm to 0.5 mm, and particularly preferably 10 to 250 μm.

  The surface of the rectangular substrate of the present invention has peelability. For this reason, a release agent layer is generally provided on the surface of the rectangular substrate. The release agent layer is generally provided with a layer of silicone resin, fluorine resin or the like, or a surfactant-containing resin layer of silicone oil or the like. The thickness is generally preferably 1 to 10 μm and 3 to 5 μm.

  The conductive layer of the present invention is set so that the surface resistance value of the obtained optical filter is generally 10Ω / □ or less, preferably 0.001 to 5Ω / □, particularly 0.005 to 5Ω / □. Is done. A mesh-like conductive layer is also preferable. Alternatively, the conductive layer may be a coating layer or a layer obtained by a vapor deposition method (a transparent conductive thin film of metal oxide (ITO or the like)). Further, it may be an alternate laminate of a metal oxide dielectric film such as ITO and a metal layer such as Ag (eg, ITO / silver / ITO / silver / ITO laminate).

  As the mesh-like conductive layer, metal fibers and metal-coated organic fiber metals made into a mesh, copper foil on a transparent film etched into a mesh and provided with openings, conductive on the transparent film And the like, in which a conductive ink is printed in a mesh shape.

  In the case of a mesh-shaped conductive layer, the mesh preferably has a wire diameter of 1 μm to 1 mm and an aperture ratio of 40 to 95% made of metal fibers and / or metal-coated organic fibers. A more preferable wire diameter is 10 to 500 μm, and an aperture ratio is 50 to 95%. When the wire diameter exceeds 1 mm in the mesh-like conductive layer, the electromagnetic wave shielding property is improved, but the aperture ratio is lowered and cannot be made compatible. If it is less than 1 μm, the strength as a mesh is lowered and handling becomes difficult. Further, when the aperture ratio exceeds 95%, it is difficult to maintain the shape as a mesh. When the aperture ratio is less than 40%, the light transmittance is reduced, and the amount of light from the display is also reduced.

  The opening ratio of the conductive mesh refers to the area ratio occupied by the opening portion in the projected area of the conductive mesh.

  The metal fibers constituting the mesh-like conductive layer and the metal of the metal-coated organic fiber include copper, stainless steel, aluminum, nickel, titanium, tungsten, tin, lead, iron, silver, carbon or alloys thereof, preferably copper, Stainless steel and nickel are used.

  As the organic material for the metal-coated organic fiber, polyester, nylon, vinylidene chloride, aramid, vinylon, cellulose and the like are used.

  When a conductive foil such as a metal foil is subjected to pattern etching, copper, stainless steel, aluminum, nickel, iron, brass, or an alloy thereof, preferably copper, stainless steel, or aluminum is used as the metal of the metal foil.

  If the thickness of the metal foil is too thin, it is not preferable in terms of handleability and workability of pattern etching, and if it is too thick, it affects the thickness of the film obtained, and the time required for the etching process becomes long. The thickness is preferably about 1 to 200 μm.

  The shape of the etching pattern is not particularly limited, and examples thereof include a grid-like metal foil in which square holes are formed, and a punching metal-like metal foil in which circular, hexagonal, triangular or elliptical holes are formed. It is done. Further, the holes are not limited to those regularly arranged, and may be a random pattern. It is preferable that the area ratio of the opening part in the projection surface of this metal foil is 20 to 95%.

  Alternatively, the mesh-like conductive layer may be formed by pattern printing of conductive ink on a transparent substrate. Using the following conductive ink, it can be printed on the surface of the transparent substrate by screen printing, ink jet printing, electrostatic printing or the like.

  In general, carbon black particles having a particle size of 100 μm or less, or particles of a conductive material such as particles of metals or alloys such as copper, aluminum, nickel, etc. are bound to a binder of PMMA, polyvinyl acetate, epoxy resin or the like at a concentration of 50 to 90% by weight. Dispersed in resin. This ink is diluted or dispersed at a suitable concentration in a solvent such as toluene, xylene, methylene chloride, water, etc., applied to the surface of the transparent substrate by printing, and then dried at room temperature to 120 ° C. as necessary. Apply. Particles obtained by covering the same conductive material particles as described above with a binder resin are directly applied by electrostatic printing and fixed by heat or the like.

  The thickness of the printed film formed in this way is not preferable because the electromagnetic wave shielding property is insufficient if it is too thin, and if it is too thick, it affects the thickness of the resulting film, so it is about 0.5 to 100 μm. It is preferable to do this.

  According to such pattern printing, the degree of freedom of the pattern is large, and a conductive layer having an arbitrary wire diameter, interval and opening shape can be formed. Therefore, a plastic film having desired electromagnetic wave shielding properties and light transmission properties Can be easily formed.

  There is no particular limitation on the pattern printing shape of the conductive layer. For example, a grid-like printed film having a rectangular opening or a punching metal shape having a circular, hexagonal, triangular or elliptical opening. Examples include printed films. Further, the openings are not limited to those regularly arranged, and may be a random pattern. It is preferable that the area ratio of the opening part in the projection surface of this printed film is 20 to 95%.

  In addition to the above, as a mesh-like conductive layer, dots are formed on the film surface by a material soluble in a solvent, and a conductive material layer made of a conductive material insoluble in a solvent is formed on the film surface, A mesh-like conductive layer obtained by contacting the film surface with a solvent to remove the dots and the conductive material layer on the dots may be used.

  Examples of the conductive layer by coating include a coating layer in which conductive particles of an inorganic compound are dispersed in a polymer.

  Examples of the inorganic compound constituting the conductive particles include metals, alloys such as aluminum, nickel, indium, chromium, gold, vanadium, tin, cadmium, silver, platinum, copper, titanium, cobalt, lead; or ITO, oxidation Indium, tin oxide, zinc oxide, indium oxide-tin oxide (ITO, so-called indium-doped tin oxide), tin oxide-antimony oxide (ATO, so-called antimony-doped tin oxide), zinc oxide-aluminum oxide (ZAO; so-called aluminum-doped oxide) And conductive oxides such as zinc). In particular, ITO is preferable. The average particle size is preferably 10 to 10,000 nm, particularly preferably 10 to 50 nm.

  Examples of the polymer include acrylic resin, polyester resin, epoxy resin, urethane resin, phenol resin, maleic acid resin, melamine resin, urea resin, polyimide resin, and silicon-containing resin. Furthermore, it is preferable that it is a thermosetting resin among these resins.

  Alternatively, the polymer is particularly preferably an ultraviolet curable resin used for a hard coat layer described later.

  The conductive layer is formed by coating by dispersing the conductive fine particles in a polymer (using a solvent if necessary) by mixing or the like to prepare a coating solution, and coating the coating solution on a transparent substrate. And then drying and curing as appropriate. In the case of using a thermoplastic resin, it is obtained by drying after coating, and in the case of a thermosetting type, it is obtained by drying and thermosetting. When an ultraviolet curable resin is used, it can be obtained by drying after application and irradiating with ultraviolet rays after coating.

  The thickness of the conductive layer formed by coating is preferably 0.01 to 5 μm, particularly preferably 0.05 to 3 μm. When the thickness is less than 0.01 μm, the electromagnetic wave shielding property may not be sufficient. On the other hand, when the thickness exceeds 5 μm, the transparency of the resulting film may be lowered.

  The conductive layer of the present invention is also preferably a conductive polymer layer formed by coating. For example, hydrocarbon polymers such as polyacetylene, polyphenylene, polyphenylene vinylene, polyacene, polyphenylacetylene, polynaphthalene; heteroatom-containing polymers such as polypyrrole, polyaniline, polythiophene, polyethylene vinylene, polyazulene, polyisothianaphthene . Polypyrrole and polythiophene are preferred. The thickness of the light conductive layer of the conductive polymer is preferably 0.01 to 5 μm, particularly preferably 0.05 to 3 μm. When the thickness is less than 0.01 μm, the electromagnetic wave shielding property may not be sufficient. On the other hand, when the thickness exceeds 5 μm, the transparency of the resulting film may be lowered.

  When the conductive layer is formed by a vapor deposition method (metal oxide layer), the formation method is not particularly limited, but a vapor phase such as sputtering, ion plating, electron beam vapor deposition, vacuum vapor deposition, chemical vapor deposition, etc. Examples of the method include a film forming method, printing, and coating, but a gas phase film forming method (sputtering, ion plating, electron beam vapor deposition, vacuum vapor deposition, chemical vapor deposition) is preferable. A conductive layer can be formed using the inorganic compound. When the conductive layer is formed by a vapor deposition method, the layer thickness is preferably 30 to 50000 nm, particularly about 50 nm.

  A metal plating layer may be further provided on the conductive layer in order to improve conductivity. The metal plating layer can be formed by a known electrolytic plating method or electroless plating method. As the metal used for plating, generally, copper, copper alloy, nickel, aluminum, silver, gold, zinc, tin or the like can be used, preferably copper, copper alloy, silver, or nickel, In particular, it is preferable to use copper or a copper alloy from the viewpoint of economy and conductivity.

  Further, the conductive layer may be an alternately laminated film of a dielectric layer (metal oxide) and a metal layer. In particular, a laminate of 5 layers or more of dielectric layer / metal layer / dielectric layer / metal layer / dielectric layer is preferable. For example, an alternate laminate of a dielectric layer of a metal oxide such as ITO and a metal layer of Ag or the like (eg, a laminate of ITO / silver / ITO / silver / ITO) can be used.

  The transparent conductive film can be formed by physical vapor deposition or chemical vapor deposition. Examples of the physical vapor deposition method include a vacuum vapor deposition method, a sputtering method, an ion plating method, and a laser ablation method, but it is generally preferable to form a film by the sputtering method. Examples of the chemical vapor deposition method include an atmospheric pressure CVD method, a low pressure CVD method, and a plasma CVD method.

  In order to improve the electromagnetic wave shielding effect by further reducing the resistance value of the conductive layer (particularly the mesh-shaped conductive layer), it is preferable to form a plating layer on the conductive layer.

  Examples of materials used for the plating process include copper, nickel, chromium, zinc, tin, silver, and gold. These may be used alone or as two or more kinds of alloys. The plating process is generally performed by ordinary liquid phase plating (electroplating, electroless plating, etc.).

  Moreover, you may give anti-glare performance. When this anti-glare treatment is performed, a blackening treatment may be performed on the surface of the (mesh) conductive layer. For example, oxidation treatment of a metal film, black plating such as chromium alloy, application of black or dark ink, and the like can be performed.

  The antireflection layer of the present invention is generally a composite film of a hard coat layer having a refractive index lower than that of a transparent film as a substrate and a low refractive index layer provided thereon, or a hard coat layer and a low refractive index layer. Is a composite film in which a high refractive index layer is further provided therebetween. The antireflection film is effective even if it is only a hard coat layer having a refractive index lower than that of the substrate. However, when the refractive index of the substrate is low, it may be a composite film of a hard coat layer having a higher refractive index than that of the transparent film and a low refractive index layer provided thereon.

  As a hard-coat layer, an acrylic resin layer, an epoxy resin layer, a urethane resin layer, a silicone resin layer, etc. can be mentioned, The thickness is 1-50 micrometers normally, Preferably it is 1-12 micrometers. Either a thermosetting resin or an ultraviolet curable resin may be used, but an ultraviolet curable resin is preferable.

  Examples of the thermosetting resin binder resin include phenol resin, resorcinol resin, urea resin, melamine resin, epoxy resin, acrylic resin, urethane resin, furan resin, and silicone resin.

  Examples of the ultraviolet curable resin (monomer, oligomer) include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, and 2-ethylhexyl polyethoxy (meth) acrylate. , Benzyl (meth) acrylate, isobornyl (meth) acrylate, phenyloxyethyl (meth) acrylate, tricyclodecane mono (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, acryloylmorpholine , N-vinylcaprolactam, 2-hydroxy-3-phenyloxypropyl (meth) acrylate, o-phenylphenyloxyethyl (meth) acrylate, neopentylglyce Di (meth) acrylate, neopentyl glycol dipropoxy di (meth) acrylate, neopentyl glycol di (meth) acrylate hydroxypivalate, tricyclodecane dimethylol di (meth) acrylate, 1,6-hexanediol di (meth) Acrylate, nonanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, tris [(meth) acryloxyethyl] isocyanurate, ditrimethylolpropane (Meth) acrylate monomers such as tetra (meth) acrylate; polyol compounds (for example, ethylene glycol, propylene glycol, neopentyl glycol, , 6-hexanediol, 3-methyl-1,5-pentanediol, 1,9-nonanediol, 2-ethyl-2-butyl-1,3-propanediol, trimethylolpropane, diethylene glycol, dipropylene glycol, polypropylene Polyols such as glycol, 1,4-dimethylolcyclohexane, bisphenol A polyethoxydiol, polytetramethylene glycol, the polyols and succinic acid, maleic acid, itaconic acid, adipic acid, hydrogenated dimer acid, phthalic acid, isophthalic acid Polyester polyols which are reaction products of polybasic acids such as acid and terephthalic acid or acid anhydrides thereof, polycaprolactone polyols which are reaction products of the polyols and ε-caprolactone, the polyols and the above, Polybasic acid or this Reaction products of these acid anhydrides with ε-caprolactone, polycarbonate polyols, polymer polyols, etc.) and organic polyisocyanates (for example, tolylene diisocyanate, isophorone diisocyanate, xylylene diisocyanate, diphenylmethane-4,4′-diisocyanate, diisocyanate) Cyclopentanyl diisocyanate, hexamethylene diisocyanate, 2,4,4′-trimethylhexamethylene diisocyanate, 2,2′-4-trimethylhexamethylene diisocyanate, etc.) and a hydroxyl group-containing (meth) acrylate (for example, 2-hydroxyethyl (meta ) Acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenyloxypropyl (meth) acrylic Rate, cyclohexane-1,4-dimethylol mono (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, glycerin di (meth) acrylate, etc.) (Meth) such as bisphenol type epoxy (meth) acrylate, which is a reaction product of bisphenol type epoxy resin such as polyurethane (meth) acrylate, bisphenol A type epoxy resin, bisphenol F type epoxy resin and (meth) acrylic acid which is a reaction product Examples include acrylate oligomers. These compounds can be used alone or in combination. These ultraviolet curable resins may be used as a thermosetting resin together with a thermal polymerization initiator.

  For the hard coat layer, among the above-mentioned ultraviolet curable resins (monomers and oligomers), hard materials such as pentaerythritol tri (meth) acrylate, pentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate are used. It is preferable to mainly use polyfunctional monomers.

  Any compound suitable for the properties of the ultraviolet curable resin can be used as the photopolymerization initiator for the ultraviolet curable resin. For example, acetophenone such as 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1 Benzoin series such as benzyldimethyl ketal, benzophenone, 4-phenylbenzophenone, benzophenone series such as hydroxybenzophenone, thioxanthone series such as isopropylthioxanthone, 2-4-diethylthioxanthone, and other special ones include methylphenyl glyoxylate Etc. can be used. Particularly preferably, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1, Examples include benzophenone. These photopolymerization initiators may be optionally selected from one or more known photopolymerization accelerators such as benzoic acid type or tertiary amine type such as 4-dimethylaminobenzoic acid. It can be used by mixing at a ratio. Moreover, it can be used by 1 type, or 2 or more types of mixture of only a photoinitiator. Particularly preferred is 1-hydroxycyclohexyl phenyl ketone (Irgacure 184, manufactured by Ciba Specialty Chemicals).

  Generally the quantity of a photoinitiator is 0.1-10 mass% with respect to a resin composition, Preferably it is 0.1-5 mass%.

  Furthermore, the hard coat layer may contain a small amount of an infrared absorber, an anti-aging agent, a paint processing aid, a colorant and the like.

The high refractive index layer is made of ITO, ATO, Sb ₂ O ₅ , Sb ₂ O ₃ , SbO ₂ , In ₂ O ₃ , SnO ₂ , ZnO, ZrO ₂ , Al in a polymer (preferably UV curable resin). A layer in which conductive metal oxide fine particles (inorganic compounds) such as doped ZnO and TiO ₂ are dispersed is preferable. The metal oxide fine particles preferably have an average particle size of 10 to 10,000 nm, preferably 10 to 50 nm. In particular, ITO (especially having an average particle diameter of 10 to 50 nm) is preferable. Those having a refractive index of 1.64 or more are suitable. The film thickness is generally in the range of 10 to 500 nm, preferably 20 to 200 nm.

  When the high refractive index layer is a conductive layer, the minimum reflectance of the surface reflectance of the antireflection film is set within 1.5% by setting the refractive index of the high refractive index layer 2 to 1.64 or more. The minimum reflectance of the surface reflectance of the antireflection film can be made to be within 1.0% by setting it to 1.69 or more, preferably 1.69 to 1.82.

  The low refractive index layer is a layer (cured) in which fine particles such as silica and fluororesin, preferably 10 to 40% by weight (preferably 10 to 30% by mass) of hollow silica are dispersed in a polymer (preferably UV curable resin). Layer). The refractive index of this low refractive index layer is preferably 1.44 to 1.51. When the refractive index is more than 1.51, the antireflection property of the antireflection film is deteriorated. The film thickness is generally in the range of 10 to 500 nm, preferably 20 to 200 nm.

  As the hollow silica, those having an average particle diameter of 10 to 100 nm, preferably 10 to 50 nm, and a specific gravity of 0.5 to 1.0, preferably 0.8 to 0.9 are preferable.

  The hard coat layer preferably has a visible light transmittance of 85% or more. Both the visible light transmittance of the high refractive index layer and the low refractive index layer are preferably 85% or more.

  When the antireflection layer is composed of the above three layers, for example, the thickness of the hard coat layer is 2 to 20 μm, the thickness of the high refractive index layer is 75 to 90 nm, and the thickness of the low refractive index layer is 85 to 110 nm. Preferably there is.

  In order to form each layer of the antireflection layer, as described above, the above-mentioned fine particles are blended with a polymer (preferably an ultraviolet curable resin) as necessary, and the obtained coating liquid is peeled off from the rectangular substrate. After coating on the surface and then drying, it is pressure-bonded to the conductive layer on the transparent film and then thermally cured or cured by ultraviolet irradiation. In the present invention, curing by ultraviolet irradiation is preferred. In this case, each layer may be applied and cured one by one, or all the layers may be applied and then cured together. Thereafter, the rectangular substrate is removed as described above to obtain the optical filter of the present invention.

  As a specific method of coating, a method of coating a coating solution in which an ultraviolet curable resin containing an acrylic monomer or the like is made into a solution with a solvent such as toluene is coated with a gravure coater, and then dried, and then cured by ultraviolet rays. Can be mentioned. This wet coating method has the advantage that the film can be uniformly formed at high speed at low cost. After this coating, for example, by irradiating and curing with ultraviolet rays, the effect of improving the adhesion and increasing the hardness of the film can be obtained. The conductive layer can be formed similarly.

  In the case of ultraviolet curing, many light sources that emit light in the ultraviolet to visible range can be used as the light source, such as ultra-high pressure, high pressure, low pressure mercury lamp, chemical lamp, xenon lamp, halogen lamp, mercury lamp, carbon arc lamp, incandescent lamp. And laser light. The irradiation time cannot be determined unconditionally depending on the type of lamp and the intensity of the light source, but is about several seconds to several minutes. Moreover, in order to accelerate curing, the laminate may be preheated to 40 to 120 ° C. and irradiated with ultraviolet rays.

  The antireflection layer of the present invention is preferably formed by coating as described above, but may be formed by a vapor phase film forming method. Usually, the high refractive index layer and the low refractive index layer can be formed by physical vapor deposition or chemical vapor deposition. Examples of the physical vapor deposition method include a vacuum vapor deposition method, a sputtering method, an ion plating method, and a laser ablation method, but it is generally preferable to form a film by the sputtering method. Examples of the chemical vapor deposition method include an atmospheric pressure CVD method, a low pressure CVD method, and a plasma CVD method.

  Examples of the combination of the high refractive index layer and the low refractive index layer include the following.

(A) 1 layer each in the order of high refractive index layer / low refractive index layer, laminated in a total of 2 layers, (b) 2 layers of high refractive index layer / low refractive index layer alternately, 4 layers in total (C) One layer each in the order of medium refractive index layer / high refractive index layer / low refractive index layer, laminated in a total of three layers, (d) high refractive index layer / low refractive index layer In this order, each layer is alternately stacked in 3 layers for a total of 6 layers. As the high refractive index layer, ITO (tin indium oxide) or ZnO, a thin film of ZnO, TiO ₂ , SnO ₂ , ZrO or the like doped with Al can be employed. As the low refractive index layer, a thin film having a refractive index of 1.6 or less, such as SiO ₂ , MgF ₂ , Al ₂ O _3, or the like can be used.

  The high refractive index layer, the low refractive index layer, and the like can be formed by physical vapor deposition or chemical vapor deposition. Examples of the physical vapor deposition method include a vacuum vapor deposition method, a sputtering method, an ion plating method, and a laser ablation method, but it is generally preferable to form a film by the sputtering method. Examples of the chemical vapor deposition method include an atmospheric pressure CVD method, a low pressure CVD method, and a plasma CVD method. However, since such a deposited film is not preferable for the transfer of the present invention, it can be used only in a layer that does not directly contact the rectangular substrate or the transparent film.

  A near-infrared absorption layer is obtained when the layer containing a pigment | dye etc. forms on the surface of a transparent film. The near-infrared absorbing layer is generally obtained by applying and drying a coating liquid containing the following pigment and binder resin. However, for example, it may be obtained by coating, drying, and curing if necessary, a coating solution containing an ultraviolet curable or electron beam curable resin containing the following dye and binder resin, or the like. The dye generally has an absorption maximum at a wavelength of 800 to 1200 nm. Examples include phthalocyanine dyes, metal complex dyes, nickel dithiolene complex dyes, cyanine dyes, squarylium dyes, polymethine dyes, Examples thereof include azomethine dyes, azo dyes, polyazo dyes, diimonium dyes, aminium dyes, and anthraquinone dyes, and cyanine dyes and squarylium dyes are particularly preferable. These dyes can be used alone or in combination. Examples of the binder resin include thermoplastic resins such as acrylic resins.

  In the present invention, the near-infrared absorbing layer may be provided with a function of adjusting color tone by providing a function of absorbing neon light emission. For this purpose, a neon-emission absorption layer may be provided, but a neon-emission selective absorption dye may be included in the near-infrared absorption layer.

  Neon luminescent selective absorption dyes include cyanine dyes, squarylium dyes, anthraquinone dyes, phthalocyanine dyes, polymethine dyes, polyazo dyes, azurenium dyes, diphenylmethane dyes, and triphenylmethane dyes. it can. Such a selective absorption dye is required to have a selective absorption of neon emission near 585 nm and a small absorption at other visible light wavelengths, so that the absorption maximum wavelength is 575 to 595 nm and the absorption spectrum half width is What is 40 nm or less is preferable.

  Also, when combining multiple types of near-infrared or neon luminescent absorbing dyes, if there is a problem with the solubility of the dye, if there is a reaction between the dyes due to mixing, if there is a decline in heat resistance, moisture resistance, etc. All the near-infrared absorbing dyes need not be contained in the same layer, and may be contained in another layer.

  Further, as long as the optical properties are not greatly affected, coloring pigments, ultraviolet absorbers, antioxidants and the like may be further added.

  As a near-infrared absorption characteristic of the optical filter of the present invention, it is preferable that the transmittance at 850 to 1000 nm is 20% or less, and further 15%. Moreover, as selective absorptivity, it is preferable that the transmittance | permeability of 585 nm is 50% or less. Especially in the former case, there is an effect of reducing the transmittance in a wavelength region where malfunction of a remote controller of a peripheral device is pointed out. In the latter case, an orange color having a peak at 575 to 595 nm is color reproducibility. This has the effect of absorbing the orange wavelength, thereby improving the redness and improving the color reproducibility.

  The layer thickness of the near infrared absorbing layer is generally 0.5 to 50 μm.

  As the conductive adhesive tape, an adhesive layer in which conductive particles are dispersed is provided on one surface of a metal foil, and this adhesive layer includes an acrylic, rubber-based, silicone-based adhesive, Epoxy or phenolic resins can be used.

  The conductive particles dispersed in the adhesive layer may be any electrically good conductor, and various types can be used. For example, metal powder such as copper, silver, nickel, etc., resin coated with such metal, ceramic powder, or the like can be used. Further, the shape is not particularly limited, and any shape such as a flake shape, a dendritic shape, a granular shape, and a pellet shape can be taken.

  The blending amount of the conductive particles is preferably 0.1 to 15% by volume with respect to the polymer constituting the adhesive layer, and the average particle size is preferably 0.1 to 100 μm. Thus, by prescribing the blending amount and the particle size, it is possible to prevent the conductive particles from condensing and obtain good conductivity.

  As metal foil used as the base material of the conductive pressure-sensitive adhesive tape, foil of copper, silver, nickel, aluminum, stainless steel or the like can be used, and the thickness thereof is usually 1 to 100 μm.

  The pressure-sensitive adhesive layer is coated with a roll coater, die coater, knife coater, my cover coater, flow coater, spray coater, etc., in which the above-mentioned pressure-sensitive adhesive and conductive particles are uniformly mixed with this metal foil in a predetermined ratio. By doing so, it can be easily formed.

  The thickness of this adhesive layer is usually 5 to 100 μm.

  The transparent adhesive layer of the present invention is a layer for adhering the optical film of the present invention to a display, and any resin can be used as long as it has an adhesive function. For example, acrylic adhesives, rubber adhesives, and thermoplastic elastomers (TPE) such as SEBS (styrene / ethylene / butadiene / styrene) and SBS (styrene / butadiene / styrene) formed from butyl acrylate, etc. TPE-based pressure-sensitive adhesives and adhesives can also be used.

  The layer thickness is generally in the range of 5 to 500 μm, particularly 10 to 100 μm. In general, the optical filter can be equipped by pressing the pressure-sensitive adhesive layer on a glass plate of a display.

  The transparent resin layer may also utilize the transparent adhesive layer.

  When two transparent films are used in the present invention, for example, ethylene-vinyl acetate copolymer, ethylene-methyl acrylate copolymer, acrylic resin (eg, ethylene- (meth) acrylic acid copolymer) Polymer, ethylene- (meth) ethyl acrylate copolymer, ethylene- (meth) methyl acrylate copolymer, metal ion crosslinked ethylene- (meth) acrylic acid copolymer), partially saponified ethylene-vinyl acetate copolymer Examples thereof include ethylene copolymers such as a polymer, a carboxylated ethylene-vinyl acetate copolymer, an ethylene- (meth) acryl-maleic anhydride copolymer, and an ethylene-vinyl acetate- (meth) acrylate copolymer. ("(Meth) acryl" means "acryl or methacryl"). In addition, polyvinyl butyral (PVB) resin, epoxy resin, phenol resin, silicon resin, polyester resin, urethane resin, rubber adhesive, thermoplastic elastomers such as SEBS and SBS can be used, but good adhesion Acrylic resin adhesives and epoxy resins are easily obtained.

  The layer thickness is generally 10 to 300 μm, preferably 20 to 300 μm. In general, the optical filter can be equipped by pressing the pressure-sensitive adhesive layer on a glass plate of a display.

  When EVA is also used as the material for the transparent pressure-sensitive adhesive layer, EVA has a vinyl acetate content of 5 to 50% by weight, preferably 15 to 40% by weight. When the vinyl acetate content is less than 5% by weight, there is a problem in transparency, and when it exceeds 40% by weight, the mechanical properties are remarkably deteriorated and the film formation becomes difficult and the films are easily blocked.

  As the cross-linking agent, an organic peroxide is suitable for heat cross-linking and is selected in consideration of sheet processing temperature, cross-linking temperature, storage stability, and the like. Examples of peroxides that can be used include 2,5-dimethylhexane-2,5-dihydroperoxide; 2,5-dimethyl-2,5-di (t-butylperoxy) hexane-3; -Butyl peroxide; t-butylcumyl peroxide; 2,5-dimethyl-2,5-di (t-butylperoxy) hexane; dicumyl peroxide; α, α'-bis (t-butylperoxyisopropyl) ) Benzene; n-butyl-4,4-bis (t-butylperoxy) valerate; 2,2-bis (t-butylperoxy) butane; 1,1-bis (t-butylperoxy) cyclohexane; , 1-bis (t-butylperoxy) -3,3,5-trimethylcyclohexane; t-butylperoxybenzoate; benzoyl peroxide; Luperoxyacetate; 2,5-dimethyl-2,5-bis (tertiarybutylperoxy) hexyne-3; 1,1-bis (tertiarybutylperoxy) -3,3,5-trimethylcyclohexane; 1-bis (tert-butylperoxy) cyclohexane; methyl ethyl ketone peroxide; 2,5-dimethylhexyl-2,5-bisperoxybenzoate; tert-butyl hydroperoxide; p-menthane hydroperoxide; p-chlorobenzoyl Peroxides; tertiary butyl peroxyisobutyrate; hydroxyheptyl peroxide; chlorohexanone peroxide. These peroxides are used singly or in combination of two or more, and are usually used at a ratio of 5 parts by mass or less, preferably 0.5 to 5.0 parts by mass with respect to 100 parts by weight of EVA. .

  The organic peroxide is usually kneaded with EVA using an extruder, a roll mill or the like, but may be dissolved in an organic solvent, a plasticizer, a vinyl monomer or the like and added to the EVA film by an impregnation method.

  Various acryloxy group or methacryloxy group and allyl group-containing compounds can be added to improve EVA physical properties (mechanical strength, optical properties, adhesiveness, weather resistance, whitening resistance, crosslinking speed, etc.). . As the compound used for this purpose, acrylic acid or methacrylic acid derivatives, for example, esters and amides thereof are the most common. As the ester residue, in addition to alkyl groups such as methyl, ethyl, dodecyl, stearyl, lauryl, cyclohexyl groups , Tetrahydrofurfuryl group, aminoethyl group, 2-hydroxyethyl group, 3-hydroxypropyl group, 3-chloro-2-hydroxypropyl group and the like. Further, esters with polyfunctional alcohols such as ethylene glycol, triethylene glycol, polyethylene glycol, trimethylolpropane, and pentaerythritol can also be used. A typical amide is diacetone acrylamide.

  Examples thereof include polyfunctional esters such as acrylic or methacrylic acid esters such as trimethylolpropane, pentaerythritol, glycerin, triallyl cyanurate, triallyl isocyanurate, diallyl phthalate, diallyl isophthalate, diallyl maleate, etc. Examples include allyl group-containing compounds. These are used alone or in combination of two or more, and are usually used in an amount of 0.1 to 2 parts by weight, preferably 0.5 to 5 parts by weight, based on 100 parts by weight of EVA. .

  When EVA is crosslinked by light, a photosensitizer is usually used in an amount of 5 parts by mass or less, preferably 0.1 to 3.0 parts by mass based on 100 parts by mass of EVA instead of the peroxide.

  In this case, usable photosensitizers include, for example, benzoin, benzophenone, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, dibenzyl, 5-nitroacenaphthene, hexachlorocyclopentadiene, p-nitrodiphenyl. , P-nitroaniline, 2,4,6-trinitroaniline, 1,2-benzanthraquinone, 3-methyl-1,3-diaza-1,9-benzanthrone, and the like. Alternatively, two or more types can be mixed and used.

  Moreover, a silane coupling agent is used in combination as an adhesion promoter. As this silane coupling agent, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycid Xylpropyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-chloropropylmethoxysilane, vinyltrichlorosilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N- β (aminoethyl) -γ-aminopropyltrimethoxysilane and the like can be mentioned.

  The silane coupling agent is generally used in an amount of 0.001 to 10 parts by mass, preferably 0.001 to 5 parts by mass, based on 100 parts by mass of EVA, and one or more types are mixed and used.

  In addition, the EVA adhesive layer according to the present invention may further contain a small amount of an ultraviolet absorber, an infrared absorber, an anti-aging agent, a coating processing aid, a colorant, and the like. A small amount of a filler such as hydrophobic silica or calcium carbonate may be included.

  For example, after the EVA and the above-mentioned additive are mixed and kneaded with an extruder, a roll or the like, the adhesive layer is formed into a predetermined shape by a film forming method such as a calendar, roll, T-die extrusion, or inflation. Manufactured by.

  A protective layer may be provided on the antireflection layer. The protective layer is preferably formed in the same manner as the hard coat layer.

  The material of the release sheet provided on the transparent adhesive layer is preferably a transparent polymer having a glass transition temperature of 50 ° C. or higher. Examples of such a material include polyesters such as polyethylene terephthalate, polycyclohexylene terephthalate, and polyethylene naphthalate. In addition to polyamide resins such as nylon resins, nylon 46, modified nylon 6T, nylon MXD6, polyphthalamide, ketone resins such as polyphenylene sulfide and polythioether sulfone, and sulfone resins such as polysulfone and polyether sulfone, Mainly composed of polymers such as polyether nitrile, polyarylate, polyether imide, polyamide imide, polycarbonate, polymethyl methacrylate, triacetyl cellulose, polystyrene, polyvinyl chloride That the resin can be used. Of these, polycarbonate, polymethyl methacrylate, polyvinyl chloride, polystyrene, and polyethylene terephthalate can be suitably used. The thickness is preferably 10 to 200 μm, particularly preferably 30 to 100 μm.

  The optical filter with an electrode part of the present invention can be manufactured as described above using the above material. The display optical filter of the present invention thus obtained is used by being bonded to the surface of an image display glass plate of a display such as a PDP.

  Since the PDP display device of the present invention uses a plastic film as the transparent substrate, the optical filter of the present invention can be directly bonded to the surface of the glass plate, so that one transparent film is used. In this case, the PDP itself can contribute to weight reduction, thickness reduction, and cost reduction. Compared with the case where a front plate made of a transparent molded body is installed on the front side of the PDP, an air layer having a low refractive index can be eliminated between the PDP and the PDP filter, so that visible light reflection due to interface reflection can be achieved. Problems such as an increase in rate and double reflection can be solved, and the visibility of the PDP can be further improved.

  Therefore, the display having the optical filter of the present invention is excellent in antireflection effect and antistatic property, hardly emits dangerous electromagnetic waves, is easy to see, is hardly attached with dust and the like, and can be called a safe display.

EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not limited to a following example.
[Example 1]
<Production of optical filter for display with electrode part>
(Preparation of a rectangular substrate having a hard coat layer and a low refractive index layer)
(1) Formation of low refractive index layer The following formulation:
OPSTAR JN-7212 (manufactured by Nippon Synthetic Rubber Co., Ltd.) 100 parts by weight Methyl ethyl ketone 117 parts by weight Methyl isobutyl ketone 117 parts by weight A coating solution obtained by mixing on the surface with a release agent layer (silicone resin; thickness 2 μm) A 100 μm-thick polyethylene terephthalate (PET) film (width: 200 mm, length 400 mm) having a thickness of 200 μm was applied to the entire surface of the release agent layer using a bar coater and dried in an oven at 80 ° C. for 5 minutes. Thereby, a low refractive index layer (refractive index 1.42) having a thickness of 90 nm was formed on the hard coat layer.

(2) Formation of hard coat layer The following formulation:
Epoxy acrylate (molecular weight 5000-150,000) 40 parts by mass Dipentaerythritol hexaacrylate (DPHA) 40 parts by mass ITO (average particle size 150 nm) 20 parts by mass Methyl ethyl ketone 100 parts by mass Toluene 100 parts by mass Irgacure 184 (manufactured by Ciba Specialty Chemicals) 4 The coating liquid obtained by mixing the mass parts was applied onto the low refractive index layer with a bar coater (see FIG. 1 (1)) and dried. Thereby, a hard coat layer (refractive index 1.52) having a thickness of 6 μm was formed on the release agent layer.

  Thereby, a rectangular substrate having a low refractive index layer and a hard coat layer was produced.

(Preparation of a transparent film having a mesh-like conductive layer)
(3) Formation of mesh-like conductive layer A 20% aqueous solution of polyvinyl alcohol was applied on an adhesive layer of a 100 μm thick PET film (width: 200 mm, length 400 mm) having an adhesive layer (polyester; thickness 2 μm) on the surface. Printed in dots. The size of one dot is a square shape with one side of 234 μm, the interval between the dots is 20 μm, and the dot arrangement is a square lattice. The printing thickness is about 5 μm after drying.

  On top of that, copper was vacuum-deposited to an average film thickness of 4 μm. Next, it was immersed in room temperature water and rubbed with a sponge to dissolve and remove the dot portion, then rinsed with water and dried to form a mesh-like conductive layer on the entire surface of the PET film.

  The conductive layer on the film surface had a square lattice shape corresponding to the negative pattern of dots accurately, the line width was 20 μm, and the aperture ratio was 77%. The average thickness of the conductive layer (copper layer) was 4 μm.

(4) Formation of near-infrared absorbing layer (having color tone correction function)
Polymethyl methacrylate 30 parts by mass TAP-2 (manufactured by Yamada Chemical Co., Ltd.) 0.4 parts by mass Plast Red 8380 (manufactured by Arimoto Chemical Co., Ltd.) 0.1 parts by mass CIR-1085 (manufactured by Nippon Carlit Co., Ltd.) ) 1.3 parts by weight IR-10A (manufactured by Nippon Shokubai Co., Ltd.) 0.6 parts by weight Methyl ethyl ketone 152 parts by weight Methyl isobutyl ketone 18 parts by weight A coating solution obtained on the back surface of the PET film was coated with a bar coater. And dried in an oven at 80 ° C. for 5 minutes, thereby forming a near-infrared absorbing layer (having a color tone correction function) having a thickness of 5 μm on the PET film.

(5) Formation of transparent adhesive layer The following formulation:
SK Dyne 1811L (manufactured by Soken Chemical Co., Ltd.) 100 parts by mass Curing agent L-45 (manufactured by Soken Chemical Co., Ltd.) 0.45 parts by mass Toluene 15 parts by mass Ethyl acetate 4 parts by mass Was coated on the near infrared absorbing layer using a bar coater and dried in an oven at 80 ° C. for 5 minutes. This formed a 25-micrometer-thick transparent adhesive layer on the near-infrared absorption layer.

  This obtained the transparent film which has a conductive layer etc. with a dimension larger than the said rectangular substrate.

(Production of optical filter for display with electrode)
A rectangular substrate having a hard coat layer and a low refractive index layer is left on the conductive layer of the transparent film having a conductive layer or the like so as to leave a band-like portion (width 10 mm) at the edge (terminal) of the four sides. Was laminated so as to be in contact with the conductive layer. The obtained laminate was heated and pressure bonded using a vacuum laminator at a temperature of 90 ° C., a degassing time of 1.5 minutes, a pressing pressure of 4.5 kg / cm ² , and a pressing time of 1.5 minutes.

  The laminated body thus bonded was irradiated with ultraviolet rays from the low refractive index layer side to cure the hard coat layer and the low refractive index layer.

  Next, the rectangular substrate was removed from the obtained cured laminate, and an optical filter for display having an electrode portion of a conductive layer protruding to the periphery was obtained.

[Example 2]
An optical filter for display having an electrode portion was obtained in the same manner as in Example 1 except that a high refractive index layer was provided as described below between the hard coat layer and the low refractive index layer.

(6) Formation of high refractive index layer The following formulation:
Dipentaerythritol hexaacrylate (DPHA) 6 parts by weight ZnO (average particle size 4 nm) 4 parts by weight Methyl ethyl ketone 100 parts by weight Toluene 100 parts by weight Irgacure 184 (manufactured by Ciba Specialty Chemicals) Was coated on the low refractive index layer using a bar coater and dried. As a result, a 90 nm thick high refractive index layer (refractive index 1.70) was formed on the low refractive index layer.

[Example 3]
An optical filter for display having an electrode part was obtained in the same manner as in Example 1 except that the layer thickness of the hard coat layer was changed to 8 μm.

[Example 4]
An optical filter for display having an electrode part was obtained in the same manner as in Example 1 except that the layer thickness of the hard coat layer was changed to 10 μm.

[Example 5]
An optical filter for display having an electrode part was obtained in the same manner as in Example 1 except that the layer thickness of the hard coat layer was changed to 12 μm.

[Comparative Example 1]
The transparent film having the mesh-like conductive layer of Example 1 was used as an optical filter for display having an electrode part.

[Reference Example 1]
An optical filter for display having an electrode part was obtained in the same manner as in Example 1 except that the layer thickness of the hard coat layer was changed to 4 μm.

[Reference Example 2]
An optical filter for display having an electrode portion was obtained in the same manner as in Example 1 except that the thickness of the hard coat layer was changed to 15 μm.

[Evaluation of optical filter]
(1) Dimensional accuracy of surrounding strip-shaped conductive layer The width of the strip-shaped conductive layer around the obtained optical filter was measured at five points, and the accuracy was evaluated. The difference between the maximum width and the minimum width was indicated as ◯ when the difference was within 0.5 mm, and × when 1 mm or more.
(2) Haze The haze of the obtained optical filter was measured according to JIS-K-7105.
(3) Warpage (curl)
The obtained optical filter was placed on a flat glass plate, and the vertical distance from the edge of the most floating part of the four sides of the filter to the glass plate surface was measured. The case where the distance was 5 mm or less was evaluated as ◯, the case where the distance was more than 5 mm and 10 mm or less, and the case where the distance was 10 mm or more.

  The results are shown in Table 1.

  As described above, in the optical filter (other than Comparative Example 1) obtained by the manufacturing method of the present invention, the electrode portion of the conductive layer is formed with high dimensional accuracy, and grounding is extremely easy. Moreover, the optical filter (the thing of an Example) which has the hard-coat layer formed by appropriate layer thickness is excellent also in haze and curl. Thereby, it turns out that it is excellent in transparency suitable for a display display, and the bonding to a display panel.

It is a figure for demonstrating one example of the manufacturing method of the optical filter for displays with an electrode part of this invention. It is a top view of one typical example of the optical filter for displays with an electrode part of this invention. It is a schematic sectional drawing of one example of the preferable aspect of the optical filter for displays with an electrode part of this invention.

Explanation of symbols

10, 20 Optical filter for display 11 Rectangular substrate 11A Release agent layer 12, 22 Transparent film 13, 23 Conductive layer 16, 26 Hard coat layer 17, 27 Antireflection layer 14, 24 Near infrared absorption layer

Claims (24)

  The uncured layer of a rectangular substrate having a predetermined size having an uncured hard coat layer or a near-infrared absorbing layer formed on the entire surface of the peelable surface has a size larger than that of the uncured layer. On the conductive layer of the laminate in which the conductive layer is formed on the entire surface of the rectangular transparent film, the uncured layer is pressed so as to leave a band-like region of the conductive layer around the uncured layer. A method for producing an optical filter for a display having a conductive layer protruding to the periphery as an electrode part, comprising a step of transferring a cured layer onto the conductive layer by removing the rectangular substrate after curing.   The production method according to claim 1, wherein an uncured hard coat layer is formed on the entire surface of the peelable surface.   The production method according to claim 2, wherein an uncured low refractive index layer having the same shape and the same dimensions as the uncured hard coat layer is present between the peelable surface and the uncured hard coat layer.   The uncured high refractive index layer having the same shape and the same dimensions as the uncured hard coat layer is present between the uncured hard coat layer and the uncured low refractive index layer. Production method.   The manufacturing method of Claim 1 which forms a non-hardened near-infrared absorption layer in the said peelable surface whole surface.   The manufacturing method of any one of Claims 2-4 in which the near-infrared absorption layer is formed in the back surface of the rectangular-shaped transparent film which has a conductive layer.   The manufacturing method of any one of Claims 2-4 which forms a near-infrared absorption layer in the back surface of the rectangular transparent film which has a hard-coat layer and a conductive layer, after removing a rectangular-shaped board | substrate.   The manufacturing method of any one of Claims 1-7 in which a near-infrared absorption layer contains a neon light absorption pigment | dye.   The manufacturing method according to any one of claims 1 to 8, wherein the rectangular substrate having a peelable surface is a rectangular substrate having a release agent layer.   The manufacturing method according to claim 1, wherein the conductive layer is a mesh-shaped conductive layer.   The manufacturing method according to claim 10, wherein the ratio of the thickness of the hard coat layer to the thickness of the mesh-like conductive layer is in the range of 2: 1 to 1:10.   Uncured hard coat layer, uncured hard coat layer and uncured low refractive index layer, or uncured hard coat layer, uncured low refractive index layer and uncured high refractive index layer are UV curable The manufacturing method of any one of Claims 1-11 containing resin.   An uncured hard coat layer, an uncured hard coat layer and an uncured low refractive index layer, or an uncured hard coat layer, an uncured low refractive index layer and an uncured high refractive index layer are thermosetting. The manufacturing method of any one of Claims 1-11 containing resin.   The manufacturing method of any one of Claims 1-13 in which a hard-coat layer contains a ultraviolet absorber.   The manufacturing method according to claim 1, wherein the transparent film is a plastic film.   The manufacturing method according to claim 1, wherein the pressure bonding is performed under vacuum.   The manufacturing method of Claim 12 which hardens | cures by ultraviolet irradiation.   The production method according to claim 13, wherein curing is performed by heating.   The optical filter for displays which has a conductive layer which protruded to the circumference as an electrode part obtained by the manufacturing method of any one of Claims 1-18.   The optical filter for display according to claim 19, wherein a transparent adhesive layer is provided on the surface of the near infrared absorbing layer opposite to the transparent film.   The optical filter for display according to claim 20, wherein a release sheet is provided on the transparent adhesive layer.   It is a filter for plasma display panels, The optical filter for displays of any one of Claims 19-21.   A display, wherein the display optical filter according to any one of claims 19 to 21 is bonded to a surface of an image display glass plate.   A plasma display panel, wherein the optical filter for display according to any one of claims 19 to 21 is bonded to a surface of an image display glass plate.

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